ES2059890T3 - Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado. - Google Patents
Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado.Info
- Publication number
- ES2059890T3 ES2059890T3 ES90111022T ES90111022T ES2059890T3 ES 2059890 T3 ES2059890 T3 ES 2059890T3 ES 90111022 T ES90111022 T ES 90111022T ES 90111022 T ES90111022 T ES 90111022T ES 2059890 T3 ES2059890 T3 ES 2059890T3
- Authority
- ES
- Spain
- Prior art keywords
- agent
- roses
- eliminating
- elevated
- resin based
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Detergent Compositions (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
LA INVENCION PROPORCIONA UN AGENTE LIMPIADOR PARA RETIRAR UN FLUJO CON BASE DE RESINA, Y EL AGENTE LIMPIADOR CONSISTE EN UNA MEZCLA DE (A) AL MENOS UN COMPUESTO DE ETER DE GLICOL REPRESENTADO POR LA FORMULA (1) DONDE R ELEVADO 1 ES UN ATOMO DE HIDROGENO O UN GRUPO ALQUILO TENIENDO DE 1 A 5 ATOMOS DE CARBONO, R ELEVADO 2 ES UN GRUPO ALQUILO TENIENDO DE 1 A 5 ATOMOS DE CARBONO, R ELEVADO 3 ES UN ATOMO DE HIDROGENO O UN GRUPO Y N ES UN ENTERO DE 2 A 4, Y (B) AL MENOS UN SURFACTANTE NO IONICO, Y TAMBIEN DESCUBRE UN METODO DE LIMPIEZA PARA RETIRAR UN FLUJO DE SOLDAR CON BASE DE RESINA, EL METODO COMPRENDE EL PONER EN CONTACTO EL AGENTE ARRIBA INDICADO CON EL FLUJO DE SOLDAR CON BASE DE RESINA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29190589 | 1989-11-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2059890T3 true ES2059890T3 (es) | 1994-11-16 |
Family
ID=17774978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES90111022T Expired - Lifetime ES2059890T3 (es) | 1989-11-08 | 1990-06-11 | Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado. |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0426943B1 (es) |
JP (1) | JPH0723479B2 (es) |
KR (1) | KR0160126B1 (es) |
DE (1) | DE69003350T2 (es) |
ES (1) | ES2059890T3 (es) |
PT (1) | PT94476A (es) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2126424A2 (es) * | 1995-01-19 | 1999-03-16 | Decap 93 S L | Procedimiento para la preparacion de suspensiones a altas concentraciones de compuestos organicos e inorganicos. |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0768547B2 (ja) * | 1989-11-21 | 1995-07-26 | 花王株式会社 | 洗浄剤組成物 |
JPH03198395A (ja) * | 1989-12-27 | 1991-08-29 | Toho Chem Ind Co Ltd | 洗浄剤組成物 |
JPH0826350B2 (ja) * | 1990-04-19 | 1996-03-13 | 三洋化成工業株式会社 | 超音波洗浄機用洗浄剤 |
JPH0457899A (ja) * | 1990-06-27 | 1992-02-25 | Arakawa Chem Ind Co Ltd | ロジン系ハンダフラックスの洗浄剤および該洗浄剤を用いてなるロジン系ハンダフラックスの洗浄方法 |
JPH08917B2 (ja) * | 1990-06-27 | 1996-01-10 | 花王株式会社 | 洗浄剤組成物 |
JPH0457898A (ja) * | 1990-06-27 | 1992-02-25 | Kao Corp | 水系洗浄剤組成物 |
JPH0668118B2 (ja) * | 1990-08-06 | 1994-08-31 | 第一工業製薬株式会社 | 洗浄剤組成物 |
JPH0756039B2 (ja) * | 1991-07-04 | 1995-06-14 | 第一工業製薬株式会社 | 洗浄剤組成物 |
JPH05179294A (ja) * | 1991-12-26 | 1993-07-20 | Arakawa Chem Ind Co Ltd | 汚染物の洗浄除去剤および汚染物の洗浄除去方法 |
JPH0624170A (ja) * | 1992-03-25 | 1994-02-01 | Sanyo Chem Ind Ltd | スクリーン印刷版用洗浄剤 |
JPH06108097A (ja) * | 1992-08-07 | 1994-04-19 | Dr Ok Wack Chem Gmbh | 洗浄剤 |
