ES2408171T3 - Producto de revestimiento con alta resistencia al rayado y estabilidad a la intemperie - Google Patents
Producto de revestimiento con alta resistencia al rayado y estabilidad a la intemperie Download PDFInfo
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- ES2408171T3 ES2408171T3 ES07856914T ES07856914T ES2408171T3 ES 2408171 T3 ES2408171 T3 ES 2408171T3 ES 07856914 T ES07856914 T ES 07856914T ES 07856914 T ES07856914 T ES 07856914T ES 2408171 T3 ES2408171 T3 ES 2408171T3
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- 238000000576 coating method Methods 0.000 title claims description 195
- 239000011248 coating agent Substances 0.000 title claims description 153
- 150000001875 compounds Chemical class 0.000 claims abstract description 71
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 24
- 238000004132 cross linking Methods 0.000 claims description 67
- 239000004922 lacquer Substances 0.000 claims description 59
- 239000005056 polyisocyanate Substances 0.000 claims description 57
- 229920001228 polyisocyanate Polymers 0.000 claims description 57
- -1 phosphoric acid diesters Chemical class 0.000 claims description 56
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 49
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 47
- 229920005862 polyol Polymers 0.000 claims description 45
- 150000003077 polyols Chemical class 0.000 claims description 45
- 239000003054 catalyst Substances 0.000 claims description 37
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 31
- 150000001412 amines Chemical class 0.000 claims description 30
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 28
- 125000000217 alkyl group Chemical group 0.000 claims description 26
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 20
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 18
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 17
- 238000003860 storage Methods 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 239000012948 isocyanate Substances 0.000 claims description 16
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- 238000005259 measurement Methods 0.000 claims description 13
- 125000000524 functional group Chemical group 0.000 claims description 11
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 11
- 125000002947 alkylene group Chemical group 0.000 claims description 10
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- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
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- 229910003813 NRa Inorganic materials 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
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- 229910002808 Si–O–Si Inorganic materials 0.000 claims description 8
- 229910052698 phosphorus Inorganic materials 0.000 claims description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- 125000004354 sulfur functional group Chemical group 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
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- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 238000002076 thermal analysis method Methods 0.000 claims description 5
- 239000005058 Isophorone diisocyanate Substances 0.000 claims description 4
- 239000000010 aprotic solvent Substances 0.000 claims description 4
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000013638 trimer Substances 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- OHJMTUPIZMNBFR-UHFFFAOYSA-N biuret Chemical class NC(=O)NC(N)=O OHJMTUPIZMNBFR-UHFFFAOYSA-N 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000000962 organic group Chemical group 0.000 claims description 3
- 229920000193 polymethacrylate Polymers 0.000 claims description 3
- 239000011593 sulfur Chemical group 0.000 claims description 3
- 150000003512 tertiary amines Chemical class 0.000 claims description 3
