JP5833926B2 - 電子構成部品をプリント回路基板に組み込むための方法 - Google Patents
電子構成部品をプリント回路基板に組み込むための方法 Download PDFInfo
- Publication number
- JP5833926B2 JP5833926B2 JP2011533484A JP2011533484A JP5833926B2 JP 5833926 B2 JP5833926 B2 JP 5833926B2 JP 2011533484 A JP2011533484 A JP 2011533484A JP 2011533484 A JP2011533484 A JP 2011533484A JP 5833926 B2 JP5833926 B2 JP 5833926B2
- Authority
- JP
- Japan
- Prior art keywords
- perforations
- conductive
- layer
- insulating layer
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 199
- 239000010410 layer Substances 0.000 claims description 277
- 230000015572 biosynthetic process Effects 0.000 claims description 41
- 239000000853 adhesive Substances 0.000 claims description 18
- 230000001070 adhesive effect Effects 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- 239000000654 additive Substances 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 11
- 239000011810 insulating material Substances 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 238000005553 drilling Methods 0.000 claims description 10
- 238000010030 laminating Methods 0.000 claims description 10
- 238000003825 pressing Methods 0.000 claims description 10
- 239000011241 protective layer Substances 0.000 claims description 8
- 239000003550 marker Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229920000642 polymer Polymers 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000000059 patterning Methods 0.000 description 39
- 238000010348 incorporation Methods 0.000 description 31
- 230000008569 process Effects 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 14
- 230000010354 integration Effects 0.000 description 9
- 239000004020 conductor Substances 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 125000002524 organometallic group Chemical group 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 238000004886 process control Methods 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- 239000005751 Copper oxide Substances 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 229910000431 copper oxide Inorganic materials 0.000 description 3
- 238000007373 indentation Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000012811 non-conductive material Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L24/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
- H05K1/188—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit manufactured by mounting on or attaching to a structure having a conductive layer, e.g. a metal foil, such that the terminals of the component are connected to or adjacent to the conductive layer before embedding, and by using the conductive layer, which is patterned after embedding, at least partially for connecting the component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68345—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self supporting substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/2401—Structure
- H01L2224/2402—Laminated, e.g. MCM-L type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus
- H01L2224/83005—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus being a temporary or sacrificial substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8312—Aligning
