DK553786A - Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale - Google Patents

Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Info

Publication number
DK553786A
DK553786A DK553786A DK553786A DK553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A
Authority
DK
Denmark
Prior art keywords
photo
hardware
sensitive material
sensitive
including photo
Prior art date
Application number
DK553786A
Other languages
Danish (da)
English (en)
Other versions
DK553786D0 (da
Inventor
Peter Gottschalk
Douglas Carlyle Neckers
Gary Benjamin Schuster
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/917,873 external-priority patent/US4772541A/en
Application filed by Mead Corp filed Critical Mead Corp
Publication of DK553786D0 publication Critical patent/DK553786D0/da
Publication of DK553786A publication Critical patent/DK553786A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06—Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H53/00—Cams ; Non-rotary cams; or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02—Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025—Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00—Dental prostheses; Making same
    • A61C13/0003—Making bridge-work, inlays, implants or the like
    • A61C13/0006—Production methods
    • A61C13/0013—Production methods using stereolithographic techniques
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00—Dental auxiliary appliances
    • A61C19/003—Apparatus for curing resins by radiation
DK553786A 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale DK553786A (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80001485A 1985-11-20 1985-11-20
US86036786A 1986-05-06 1986-05-06
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

Publications (2)

Publication Number Publication Date
DK553786D0 DK553786D0 (da) 1986-11-19
DK553786A true DK553786A (da) 1987-05-21

Family

ID=27419957

Family Applications (1)

Application Number Title Priority Date Filing Date
DK553786A DK553786A (da) 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Country Status (6)

Country Link
EP (2) EP0223587B1 (fr)
KR (1) KR940002538B1 (fr)
CN (1) CN86108826A (fr)
BR (1) BR8605710A (fr)
DE (2) DE3650107T2 (fr)
DK (1) DK553786A (fr)

