EP2050841A1 - Bain galvanique alcalin doté d'une membrane de filtration - Google Patents

Bain galvanique alcalin doté d'une membrane de filtration Download PDF

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Publication number
EP2050841A1
EP2050841A1 EP09152660A EP09152660A EP2050841A1 EP 2050841 A1 EP2050841 A1 EP 2050841A1 EP 09152660 A EP09152660 A EP 09152660A EP 09152660 A EP09152660 A EP 09152660A EP 2050841 A1 EP2050841 A1 EP 2050841A1
Authority
EP
European Patent Office
Prior art keywords
anode
filtration membrane
cathode
zinc
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP09152660A
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German (de)
English (en)
Other versions
EP2050841B1 (fr
Inventor
Karlheinz Arzt
Jens-Eric Geissler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
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Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35530823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP2050841(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Priority to EP09152660.8A priority Critical patent/EP2050841B1/fr
Priority to ES09152660.8T priority patent/ES2574158T3/es
Publication of EP2050841A1 publication Critical patent/EP2050841A1/fr
Application granted granted Critical
Publication of EP2050841B1 publication Critical patent/EP2050841B1/fr
Revoked legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange

Definitions

  • the invention relates to an alkaline electroplating bath for applying zinc alloys to substrates, in which the anode space and the cathode space are separated from one another by a filtration membrane.
  • zinc alloys can be deposited on substrates in a consistently high quality.
  • the electroplating bath is operated with zinc alloy baths containing organic additives such as brighteners and wetting agents and complexing agents in addition to soluble zinc salts and optionally other metal salts selected from iron, nickel, cobalt and tin salts.
  • Activated carbon treatment by stirring 0.5-2 g / l of activated carbon into the bath followed by filtration reduces the concentration of impurities by adsorption on the coal. Disadvantage of this method is that it is laborious is and causes only a relatively small reduction.
  • Alkaline Zn baths contain a factor of 5 to 10 lower proportion of organic additives as acidic baths. Accordingly, contamination by decomposition products is generally less critical. In the case of alkaline alloy baths, however, the addition of significant amounts of organic complexing agents is required to complex the alloying additive (Fe, Co, Ni, Sn). These are oxidatively degraded at the anode and the accumulated decomposition products have a negative effect on the production process.
  • the WO 00/06807 and WO 01/96631 describe electroplating baths for applying zinc-nickel coatings. To avoid the undesirable decomposition of additives at the anode, it is proposed to separate the anode from the alkaline electrolyte through an ion exchange membrane.
  • the invention has for its object to provide an alkaline electroplating bath, which does not have the aforementioned disadvantages.
  • the life of the bath is to be increased, the anodic decomposition of organic constituents of the bath to be minimized and, when it is used, a layer thickness of consistently high quality to be obtained on the coated substrate.
  • filtration membranes are used.
  • the size of the pores of these filtration membranes is generally in a range from 0.0001 to 1.0 ⁇ m and from 0.001 to 1.0 ⁇ m, depending on the type of membrane (nano- or ultrafiltration membrane).
  • the pore size is in a range of 0.1 to 0.3 microns.
  • filtration membranes made of polypropylene.
  • the filtration membrane in the alkaline electroplating bath according to the invention is designed as a flat membrane.
  • the alkaline electroplating bath according to the invention can also be realized with other membrane forms, examples being hoses, capillaries and hollow fibers.
  • Such baths are for example in US 5,417,840 .
  • US 4,421,611 US 4,877,496 or US 6,652,728 described.
  • the alkaline electroplating bath according to the invention has the advantage that in it also baths for the deposition of zinc alloys can be used, which are suitable for use in the from WO 00/06807 and WO 01/96631 known alkaline zinc-nickel bath with an ion exchange membrane are not suitable.
  • sold by the applicant bath "Protedur Ni-75" to call which is characterized by a particularly high efficiency.
  • the previously used anodes can be used further. These are mostly nickel anodes.
  • the use of these anodes is less expensive than that from the WO 00/06807 known electroplating bath, in which special platinum-plated titanium anodes must be used in addition.
  • the anode space is preferably made smaller than the cathode space, since the essential processes take place there.
  • Both baths were operated with and without filtration membrane in 5-liter tanks.
  • the filtration membrane used was the Abwa-Tec polymer membrane P150F, which has a pore size of 0.12 ⁇ m.
  • the membrane was placed in the anode to cathode bath with the anolyte and catholyte being identical, ie, no special anolyte was added.
  • iron sheets (7 ⁇ 10 cm), which are usually used for Hull cell tests, were used as workpieces to be coated and coated at a current density of 2 A / dm 2 .
  • the baths were operated in serial connection. The movement of the iron sheets was mechanical, at a speed of 1.4 m / min.
  • a filtration membrane is produced after a throughput of> 1000 Ah / l introduced after a short time comparable to a new approach current efficiency.
  • Table 3 shows the average consumption (1 / 10,000 Ah) of the electrolyte in the bath for filtration membrane electroplating baths according to the invention and baths which do not have this membrane.
  • the organic consumption was reduced between 12 and 29% depending on the additive.
  • composition of the aforementioned baths were analyzed according to the tests described above. Of particular interest was their cyanide content. This was much lower when using the baths according to the invention with a filtration membrane as baths without membrane. As shown in Table 4 below, a bath without the membrane had a cyanide content of 680 mg / L (new batch) and 790 mg / L (bath of> 1000 Ah / L), respectively, while the corresponding membrane baths contained a cyanide Content of 96 mg / L or 190 mg / L.
  • the cyanide content of an old batch ie a bath with> 1000 Ah / l can be reduced when it is provided with a filtration membrane and operated.
  • the cyanide content was reduced from 670 mg / l to 190 mg / l.
  • the color of the baths was also evaluated. It was found that the color of a freshly prepared bath without membrane changed from initially violet-orange to brown within 15 Ah / l, whereby it remained violet or violet-orange over the entire time when using a filtration membrane. The old batch remained brown without using a membrane and the color changed to orange-brown after 15 Ah / l using a filtration membrane. Violet is also the color of freshly applied baths, which then turn to orange (after a few Ah / l) and at high throughput in brown.
  • the voltage between anode and cathode was measured. It was about 3 V and was only about 50-100 mV higher in both approaches using a filtration membrane. Is used instead of the filtration membrane an ion exchange membrane, as in the WO 00/06807 described is, the voltage is higher by at least 500 mV. This again shows the advantage of using a filtration membrane instead of an ion exchange membrane.
  • the use of filtration membranes over the use of ion exchange membranes offers many advantages.
  • the coating process carried out therewith is more cost-effective, since no platinized anodes have to be used, catholyte and anolyte can have the same composition, and thus no circulation for the anolyte is required.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
EP09152660.8A 2005-04-26 2005-04-26 Bain galvanique alcalin doté d'une membrane de filtration Revoked EP2050841B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP09152660.8A EP2050841B1 (fr) 2005-04-26 2005-04-26 Bain galvanique alcalin doté d'une membrane de filtration
ES09152660.8T ES2574158T3 (es) 2005-04-26 2005-04-26 Baño galvánico alcalino con una membrana de filtración

