KR900014930A - 염료 보레이트 광개시제 및 이를 함유하는 광경화성 조성물 - Google Patents

염료 보레이트 광개시제 및 이를 함유하는 광경화성 조성물 Download PDF

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Publication number
KR900014930A
KR900014930A KR1019900003929A KR900003929A KR900014930A KR 900014930 A KR900014930 A KR 900014930A KR 1019900003929 A KR1019900003929 A KR 1019900003929A KR 900003929 A KR900003929 A KR 900003929A KR 900014930 A KR900014930 A KR 900014930A
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South Korea
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group
photocurable composition
alkyl group
carbon atoms
alkyl
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KR1019900003929A
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English (en)
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카트척 피터
엠 스케그스 리사
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로레인 제이. 프란시스
더 미드 코포레이션
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Application filed by 로레인 제이. 프란시스, 더 미드 코포레이션 filed Critical 로레인 제이. 프란시스
Publication of KR900014930A publication Critical patent/KR900014930A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)

Abstract

내용 없음.

Description

염료 보레이트 광개시제 및 이를 함유하는 광경화성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. 일반식(Ⅰ)인 화합물.
    상기식에서, Y1및 Y2는 동일하거나 상이하며, 산소원자, 황원자, 셀레늄원자, 비닐 그룹, 〉C(CH3)2, 또는 N-R7이고, n은 0,1,2,또는 3이며, R1및 R2는 알킬 그룹이고, R1및R2중 하나 이상은 8개 이상의 탄소원자를 지닌 장쇄의 알킬 그룹이며, R3내지R6는 알킬, 아릴, 아르알킬, 알바릴, 알케닐, 알키닐, 알라사이릭, 헤테로사이클릭 및 알킬 그룹으로 구성된 그룹으로부터 선택되고, R7는 단쇄의 알킬 그룹이다.
  2. 제1항에 있어서, R3내지 R6중 하나가 알킬 그룹이고 나머지가 아릴 그룹인 화합물.
  3. 자유 라디칼 중합성 또는 가교결합성 화합물 및 일반식(Ⅰ)의 화합물울 함유하는 광경화성 조성물.
    상기식에서, Y1및 Y2는 동일하거나 상이하며, 산소원자, 황원자, 셀레늄원자, 비닐 그룹, 〉C(CH3)2,또는 N-R7이고, n은 0,1,2,또는 3이며, R1및 R2는 알킬 그룹이고, R1및 R2중 하나 이상은 8개 이상의 탄소원자를 지닌 장쇄 알킬 그룹이며, R3내지 R6는 알킬, 아릴, 아르알킬, 알카릴, 알케닐, 알키닐, 알리사이클릭, 헤테로사이클릭 및 알릴 그룹으로 구성된 그룹으로부터 선택되고, R7는 단쇄의 알킬 그룹이다.
  4. 제2항에 있어서, R3내지 R6중 하나가 알킬 그룹이고 나머지가 아릴 그룹인 광경화성 조성물.
  5. 제4항에 있어서, R3내지 R6중 하나가 알킬 그룹이고 나머지가 페닐 그룹인 광경화성 조성물.
  6. 자유 라디칼 부가 중합성 물질 및 일반식(Ⅰ)의 광개시제를 함유하는 광경화성 조성물층을 표면에 지니는 지지체를 함유하는 감광성 물질.
    상기식에서, Y1및 Y2는 동일하거나 상이하며, 산소원자, 황원자, 셀레늄원자, 비닐 그룹, 〉C(CH3)2, 또는 N-R7이고, n은 0,1,2, 또는 3이며, R1및 R2는 알킬 그룹이고, R1및 R2중 하나 이상은 8개 이상의 탄소원자를 지닌 장쇄의 알킬 그룹이며, R3내지 R6는 알킬, 아릴, 아르알킬, 알카릴, 알케닐, 알키닐, 알리사이클릭, 헤테로사이클릭 및 알킬 그룹으로 구성된 그룹에서 선택되고, R7는 단쇄의 알킬 그룹이다.
  7. 제6항에 있어서, R3내지 R6중 하나가 알킬 그룹이고 나머지가 아릴 그룹인 감광성 물질.
  8. 제7항에 있어서, R3내지 R6중 하나가 알킬 그룹이고 나머지가 페닐 그룹인 감광성 물질.
  9. 제6항에 있어서, 광경화성 조성물이 마이크로 캡슐화된 감광성 재료.
  10. 제3항에 있어서, R1및 R2가 10개 이상의 탄소원자를 함유하는 광경화성 조성물.
  11. 제10항에 있어서, R1및 R2가 12개 이상의 탄소원자를 함유하는 광경화성 조성물.
  12. 제6항에 있어서, R1및 R2가 10개 이상의 탄소원자를 함유하는 감광성 물질.
  13. 제12항에 있어서, R1및 R2가 12개 이상의 탄소원자를 함유하는 감광성 물질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900003929A 1989-03-27 1990-03-23 염료 보레이트 광개시제 및 이를 함유하는 광경화성 조성물 KR900014930A (ko)

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US32866989A 1989-03-27 1989-03-27
US328669 1989-03-27

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EP (1) EP0390439A1 (ko)
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JPH0320260A (ja) 1991-01-29
EP0390439A1 (en) 1990-10-03

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