- 229940008841 1,6-hexamethylene diisocyanate Drugs 0.000 claims 1
- PAUHLEIGHAUFAK-UHFFFAOYSA-N 1-isocyanato-1-[(1-isocyanatocyclohexyl)methyl]cyclohexane Chemical compound C1CCCCC1(N=C=O)CC1(N=C=O)CCCCC1 PAUHLEIGHAUFAK-UHFFFAOYSA-N 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 150000005690 diesters Chemical class 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000000470 constituent Substances 0.000 abstract description 6
- 239000008199 coating composition Substances 0.000 abstract 2
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 abstract 1
- 239000000047 product Substances 0.000 description 95
- 238000006243 chemical reaction Methods 0.000 description 42
- 229910000077 silane Inorganic materials 0.000 description 33
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 30
- 239000000203 mixture Substances 0.000 description 24
- 229920004482 WACKER® Polymers 0.000 description 23
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 21
- 150000004756 silanes Chemical class 0.000 description 20
- 238000012360 testing method Methods 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 16
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- 239000007787 solid Substances 0.000 description 11
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- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 description 9
- 238000002444 silanisation Methods 0.000 description 9
- 230000001588 bifunctional effect Effects 0.000 description 8
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- 238000003756 stirring Methods 0.000 description 8
- 238000007792 addition Methods 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 7
- 238000004448 titration Methods 0.000 description 7
- TZZGHGKTHXIOMN-UHFFFAOYSA-N 3-trimethoxysilyl-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCCC[Si](OC)(OC)OC TZZGHGKTHXIOMN-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 230000036961 partial effect Effects 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 125000005370 alkoxysilyl group Chemical group 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
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- 125000001424 substituent group Chemical group 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
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- 150000008064 anhydrides Chemical class 0.000 description 3
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- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
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- 125000006850 spacer group Chemical group 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- KCZQSKKNAGZQSZ-UHFFFAOYSA-N 1,3,5-tris(6-isocyanatohexyl)-1,3,5-triazin-2,4,6-trione Chemical compound O=C=NCCCCCCN1C(=O)N(CCCCCCN=C=O)C(=O)N(CCCCCCN=C=O)C1=O KCZQSKKNAGZQSZ-UHFFFAOYSA-N 0.000 description 2
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 2
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 2
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 2
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 2
- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 description 2
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- 125000001931 aliphatic group Chemical group 0.000 description 2
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- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000006120 scratch resistant coating Substances 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 125000005624 silicic acid group Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 230000002110 toxicologic effect Effects 0.000 description 1
- 231100000027 toxicology Toxicity 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- AVWRKZWQTYIKIY-UHFFFAOYSA-N urea-1-carboxylic acid Chemical group NC(=O)NC(O)=O AVWRKZWQTYIKIY-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/2805—Compounds having only one group containing active hydrogen