Families Citing this family (189)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
JPS62232638A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
US4840866A (en) * 1988-03-24 1989-06-20 The Mead Corporation Microcapsule imaging system having improved dynamic range
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
EP0364250A3 (fr) * 1988-10-11 1991-01-30 The Mead Corporation Production d'images
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
CA2005933A1 (fr) * 1989-01-09 1990-07-09 Jesse Hipps, Sr. Composition photoreticulable renfermant un groupe aromatique a cinq membres avec une fraction imine
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
CA2009652A1 (fr) * 1989-03-09 1990-09-09 Paul Davis Composes photoinitiateurs contenant des disulfides et composes photodurcissables contenant ces memes substances
KR900014930A (ko) * 1989-03-27 1990-10-25 로레인 제이. 프란시스 염료 보레이트 광개시제 및 이를 함유하는 광경화성 조성물
DE69030477T2 (de) * 1989-10-13 1997-08-28 Fuji Photo Film Co Ltd Einen Aluminatkomplex enthaltendes Bildaufzeichnungsmaterial
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
EP0438123B1 (fr) * 1990-01-16 1995-09-13 Showa Denko Kabushiki Kaisha Initiateur de polymérisation utilisable dans l'infrarouge proche
EP0450254A1 (fr) * 1990-04-03 1991-10-09 Ciba-Geigy Ag Compositions photodurcissables
JPH043064A (ja) * 1990-04-20 1992-01-08 Oriental Photo Ind Co Ltd 感光体
JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
TW207021B (fr) * 1990-07-23 1993-06-01 Showa Denko Kk
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
CA2120838A1 (fr) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Substance a couleur en aplat variable a l'ultraviolet
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
ATE175034T1 (de) * 1993-08-26 1999-01-15 Ciba Geigy Ag Flüssige strahlungshärtbare zusammensetzung, insbesondere für die stereolithographie
US6033465A (en) 1995-06-28 2000-03-07 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
EP0646580B1 (fr) 1993-09-16 2000-05-31 Ciba SC Holding AG Composés de vinyléther avec des groupes fonctionnels additionnels différents de vinyléther et leur utilisation dans la formulation de compositions durcissables
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW418215B (en) * 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
ATE195815T1 (de) 1995-06-05 2000-09-15 Kimberly Clark Co Farbstoffvorläufer und diese enthaltende zusammensetzungen
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
DK0854783T3 (da) * 1995-09-09 2003-02-24 Vantico Ltd Fremgangsmåde til fremstilling af polymerlag med selektivt farvede arealer
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
JPH10513502A (ja) 1995-11-28 1998-12-22 キンバリー クラーク ワールドワイド インコーポレイテッド 改良された着色剤安定剤
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
DE59701299D1 (de) * 1996-07-29 2000-04-27 Ciba Sc Holding Ag Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
DE69710657T3 (de) † 1996-08-23 2007-07-05 Showa Denko K.K. Photohärtbare Zusammensetzung und Härtungsverfahren
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6211260B1 (en) 1997-11-05 2001-04-03 Showa Denko K.K. Photocurable paint composition for road markings
KR20010041213A (ko) * 1998-02-25 2001-05-15 싸이칼라, 인크 캡슐화된 방사선 민감성 조성물을 사용하는 화상 시스템
JPH11249304A (ja) * 1998-03-02 1999-09-17 Oriental Photo Ind Co Ltd 乾式画像形成材料及び乾式画像形成方法
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
CA2298468A1 (fr) 1998-06-03 1999-12-09 John Gavin Macdonald Nouveaux photoamorceurs et applications
CA2298615C (fr) 1998-06-03 2009-03-31 Kimberly-Clark Worldwide, Inc. Techniques recourant aux neonanoplastes et aux microemulsions relatives aux encres et a l'impression par jets d'encre
WO2000004104A1 (fr) 1998-07-20 2000-01-27 Kimberly-Clark Worldwide, Inc. Compositions a jet d'encre ameliorees
US6489374B1 (en) 1998-08-21 2002-12-03 Ciba Specialty Chemicals Corporation Photoactivatable bases containing nitrogen
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
JP2003533548A (ja) 1998-09-28 2003-11-11 キンバリー クラーク ワールドワイド インコーポレイテッド 光重合開始剤であるキノイド基を含むキレート
DE69916750T2 (de) 1998-11-17 2005-01-05 Showa Denko K.K. Photohärtbare Zusammensetzung
