DK553786A - Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale - Google Patents

Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Info

Publication number
DK553786A
DK553786A DK553786A DK553786A DK553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A
Authority
DK
Denmark
Prior art keywords
photo
hardware
sensitive material
sensitive
including photo
Prior art date
Application number
DK553786A
Other languages
English (en)
Other versions
DK553786D0 (da
Inventor
Peter Gottschalk
Douglas Carlyle Neckers
Gary Benjamin Schuster
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/917,873 external-priority patent/US4772541A/en
Application filed by Mead Corp filed Critical Mead Corp
Publication of DK553786D0 publication Critical patent/DK553786D0/da
Publication of DK553786A publication Critical patent/DK553786A/da

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/025Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/02Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16HGEARING
    • F16H53/00Cams ; Non-rotary cams; or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00Dental prostheses; Making same
    • A61C13/0003Making bridge-work, inlays, implants or the like
    • A61C13/0006Production methods
    • A61C13/0013Production methods using stereolithographic techniques
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00Dental auxiliary appliances
    • A61C19/003Apparatus for curing resins by radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DK553786A 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale DK553786A (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80001485A 1985-11-20 1985-11-20
US86036786A 1986-05-06 1986-05-06
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

Publications (2)

Publication Number Publication Date
DK553786D0 DK553786D0 (da) 1986-11-19
DK553786A true DK553786A (da) 1987-05-21

Family

ID=27419957

Family Applications (1)

Application Number Title Priority Date Filing Date
DK553786A DK553786A (da) 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Country Status (6)

Country Link
EP (2) EP0389067B1 (da)
KR (1) KR940002538B1 (da)
CN (1) CN86108826A (da)
BR (1) BR8605710A (da)
DE (2) DE3650107T2 (da)
DK (1) DK553786A (da)