- C08G18/288—Compounds containing at least one heteroatom other than oxygen or nitrogen
- C08G18/289—Compounds containing at least one heteroatom other than oxygen or nitrogen containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
- C08G18/6254—Polymers of alpha-beta ethylenically unsaturated carboxylic acids and of esters of these acids containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/778—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
- C08G18/8061—Masked polyisocyanates masked with compounds having only one group containing active hydrogen
- C08G18/8083—Masked polyisocyanates masked with compounds having only one group containing active hydrogen with compounds containing at least one heteroatom other than oxygen or nitrogen
- C08G18/809—Masked polyisocyanates masked with compounds having only one group containing active hydrogen with compounds containing at least one heteroatom other than oxygen or nitrogen containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Polyurethanes Or Polyureas (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006059951 | 2006-12-19 | ||
| DE102006059951 | 2006-12-19 | ||
| PCT/EP2007/011191 WO2008074490A1 (de) | 2006-12-19 | 2007-12-19 | Beschichtungsmittel mit hoher kratzbeständigkeit und witterungsstabilität |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2408171T3 true ES2408171T3 (es) | 2013-06-18 |
Family
ID=39199992
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES07856915T Active ES2369110T3 (es) | 2006-12-19 | 2007-12-19 | Agente de revestimiento con alta resistencia al rayado y estabilidad a la intemperie. |
| ES07856913T Active ES2409182T3 (es) | 2006-12-19 | 2007-12-19 | Producto de revestimiento con alta resistencia al rayado y estabilidad a la intemperie |
| ES07856914T Active ES2408171T3 (es) | 2006-12-19 | 2007-12-19 | Producto de revestimiento con alta resistencia al rayado y estabilidad a la intemperie |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES07856915T Active ES2369110T3 (es) | 2006-12-19 | 2007-12-19 | Agente de revestimiento con alta resistencia al rayado y estabilidad a la intemperie. |
| ES07856913T Active ES2409182T3 (es) | 2006-12-19 | 2007-12-19 | Producto de revestimiento con alta resistencia al rayado y estabilidad a la intemperie |
Country Status (13)
| Country | Link |
|---|---|
| US (4) | US8569438B2 (OSRAM) |
| EP (3) | EP2091987B1 (OSRAM) |
| JP (3) | JP5637687B2 (OSRAM) |
| KR (3) | KR101500460B1 (OSRAM) |
| CN (3) | CN101583643B (OSRAM) |
| AT (1) | ATE515523T1 (OSRAM) |
| BR (3) | BRPI0721288A2 (OSRAM) |
| CA (3) | CA2671662C (OSRAM) |
| ES (3) | ES2369110T3 (OSRAM) |
| MX (3) | MX2009005613A (OSRAM) |
| PL (3) | PL2091987T3 (OSRAM) |
| RU (3) | RU2467027C2 (OSRAM) |
| WO (3) | WO2008074489A1 (OSRAM) |
Families Citing this family (94)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005045228A1 (de) * | 2005-09-22 | 2007-04-05 | Basf Coatings Ag | Verwendung von Phosphonsäurediestern und Diphosphonsäurediestern sowie silangruppenhaltige, härtbare Gemische, enthaltend Phosphonsäurediester und Diphosphonsäurediester |
| DE102005045150A1 (de) * | 2005-09-22 | 2007-04-05 | Basf Coatings Ag | Verwendung von Phosphonsäurediestern und Diphosphonsäurediestern sowie thermisch härtbare Gemische, enthaltend Phosphonsäurediester und Diphosphonsäurediester |
| DE102006024823A1 (de) * | 2006-05-29 | 2007-12-06 | Basf Coatings Ag | Verwendung von härtbaren Gemischen, enthaltend silangruppenhaltige Verbindungen sowie Phosphonsäurediester oder Diphosphonsäurediester, als Haftvermittler |
| CA2671662C (en) | 2006-12-19 | 2016-03-08 | Basf Coatings Ag | Coating compositions with high scratch resistance and weathering stability |
| DE102007014720A1 (de) * | 2007-03-23 | 2008-09-25 | Basf Coatings Japan Ltd., Yokohama | Phosphonat-haltiges Zweikomponenten-Lacksystem, dessen Herstellung und Verwendung |
