|
US3669673A
(en)
|
1970-10-23 |
1972-06-13 |
Rca Corp |
Recording of a continuous tone focused image on a diffraction grating
|
|
US3944420A
(en)
|
1974-05-22 |
1976-03-16 |
Rca Corporation |
Generation of permanent phase holograms and relief patterns in durable media by chemical etching
|
|
US4057326A
(en)
|
1976-05-27 |
1977-11-08 |
Rca Corporation |
Simplified and improved diffractive subtractive color filtering technique
|
|
DE2657246C2
(de)
|
1976-12-17 |
1978-09-28 |
Hoechst Ag, 6000 Frankfurt |
Original eines Informationsträgers, Verfahren zum Herstellen des Originals, Verfahren zum Herstellen einer Matrize zum Prägen des Originals sowie Informa tionsträger, der mit der Matrize hergestellt ist
|
|
JPS5634205A
(en)
|
1979-08-28 |
1981-04-06 |
Nec Corp |
Feedback amplifier
|
|
JPS6033503A
(ja)
*
|
1983-08-05 |
1985-02-20 |
Agency Of Ind Science & Technol |
ブレ−ズド格子の製造方法
|
|
JPS6033504A
(ja)
*
|
1983-08-05 |
1985-02-20 |
Agency Of Ind Science & Technol |
ブレ−ズド格子の製造方法
|
|
JPS60103310A
(ja)
|
1983-11-11 |
1985-06-07 |
Pioneer Electronic Corp |
マイクロフレネルレンズの製造方法
|
|
JPS60188909A
(ja)
*
|
1984-03-08 |
1985-09-26 |
Canon Inc |
グレ−テイングカツプラ−の作製方法
|
|
JPS6242103A
(ja)
*
|
1985-08-20 |
1987-02-24 |
Nippon Sheet Glass Co Ltd |
ブレ−ズ格子の製造方法
|
|
JPS63168601A
(ja)
*
|
1986-12-29 |
1988-07-12 |
Shimadzu Corp |
回折格子及びその作製方法
|
|
JPS6415705A
(en)
|
1987-07-09 |
1989-01-19 |
Matsushita Electric Industrial Co Ltd |
Production of fine element
|
|
US5113288A
(en)
|
1990-04-04 |
1992-05-12 |
Nikon Corporation |
Behind stop wide angle lens system
|
|
JPH04186829A
(ja)
*
|
1990-11-21 |
1992-07-03 |
Fujitsu Ltd |
半導体装置の製造方法
|
|
DE4100291C1
(enExample)
|
1991-01-08 |
1991-10-02 |
Leybold Ag, 6450 Hanau, De |
|
|
JPH06258510A
(ja)
|
1993-03-09 |
1994-09-16 |
Canon Inc |
回折格子製作用成形型およびその製造方法
|
|
US5561558A
(en)
|
1993-10-18 |
1996-10-01 |
Matsushita Electric Industrial Co., Ltd. |
Diffractive optical device
|
|
JP3323884B2
(ja)
*
|
1994-02-08 |
2002-09-09 |
シャープ株式会社 |
ホログラフィック回折格子の製造方法
|
|
DE4421392A1
(de)
|
1994-06-18 |
1995-12-21 |
Karlsruhe Forschzent |
Gitterstruktur und deren Verwendung
|
|
US5907436A
(en)
|
1995-09-29 |
1999-05-25 |
The Regents Of The University Of California |
Multilayer dielectric diffraction gratings
|
|
JPH1078667A
(ja)
|
1996-09-04 |
1998-03-24 |
Ebara Corp |
微細加工方法
|
|
CA2197706A1
(en)
|
1997-02-14 |
1998-08-14 |
Peter Ehbets |
Method of fabricating apodized phase mask
|
|
US6071652A
(en)
|
1997-03-21 |
2000-06-06 |
Digital Optics Corporation |
Fabricating optical elements using a photoresist formed from contact printing of a gray level mask
|
|
JPH1131863A
(ja)
|
1997-07-11 |
1999-02-02 |
Hitachi Ltd |
回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム
|
|
US6475704B1
(en)
|
1997-09-12 |
2002-11-05 |
Canon Kabushiki Kaisha |
Method for forming fine structure
|
|
JPH11160510A
(ja)
|
1997-09-12 |
1999-06-18 |
Canon Inc |
多段階段状素子の作製方法又は該素子作製用モールド型の作製方法
|
|
CA2214927A1
(en)
|
1997-10-31 |
1999-04-30 |
Pin Long |
Methods for making phase masks with spatial variable first order efficiency for fiber bragg grating fabrication
|
|
US6534221B2
(en)
|
1998-03-28 |
2003-03-18 |
