ES2153442T3 - Composicion limpiadora alcalina que contiene un agente tensioactivo no ionico con ph ajustado para la limpieza de sustratos microelectronicos. - Google Patents

Composicion limpiadora alcalina que contiene un agente tensioactivo no ionico con ph ajustado para la limpieza de sustratos microelectronicos.

Info

Publication number
ES2153442T3
ES2153442T3 ES95105743T ES95105743T ES2153442T3 ES 2153442 T3 ES2153442 T3 ES 2153442T3 ES 95105743 T ES95105743 T ES 95105743T ES 95105743 T ES95105743 T ES 95105743T ES 2153442 T3 ES2153442 T3 ES 2153442T3
Authority
ES
Spain
Prior art keywords
adjusted
composition containing
microelectronic substrates
cleaning
cleaning composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95105743T
Other languages
English (en)
Inventor
Joseph M Ilardi
George Schwartzkopf
Gary G Dailey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of ES2153442T3 publication Critical patent/ES2153442T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/0005—Other compounding ingredients characterised by their effect
    • C11D3/0047—Other compounding ingredients characterised by their effect pH regulated compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/044—Hydroxides or bases
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)

Abstract

SOLUCIONES DE LIMPIEZA ALCALINAS ACUOSAS PARA LIMPIAR SUSTRATOS MICROELECTRONICOS Y MANTENER LA SUAVIDAD DE LA SUPERFICIE DEL SUSTRATO QUE CONTIENE UNA BASE SIN IONES METALICOS, UN SURFACTANTE NO IONICO Y UN COMPONENTE PARA REDUCIR O CONTROLAR EL PH DE LA SOLUCION DE LIMPIEZA A UN PH ENTRE 8 APROXIMADAMENTE Y 10 APROXIMADAMENTE.
ES95105743T 1994-04-20 1995-04-18 Composicion limpiadora alcalina que contiene un agente tensioactivo no ionico con ph ajustado para la limpieza de sustratos microelectronicos. Expired - Lifetime ES2153442T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/230,132 US5466389A (en) 1994-04-20 1994-04-20 PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates

Publications (1)

Publication Number Publication Date
ES2153442T3 true ES2153442T3 (es) 2001-03-01

Family

ID=22864064

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95105743T Expired - Lifetime ES2153442T3 (es) 1994-04-20 1995-04-18 Composicion limpiadora alcalina que contiene un agente tensioactivo no ionico con ph ajustado para la limpieza de sustratos microelectronicos.

Country Status (11)

Country Link
US (1) US5466389A (es)
EP (1) EP0678571B1 (es)
JP (1) JP2670987B2 (es)
KR (1) KR0160372B1 (es)
AT (1) ATE198907T1 (es)
CA (1) CA2146036C (es)
DE (1) DE69519955T2 (es)
ES (1) ES2153442T3 (es)
IL (1) IL113036A (es)
MY (1) MY112282A (es)
TW (1) TW301669B (es)

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DE69519955D1 (de) 2001-03-01
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JP2670987B2 (ja) 1997-10-29
TW301669B (es) 1997-04-01
KR0160372B1 (ko) 1998-11-16
CA2146036A1 (en) 1995-10-21
EP0678571A2 (en) 1995-10-25
IL113036A (en) 1999-09-22
MY112282A (en) 2001-05-31
CA2146036C (en) 1999-08-17
EP0678571B1 (en) 2001-01-24
IL113036A0 (en) 1995-06-29
KR950032597A (ko) 1995-12-22
US5466389A (en) 1995-11-14
EP0678571A3 (en) 1997-01-15
DE69519955T2 (de) 2001-08-23

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