| JP4829837B2 (ja) * | 2007-04-27 | 2011-12-07 | 関西ペイント株式会社 | 複層塗膜形成方法 |
| DE102007061855A1 (de) * | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
| DE102007061854A1 (de) | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
| DE102007061856A1 (de) * | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
| DE102008030304A1 (de) | 2008-06-25 | 2009-12-31 | Basf Coatings Ag | Verwendung teilsilanisierter Verbindungen auf Polyisocyanatbasis als Vernetzungsmittel in Beschichtungszusammensetzungen und Beschichtungszusammensetzung enthaltend die Verbindungen |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008060454A1 (de) * | 2008-12-05 | 2010-06-10 | Basf Coatings Ag | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzbeständigkeit und Witterungsstabilität sowie guten optischen Eigenschaften |
| DE102009016195A1 (de) * | 2009-04-03 | 2010-10-07 | Basf Coatings Ag | Feuchtigkeitshärtende Beschichtungsmittel auf der Basis aprotischer Lösemittel enthaltend Bindemittel mit Alkoxysilangruppen und deren Verwendung |
| DE102009022631A1 (de) | 2009-05-25 | 2010-12-16 | Evonik Goldschmidt Gmbh | Härtbare Silylgruppen enthaltende Zusammensetzungen und deren Verwendung |
| DE102009030481A1 (de) * | 2009-06-24 | 2011-01-05 | Basf Coatings Gmbh | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzfestigkeit bei gleichzeitig guten Ergebnissen in der Prüfung der Erichsentiefung und guten Steinschlagschutzeigenschaften |
| DE102009041380A1 (de) * | 2009-09-12 | 2011-03-24 | Basf Coatings Gmbh | Bindemittelmischung und sie enthaltende Beschichtungsmittel sowie daraus hergestellte Beschichtungen mit hoher Kratzbeständigkeit und Witterungsstabilität sowie guten optischen Eigenschaften |
| DE102009054071A1 (de) * | 2009-11-20 | 2011-05-26 | Basf Coatings Gmbh | Beschichtungsmittel mit guter Lagerbeständigkeit und daraus hergestellte Beschichtungen mit hoher Kratzfestigkeit bei gleichzeitig guter Witterungsbeständigkeit |
| MX2012010550A (es) | 2010-04-21 | 2012-11-16 | Basf Coatings Gmbh | Materiales de recubrimiento con alto contenido de solidos y sistemas de pintura de multiple capa con buena nivelacion producidos de los mismos y usos de los mismos. |
| DE102010015683A1 (de) | 2010-04-21 | 2011-10-27 | Basf Coatings Gmbh | Beschichtungsmittel mit hohem Festkörpergehalt und gutem Verlauf sowie daraus hergestellte Mehrschichtlackierungen und deren Verwendung |
| DE102010015675A1 (de) | 2010-04-21 | 2011-10-27 | Basf Coatings Gmbh | Beschichtungsmittel mit verbesserter Ablaufneigung |
| KR101906618B1 (ko) | 2010-11-19 | 2018-10-10 | 바스프 코팅스 게엠베하 | 높은 고형물 함량 및 양호한 레벨링을 갖는 코팅 조성물, 및 이로부터 형성된 다층 표면 코팅, 및 이들의 용도 |
| US9029491B2 (en) | 2010-12-22 | 2015-05-12 | Teknologisk Institut | Repellent coating composition and coating, method for making and uses thereof |
| US9777190B2 (en) | 2011-01-20 | 2017-10-03 | Basf Coatings Gmbh | Aqueous polyurethane coating material and coatings produced therefrom and having high scratch resistance and good chemicals resistance |
| ES2526790T3 (es) * | 2011-03-14 | 2015-01-15 | Basf Coatings Gmbh | Composición de agentes de recubrimiento de poliuretano, métodos de recubrimiento de varias etapas por empleo de estas composiciones de agentes de recubrimiento, así como el empleo de las composiciones de agentes de recubrimiento como laca clara y laca pigmentada o bien aplicación del método de recubrimiento, para el lacado de refacción de automóviles y/o para el recubrimiento de sustratos plásticos y/o vehículos utilitarios |
| RU2598360C2 (ru) * | 2011-03-14 | 2016-09-20 | БАСФ Коатингс ГмбХ | Композиция полиуретанового покровного средства, многостадийные способы покрытия с применением этих композиций покровного средства, а также применение композиции покровного средства в качестве прозрачного лака и пигментированного лака, соответственно применение способа покрытия для ремонтного лакирования автомобилей и/или для покрытия полимерных субстратов и/или грузовых транспортных средств |