Families Citing this family (189)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
JPS62232638A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
US4840866A (en) * 1988-03-24 1989-06-20 The Mead Corporation Microcapsule imaging system having improved dynamic range
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
JPH02244051A (ja) * 1988-10-11 1990-09-28 Mead Corp:The 画像形成方法
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
CA2005933A1 (en) * 1989-01-09 1990-07-09 Jesse Hipps, Sr. Photohardenable composition containing five member aromatic group with imine moiety
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
CA2009652A1 (en) * 1989-03-09 1990-09-09 Paul Davis Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
EP0390439A1 (en) * 1989-03-27 1990-10-03 The Mead Corporation Complexes useful as photoinitiators and photohardenable compositions containing the same
DE69030477T2 (de) * 1989-10-13 1997-08-28 Fuji Photo Film Co Ltd Einen Aluminatkomplex enthaltendes Bildaufzeichnungsmaterial
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
DE69112852T2 (de) * 1990-01-16 1996-05-15 Showa Denko Kk Polymerisationsinitiator verwendbar in der Nähe von Infrarot.
EP0450254A1 (en) * 1990-04-03 1991-10-09 Ciba-Geigy Ag Photocurable compositions
JPH043064A (ja) * 1990-04-20 1992-01-08 Oriental Photo Ind Co Ltd 感光体
TW207021B (da) * 1990-07-23 1993-06-01 Showa Denko Kk
JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
DE59407524D1 (de) * 1993-08-26 1999-02-04 Ciba Geigy Ag Flüssige strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
WO1997001605A1 (en) 1995-06-28 1997-01-16 Kimberly-Clark Worldwide, Inc. Novel colorants and colorant modifiers
EP0646580B1 (de) * 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW418215B (en) 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
PL323727A1 (en) 1995-06-05 1998-04-14 Kimberly Clark Co Novel precursors of dyes
ATE226509T1 (de) * 1995-09-09 2002-11-15 Vantico Ltd Verfahren zum herstellung von polymerschichten mit selektiv gefärbten zonen
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
ES2175168T3 (es) 1995-11-28 2002-11-16 Kimberly Clark Co Compuestos de colorantes estabilizados por la luz.
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
KR100491736B1 (ko) * 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
DE69710657T3 (de) 1996-08-23 2007-07-05 Showa Denko K.K. Photohärtbare Zusammensetzung und Härtungsverfahren
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
DE69821190D1 (de) * 1997-11-05 2004-02-26 Showa Denko Kk Photohärtbare Farbzusammensetzung für Strassenmarkierungen
WO1999044099A1 (en) * 1998-02-25 1999-09-02 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
JPH11249304A (ja) * 1998-03-02 1999-09-17 Oriental Photo Ind Co Ltd 乾式画像形成材料及び乾式画像形成方法
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
SK1542000A3 (en) 1998-06-03 2001-11-06 Kimberly Clark Co Neonanoplasts produced by microemulsion technology and inks for ink jet printing
AU4818299A (en) 1998-06-03 1999-12-20 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
JP2002520470A (ja) 1998-07-20 2002-07-09 キンバリー クラーク ワールドワイド インコーポレイテッド 改良されたインクジェットインク組成物
DE59903270D1 (de) 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
CA2353685A1 (en) 1998-09-28 2000-04-06 Kimberly-Clark Worldwide, Inc. Chelates comprising chinoid groups as photoinitiators
EP1002817B1 (en) 1998-11-17 2004-04-28 Showa Denko K.K. Photocurable composition
EP1144512B1 (en) 1999-01-19 2003-04-23 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
WO2002000735A1 (en) 2000-06-19 2002-01-03 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
US6841589B2 (en) 2001-10-03 2005-01-11 3D Systems, Inc. Ultra-violet light curable hot melt composition
WO2003029365A1 (en) 2001-10-03 2003-04-10 3D Systems, Inc. Phase change support material composition
KR100811393B1 (ko) * 2001-12-04 2008-03-07 주식회사 하이닉스반도체 패턴 붕괴 개선용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물
EP2466378B1 (en) 2002-05-03 2014-01-08 DSM IP Assets B.V. Radiation curable resin composition and rapid prototyping process using the same
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
EP1622178A1 (en) * 2004-07-29 2006-02-01 Ecole Polytechnique Federale De Lausanne (Epfl) 2,2 -Bipyridine ligand, sensitizing dye and dye sensitized solar cell
DE102004058584A1 (de) 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
CN101939140B (zh) 2006-12-21 2012-11-28 圣戈本磨料股份有限公司 低腐蚀磨料制品及其制备方法
IL200997A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
US8852829B2 (en) 2008-10-01 2014-10-07 Bayer Materialscience Ag Prepolymer-based polyurethane formulations for producing holographic media