- H01L2224/83121—Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8312—Aligning
- H01L2224/83121—Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors
- H01L2224/83132—Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors using marks formed outside the semiconductor or solid-state body, i.e. "off-chip"
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
- H01L2224/9212—Sequential connecting processes
- H01L2224/92142—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92144—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01032—Germanium [Ge]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09509—Blind vias, i.e. vias having one side closed
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09918—Optically detected marks used for aligning tool relative to the PCB, e.g. for mounting of components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10954—Other details of electrical connections
- H05K2201/10977—Encapsulated connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
- H05K2203/108—Using a plurality of lasers or laser light with a plurality of wavelengths
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1461—Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
- H05K2203/1469—Circuit made after mounting or encapsulation of the components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
- H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49146—Assembling to base an electrical component, e.g., capacitor, etc. with encapsulating, e.g., potting, etc.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Description
薄い絶縁層(15から30μm)および/または充填剤含有量が少ない接着剤
パルスCO2レーザー
パワー:3ワット
ビーム直径:180μm
パルス持続時間:6μs
パルス数:13
穴の直径:75μm
厚い絶縁層(30から50μm)および/または充填剤含有量が多い接着剤
パルスCO2レーザー
パワー:4ワット
ビーム直径:280μm
パルス持続時間:8μs
パルス数:13
穴の直径:120μm
Claims (17)
- 電子構成部品(4)をプリント回路基板に組み込むための方法であって、
導電または伝導層(2)および非導電または絶縁層(1)を含んで構成される積層板に固定される電子構成部品(4)が、絶縁層(1)の方向へ向いた接点(6)を備え、
電子構成部品(4)が絶縁層(1)に固定されると、電子構成部品(4)の接点(6)に対応した穴または穿孔(8、11)が導電層(2)および絶縁層(1)の双方に別々の方法ステップで形成され、接点(6)がその後に導電層(2)と接触され、
絶縁層(1)への電子構成部品(4)の固定の前に、絶縁層(1)での当該部品(4)の位置出しおよび位置合わせのため、少なくとも1つのマーカー(15)が、レーザーを用いて絶縁層(1)および導電層(2)の双方を貫通する同径の穴または穿孔により形成されることを特徴とする、方法。 - 電子構成部品(4)が絶縁層(1)に固定されると、絶縁材料(7、16、17、18)により囲まれるかまたは被覆されることを特徴とする、請求項1に記載の方法。
- 電子構成部品(4)の被覆が複数の絶縁層(16、17)のプレス加工またはラミネート加工によって実現されることを特徴とする、請求項2に記載の方法。
- 電子構成部品(4)の固定の前に、少なくとも1つのキャリアまたは保護層(3、26)が、導電層(2)上、絶縁層(1)の反対側の表面上に備えられ、絶縁材料による電子構成部品(4)の被覆(7、18)の後に除去されることを特徴とする、請求項2または3に記載の方法。
- キャリアまたは保護層(26)が金属シートまたはポリマーで形成されることを特徴とする、請求項4に記載の方法。
- 電子構成部品(4)が接着剤(5)により絶縁層(1)に固定されることを特徴とする、請求項1から5のいずれか一項に記載の方法。
- 絶縁層(1)への電子構成部品(4)の固定に、熱伝達性または熱伝導性の接着材料(5)が使用されることを特徴とする、請求項6に記載の方法。
- 導電層(2)の穴または穿孔(8)が穴開け手順またはエッチング手順により形成されることを特徴とする、請求項1から7のいずれか一項に記載の方法。
- 導電層(2)の穴または穿孔(8)がUVレーザーを用いて形成されることを特徴とする、請求項1から8のいずれか一項に記載の方法。
- 絶縁層(1)の穴または穿孔(11)がCO2レーザー(12、32)を用いて形成されることを特徴とする、請求項1から9のいずれか一項に記載の方法。
- 寸法または直径が導電層(2)の穴または穿孔(11)の正味の幅を超過するレーザービーム(12)が、絶縁層(1)の穴または穿孔(11)の別々の形成のために使用されることを特徴とする、請求項10に記載の方法。
- 絶縁層(2)に穴または穿孔(11)を別々に形成するため、0.1から75Wのパワーを有するパルスCO2レーザーが、0.1から20μsの期間またはパルス長で使用されることを特徴とする、請求項10または11に記載の方法。
- 導電層(2)および絶縁層(1)の電子構成部品(4)の接点(6)に対応する穴または穿孔(8)を形成することに加えて、後続のフィードスルー(23)を形成しおよび/または回路基板素子(31)の外縁を定めるための追加の穿孔を備えるため、積層板(10)への電子構成部品(4)の固定化の領域外で、少なくとも1つの追加の穿孔(20、21)が形成されることを特徴とする、請求項1から12のいずれか一項に記載の方法。
