KR100772772B1 - 신규한 광개시제 및 그의 용도 - Google Patents
신규한 광개시제 및 그의 용도 Download PDFInfo
- Publication number
- KR100772772B1 KR100772772B1 KR1020027017284A KR20027017284A KR100772772B1 KR 100772772 B1 KR100772772 B1 KR 100772772B1 KR 1020027017284 A KR1020027017284 A KR 1020027017284A KR 20027017284 A KR20027017284 A KR 20027017284A KR 100772772 B1 KR100772772 B1 KR 100772772B1
- Authority
- KR
- South Korea
- Prior art keywords
- photoinitiator
- formula
- carbon atoms
- alkyl group
- photoinitiators
- Prior art date
Links
- 239000000203 mixture Substances 0.000 claims abstract description 82
- 238000000034 method Methods 0.000 claims abstract description 46
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 claims abstract description 34
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 26
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 8
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 7
- 230000005855 radiation Effects 0.000 claims description 77
- -1 hexafluorophosphate Chemical compound 0.000 claims description 37
- 150000003254 radicals Chemical class 0.000 claims description 20
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- 229910052736 halogen Chemical group 0.000 claims description 12
- 150000002367 halogens Chemical group 0.000 claims description 12
- 150000002431 hydrogen Chemical class 0.000 claims description 12
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 4
- 125000002091 cationic group Chemical group 0.000 claims description 2
- 238000007639 printing Methods 0.000 abstract description 25
- 239000000178 monomer Substances 0.000 abstract description 21
- 239000000853 adhesive Substances 0.000 abstract description 20
- 230000001070 adhesive effect Effects 0.000 abstract description 20
- 239000011347 resin Substances 0.000 abstract description 8
- 229920005989 resin Polymers 0.000 abstract description 8
- 238000010030 laminating Methods 0.000 abstract description 4
- 239000000976 ink Substances 0.000 description 24
- 239000010408 film Substances 0.000 description 19
- 238000001723 curing Methods 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 16
- 238000001035 drying Methods 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- 238000006862 quantum yield reaction Methods 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 10
- 239000000835 fiber Substances 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- 239000011701 zinc Substances 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 8
- 150000001450 anions Chemical class 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000006552 photochemical reaction Methods 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 0 CC1*C(C2)C2C1 Chemical compound CC1*C(C2)C2C1 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 229920002521 macromolecule Polymers 0.000 description 4
- 238000000016 photochemical curing Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- QKHHCXOSPQAQQI-UHFFFAOYSA-N 2-bromo-1-(4-fluorophenyl)propan-1-one Chemical compound CC(Br)C(=O)C1=CC=C(F)C=C1 QKHHCXOSPQAQQI-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 150000005839 radical cations Chemical class 0.000 description 3
- 238000006479 redox reaction Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- AGSQAWMWCGWBEQ-UHFFFAOYSA-N 2-amino-1-(4-fluorophenyl)-2-methylpropan-1-one Chemical compound CC(C)(N)C(=O)C1=CC=C(F)C=C1 AGSQAWMWCGWBEQ-UHFFFAOYSA-N 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 2
- 206010073306 Exposure to radiation Diseases 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008033 biological extinction Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 238000000295 emission spectrum Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- PGRNEGLBSNLPNP-UHFFFAOYSA-N 1,6-dichloro-3-methylhex-1-ene Chemical compound ClC=CC(C)CCCCl PGRNEGLBSNLPNP-UHFFFAOYSA-N 0.000 description 1
- QIJNVLLXIIPXQT-UHFFFAOYSA-N 1-(4-fluorophenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(F)C=C1 QIJNVLLXIIPXQT-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- ZISFVSBQBJYRDB-UHFFFAOYSA-N 2-bromo-1-(4-fluorophenyl)-2-methylpropan-1-one Chemical compound CC(C)(Br)C(=O)C1=CC=C(F)C=C1 ZISFVSBQBJYRDB-UHFFFAOYSA-N 0.000 description 1
- RSROEZYGRKHVMN-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.CCC(CO)(CO)CO RSROEZYGRKHVMN-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- ANHQLUBMNSSPBV-UHFFFAOYSA-N 4h-pyrido[3,2-b][1,4]oxazin-3-one Chemical group C1=CN=C2NC(=O)COC2=C1 ANHQLUBMNSSPBV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000012958 Amine synergist Substances 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- YQHHCMVUMULAPZ-UHFFFAOYSA-N C[CH2+] Chemical compound C[CH2+] YQHHCMVUMULAPZ-UHFFFAOYSA-N 0.000 description 1
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021552 Vanadium(IV) chloride Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 1
- 238000006114 decarboxylation reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- JUHDUIDUEUEQND-UHFFFAOYSA-N methylium Chemical compound [CH3+] JUHDUIDUEUEQND-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- WPKVKNZNPQRHOD-UHFFFAOYSA-N prop-1-ene Chemical compound [CH2+]C=C WPKVKNZNPQRHOD-UHFFFAOYSA-N 0.000 description 1
- ZEJYUSNKPNYKPO-UHFFFAOYSA-N prop-1-ene Chemical compound CC=[CH-] ZEJYUSNKPNYKPO-UHFFFAOYSA-N 0.000 description 1
- WTXMTPLATLKWQS-UHFFFAOYSA-N propane Chemical compound CC[CH2+] WTXMTPLATLKWQS-UHFFFAOYSA-N 0.000 description 1
- 150000005838 radical anions Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000006462 rearrangement reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229940080262 sodium tetrachloroaurate Drugs 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- ZLUSCZLCHQSJRU-UHFFFAOYSA-N thallium(1+) Chemical compound [Tl+] ZLUSCZLCHQSJRU-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- JTJFQBNJBPPZRI-UHFFFAOYSA-J vanadium tetrachloride Chemical compound Cl[V](Cl)(Cl)Cl JTJFQBNJBPPZRI-UHFFFAOYSA-J 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Abstract
Description
Zn-함유 화합물 또는 착화합물 | 얻어지는 R9 기 | 얻어지는 음이온 |
Zn(OEt2)2Cl2 | OEt2 | Cl_ |
Zn(H2O)6(BF4)2 | H2O | BF4 _ |
Zn(H2O)6(BPh4)2 | H2O | BPh4 _ |
Claims (20)
- 하기 화학식 1을 갖는 광개시제.<화학식 1>상기 식에서,Z는 각각 독립적으로이고; R1, R2, R3 및 R4 는 각각 독립적으로 수소, 탄소원자수 1 내지 6개의 알킬기, 탄소원자수 1 내지 6개의 알콕시기, 또는 할로겐 치환 알킬기이고; R5, R6, R7 및 R8은 각각 독립적으로 탄소원자수 1 내지 6개의 알킬기, 아릴기, 또는 탄소원자수 1 내지 6개의 할로겐 치환 알킬기이며; R9는 (R10)2O 또는 (R10)3N(여기서, R10은 수소 또는 탄소원자수 1 내지 8개의 알킬기임)이며; R11은 수소, 탄소원자수 1 내지 8개의 알킬기, 벤질기 또는 아르알킬기이다.
- 제1항에 있어서, 1종 이상의 반대이온(counterions)과 결합한 광개시제.
- 제1항에 있어서, 상기 1종 이상의 반대이온이 테트라페닐보론, 테트라클로로보론, 테트라플루오로보론, 헥사플루오로포스페이트, 퍼클로레이트, 또는 이들의 조합물을 포함하는 것인 광개시제.
- 제4항에 있어서, 상기의 1종 이상의 반대이온이 테트라페닐보론 또는 테트라플루오로보론을 포함하는 것인 광개시제.
- 제1항의 광개시제에 방사선을 조사하는 것을 포함하는, 반응성 화학종을 발생시키는 방법.
- 중합성 재료와 제1항의 광개시제의 혼합물에 방사선을 조사하는 것을 포함하 는, 중합성 재료를 중합하는 방법.
- 하기 화학식 1의 광개시제에 방사선을 조사하여 1종 이상의 양이온 자유 라디칼과 1종 이상의 질소 라디칼종을 생성시키는 것을 포함하는, 반응성 화학종을 발생시키는 방법<화학식 1>상기 식에서,Z는 각각 독립적으로이고; R1, R2, R3 및 R4는 각각 독립적으로 수소, 탄소원자수 1 내지 6개의 알킬기, 탄소원자수 1 내지 6개의 알콕시기, 또는 할로겐 치환 알킬기이고; R5, R6, R7 및 R8은 각각 독립적으로 탄소원자수 1 내지 6개의 알킬기, 아릴기, 또는 탄소원자수 1 내지 6개의 할로겐 치환 알킬기이며; R9는 (R10)2O 또는 (R10)3N(여기서, R10은 수소 또는 탄소원자수 1 내지 8개의 알킬기임)이며; R11은 수소, 탄소원자수 1 내지 8개의 알킬기, 벤질기 또는 아르알킬기이다.