IL200722A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
IL200995A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200996A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
EP2218743A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2218742A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
US8501033B2 (en) 2009-03-13 2013-08-06 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three-dimensional imaging process using the same
WO2011054792A1 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Urethanacrylate mit hohem brechungsindex und reduzierter doppelbindungsdichte
WO2011067057A1 (de) 2009-11-03 2011-06-09 Bayer Materialscience Ag Verfahren zur herstellung eines holographischen films
EP2497084B1 (de) 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
EP2496549B1 (de) 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
EP2497083B1 (de) 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Photopolymer-formulierung mit verschiedenen schreibcomonomeren
ATE548730T1 (de) 2009-11-03 2012-03-15 Bayer Materialscience Ag Photopolymerformulierungen mit einstellbarem mechanischem modul guv
ES2535950T3 (es) 2009-11-03 2015-05-19 Bayer Intellectual Property Gmbh Uretanos como aditivos en una formulación de fotopolímeros
BR112012010471B1 (pt) 2009-11-03 2020-10-20 Bayer Materialscience Ag formulação de fotopolímero compreendendo fluorouretanos e processo para exposição de mídia holográfica
CN102754026B (zh) 2010-02-02 2015-10-07 拜耳知识产权有限责任公司 具有酯基书写单体的光聚合物制剂
EP2354845B1 (de) 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
EP2531892B1 (de) 2010-02-02 2016-01-27 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren
EP2330461A1 (de) 2010-03-26 2011-06-08 Bayer MaterialScience AG Projektionseinrichtung für einen Picoprojektor und holographischer Projektionsschirm
RU2013110226A (ru) 2010-08-11 2014-09-20 Байер Интеллектуэль Проперти Гмбх Дифункциональные (мет)-акрилатные пишущие мономеры
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
EP2450387A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
US8460451B2 (en) 2011-02-23 2013-06-11 3D Systems, Inc. Support material and applications thereof
US9157007B2 (en) 2011-03-09 2015-10-13 3D Systems, Incorporated Build material and applications thereof
US9394441B2 (en) 2011-03-09 2016-07-19 3D Systems, Inc. Build material and applications thereof
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
US9475889B2 (en) 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses
EP2766903A1 (de) 2011-10-12 2014-08-20 Bayer Intellectual Property GmbH Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
US20140255824A1 (en) 2011-10-12 2014-09-11 Bayer Intellectual Property Gmbh Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations
EP2613318B1 (de) 2012-01-05 2014-07-30 Bayer Intellectual Property GmbH Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht
TWI557187B (zh) 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
EP2700510B1 (de) 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
CN104540685B (zh) 2012-08-23 2017-09-26 科思创德国股份有限公司 含有具有全息图的视觉可变窗口的安全文件和/或有价文件
US8980406B2 (en) 2012-08-28 2015-03-17 3D Systems, Inc. Color stable inks and applications thereof
US9657186B2 (en) 2012-09-13 2017-05-23 3D Systems, Inc. Opaque inks and applications thereof
JP2016511712A (ja) 2013-01-25 2016-04-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG 体積ホログラムと印刷されたフィーチャを有するセキュリティ要素
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
WO2014152531A1 (en) 2013-03-15 2014-09-25 3D Systems, Inc. Three dimensional printing material system
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag ハロー防止層を有するホログラフィック記録媒体およびその製造
US10001703B2 (en) 2013-10-17 2018-06-19 Covestro Deutschland Ag Photopolymer formulation for production of holographic media comprising borates with low TG
WO2015063064A1 (de) 2013-10-30 2015-05-07 Bayer Materialscience Ag Verbund umfassend ein substrat und einen photopolymerfilm
JP2017504827A (ja) 2013-12-20 2017-02-09 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag 改善された光感受性を備えるホログラフィック媒体
US11602892B2 (en) 2013-12-23 2023-03-14 3D Systems, Inc. Three dimensional printing materials, systems, and methods
US10052861B2 (en) 2014-03-11 2018-08-21 3D Systems, Inc. Inks for 3D printing
EP3134446B1 (de) 2014-04-25 2019-04-24 Covestro Deutschland AG Aromatische glykolether als schreibmonomere in holographischen photopolymer-formulierungen
WO2015184220A1 (en) 2014-05-30 2015-12-03 3D Systems, Incorporated Water dispersible support materials for 3d printing
CN106661357B (zh) 2014-06-04 2020-07-28 3D系统公司 用于3d打印的含胶凝剂油墨
EP3152035B1 (en) 2014-06-09 2020-09-02 3D Systems, Inc. Methods of printing full-color 3d articles