Gray Scale Technologies, Inc. |
Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics
|
|
JP3576885B2
(ja)
|
1998-09-18 |
2004-10-13 |
キヤノン株式会社 |
素子の製造方法
|
|
US6670105B2
(en)
|
1998-09-18 |
2003-12-30 |
Canon Kabushiki Kaisha |
Method of manufacturing diffractive optical element
|
|
JP2000258608A
(ja)
|
1999-03-11 |
2000-09-22 |
Canon Inc |
光学素子への成膜方法
|
|
JP2001004821A
(ja)
|
1999-06-24 |
2001-01-12 |
Canon Inc |
回折光学素子及びその製造方法
|
|
JP3569911B2
(ja)
|
1999-11-02 |
2004-09-29 |
久夫 高津 |
粘着テープ体
|
|
JP2001343512A
(ja)
|
2000-05-31 |
2001-12-14 |
Canon Inc |
回折光学素子及びそれを有する光学系
|
|
WO2002006860A1
(en)
|
2000-07-13 |
2002-01-24 |
Network Photonics, Inc. |
Diffraction grating with reduced polarization-dependent loss
|
|
JP2002189112A
(ja)
|
2000-12-22 |
2002-07-05 |
Canon Inc |
回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス
|
|
KR100368930B1
(ko)
|
2001-03-29 |
2003-01-24 |
한국과학기술원 |
반도체 기판 위에 높이 떠 있는 3차원 금속 소자, 그 회로모델, 및 그 제조방법
|
|
CN100592112C
(zh)
|
2002-02-12 |
2010-02-24 |
奥尔利康贸易股份公司（特吕巴赫） |
包括亚微米空心空间的部件
|
|
US6913871B2
(en)
|
2002-07-23 |
2005-07-05 |
Intel Corporation |
Fabricating sub-resolution structures in planar lightwave devices
|
|
US6905618B2
(en)
|
2002-07-30 |
2005-06-14 |
Agilent Technologies, Inc. |
Diffractive optical elements and methods of making the same
|
|
EP1547132A1
(en)
|
2002-09-18 |
2005-06-29 |
Tokyo University of Science |
Surface processing method
|
|
JP4349104B2
(ja)
|
2003-11-27 |
2009-10-21 |
株式会社島津製作所 |
ブレーズド・ホログラフィック・グレーティング、その製造方法、及びレプリカグレーティング
|
|
JP2005202104A
(ja)
|
2004-01-15 |
2005-07-28 |
Nikon Corp |
偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置
|
|
US20050275944A1
(en)
|
2004-06-11 |
2005-12-15 |
Wang Jian J |
Optical films and methods of making the same
|
|
JP4415774B2
(ja)
|
2004-06-30 |
2010-02-17 |
富士ゼロックス株式会社 |
画像形成装置および画像形成方法
|
|
CN1797199A
(zh)
|
2004-12-22 |
2006-07-05 |
中国科学院光电技术研究所 |
移动灰阶掩模微纳结构成形方法
|
|
KR20060090433A
(ko)
|
2005-02-05 |
2006-08-11 |
삼성에스디아이 주식회사 |
평판 디스플레이 장치 및 이의 제조 방법
|
|
WO2006120720A1
(ja)
|
2005-05-02 |
2006-11-16 |
Oki Electric Industry Co., Ltd. |
回折光学素子の製造方法
|
|
JP2007057622A
(ja)
|
2005-08-22 |
2007-03-08 |
Ricoh Co Ltd |
光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型
|
|
EP1930776A4
(en)
|
2005-09-09 |
2008-11-26 |
Univ Tokyo Sci Educ Found |
PROCESS FOR PRODUCING A THREE-DIMENSIONAL FORM, PROCESS FOR MANUFACTURING A MICROFABRICATION PRODUCT, PROCESS FOR PRODUCING A MICROSTRUCTURE FORMULATION, THREE-DIMENSIONAL FORM, MICROFABRICATION PRODUCT, MICROSTRUCTURE FORMING AND OPTICAL DEVICE
|
|
EP1942364A1
(en)
|
2005-09-14 |
2008-07-09 |
Mirage Innovations Ltd. |
Diffractive optical relay and method for manufacturing the same
|
|
DE602007001530D1
(de)
|
2006-01-21 |
2009-08-20 |
Suisse Electronique Microtech |
Modensprungfreies laser mit einem mikrohergestelltes gitter mit blaze-bereich
|
|
JP2007212575A
(ja)
|
2006-02-07 |
2007-08-23 |
Ricoh Co Ltd |
光回折素子、光線走査方法、光線走査装置及び画像形成装置
|
|
JP2007328096A
(ja)
|
2006-06-07 |
2007-12-20 |
Ricoh Co Ltd |
回折光学素子とその作製方法および光学モジュール
|
|
WO2008022097A2
(en)
|
2006-08-15 |
2008-02-21 |
Api Nanofabrication And Research Corp. |
Methods for forming patterned structures