- 追加の穿孔(20、21)が事前に作成されたマーカー(15)に対して形成されることを特徴とする、請求項13に記載の方法。
- 導電および絶縁層(1、2)に穴または穿孔(8、11)を形成するのに用いられるレーザービーム(9、12、32)が、フィードスルー(23)の形成および/または外縁の画定用の追加の穿孔(20、21)の形成に使用されることを特徴とする、請求項13または14に記載の方法。
- 電子構成部品(4)に面する絶縁層(1)が、導電層(2)と電子構成部品(4)を取り囲む材料(7、16、17、18)との間の接着性を向上させる層で形成されることを特徴とする、請求項1から15のいずれか一項に記載の方法。
- 導電パターンを形成するための積層板(10)の電子構成部品(4)および/または導電層(2)の接点(6)を接触させるための導電層(13、22)が、セミアディティブ法またはサブトラクティブ法によって付着および/またはパターン化されることを特徴とする、請求項1から16のいずれか一項に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT0061908U AT12316U1 (de) | 2008-10-30 | 2008-10-30 | Verfahren zur integration eines elektronischen bauteils in eine leiterplatte |
ATGM619/2008 | 2008-10-30 | ||
AT5292009 | 2009-08-25 | ||
ATGM529/2009 | 2009-08-25 | ||
PCT/AT2009/000418 WO2010048653A2 (de) | 2008-10-30 | 2009-10-28 | Verfahren zur integration eines elektronischen bauteils in eine leiterplatte |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012507154A JP2012507154A (ja) | 2012-03-22 |
JP5833926B2 true JP5833926B2 (ja) | 2015-12-16 |
Family
ID=41572549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011533484A Active JP5833926B2 (ja) | 2008-10-30 | 2009-10-28 | 電子構成部品をプリント回路基板に組み込むための方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8914974B2 (ja) |
EP (1) | EP2342958B1 (ja) |
JP (1) | JP5833926B2 (ja) |
KR (1) | KR20110076979A (ja) |
CN (1) | CN102204418B (ja) |
WO (1) | WO2010048653A2 (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102204418B (zh) * | 2008-10-30 | 2016-05-18 | At&S奥地利科技及系统技术股份公司 | 用于将电子部件集成到印制电路板中的方法 |
KR101283821B1 (ko) * | 2011-05-03 | 2013-07-08 | 엘지이노텍 주식회사 | 인쇄회로기판의 제조 방법 |
DE102012003603A1 (de) * | 2012-02-21 | 2013-08-22 | Giesecke & Devrient Gmbh | Elektronisches Modul und portabler Datenträger mit elektronischem Modul |
AT513047B1 (de) * | 2012-07-02 | 2014-01-15 | Austria Tech & System Tech | Verfahren zum Einbetten zumindest eines Bauteils in eine Leiterplatte |
EP2897447A4 (en) * | 2012-09-11 | 2016-05-25 | Meiko Electronics Co Ltd | METHOD FOR PRODUCING A SUBSTRATE WITH AN EMBEDDED COMPONENT AND SUBSTRATE PRODUCED IN THIS METHOD WITH AN EMBEDDED COMPONENT |
JP6033878B2 (ja) * | 2012-09-26 | 2016-11-30 | 株式会社メイコー | 部品内蔵基板の製造方法 |
AT514564B1 (de) | 2013-07-04 | 2015-02-15 | Austria Tech & System Tech | Verfahren zum Ankontaktieren und Umverdrahten |
CN104617033B (zh) * | 2013-11-05 | 2018-09-14 | 中芯国际集成电路制造(上海)有限公司 | 晶圆级封装方法 |
US10219384B2 (en) | 2013-11-27 | 2019-02-26 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Circuit board structure |
AT515101B1 (de) | 2013-12-12 | 2015-06-15 | Austria Tech & System Tech | Verfahren zum Einbetten einer Komponente in eine Leiterplatte |
JP2015130443A (ja) * | 2014-01-08 | 2015-07-16 | 富士通株式会社 | 部品内蔵基板の製造方法 |
DE102014101366B3 (de) | 2014-02-04 | 2015-05-13 | Infineon Technologies Ag | Chip-Montage an über Chip hinausstehender Adhäsions- bzw. Dielektrikumsschicht auf Substrat |
US11523520B2 (en) | 2014-02-27 | 2022-12-06 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Method for making contact with a component embedded in a printed circuit board |