US9650526B2 (en) 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
JP6401391B2 (ja) 2014-11-24 2018-10-10 スリーディー システムズ インコーポレーテッド 3dプリント用の液状ゴムを含むインク
EP3230261B1 (de) 2014-12-12 2018-09-05 Covestro Deutschland AG Naphthylacrylate als schreibmonomere für photopolymere
EP3233791B8 (de) 2014-12-19 2020-12-30 Covestro Intellectual Property GmbH & Co. KG Feuchtigkeitsstabile holographische medien
TWI698326B (zh) 2015-01-14 2020-07-11 德商科思創德意志股份有限公司 以全相光學元件製備光學鑄件之方法及光學鑄件
EP3313827B1 (de) 2015-06-23 2019-11-06 Covestro Deutschland AG Substituierte triazine
JP6590449B2 (ja) 2015-11-03 2019-10-16 スリーディー システムズ インコーポレーテッド 3dプリンティング用の生体適合インク
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
EP3950855A1 (en) 2016-03-08 2022-02-09 3D Systems, Incorporated Non-isocyanate polyurethane inks for 3d printing
WO2017176977A1 (en) 2016-04-07 2017-10-12 3D Systems, Incorporated Thiol-ene inks for 3d printing
TW201833122A (zh) 2016-11-09 2018-09-16 德商科思創德意志股份有限公司 製備三芳基有機硼酸鹽的方法
KR102489809B1 (ko) 2016-11-09 2023-01-20 코베스트로 도이칠란트 아게 트리아릴 유기보레이트의 제조 방법
JP2019535692A (ja) 2016-11-09 2019-12-12 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag トリアリール−有機ボレートを製造するための方法
CN110520486B (zh) 2017-02-01 2022-05-27 3D系统公司 含有可环化聚合单体的3d印刷油墨
KR20200005738A (ko) 2017-05-09 2020-01-16 코베스트로 도이칠란트 아게 홀로그래픽 노출용 광중합체 층 및 고내성의 코팅 층을 함유하는 홀로그래픽 매체
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含uv硬化性黏著層的塑膠膜
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
JP2020520471A (ja) 2017-05-09 2020-07-09 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag 光重合体フィルム複合材料中のホログラムを保護するための2つのuv硬化ドライ式転写コーティング層からなるシステム
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
EP3692105A1 (en) 2017-10-05 2020-08-12 3D Systems, Inc. Cyclopolymerizable compounds for 3d printing
EP4141075A1 (en) 2017-11-07 2023-03-01 3D Systems, Incorporated Inks for 3d printing having low print through depth
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
US11247386B2 (en) 2018-06-22 2022-02-15 3D Systems, Inc. Method of verifying integrity of a post-process removal of support material
JP7093857B2 (ja) 2018-06-22 2022-06-30 スリーディー システムズ インコーポレーテッド 蛍燐光体を含む3dプリント用の造形材料およびサポート材料
WO2020112496A1 (en) 2018-11-30 2020-06-04 3D Systems, Inc. Inks for 3d printing having low polymerization shrinkage
WO2021011357A1 (en) 2019-07-12 2021-01-21 3D Systems, Inc. Build materials for 3d printing
EP3772671A1 (de) 2019-08-06 2021-02-10 Covestro Deutschland AG Schichtaufbau für die belichtung von hologrammen
JP7340098B2 (ja) 2019-10-01 2023-09-06 スリーディー システムズ インコーポレーテッド 3dプリントのための長期保存可能な造形材料
EP4038151A1 (en) 2019-10-01 2022-08-10 3D Systems, Inc. Optically active build materials for 3d printing
EP4093800B1 (en) 2020-01-24 2024-03-06 3D Systems, Inc. Water soluble waxy support materials for three-dimensional printing applications
JP2023549334A (ja) 2020-11-16 2023-11-24 スリーディー システムズ インコーポレーテッド 3d物品をプリントするための造形材料
US11905355B2 (en) 2020-12-10 2024-02-20 3D Systems, Inc. Flame resistant build materials and associated printed 3D articles
US11912846B2 (en) 2021-03-10 2024-02-27 3D Systems, Inc. Additives for build materials and associated printed 3D articles
EP4304833A1 (en) 2021-03-10 2024-01-17 3D Systems, Inc. Flame resistant build materials and associated printed 3d articles
US11890806B2 (en) 2021-05-07 2024-02-06 3D Systems, Inc. Additives for build materials and associated printed 3D articles
US20240091412A1 (en) 2021-09-21 2024-03-21 3D Systems, Inc. Curable compounds and formulations for biomedical applications
WO2023156485A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen
WO2023156484A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Photopolymerzusammensetzungen für thermostabile photopolymere im sichtbaren spektralbereich
WO2023156482A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Thermostabile photopolymere im sichtbaren spektralbereich und photopolymer-zusammensetzungen damit
US20240026183A1 (en) 2022-07-15 2024-01-25 3D Systems, Inc. Hydrogels for 3d printing having high resolution
WO2024052256A1 (de) 2022-09-07 2024-03-14 Covestro Deutschland Ag Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS509178B1 (da) * 1970-12-28 1975-04-10
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives

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EP0223587B1 (en) 1991-02-13
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EP0389067B1 (en) 1994-10-19
BR8605710A (pt) 1987-08-18
EP0223587A1 (en) 1987-05-27
CN86108826A (zh) 1987-11-25
KR940002538B1 (ko) 1994-03-25
EP0389067A3 (en) 1990-11-28
EP0389067A2 (en) 1990-09-26
KR870005270A (ko) 1987-06-05
DK553786D0 (da) 1986-11-19
DE3650107T2 (de) 1995-05-24

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