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP09152660.8A EP2050841B1 (fr) 2005-04-26 2005-04-26 Bain galvanique alcalin doté d'une membrane de filtration
EP05009127A EP1717353B1 (fr) 2005-04-26 2005-04-26 Bain galvanique contenant une membrane de filtration

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
EP05009127A Division EP1717353B1 (fr) 2005-04-26 2005-04-26 Bain galvanique contenant une membrane de filtration

Publications (2)

Publication Number Publication Date
EP2050841A1 true EP2050841A1 (fr) 2009-04-22
EP2050841B1 EP2050841B1 (fr) 2016-05-11

Family

ID=35530823

Family Applications (2)

Application Number Title Priority Date Filing Date
EP09152660.8A Revoked EP2050841B1 (fr) 2005-04-26 2005-04-26 Bain galvanique alcalin doté d'une membrane de filtration
EP05009127A Active EP1717353B1 (fr) 2005-04-26 2005-04-26 Bain galvanique contenant une membrane de filtration

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP05009127A Active EP1717353B1 (fr) 2005-04-26 2005-04-26 Bain galvanique contenant une membrane de filtration

Country Status (11)

Country Link
US (1) US8293092B2 (fr)
EP (2) EP2050841B1 (fr)
JP (1) JP4955657B2 (fr)
KR (1) KR101301275B1 (fr)
CN (3) CN101146934A (fr)
AT (1) ATE429528T1 (fr)
BR (1) BRPI0610765B1 (fr)
CA (1) CA2600273C (fr)
DE (1) DE502005007138D1 (fr)
ES (2) ES2574158T3 (fr)
WO (1) WO2006114305A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3168332B1 (fr) 2015-03-13 2019-03-13 Okuno Chemical Industries Co., Ltd. Agent de décapage électrolytique pour enlever du palladium d'un gabarit

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8084684B2 (en) * 2006-10-09 2011-12-27 Solexel, Inc. Three-dimensional thin-film solar cells
ITTO20070704A1 (it) * 2007-10-05 2009-04-06 Create New Technology S R L Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
US8177944B2 (en) 2007-12-04 2012-05-15 Ebara Corporation Plating apparatus and plating method
DE102008056776A1 (de) 2008-11-11 2010-05-12 Enthone Inc., West Haven Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
ES2404844T3 (es) 2010-05-07 2013-05-29 Dr.Ing. Max Schlötter Gmbh & Co. Kg Regeneración de electrolitos de cinc-níquel alcalinos mediante la eliminación de iones cianuro
IT1405319B1 (it) * 2010-12-27 2014-01-03 Fontana R D S R L Procedimento di rivestimento di pezzi metallici filettati
KR101420865B1 (ko) * 2012-10-12 2014-07-18 주식회사 익스톨 금속 도금장치
EP2784189A1 (fr) 2013-03-28 2014-10-01 Coventya SAS Bain d'électrodéposition d'alliages zinc-fer, procédé de dépôt d'alliage zinc-fer sur un dispositif et ledit dispositif
US10156020B2 (en) 2015-07-22 2018-12-18 Dipsol Chemicals Co., Ltd. Zinc alloy plating method
CN106550607B (zh) * 2015-07-22 2018-09-18 迪普索股份公司 锌合金镀敷方法
US11913131B2 (en) * 2016-05-24 2024-02-27 Macdermid, Incorporated Ternary zinc-nickel-iron alloys and alkaline electrolytes or plating such alloys
EP3491177A4 (fr) * 2016-07-29 2020-08-12 Simon Fraser University Procédé de dépôt électrochimique
EP3358045A1 (fr) * 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques
DK3415665T3 (da) 2017-06-14 2024-02-12 Dr Ing Max Schloetter Gmbh & Co Kg Fremgangsmåde til galvanisk udfældning af zink-nikkel-legeringsovertræk ud fra et alkalisk zink-nikkel-legeringsbad med reduceret nedbrydning af tilsætningsstoffer
PL3461933T3 (pl) * 2017-09-28 2020-03-31 Atotech Deutschland Gmbh Sposób elektrolitycznego osadzania warstwy stopu cynkowo-niklowego co najmniej na podłożu przeznaczonym do obróbki
US11165091B2 (en) 2018-01-23 2021-11-02 City University Of Hong Kong Battery system and a method of forming a battery
ES2952069T3 (es) * 2019-01-24 2023-10-26 Atotech Deutschland Gmbh & Co Kg Método para la deposición electrolítica una aleación de zinc-níquel usando un sistema de ánodo de membrana
CN110462107A (zh) 2019-02-15 2019-11-15 迪普索股份公司 锌或锌合金电镀方法和系统
RU2712582C1 (ru) * 2019-07-16 2020-01-29 Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" Электролит для электроосаждения цинк-железных покрытий
EP4273303A1 (fr) * 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Procédé de dépôt d'un alliage zinc-nickel sur un substrat, bain de dépôt zinc-nickel aqueux, agent d'éclaircissement et son utilisation

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3974049A (en) * 1973-08-03 1976-08-10 Parel. Societe Anonyme Electrochemical process
US4421611A (en) 1982-09-30 1983-12-20 Mcgean-Rohco, Inc. Acetylenic compositions and nickel plating baths containing same
US4877496A (en) 1986-08-22 1989-10-31 Nippon Hyomen Kagaku Kabushiki Kaisha Zinc-nickel alloy plating solution
US5417840A (en) 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
WO2000006807A2 (fr) 1998-07-30 2000-02-10 Walter Hillebrand Gmbh & Co. Galvanotechnik Bain alcalin de zinc-nickel
WO2001096631A1 (fr) 2000-06-15 2001-12-20 Taskem Inc. Electrodeposition zinc-nickel
US6652728B1 (en) 1998-09-02 2003-11-25 Atotech Deutschland Gmbh Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings
EP1365046A1 (fr) * 2002-05-16 2003-11-26 UNIVERSITE PAUL SABATIER (TOULOUSE III) Etablissement public a caractère scientifique, culturel et professionnel Procédé de protection d'un substrat en acier ou alliage d'alumium contre la corrosion permettant de lui conferer des propriétés tribologiques, et substrat obtenu
EP1369505A2 (fr) 2002-06-06 2003-12-10 Goema Ag Procédé et dispositif de recirculation de l'eau de rincage et de nettoyage d'un bain
WO2005073438A1 (fr) 2003-12-31 2005-08-11 Coventya Sas Installation de depot de zinc ou d’alliages de zinc

