FI117369B - Förfarande för tillverkning av en elektronikmodul - Google Patents
Förfarande för tillverkning av en elektronikmodul Download PDFInfo
- Publication number
- FI117369B FI117369B FI20041524A FI20041524A FI117369B FI 117369 B FI117369 B FI 117369B FI 20041524 A FI20041524 A FI 20041524A FI 20041524 A FI20041524 A FI 20041524A FI 117369 B FI117369 B FI 117369B
- Authority
- FI
- Finland
- Prior art keywords
- layer
- conductor
- component
- film
- contact
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 62
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000004020 conductor Substances 0.000 claims description 82
- 230000001070 adhesive effect Effects 0.000 claims description 39
- 239000000853 adhesive Substances 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 25
- 238000009413 insulation Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 5
- 238000001465 metallisation Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 160
- 239000011810 insulating material Substances 0.000 description 30
- 239000012790 adhesive layer Substances 0.000 description 16
- 239000010949 copper Substances 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000003292 glue Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000004026 adhesive bonding Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000012774 insulation material Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
- H05K1/188—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit manufactured by mounting on or attaching to a structure having a conductive layer, e.g. a metal foil, such that the terminals of the component are connected to or adjacent to the conductive layer before embedding, and by using the conductive layer, which is patterned after embedding, at least partially for connecting the component
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
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- H—ELECTRICITY
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/19—Manufacturing methods of high density interconnect preforms
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- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L24/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
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- H01L24/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
- H01L2224/82009—Pre-treatment of the connector or the bonding area
- H01L2224/8203—Reshaping, e.g. forming vias
- H01L2224/82035—Reshaping, e.g. forming vias by heating means
- H01L2224/82039—Reshaping, e.g. forming vias by heating means using a laser
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
- H01L2224/82009—Pre-treatment of the connector or the bonding area
- H01L2224/8203—Reshaping, e.g. forming vias
- H01L2224/82047—Reshaping, e.g. forming vias by mechanical means, e.g. severing, pressing, stamping
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8312—Aligning
- H01L2224/83121—Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors
- H01L2224/83132—Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors using marks formed outside the semiconductor or solid-state body, i.e. "off-chip"
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- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
- H01L2224/9212—Sequential connecting processes
- H01L2224/92142—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92144—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
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- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
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- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Claims (12)
1. Förfarande för tillverkning av en elektronikmodul, vilken innehäller ätminstone en komponent (6) med ätminstone ett kontaktomräde (7), vilket är elektriskt anslutet tili ett 5 ledarmönsterskikt (14), k ä n n e t e c k n a t av att vid förfarandet: - väljs en skiktfilm, vilken omfattar ätminstone ett ledarskikt (4) samt ett isoleringsskikt (10) pä en första yta av ledarskiktet (4), - utformas kontaktöppningar (17), vilkas inbördes position motsvarar den inbördes positionen for vaije for fästning avsedd komponents (6) kontaktomräden (7) och 10 vilka penetrerar bäde ledarskiktet (4) och isoleringsskiktet (10), - fasts efter utformningen av kontaktöppningama (17) varje komponent (6) pä ytan (6) av skiktfilmens isoleringsskikt (10) pä sä sätt anordnat, att komponentens (6) kontaktomräden (7) kommer att ligga mot motsvarande kontaktöppningar (17), - framställs ätminstone i kontaktöppningama (17) och komponentens (6) kontakt- 15 omraden (7) ledarraaterial, vilket ansluter komponenten (6) tili ledarskiktet (4), och - ledarskiktet (4) konfigureras tili ett ledarmönsterskikt (14). M· * • «M • « • i i « ♦· • ·
2. Förfarande i enlighet med patentkrav 1, kännetecknat av att före *:**: utformningen av kontaktöppningama (17): bestär skiktfilmen av ett ledarskikt (4) samt 20 ett isoleringsskikt (10) pä den första ytan av ledarskiktet (4). • v · i * • * «ta I
: 3. Förfarande i enlighet med patentkrav 1, kännetecknat av att före I utformningen av kontaktöppningama (17): omfattar skiktfilmen ett stödskikt (12) pä I den andra ytan av ledarskiktet (4). I M * 117369
4. Förfarande i enlighet med nägot av patentkraven 1-3, kännetecknat av att före utformningen av kontaktöppningama (17): innehäller skiktfilmens ledarskikt (4) väsentligen alli det ledarmaterial varav ledarmonsterskiktet (14) senare bildas.
5 5. Förfarande i enlighet med nägot av patentkraven 1-4, kännetecknat av att skiktfilmens isoleringsskikt (10) utgörs av epoxi.
6. Förfarande i enlighet med nägot av patentkraven 1-5, kännetecknat av att tjockleken av skiktfilmens isoleringsskikt (10) ligger under 10 mikrometer, lämpligen i 10 intervallet 4-7 mikrometer.
7. Förfarande i enlighet med nägot av patentkraven 1-6, kännetecknat av att komponenten fasts vid isoleringsskiktet (10) medelst isolerande lim (5). 15
8. Förfarande i enlighet med nägot av patentkraven 1-7, kännetecknat av att ·;· ledarmaterialet, som ansluter komponenten (6) tili ledarskiktet (4), framställs medelst *··« ett kemiskt och/eller elektrokemiskt metalliseringsförfarande. • e * « · • · · ··· · * » ββ·ϊ·
9. Förfarande i enlighet med nägot av patentkraven 1-8, kännetecknat av att 20 ledarmaterialet, som ansluter komponenten (6) tili ledarskiktet (4), utformas genom att fylla kontaktöppningama (17) med ledarmaterial, t.ex. ledande pasta. • i « e t · » ·#· ··# • ψ *99 9 : V.
10. Förfarande i enlighet med nägot av patentkraven 1-9, kännetecknat av att i • * . * * ·; elektronikmodulen tillverkas ätminstone ett andra ledarmönsterskikt (19). at* ·:··: 25 99 9 9 9 9 9 9 * t 117369
11. Förfarande i enlighet med nigot av patentkraven 1-10, kännetecknat av att i elektronikmodulen anordnas flera än en komponent (6) och de insänkta komponentema (6) ansluts elektriskt med varandra för att bilda en fimktionell helhet. 5
12. Förfarande i enlighet med nägot av patentkraven 1-11, där ätminstone en komponent (6) avsedd att fästas vid ledarskiktet (4) utgörs av en icke-packad mikrokretschip. • f · « «««« • · • « 1 • ·· • 9 • 1 • · » * · « ««I « ft ft ft ··· ft • ••ft ft ·· ft ft ft ft ft ft ft • • ft ft ft ft ft • •ft • ft· ft ft ft ft ··· ft • ft ft ft ft ft • ft ft ft ftft ft ft ft ft ft·· ft • ft ft «· ft ft · ft • ft ft ft
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20041524A FI117369B (sv) | 2004-11-26 | 2004-11-26 | Förfarande för tillverkning av en elektronikmodul |
JP2007542017A JP5160895B2 (ja) | 2004-11-26 | 2005-11-23 | 電子モジュールの製造方法 |
PCT/FI2005/000499 WO2006056643A2 (en) | 2004-11-26 | 2005-11-23 | Method for manufacturing an electronics module |
CN2005800402916A CN101065843B (zh) | 2004-11-26 | 2005-11-23 | 制造电子模块的方法 |
US11/667,429 US8062537B2 (en) | 2004-11-26 | 2005-11-23 | Method for manufacturing an electronics module |
KR1020077014479A KR101101603B1 (ko) | 2004-11-26 | 2005-11-23 | 전자 모듈 제조 방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FI20041524 | 2004-11-26 | ||
FI20041524A FI117369B (sv) | 2004-11-26 | 2004-11-26 | Förfarande för tillverkning av en elektronikmodul |
Publications (3)
Publication Number | Publication Date |
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FI20041524A0 FI20041524A0 (sv) | 2004-11-26 |
FI20041524A FI20041524A (sv) | 2006-03-17 |
FI117369B true FI117369B (sv) | 2006-09-15 |
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FI20041524A FI117369B (sv) | 2004-11-26 | 2004-11-26 | Förfarande för tillverkning av en elektronikmodul |
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US (1) | US8062537B2 (sv) |
JP (1) | JP5160895B2 (sv) |
KR (1) | KR101101603B1 (sv) |
CN (1) | CN101065843B (sv) |
FI (1) | FI117369B (sv) |
WO (1) | WO2006056643A2 (sv) |
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- 2004-11-26 FI FI20041524A patent/FI117369B/sv active IP Right Grant
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2005
- 2005-11-23 KR KR1020077014479A patent/KR101101603B1/ko active IP Right Grant
- 2005-11-23 CN CN2005800402916A patent/CN101065843B/zh active Active
- 2005-11-23 JP JP2007542017A patent/JP5160895B2/ja active Active
- 2005-11-23 US US11/667,429 patent/US8062537B2/en active Active
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US8742572B2 (en) | 2006-08-04 | 2014-06-03 | Micron Technology, Inc. | Microelectronic devices and methods for manufacturing microelectronic devices |
Also Published As
Publication number | Publication date |
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KR20070086645A (ko) | 2007-08-27 |
KR101101603B1 (ko) | 2012-01-02 |
US8062537B2 (en) | 2011-11-22 |
US20070267136A1 (en) | 2007-11-22 |
FI20041524A (sv) | 2006-03-17 |
WO2006056643A2 (en) | 2006-06-01 |
FI20041524A0 (sv) | 2004-11-26 |
CN101065843B (zh) | 2010-08-18 |
WO2006056643A3 (en) | 2006-11-09 |
JP5160895B2 (ja) | 2013-03-13 |
CN101065843A (zh) | 2007-10-31 |
JP2008522396A (ja) | 2008-06-26 |
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