| US9371469B2 (en) * | 2011-06-09 | 2016-06-21 | Basf Coatings Gmbh | Coating agent compositions, coatings made therefrom and exhibiting high scratch resistance and good polishability, and use thereof |
| CN103547607B (zh) * | 2011-06-09 | 2015-07-15 | 巴斯夫涂料有限公司 | 涂布剂组合物和由其制备的具有高耐划伤性且同时具有良好的可抛光性的涂层及其用途 |
| CN103517931B (zh) | 2011-06-09 | 2015-11-25 | 巴斯夫涂料有限公司 | 涂布剂组合物和由其制得的具有高耐划伤性且同时具有良好的可抛光性的涂层及其用途 |
| US9035082B2 (en) | 2011-10-10 | 2015-05-19 | Cytonix, Llc | Low surface energy touch screens, coatings, and methods |
| WO2013072481A1 (de) | 2011-11-17 | 2013-05-23 | Basf Coatings Gmbh | Glyceroldiester, verfahren zu deren herstellung und deren verwendung in beschichtungsmitteln |
| CN103946321B (zh) | 2011-11-17 | 2016-08-24 | 巴斯夫涂料有限公司 | 包含甘油二酯的涂料及其在多层漆中的用途 |
| US9090797B2 (en) * | 2011-12-02 | 2015-07-28 | Ppg Industries Ohio, Inc. | Method of mitigating ice build-up on a substrate |
| DE102012204290A1 (de) | 2012-03-19 | 2013-09-19 | Evonik Degussa Gmbh | Addukte aus Isocyanatoalkyl-trialkoxysilanen und aliphatischen, alkyl-verzweigten Diolen oder Polyolen |
| WO2013146705A1 (ja) * | 2012-03-30 | 2013-10-03 | 太陽ホールディングス株式会社 | ポリ（メタ）アクリレートの製造方法、これにより得られたポリ（メタ）アクリレート、モノマー組成物、その硬化物、およびこれを含むプリント配線板 |
| WO2014016026A1 (de) | 2012-07-25 | 2014-01-30 | Basf Coatings Gmbh | Polyurethan-beschichtungsmittelzusammensetzung und ihre verwendung, mehrstufige beschichtungsverfahren |
| KR20150038152A (ko) * | 2012-07-25 | 2015-04-08 | 바스프 코팅스 게엠베하 | 폴리우레탄 코팅 물질 조성물, 다단식 코팅 방법 |
| WO2014026780A1 (en) | 2012-08-16 | 2014-02-20 | Basf Coatings Gmbh | Coating compositions containing benzotrizol based uv-absorbers |
| KR102182771B1 (ko) * | 2012-12-03 | 2020-11-25 | 바스프 코팅스 게엠베하 | 높은 내스크래치성 및 양호한 연마성 및 양호한 광학 특성을 가지는 코팅 재료 조성물 및 이로부터 제조된 코팅, 및 이의 용도 |
| US10081738B2 (en) * | 2012-12-03 | 2018-09-25 | Basf Coatings Gmbh | Multicoat effect and/or color paint system and method for producing it, and its use |
| KR101392725B1 (ko) * | 2013-02-08 | 2014-05-08 | 전북대학교산학협력단 | 수용성 방염액, 목재의 방염 공정처리 방법, 이에 의한 방염목재 |
| US10579497B2 (en) * | 2013-02-26 | 2020-03-03 | Red Hat, Inc. | Providing context simulation |
| PL3083078T3 (pl) | 2013-12-18 | 2019-09-30 | Basf Coatings Gmbh | Sposób wytwarzania wielowarstwowej powłoki lakierniczej |
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| US20070026154A1 (en) | 2005-07-29 | 2007-02-01 | Ayumu Yokoyama | Method for producing damage resistant multi-layer coating on an automotive body or part thereof |
| US7858190B2 (en) * | 2005-09-15 | 2010-12-28 | Basf Coatings Gmbh | Thermosetting coating compositions with multiple cure mechanisms |
| DE102005045228A1 (de) * | 2005-09-22 | 2007-04-05 | Basf Coatings Ag | Verwendung von Phosphonsäurediestern und Diphosphonsäurediestern sowie silangruppenhaltige, härtbare Gemische, enthaltend Phosphonsäurediester und Diphosphonsäurediester |
| DE102006024823A1 (de) | 2006-05-29 | 2007-12-06 | Basf Coatings Ag | Verwendung von härtbaren Gemischen, enthaltend silangruppenhaltige Verbindungen sowie Phosphonsäurediester oder Diphosphonsäurediester, als Haftvermittler |
| US20080075871A1 (en) * | 2006-09-21 | 2008-03-27 | Ppg Industries Ohio, Inc. | Low temperature, moisture curable coating compositions and related methods |
| CA2671662C (en) * | 2006-12-19 | 2016-03-08 | Basf Coatings Ag | Coating compositions with high scratch resistance and weathering stability |
| DE102007013242A1 (de) | 2007-03-15 | 2008-09-18 | Basf Coatings Ag | Hochkratzfeste Beschichtung mit guter Witterungs- und Rissbeständigkeit |
| DE102007026722A1 (de) | 2007-06-06 | 2008-12-11 | Basf Coatings Japan Ltd., Yokohama | Klarlackzusammensetzungen enthaltend hyperverzweigte, dendritische hydroxyfunktionelle Polyester |