AU2494092A (en) * | 1992-09-03 | 1994-03-29 | Circuit Chemical Products Gmbh | Cleaning-agent mixture for cleaning printed circuits and a method of cleaning such circuits |
DE4325133A1 (de) * | 1993-07-27 | 1995-02-02 | Wack O K Chemie Gmbh | Verfahren zum Reinigen von Gegenständen |
GB2281909B (en) * | 1993-09-21 | 1997-06-04 | Asahi Chemical Ind | Propylene glycol cyclohexyl ether derivatives, method of producing same and uses thereof |
US5531939A (en) * | 1994-03-23 | 1996-07-02 | Amway Corporation | Concentrated glass and window cleaning composition and method of use |
DE4411677C1 (de) * | 1994-04-05 | 1995-10-26 | Mtu Muenchen Gmbh | Verfahren zum Entfernen organischer Materialien von Triebwerkskomponenten |
EP0724011A1 (en) * | 1995-01-24 | 1996-07-31 | The Dow Chemical Company | Aqueous cleaning composition |
WO2020116534A1 (ja) * | 2018-12-05 | 2020-06-11 | 花王株式会社 | フラックス残渣の洗浄 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3886099A (en) * | 1972-03-13 | 1975-05-27 | Griffin Bros Inc | Water soluble flux remover |
DE2846088A1 (de) * | 1978-10-23 | 1980-04-30 | Ries Walter | Reinigungsfluessigkeit und deren verwendung zur selbstaendigen oberflaechenreinigung von aeusseren verschmutzungen ausgesetzten koerpern |
DE2847691C2 (de) * | 1978-11-03 | 1986-05-22 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Waschflüssigkeit zur Reinigung von Oberflächen gedruckter Schaltungen |
JPH0227398B2 (ja) * | 1982-04-23 | 1990-06-15 | Asahi Denka Kogyo Kk | Senjozaisoseibutsu |
FR2582546B2 (fr) * | 1984-10-04 | 1990-04-27 | Dow Chemical France | Agent de rincage et nettoyage pour ensembles de pulverisation et atomisation, notamment a usage agricole, a base d'un ether de glycol derive du propylene glycol et d'un tensio-actif |
JPS6369897A (ja) * | 1986-09-11 | 1988-03-29 | 第一工業製薬株式会社 | プリント基板洗浄用洗浄剤組成物 |
EP0261718B1 (en) * | 1986-09-22 | 1991-03-06 | The Procter & Gamble Company | Creamy scouring compositions |
JPS63234095A (ja) * | 1987-01-20 | 1988-09-29 | ザ ダウ ケミカル カンパニー | ガスタービン圧縮機清掃用組成物 |
-
1990
- 1990-06-11 ES ES90111022T patent/ES2059890T3/es not_active Expired - Lifetime
- 1990-06-11 EP EP90111022A patent/EP0426943B1/en not_active Expired - Lifetime
- 1990-06-11 DE DE90111022T patent/DE69003350T2/de not_active Expired - Fee Related
- 1990-06-16 KR KR1019900008884A patent/KR0160126B1/ko not_active IP Right Cessation
- 1990-06-25 PT PT94476A patent/PT94476A/pt not_active Application Discontinuation
- 1990-10-04 JP JP26794290A patent/JPH0723479B2/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2126424A2 (es) * | 1995-01-19 | 1999-03-16 | Decap 93 S L | Procedimiento para la preparacion de suspensiones a altas concentraciones de compuestos organicos e inorganicos. |
Also Published As
Publication number | Publication date |
---|---|
DE69003350T2 (de) | 1994-01-13 |
JPH03227400A (ja) | 1991-10-08 |
JPH0723479B2 (ja) | 1995-03-15 |
KR0160126B1 (ko) | 1998-12-15 |
EP0426943A2 (en) | 1991-05-15 |
DE69003350D1 (de) | 1993-10-21 |
KR910011101A (ko) | 1991-06-29 |
EP0426943A3 (en) | 1991-09-04 |
EP0426943B1 (en) | 1993-09-15 |
PT94476A (pt) | 1991-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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