AT515447B1 (de) | 2014-02-27 | 2019-10-15 | At & S Austria Tech & Systemtechnik Ag | Verfahren zum Kontaktieren eines in eine Leiterplatte eingebetteten Bauelements sowie Leiterplatte |
JP2018511926A (ja) * | 2015-01-23 | 2018-04-26 | フィリップス ライティング ホールディング ビー ヴィ | 熱応答性の黒体軌跡調光機能を備えるled |
EP3091822A1 (en) * | 2015-05-08 | 2016-11-09 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Method for the production of an electronic module as well as corresponding electronic module |
EP3148300B1 (en) * | 2015-09-24 | 2023-07-26 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Connection system for electronic components |
US10153021B1 (en) | 2017-06-09 | 2018-12-11 | Micron Technology, Inc. | Time-based access of a memory cell |
US10153022B1 (en) | 2017-06-09 | 2018-12-11 | Micron Technology, Inc | Time-based access of a memory cell |
TWI733056B (zh) * | 2018-09-19 | 2021-07-11 | 矽品精密工業股份有限公司 | 電子封裝件及其製法 |
WO2021146894A1 (zh) * | 2020-01-21 | 2021-07-29 | 鹏鼎控股(深圳)股份有限公司 | 内埋电子元件的电路板及制作方法 |
CN113207244A (zh) * | 2020-02-03 | 2021-08-03 | 奥特斯奥地利科技与系统技术有限公司 | 制造部件承载件的方法及部件承载件 |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4830014A (en) * | 1983-05-11 | 1989-05-16 | Nellcor Incorporated | Sensor having cutaneous conformance |
JPH0227831B2 (ja) | 1984-04-28 | 1990-06-20 | Nippon Denki Hoomu Erekutoronikusu Kk | Purintohaisenban |
US5224478A (en) * | 1989-11-25 | 1993-07-06 | Colin Electronics Co., Ltd. | Reflecting-type oxymeter probe |
US5490523A (en) * | 1994-06-29 | 1996-02-13 | Nonin Medical Inc. | Finger clip pulse oximeter |
DE19541605C2 (de) * | 1995-11-08 | 1999-06-24 | Hewlett Packard Co | Sensor und Verfahren für die Durchführung medizinischer Messungen, insbesondere pulsoximetrischer Messungen, am menschlichen Finger |
JPH10190234A (ja) | 1996-12-26 | 1998-07-21 | Nippon Carbide Ind Co Inc | 多層配線板の製造方法 |
FI982568A (fi) * | 1997-12-02 | 1999-06-03 | Samsung Electro Mech | Menetelmä monikerroksisen painetun piirilevyn valmistamiseksi |
US6236037B1 (en) * | 1998-02-20 | 2001-05-22 | Massachusetts Institute Of Technology | Finger touch sensors and virtual switch panels |
US6388247B2 (en) * | 1998-02-20 | 2002-05-14 | Massachusetts Institute Of Technology | Fingernail sensors for measuring finger forces and finger posture |
EA003263B1 (ru) | 1999-03-23 | 2003-02-27 | Сэркит Фойл Люксембург Трейдинг С.А. Р.Л. | Способ изготовления многослойной печатной платы и предназначенная для этого композиционная фольга |
TW429735B (en) * | 1999-05-07 | 2001-04-11 | Unitech Printed Circuit Board | Method of making multi-layered circuit board |
US6803528B1 (en) * | 1999-11-05 | 2004-10-12 | 3M Innovative Properties Company | Multi-layer double-sided wiring board and method of fabricating the same |
DE19954941C2 (de) | 1999-11-16 | 2003-11-06 | Fraunhofer Ges Forschung | Verfahren zum Integrieren eines Chips innerhalb einer Leiterplatte |
US6475877B1 (en) | 1999-12-22 | 2002-11-05 | General Electric Company | Method for aligning die to interconnect metal on flex substrate |
JP3716178B2 (ja) * | 2000-12-13 | 2005-11-16 | 埼玉日本電気株式会社 | フレキシブルプリント配線板の製法 |