| DE102007061854A1 (de) * | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
| DE102007061856A1 (de) * | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
| DE102007061855A1 (de) | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
| DE102008030304A1 (de) * | 2008-06-25 | 2009-12-31 | Basf Coatings Ag | Verwendung teilsilanisierter Verbindungen auf Polyisocyanatbasis als Vernetzungsmittel in Beschichtungszusammensetzungen und Beschichtungszusammensetzung enthaltend die Verbindungen |
| DE102008060454A1 (de) | 2008-12-05 | 2010-06-10 | Basf Coatings Ag | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzbeständigkeit und Witterungsstabilität sowie guten optischen Eigenschaften |
| DE102009024103A1 (de) * | 2009-06-06 | 2010-12-09 | Basf Coatings Gmbh | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzfestigkeit und hoher Kocherstabilität |
| DE102009030481A1 (de) * | 2009-06-24 | 2011-01-05 | Basf Coatings Gmbh | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzfestigkeit bei gleichzeitig guten Ergebnissen in der Prüfung der Erichsentiefung und guten Steinschlagschutzeigenschaften |
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2007
- 2007-12-19 CA CA2671662A patent/CA2671662C/en active Active
- 2007-12-19 CN CN2007800466688A patent/CN101583643B/zh not_active Expired - Fee Related
- 2007-12-19 CA CA2671516A patent/CA2671516C/en active Active
- 2007-12-19 US US12/519,458 patent/US8569438B2/en active Active
- 2007-12-19 WO PCT/EP2007/011190 patent/WO2008074489A1/de not_active Ceased
- 2007-12-19 JP JP2009541877A patent/JP5637687B2/ja active Active
- 2007-12-19 KR KR1020097015002A patent/KR101500460B1/ko active Active
- 2007-12-19 BR BRPI0721288-7A2A patent/BRPI0721288A2/pt not_active Application Discontinuation
- 2007-12-19 BR BRPI0721070-1A2A patent/BRPI0721070A2/pt not_active IP Right Cessation
- 2007-12-19 EP EP07856913A patent/EP2091987B1/de not_active Revoked
- 2007-12-19 EP EP07856914A patent/EP2091988B1/de not_active Revoked
- 2007-12-19 RU RU2009127638/04A patent/RU2467027C2/ru active
- 2007-12-19 PL PL07856913T patent/PL2091987T3/pl unknown
- 2007-12-19 KR KR1020097015003A patent/KR20090094377A/ko not_active Ceased
- 2007-12-19 MX MX2009005613A patent/MX2009005613A/es active IP Right Grant
- 2007-12-19 CN CN2007800466781A patent/CN101568565B/zh active Active
- 2007-12-19 US US12/519,449 patent/US9353287B2/en active Active
- 2007-12-19 CA CA002671663A patent/CA2671663A1/en not_active Abandoned
- 2007-12-19 MX MX2009005536A patent/MX2009005536A/es active IP Right Grant
- 2007-12-19 RU RU2009127635/04A patent/RU2467026C2/ru active
- 2007-12-19 CN CN2007800467267A patent/CN101563382B/zh active Active
- 2007-12-19 PL PL07856914T patent/PL2091988T3/pl unknown
- 2007-12-19 ES ES07856915T patent/ES2369110T3/es active Active
- 2007-12-19 ES ES07856913T patent/ES2409182T3/es active Active
- 2007-12-19 JP JP2009541879A patent/JP5631004B2/ja active Active
- 2007-12-19 WO PCT/EP2007/011192 patent/WO2008074491A1/de not_active Ceased
- 2007-12-19 JP JP2009541878A patent/JP2010513617A/ja active Pending
- 2007-12-19 EP EP07856915A patent/EP2102263B1/de not_active Revoked
- 2007-12-19 US US12/519,466 patent/US20100015344A1/en not_active Abandoned
- 2007-12-19 ES ES07856914T patent/ES2408171T3/es active Active
- 2007-12-19 MX MX2009005495A patent/MX2009005495A/es active IP Right Grant
- 2007-12-19 WO PCT/EP2007/011191 patent/WO2008074490A1/de not_active Ceased
- 2007-12-19 BR BRPI0721292-5A2A patent/BRPI0721292A2/pt not_active IP Right Cessation
- 2007-12-19 KR KR1020097015004A patent/KR101500462B1/ko active Active
- 2007-12-19 AT AT07856915T patent/ATE515523T1/de active
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2013
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