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB381931A (en) * 1931-07-11 1932-10-11 Mond Nickel Co Ltd Improvements relating to electro-plating and the electrodeposition of metals
US3945900A (en) 1972-05-02 1976-03-23 Dorr-Oliver Incorporated Electro ultrafiltration process and apparatus
US4250002A (en) * 1979-09-19 1981-02-10 Hooker Chemicals & Plastics Corp. Polymeric microporous separators for use in electrolytic processes and devices
JPH01116094A (ja) * 1987-10-28 1989-05-09 Eagle Ind Co Ltd 隔膜鍍金法
JPH02141596A (ja) * 1988-11-21 1990-05-30 Yuken Kogyo Kk ジンケート型亜鉛合金メッキ浴
JPH0444375A (ja) * 1990-06-12 1992-02-14 Zexel Corp レーザ共振器のアライメント装置
US5443727A (en) 1990-10-30 1995-08-22 Minnesota Mining And Manufacturing Company Articles having a polymeric shell and method for preparing same
US5082538A (en) 1991-01-09 1992-01-21 Eltech Systems Corporation Process for replenishing metals in aqueous electrolyte solutions
CN2175238Y (zh) 1993-09-29 1994-08-24 北京科技大学 锌-镍合金电镀用阳极
US5631102A (en) * 1996-02-12 1997-05-20 Wilson Greatbatch Ltd. Separator insert for electrochemical cells
JPH11200099A (ja) 1998-01-08 1999-07-27 Toyo Kohan Co Ltd 不溶性陽極を用いるめっき方法およびめっき装置
JP2000087299A (ja) * 1998-09-08 2000-03-28 Ebara Corp 基板メッキ装置
US6383352B1 (en) 1998-11-13 2002-05-07 Mykrolis Corporation Spiral anode for metal plating baths
JP4060012B2 (ja) * 1999-07-19 2008-03-12 日本エレクトロプレイテイング・エンジニヤース株式会社 カップ式めっき装置
AU2003252677A1 (en) 2002-07-25 2004-02-16 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film
WO2004108995A1 (fr) * 2003-06-03 2004-12-16 Taskem Inc. Electrodeposition de zinc et d'alliage de zinc
JP4120497B2 (ja) * 2003-06-27 2008-07-16 Ｊｆｅスチール株式会社 電気亜鉛系めっき鋼板
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3974049A (en) * 1973-08-03 1976-08-10 Parel. Societe Anonyme Electrochemical process
US4421611A (en) 1982-09-30 1983-12-20 Mcgean-Rohco, Inc. Acetylenic compositions and nickel plating baths containing same
US4877496A (en) 1986-08-22 1989-10-31 Nippon Hyomen Kagaku Kabushiki Kaisha Zinc-nickel alloy plating solution
US5417840A (en) 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
WO2000006807A2 (fr) 1998-07-30 2000-02-10 Walter Hillebrand Gmbh & Co. Galvanotechnik Bain alcalin de zinc-nickel
US6652728B1 (en) 1998-09-02 2003-11-25 Atotech Deutschland Gmbh Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings
WO2001096631A1 (fr) 2000-06-15 2001-12-20 Taskem Inc. Electrodeposition zinc-nickel
EP1365046A1 (fr) * 2002-05-16 2003-11-26 UNIVERSITE PAUL SABATIER (TOULOUSE III) Etablissement public a caractère scientifique, culturel et professionnel Procédé de protection d'un substrat en acier ou alliage d'alumium contre la corrosion permettant de lui conferer des propriétés tribologiques, et substrat obtenu
EP1369505A2 (fr) 2002-06-06 2003-12-10 Goema Ag Procédé et dispositif de recirculation de l'eau de rincage et de nettoyage d'un bain
WO2005073438A1 (fr) 2003-12-31 2005-08-11 Coventya Sas Installation de depot de zinc ou d’alliages de zinc

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3168332B1 (fr) 2015-03-13 2019-03-13 Okuno Chemical Industries Co., Ltd. Agent de décapage électrolytique pour enlever du palladium d'un gabarit
US11649558B2 (en) 2015-03-13 2023-05-16 Okuno Chemical Industries Co., Ltd. Electrolytic stripping agent for jig

Also Published As

Publication number Publication date
BRPI0610765A2 (pt) 2010-07-20
CN104911651A (zh) 2015-09-16
US20090107845A1 (en) 2009-04-30
BRPI0610765B1 (pt) 2017-04-04
ES2574158T3 (es) 2016-06-15
JP2008539329A (ja) 2008-11-13
EP1717353B1 (fr) 2009-04-22
EP2050841B1 (fr) 2016-05-11
ATE429528T1 (de) 2009-05-15
JP4955657B2 (ja) 2012-06-20
KR20070122454A (ko) 2007-12-31
DE502005007138D1 (de) 2009-06-04
CA2600273A1 (fr) 2006-11-02
CA2600273C (fr) 2014-08-12
ES2324169T3 (es) 2009-07-31
CN101146934A (zh) 2008-03-19
US8293092B2 (en) 2012-10-23
CN104911676A (zh) 2015-09-16
WO2006114305A1 (fr) 2006-11-02
CN104911676B (zh) 2017-11-17
KR101301275B1 (ko) 2013-08-29
EP1717353A1 (fr) 2006-11-02

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