FR2822338B1 (fr) | 2001-03-14 | 2003-06-27 | Sagem | Procede pour connecter electriquement des plots de contact d'un composant microelectronique directement a des pistes de circuits imprimes, et plaque a circuits imprimes ainsi constituee |
JP2003007922A (ja) * | 2001-06-19 | 2003-01-10 | Sanyo Electric Co Ltd | 回路装置の製造方法 |
JP2003168860A (ja) | 2001-11-30 | 2003-06-13 | Cmk Corp | プリント配線板及びその製造方法 |
JP2003204137A (ja) | 2002-01-09 | 2003-07-18 | Hitachi Via Mechanics Ltd | レーザー穴あけ加工方法 |
FI115285B (fi) | 2002-01-31 | 2005-03-31 | Imbera Electronics Oy | Menetelmä komponentin upottamiseksi alustaan ja kontaktin muodostamiseksi |
FI119215B (fi) | 2002-01-31 | 2008-08-29 | Imbera Electronics Oy | Menetelmä komponentin upottamiseksi alustaan ja elektroniikkamoduuli |
FI119583B (fi) | 2003-02-26 | 2008-12-31 | Imbera Electronics Oy | Menetelmä elektroniikkamoduulin valmistamiseksi |
JP2004296562A (ja) * | 2003-03-26 | 2004-10-21 | Sharp Corp | 電子部品内蔵基板及びその製造方法 |
FI115601B (fi) | 2003-04-01 | 2005-05-31 | Imbera Electronics Oy | Menetelmä elektroniikkamoduulin valmistamiseksi ja elektroniikkamoduuli |
FI20041680A (fi) | 2004-04-27 | 2005-10-28 | Imbera Electronics Oy | Elektroniikkamoduuli ja menetelmä sen valmistamiseksi |
TWI237883B (en) * | 2004-05-11 | 2005-08-11 | Via Tech Inc | Chip embedded package structure and process thereof |
US7410307B2 (en) * | 2004-06-04 | 2008-08-12 | Finisar Corporation | Modular optical device package compatible with multiple fiber connectors |
FI117369B (fi) | 2004-11-26 | 2006-09-15 | Imbera Electronics Oy | Menetelmä elektroniikkamoduulin valmistamiseksi |
FI119714B (fi) | 2005-06-16 | 2009-02-13 | Imbera Electronics Oy | Piirilevyrakenne ja menetelmä piirilevyrakenteen valmistamiseksi |
JP2007019268A (ja) | 2005-07-07 | 2007-01-25 | Toshiba Corp | 配線基板、この配線基板を内蔵した電子機器、およびこの配線基板の製造方法 |
WO2007117889A2 (en) * | 2006-03-31 | 2007-10-18 | University Of Utah Research Foundation | System, method and apparatus for detecting a force applied to a finger |
KR100730782B1 (ko) | 2006-04-13 | 2007-06-20 | (주)인터플렉스 | Uv-co2레이저를 이용한 연성회로기판 제조방법 |
TWI318792B (en) * | 2006-09-19 | 2009-12-21 | Phoenix Prec Technology Corp | Circuit board structure having embedded semiconductor chip and fabrication method thereof |
US8195264B2 (en) * | 2006-09-22 | 2012-06-05 | Nellcor Puritan Bennett Llc | Medical sensor for reducing signal artifacts and technique for using the same |
US20090166065A1 (en) * | 2008-01-02 | 2009-07-02 | Clayton James E | Thin multi-chip flex module |
CN102204418B (zh) * | 2008-10-30 | 2016-05-18 | At&S奥地利科技及系统技术股份公司 | 用于将电子部件集成到印制电路板中的方法 |
US8329493B2 (en) * | 2009-03-20 | 2012-12-11 | University Of Utah Research Foundation | Stretchable circuit configuration |
US8984747B2 (en) * | 2011-04-05 | 2015-03-24 | Electronics And Telecommunications Research Institute | Method for manufacturing fabric type circuit board |
US9018532B2 (en) * | 2011-06-09 | 2015-04-28 | Multi-Fineline Electronix, Inc. | Stretchable circuit assemblies |
KR101555211B1 (ko) * | 2011-10-05 | 2015-09-25 | 한국전자통신연구원 | 직물 회로 기판 및 이의 제조 방법 |
-
2009
- 2009-10-28 CN CN200980143054.0A patent/CN102204418B/zh active Active
- 2009-10-28 EP EP09748690.6A patent/EP2342958B1/de active Active
- 2009-10-28 WO PCT/AT2009/000418 patent/WO2010048653A2/de active Application Filing