- 삭제
- 제9항에 있어서, 상기 광개시제가 1종 이상의 반대이온과 결합한 것인 방법.
- 제12항에 있어서, 상기 1종 이상의 반대이온이 테트라페닐보론, 테트라클로로보론, 테트라플루오로보론, 헥사플루오로포스페이트, 퍼클로레이트, 또는 이들의 조합물을 포함하는 것인 방법.
- 제13항에 있어서, 상기 1종 이상의 반대이온이 테트라페닐보론 또는 테트라플루오로보론을 포함하는 것인 방법.
- 1종 이상의 하기 화학식 1의 광개시제 및 1종 이상의 반대이온을 함유하며, 1종 이상의 양이온 자유 라디칼과 1종 이상의 질소 라디칼종을 발생시킬 수 있는 광반응성 조성물<화학식 1>상기 식에서,Z는 각각 독립적으로이고; R1, R2, R3 및 R4 는 각각 독립적으로 수소, 탄소원자수 1 내지 6개의 알킬기, 탄소원자수 1 내지 6개의 알콕시기, 또는 할로겐 치환 알킬기이고; R5, R6, R7 및 R8은 각각 독립적으로 탄소원자수 1 내지 6개의 알킬기, 아릴기, 또는 탄소원자수 1 내지 6개의 할로겐 치환 알킬기이며; R9는 (R10)2O 또는 (R10)3N(여기서, R10은 수소 또는 탄소원자수 1 내지 8개의 알킬기임)이며; R11은 수소, 탄소원자수 1 내지 8개의 알킬기, 벤질기 또는 아르알킬기이다.
- 삭제
- 제16항에 있어서, 상기 1종 이상의 반대이온이 테트라페닐보론, 테트라클로로보론, 테트라플루오로보론, 헥사플루오로포스페이트, 퍼클로레이트, 또는 이들의 조합물을 포함하는 것인 광반응성 조성물.
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KR20030011359A KR20030011359A (ko) | 2003-02-07 |
KR100772772B1 true KR100772772B1 (ko) | 2007-11-01 |
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EP (1) | EP1297022B1 (ko) |
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AT (1) | ATE333471T1 (ko) |
AU (1) | AU2001269905A1 (ko) |
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DE (1) | DE60121588T2 (ko) |
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2001
- 2001-06-19 WO PCT/US2001/019525 patent/WO2002000735A1/en active IP Right Grant
- 2001-06-19 CA CA2412607A patent/CA2412607C/en not_active Expired - Fee Related
- 2001-06-19 US US09/884,896 patent/US6486227B2/en not_active Expired - Lifetime
- 2001-06-19 KR KR1020027017284A patent/KR100772772B1/ko active IP Right Grant
- 2001-06-19 AT AT01948460T patent/ATE333471T1/de not_active IP Right Cessation
- 2001-06-19 JP JP2002505857A patent/JP2004501987A/ja not_active Abandoned
- 2001-06-19 AU AU2001269905A patent/AU2001269905A1/en not_active Abandoned
- 2001-06-19 EP EP01948460A patent/EP1297022B1/en not_active Expired - Lifetime
- 2001-06-19 MX MXPA02012011A patent/MXPA02012011A/es active IP Right Grant
- 2001-06-19 DE DE60121588T patent/DE60121588T2/de not_active Expired - Lifetime
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US20020099111A1 (en) | 2002-07-25 |
EP1297022B1 (en) | 2006-07-19 |
DE60121588T2 (de) | 2006-11-16 |
MXPA02012011A (es) | 2003-04-22 |
EP1297022A1 (en) | 2003-04-02 |
JP2004501987A (ja) | 2004-01-22 |
DE60121588D1 (de) | 2006-08-31 |
CA2412607C (en) | 2010-12-21 |
US6486227B2 (en) | 2002-11-26 |
WO2002000735A1 (en) | 2002-01-03 |
KR20030011359A (ko) | 2003-02-07 |
CA2412607A1 (en) | 2002-01-03 |
ATE333471T1 (de) | 2006-08-15 |
AU2001269905A1 (en) | 2002-01-08 |
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