|
|
JP2008089923A
(ja)
|
2006-09-29 |
2008-04-17 |
Oki Electric Ind Co Ltd |
光学素子の製造方法
|
|
DE102007021036A1
(de)
|
2007-05-04 |
2008-11-06 |
Carl Zeiss Ag |
Anzeigevorrichtung und Anzeigeverfahren zur binokularen Darstellung eines mehrfarbigen Bildes
|
|
US8317321B2
(en)
|
2007-07-03 |
2012-11-27 |
Pixeloptics, Inc. |
Multifocal lens with a diffractive optical power region
|
|
US20090023011A1
(en)
|
2007-07-20 |
2009-01-22 |
Hewlett-Packard Development Company, L.P. |
Systems and Methods for Forming Conductive Traces on Plastic Substrates
|
|
KR100947945B1
(ko)
*
|
2007-11-30 |
2010-03-15 |
주식회사 동부하이텍 |
반도체 소자의 제조 방법
|
|
US20090231702A1
(en)
|
2008-03-17 |
2009-09-17 |
Qihong Wu |
Optical films and methods of making the same
|
|
JP5194925B2
(ja)
*
|
2008-03-25 |
2013-05-08 |
オムロン株式会社 |
レジスト露光方法
|
|
US7972959B2
(en)
|
2008-12-01 |
2011-07-05 |
Applied Materials, Inc. |
Self aligned double patterning flow with non-sacrificial features
|
|
JP5402317B2
(ja)
|
2009-06-29 |
2014-01-29 |
セイコーエプソン株式会社 |
偏光素子および偏光素子の製造方法、投写型表示装置、液晶装置、電子機器
|
|
US8435415B2
(en)
|
2009-11-24 |
2013-05-07 |
The United States of America, as represented by the Secretary of Commerce, The National Institute of Standards and Technology |
Nanofabrication process and nanodevice
|
|
US9791623B2
(en)
|
2009-11-30 |
2017-10-17 |
Board Of Regents, The University Of Texas System |
Multilevel leaky-mode resonant optical devices
|
|
JP2011215267A
(ja)
|
2010-03-31 |
2011-10-27 |
Nagoya Univ |
色消しレンズとその製造方法、および色消しレンズを備えた光学装置
|
|
WO2011129814A1
(en)
|
2010-04-13 |
2011-10-20 |
Hewlett-Packard Development Company, L.P. |
Controlling phase response in a sub-wavelength grating optical device
|
|
JP2012013930A
(ja)
|
2010-06-30 |
2012-01-19 |
Nagoya Univ |
グリズムとその製造方法、およびグリズムを備えた光学装置
|
|
SG10201508629SA
(en)
|
2010-10-28 |
2015-11-27 |
Univ Singapore |
Lithography method and apparatus
|
|
CN101986173B
(zh)
|
2010-12-02 |
2012-04-25 |
苏州大学 |
一种计算全息片
|
|
CN102360093A
(zh)
*
|
2011-10-19 |
2012-02-22 |
苏州大学 |
一种全息闪耀光栅制作方法
|
|
CN102323634B
(zh)
*
|
2011-10-19 |
2016-06-22 |
苏州大学 |
一种全息双闪耀光栅的制作方法
|
|
TWI440833B
(zh)
|
2011-12-30 |
2014-06-11 |
Oto Photonics Inc |
混合式繞射光柵、模具及繞射光柵及其模具的製造方法
|
|
WO2015035127A1
(en)
|
2013-09-06 |
2015-03-12 |
Massachusetts Institute Of Technology |
Metallic dielectric photonic crystals and methods of fabrication
|
|
JP5929860B2
(ja)
|
2013-09-24 |
2016-06-08 |
ウシオ電機株式会社 |
グリッド偏光素子製造方法
|
|
CN103901520B
(zh)
|
2014-04-23 |
2016-07-06 |
中国科学技术大学 |
一种顶角90°三角形槽阶梯光栅的制作方法
|
|
US20160033784A1
(en)
|
2014-07-30 |
2016-02-04 |
Tapani Levola |
Optical Components
|
|
KR20160020622A
(ko)
|
2014-08-13 |
2016-02-24 |
삼성디스플레이 주식회사 |
편광 소자 및 이의 제조방법
|
|
EP3012860A1
(en)
|
2014-10-22 |
2016-04-27 |
IMEC vzw |
A method for forming contact vias
|
|
US9941389B2
(en)
|
2015-04-20 |
2018-04-10 |
Board Of Regents, The University Of Texas System |
Fabricating large area multi-tier nanostructures
|
|
WO2016185602A1
(ja)
|
2015-05-21 |
2016-11-24 |
ナルックス株式会社 |
回折光学素子
|
|
US9946072B2
(en)
|
2015-10-29 |
2018-04-17 |
Microsoft Technology Licensing, Llc |
Diffractive optical element with uncoupled grating structures
|
|
KR102626696B1
(ko)
|
2015-11-13 |
2024-01-19 |
도판 인사츠 가부시키가이샤 |
고체 촬상 소자 및 그의 제조 방법
|
|
SG10202004257WA
(en)
|
2015-11-24 |
2020-06-29 |
Harvard College |
Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum
|
|
CN109196387A
(zh)
|
2016-04-05 |
2019-01-11 |
哈佛学院院长及董事 |
用于亚波长分辨率成像的超透镜
|
|
US9885870B2
(en)
|
2016-04-25 |
2018-02-06 |
Microsoft Technology Licensing, Llc |
Diffractive optical elements with analog modulations and switching
|
|
US10061124B2
(en)
|
2016-04-29 |
2018-08-28 |
Microsoft Technology Licensing, Llc |
Robust architecture for large field of view components
|
|
CN105785493B
(zh)
|
2016-05-09 |
2019-01-22 |
深圳市华星光电技术有限公司 |
金属光栅偏光片及其制作方法
|
|
US10241244B2
(en)
|
2016-07-29 |
2019-03-26 |
Lumentum Operations Llc |
Thin film total internal reflection diffraction grating for single polarization or dual polarization
|
|
WO2018026412A1
(en)
|
2016-08-02 |
2018-02-08 |
The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory |
Fabrication method for digital etching of nanometer-scale level structures
|
|
CN110036317B
(zh)
*
|
2016-10-05 |
2021-11-26 |
奇跃公司 |
制作非均匀衍射光栅
|
|
JP6923277B2
(ja)
|
2016-12-23 |
2021-08-25 |
インテル・コーポレーション |
高度なリソグラフィおよび自己組織化デバイス
|
|
CN116520644A
(zh)
*
|
2017-11-29 |
2023-08-01 |
应用材料公司 |
波导组合器的直接蚀刻制造的方法
|
|
US10598832B2
(en)
*
|
2018-01-09 |
2020-03-24 |
Varian Semiconductor Equipment Associates, Inc. |
System and method for forming diffracted optical element having varied gratings
|
|
US10649141B1
(en)
|
2018-04-23 |
2020-05-12 |
Facebook Technologies, Llc |
Gratings with variable etch heights for waveguide displays
|
|
US10761334B2
(en)
*
|
2018-07-13 |
2020-09-01 |
Varian Semiconductor Equipment Associates, Inc. |
System and method for optimally forming gratings of diffracted optical elements
|
|
US10795173B2
(en)
|
2018-07-13 |
2020-10-06 |
Varian Semiconductor Equipment Associates, Inc. |
System and method for optimally forming gratings of diffracted optical elements
|
|
EP4745457A3
(en)
*
|
2018-07-24 |
2026-07-22 |
Magic Leap, Inc. |
Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods
|
|
US11226439B2
(en)
*
|
2018-11-09 |
2022-01-18 |
Applied Materials, Inc. |
System and method for forming surface relief gratings
|
|
US11512385B2
(en)
*
|
2018-12-17 |
2022-11-29 |
Applied Materials, Inc. |
Method of forming gratings
|
|
WO2020131317A1
(en)
*
|
2018-12-17 |
2020-06-25 |
Applied Materials, Inc. |
Methods for controlling etch depth by localized heating
|
|
WO2020185954A1
(en)
|
2019-03-12 |
2020-09-17 |
Magic Leap, Inc. |
Waveguides with high index materials and methods of fabrication thereof
|
|
EP4018230B1
(en)
*
|
2019-08-21 |
2024-07-31 |
Snap Inc. |
Manufacture of surface relief structures
|
|
US10823888B1
(en)
*
|
2019-11-12 |
2020-11-03 |
Applied Materials, Inc. |
Methods of producing slanted gratings with variable etch depths
|
|
US11226446B2
(en)
*
|
2020-05-06 |
2022-01-18 |
Facebook Technologies, Llc |
Hydrogen/nitrogen doping and chemically assisted etching of high refractive index gratings
|
|
US20220397708A1
(en)
*
|
2021-06-10 |
2022-12-15 |
Meta Platforms Technologies, Llc |
Method of etching surface-relief structures
|