ES2195869T3 (es) 1999-01-19 2003-12-16 Kimberly Clark Co Nuevos colorantes, estabilizantes de colorantes, compuestos de tinta y metodos mejorados para su fabricacion.
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
KR100772772B1 (ko) 2000-06-19 2007-11-01 킴벌리-클라크 월드와이드, 인크. 신규한 광개시제 및 그의 용도
EP1456307B1 (fr) 2001-10-03 2011-12-07 3D Systems, Inc. Composition de materiau de support a changement de phase
US6841589B2 (en) 2001-10-03 2005-01-11 3D Systems, Inc. Ultra-violet light curable hot melt composition
KR100811393B1 (ko) * 2001-12-04 2008-03-07 주식회사 하이닉스반도체 패턴 붕괴 개선용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물
WO2003093901A1 (fr) 2002-05-03 2003-11-13 Dsm Ip Assets B.V. Composition de resine durcissable par irradiation et procede de prototypage rapide faisant appel a celle-ci
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
EP1622178A1 (fr) * 2004-07-29 2006-02-01 Ecole Polytechnique Federale De Lausanne (Epfl) Ligands 2,2 -bipyridine, colorant sensibilisateur et pile solaire sensibilisee par un colorant
DE102004058584A1 (de) 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
WO2008079934A2 (fr) 2006-12-21 2008-07-03 Saint-Gobain Abrasives, Inc. Articles abrasifs à faible corrosion et procédés de formation de ceux-ci
RU2515549C9 (ru) 2008-10-01 2014-09-20 Байер Матириальсайенс Аг Полиуретановые композиции на основе форполимера для изготовления голографических сред
IL200996A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
IL200995A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200997A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200722A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
EP2218743A1 (fr) 2009-02-12 2010-08-18 Bayer MaterialScience AG Formules de polyuréthane à base de prépolymère pour la fabrication de films holographiques
EP2218742A1 (fr) 2009-02-12 2010-08-18 Bayer MaterialScience AG Compositions photopolymères en tant que formules imprimables
EP2219073B1 (fr) 2009-02-17 2020-06-03 Covestro Deutschland AG Supports holographiques et compositions de photopolymère
EP2406318B1 (fr) 2009-03-13 2021-04-21 DSM IP Assets B.V. Composition de résine durcissable par rayonnement et procédé d'imagerie tridimensionnelle rapide l'utilisant
IN2012DN03890A (fr) 2009-11-03 2015-09-04 Bayer Materialscience Ag
ES2381808T3 (es) 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
CN102667935B (zh) 2009-11-03 2016-01-20 拜尔材料科学股份公司 具有不同书写共聚单体的光聚合物制剂
CN104892462B (zh) 2009-11-03 2017-08-22 科思创德国股份有限公司 新型非结晶甲基丙烯酸酯、其的制备和应用
RU2542984C2 (ru) 2009-11-03 2015-02-27 Байер Матириальсайенс Аг Способ изготовления голографической пленки
WO2011054792A1 (fr) 2009-11-03 2011-05-12 Bayer Materialscience Ag Acrylates d'uréthane à haut indice de réfraction et densité de double liaison réduite
WO2011054799A2 (fr) 2009-11-03 2011-05-12 Bayer Materialscience Ag Uréthanes utilisés comme additifs dans une formulation photopolymère
WO2011054796A1 (fr) 2009-11-03 2011-05-12 Bayer Materialscience Ag Procédé de sélection d'additifs dans des photopolymères
CN102754026B (zh) 2010-02-02 2015-10-07 拜耳知识产权有限责任公司 具有酯基书写单体的光聚合物制剂
RU2012137134A (ru) 2010-02-02 2014-03-10 Байер Интеллектуэль Проперти Гмбх Фотополимерная композиция с записывающими мономерами на основе триазина
EP2354845B1 (fr) 2010-02-02 2015-12-23 Covestro Deutschland AG Composition de Photopolymère pour la Fabrication de Médias Holographiques
EP2330461A1 (fr) 2010-03-26 2011-06-08 Bayer MaterialScience AG Dispositif de projection pour un picoprojecteur et écran de projection holographique
RU2013110226A (ru) 2010-08-11 2014-09-20 Байер Интеллектуэль Проперти Гмбх Дифункциональные (мет)-акрилатные пишущие мономеры
EP2450387A1 (fr) 2010-11-08 2012-05-09 Bayer MaterialScience AG Formule photopolymère pour la fabrication de supports holographiques
EP2450893A1 (fr) 2010-11-08 2012-05-09 Bayer MaterialScience AG Formule photopolymère pour la fabrication de supports holographiques dotés de polymères à matrice hautement réticulés
US8460451B2 (en) 2011-02-23 2013-06-11 3D Systems, Inc. Support material and applications thereof
US9157007B2 (en) 2011-03-09 2015-10-13 3D Systems, Incorporated Build material and applications thereof
US9394441B2 (en) 2011-03-09 2016-07-19 3D Systems, Inc. Build material and applications thereof
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
US9475889B2 (en) 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses
CN103875037A (zh) 2011-10-12 2014-06-18 拜耳知识产权有限责任公司 在聚氨酯基光聚合物组合物中的链转移试剂
JP2014535071A (ja) 2011-10-12 2014-12-25 バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ ポリウレタン系フォトポリマー処方物における硫黄含有連鎖移動剤
EP2613318B1 (fr) 2012-01-05 2014-07-30 Bayer Intellectual Property GmbH Montage de couche doté d'une couche de protection et d'une couche de photopolymère éclairée
TWI557187B (zh) 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
EP2700510B1 (fr) 2012-08-23 2015-09-16 Bayer MaterialScience AG Documents de valeur et/ou de sécurité à base de polycarbonate avec hologramme dans le corps de la carte
EP2888116B1 (fr) 2012-08-23 2016-09-21 Covestro Deutschland AG Document de valeur et/ou de sécurité comprenant une fenêtre commutable visuellement avec un hologramme
US8980406B2 (en) 2012-08-28 2015-03-17 3D Systems, Inc. Color stable inks and applications thereof
US9657186B2 (en) 2012-09-13 2017-05-23 3D Systems, Inc. Opaque inks and applications thereof
CN105051620A (zh) 2013-01-25 2015-11-11 拜耳材料科技股份有限公司 具有体积全息图和印刷特征的安全元件
EP2772917A1 (fr) 2013-02-27 2014-09-03 Bayer MaterialScience AG Laque de protection à base de dispersions de polyuréthane réticulables par irradiation
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
US9353284B2 (en) 2013-03-15 2016-05-31 3D Systems, Inc. Three dimensional printing material system and method
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ハロー防止層を有するホログラフィック記録媒体およびその製造
PL3058423T3 (pl) 2013-10-17 2018-09-28 Covestro Deutschland Ag Formulacja fotopolimerowa do wytwarzania mediów holograficznych z boranami o niskiej TG
US9703194B2 (en) 2013-10-30 2017-07-11 Covestro Deutschland Ag Composite comprising a substrate and a photopolymer film
JP2017504827A (ja) 2013-12-20 2017-02-09 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ 改善された光感受性を備えるホログラフィック媒体
WO2015100243A1 (fr) 2013-12-23 2015-07-02 3D Systems, Inc. Matériaux, systèmes et procédés pour impression 3d
EP3116707B1 (fr) 2014-03-11 2021-05-05 3D Systems, Inc. Coloration en impression 3d
EP3134446B1 (fr) 2014-04-25 2019-04-24 Covestro Deutschland AG Éther de glycol aromatique comme monomère d'enregistrement dans des formules photo-polymères holographiques
WO2015184220A1 (fr) 2014-05-30 2015-12-03 3D Systems, Incorporated Matériaux de support dispersibles dans l'eau pour l'impression 3d
WO2015187933A1 (fr) 2014-06-04 2015-12-10 3D Systems, Incorporated Encres comprenant des gélifiants pour impression 3d
US9827712B2 (en) 2014-06-09 2017-11-28 3D Systems, Inc. Method of printing grayscale and full-color 3D articles
US9650526B2 (en) 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
WO2016085863A1 (fr) 2014-11-24 2016-06-02 3D Systems, Incorporated Encres comprenant du caoutchouc liquide pour impression 3d
JP6700280B2 (ja) 2014-12-12 2020-05-27 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ フォトポリマーのための書込モノマーとしてのナフチルアクリレート
CN107223121B (zh) 2014-12-19 2020-10-27 科思创德国股份有限公司 湿稳定的全息介质
TWI698326B (zh) 2015-01-14 2020-07-11 德商科思創德意志股份有限公司 以全相光學元件製備光學鑄件之方法及光學鑄件
WO2016207158A1 (fr) 2015-06-23 2016-12-29 Covestro Deutschland Ag Triazines substituées et procédé pour leur production
EP3371263B1 (fr) 2015-11-03 2020-10-21 3D Systems, Incorporated Encres biocompatibles pour l'impression 3d
EP3166109A1 (fr) 2015-11-09 2017-05-10 Covestro Deutschland AG Ensemble de pieces comprenant une couche couvre-n uds et photo-polymere
WO2017156132A1 (fr) 2016-03-08 2017-09-14 3D Systems, Incorporated Encres de polyuréthane non-isocyanate pour impression en 3d
EP4215594A1 (fr) 2016-04-07 2023-07-26 3D Systems, Incorporated Encres thiol-ène pour impression 3d
TWI746687B (zh) 2016-11-09 2021-11-21 德商科思創德意志股份有限公司 製備三芳基有機硼酸鹽之方法
EP3541793B1 (fr) 2016-11-09 2021-03-31 Covestro Intellectual Property GmbH & Co. KG Procédé de fabrication de triaryl-alkylborates
KR102499972B1 (ko) 2016-11-09 2023-02-15 코베스트로 도이칠란트 아게 트리아릴-유기 보레이트를 제조하는 방법
US11142660B2 (en) 2017-02-01 2021-10-12 3D Systems, Inc. 3D printing ink containing a cyclopolymerizable monomer
EP3622511B1 (fr) 2017-05-09 2022-04-27 Covestro Intellectual Property GmbH & Co. KG Moyen holographique comprenant une couche photopolymère servant à l'éclairage holographique et couche de peinture haute résistance
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
EP3401910A1 (fr) 2017-05-09 2018-11-14 Covestro Deutschland AG Moyen holographique comprenant une couche photopolymère servant à l'éclairage holographique et couche de peinture haute résistance
EP3401909A1 (fr) 2017-05-09 2018-11-14 Covestro Deutschland AG Élaboration de feuille comprenant une couche photopolymère servant à l'éclairage holographique et couche de peinture haute résistance
US11640136B2 (en) 2017-05-09 2023-05-02 Covestro Deutschland Ag System consisting of two UV-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite
EP3435156A1 (fr) 2017-07-26 2019-01-30 Covestro Deutschland AG Couche protectrice pour photopolymères
EP3692105A1 (fr) 2017-10-05 2020-08-12 3D Systems, Inc. Composés cyclopolymérisables pour impression 3d
JP7165190B2 (ja) 2017-11-07 2022-11-02 スリーディー システムズ インコーポレーテッド 低プリントスルー深さの３ｄプリント用インク
EP3495886A1 (fr) 2017-12-06 2019-06-12 Covestro Deutschland AG Structure en couches en photopolymère sans adhésif
WO2019245847A1 (fr) 2018-06-22 2019-12-26 3D Systems, Inc. Procédé de vérification de l'intégrité d'une élimination post-traitement d'un matériau de support
EP3810722A1 (fr) 2018-06-22 2021-04-28 3D Systems, Inc. Matériaux de construction et matériaux de support pour impression 3d comprenant un phosphore
WO2020112496A1 (fr) 2018-11-30 2020-06-04 3D Systems, Inc. Encres pour impression 3d ayant un rétrécissement de polymérisation réduit
CN117210052A (zh) 2019-07-12 2023-12-12 3D系统公司 用于3d印刷的建筑材料
EP3772671A1 (fr) 2019-08-06 2021-02-10 Covestro Deutschland AG Structure en couches destinée à l'exposition à la lumière des hologrammes
WO2021067540A1 (fr) 2019-10-01 2021-04-08 3D Systems, Inc. Matériaux de construction longue conservation pour impression 3d
EP4038151A1 (fr) 2019-10-01 2022-08-10 3D Systems, Inc. Matériaux de construction optiquement actifs pour impression 3d
CN114945616A (zh) 2020-01-24 2022-08-26 3D系统公司 用于三维印刷应用的水溶性蜡质载体材料
US11739221B2 (en) 2020-11-16 2023-08-29 3D Systems, Inc. Build materials for printing 3D articles
WO2022125668A1 (fr) 2020-12-10 2022-06-16 3D Systems, Inc. Matériaux de construction résistants à la flamme et articles associés imprimés en 3d
CN117083260A (zh) 2021-03-10 2023-11-17 3D系统公司 用于构建材料的添加剂和相关打印3d制品
CN116917108A (zh) 2021-03-10 2023-10-20 3D系统公司 阻燃构建材料和相关的3d印刷制品
JP2024517102A (ja) 2021-05-07 2024-04-19 スリーディー システムズ インコーポレーテッド 造形材料のための添加剤および関連するプリントされた３ｄ物品
US20240091412A1 (en) 2021-09-21 2024-03-21 3D Systems, Inc. Curable compounds and formulations for biomedical applications
WO2023156484A1 (fr) 2022-02-21 2023-08-24 Covestro Deutschland Ag Compositions photopolymères pour photopolymères thermostables dans le domaine spectral visible
WO2023156485A1 (fr) 2022-02-21 2023-08-24 Covestro Deutschland Ag Sels de triarylalkylborate servant de co-amorceurs dans des compositions de photopolymères nir
WO2023156482A1 (fr) 2022-02-21 2023-08-24 Covestro Deutschland Ag Photopolymères thermostables dans le domaine spectral visible et compositions photopolymères les contenant
US20240026183A1 (en) 2022-07-15 2024-01-25 3D Systems, Inc. Hydrogels for 3d printing having high resolution
WO2024052256A1 (fr) 2022-09-07 2024-03-14 Covestro Deutschland Ag Sels de benzopyrylium spécifiques en tant que colorants pour compositions photopolymères

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS509178B1 (fr) * 1970-12-28 1975-04-10
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives

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KR940002538B1 (ko) 1994-03-25
EP0223587B1 (fr) 1991-02-13
DE3677527D1 (de) 1991-03-21
DE3650107T2 (de) 1995-05-24
EP0389067B1 (fr) 1994-10-19
DE3650107D1 (de) 1994-11-24
KR870005270A (ko) 1987-06-05
EP0389067A2 (fr) 1990-09-26
EP0389067A3 (en) 1990-11-28
DK553786D0 (da) 1986-11-19
CN86108826A (zh) 1987-11-25
EP0223587A1 (fr) 1987-05-27

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