- 2009-10-28 JP JP2011533484A patent/JP5833926B2/ja active Active
- 2009-10-28 KR KR1020117009747A patent/KR20110076979A/ko not_active Application Discontinuation
- 2009-10-28 US US13/125,885 patent/US8914974B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN102204418A (zh) | 2011-09-28 |
US8914974B2 (en) | 2014-12-23 |
CN102204418B (zh) | 2016-05-18 |
US20110203107A1 (en) | 2011-08-25 |
EP2342958A2 (de) | 2011-07-13 |
KR20110076979A (ko) | 2011-07-06 |
EP2342958B1 (de) | 2020-06-17 |
WO2010048653A3 (de) | 2011-03-03 |
JP2012507154A (ja) | 2012-03-22 |
WO2010048653A2 (de) | 2010-05-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5833926B2 (ja) | 電子構成部品をプリント回路基板に組み込むための方法 | |
JP3993211B2 (ja) | 多層プリント配線板およびその製造方法 | |
KR20080046275A (ko) | 다층 프린트 배선판 및 그 제조 방법 | |
JP2011515862A (ja) | 電子構成群を製造する方法 | |
TWI593064B (zh) | Method of manufacturing substrate with built-in element and substrate with built-in element manufactured by the method | |
TWI481329B (zh) | 貫通孔形成方法及配線電路基板的製造方法 | |
TW201340818A (zh) | 內藏有元件之基板的製造方法以及使用該方法製出之內藏有元件之基板 | |
US9596765B2 (en) | Manufacturing method for component incorporated substrate and component incorporated substrate manufactured using the method | |
TW200917924A (en) | Method for manufacturing multilayer printed-wiring board | |
US20150382478A1 (en) | Device embedded substrate and manufacturing method of device embedded substrate | |
JP2010206124A (ja) | 多層回路基板の製造方法及び多層回路基板 | |
KR20170044219A (ko) | 캐비티 회로기판 제조방법 | |
KR20020087643A (ko) | 인쇄회로기판의 제조방법 | |
JP2007250608A (ja) | 中空部を有する回路基板、その製造方法およびそれを用いた回路装置の製造方法 | |
JP5293239B2 (ja) | プリント基板およびその製造方法 | |
KR101077377B1 (ko) | 기판 제조용 캐리어 부재 및 이를 이용한 기판의 제조방법 | |
JP2008166741A (ja) | 積層基板及びその製造方法 | |
CN111629513B (zh) | 同时具有贯孔及盲孔的多层电路板结构及其制法 | |
KR20120045639A (ko) | 인쇄회로기판 및 그의 제조 방법 | |
KR20110060623A (ko) | 기판 제조용 캐리어 부재 및 이를 이용한 기판의 제조방법 | |
JP5235107B2 (ja) | プリント配線板とその製造方法 | |
JP5377792B1 (ja) | 回路基板の製造方法 | |
JP2005228946A (ja) | 多層配線板およびその製造方法 | |
JP2022175734A (ja) | 配線基板、部品内蔵配線基板、及び部品内蔵配線基板の製造方法 | |
JPH03222391A (ja) | 回路基板の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120711 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130424 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130430 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130729 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130805 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131031 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140318 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140613 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140620 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140918 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20150303 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150703 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150706 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20150730 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20151006 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20151030 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5833926 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |