KR870005270A - 개시제로서 이온성 염료 화합물을 함유하는 감광성 재료 - Google Patents

개시제로서 이온성 염료 화합물을 함유하는 감광성 재료 Download PDF

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KR870005270A
KR870005270A KR860009769A KR860009769A KR870005270A KR 870005270 A KR870005270 A KR 870005270A KR 860009769 A KR860009769 A KR 860009769A KR 860009769 A KR860009769 A KR 860009769A KR 870005270 A KR870005270 A KR 870005270A
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dye
compound
photosensitive material
ionic
cationic
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KR940002538B1 (ko
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고트샤크 피터
칼라일 네커즈 더글라스
벤자민 슈스터 개리
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더 미드 코포레이션
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
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    • C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06—Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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    • F16H—GEARING
    • F16H53/00—Cams ; Non-rotary cams; or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02—Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025—Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
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    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00—Dental prostheses; Making same
    • A61C13/0003—Making bridge-work, inlays, implants or the like
    • A61C13/0006—Production methods
    • A61C13/0013—Production methods using stereolithographic techniques
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
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Abstract

내용 없음

Description

개시제로서 이온성 염료 화합물을 함유하는 감광성 재료
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (49)

  1. 화학선을 흡수할 수 있으며, 중합성 또는 가교 결합성 화합물의 유리 라디칼 중합 또는 가교 결합을 개시하는 유리 라디칼을 생성할 수 있는 이온성 염료-대이온 화합물과 유리 라디칼 부가중합성 또는 가교 결합성 화합물로 이루어지는 광경화성 조성물.
  2. 제1항에 있어서, 노출전 이온성 염료-대이온 화합물이 안정한 비-천이화합물인 광경화성 조성물.
  3. 제1항에 있어서, 이온성 염료-대이온 화합물이 유리 라디칼 부가중합성 또는 가교 결합성 화합물에 가용성인 광경화성 조성물.
  4. 제1항에 있어서, 이온성 염로-대이온 화합물이 이를 빛에 노출시킴에 따라서 염료가 대이온에 의해 소광되는 단일 상태로 여기됨을 특징으로 하는 광경화성 조성물.
  5. 제4항에 있어서, 이온성 염료-대이온 화합물을 빛애 노출시킨 후, 전자가 염료에서 대이온으로 또는 대이온에서 염료로 이동하며, 전자 이동속도가 확산에 의해 조절되는 속도보다 큰 광경화성 조성물.
  6. 제1항에 있어서, 화합물이 음이온성 염료화합물인 광경화성 조성물.
  7. 제6항에 있어서, 음이온성 염료가 크산텐 및 옥소놀 염료로 이루어진 그룹중에서 선택되는 광경화성 조성물.
  8. 제1항에 있어서, 중합성 또는 가교결합성 화합물이 에틸렌성 불포화 화합물인 광경화성 조성물.
  9. 제6항에 있어서, 이온성 염료-대이온 화합물이 음이온성 염료-요오도늄 이온 착화합물 또는 음이온성 염료-피릴륨 이온 착화합물인 광경화성 조성물.
  10. 제9항에 있어서, 염료가 크산텐 염료인 광경화성 조성물.
  11. 제1항에 있어서, 이온성 염료-대이온 화합물이 양이온성 염료-보레이트 음이온 화합물인 광경화성 조성물.
  12. 제11항에 있어서 양이온성 염료-보레이트 음이온 화합물이 하기 일반식(Ⅰ)로 표시되는 광경화성 조성물.
  13. 제12항에 있어서, 양이온성 염료가 양이온성 메틴, 폴리메틴, 트리아릴메탄, 인돌린, 아진, 티아진 크산텐, 옥사진 및 아크리딘 염료로 이루어진 그룹중에서 선택되는 광경화성 조성물.
  14. 제13항에 있어서, 양이온성 염료가 양이온서 시아닌, 카보시아닌, 헤미시아닌, 로다민 및 아자메틴 염료로 이루어진 그룹중에서 선택되는 광경화성 조성물.
  15. 제14항에 있어서, R1,R2,R3및 R4중 적어도 하나가 알킬 그룹이고 적어도 하나는 아릴 그룹인 광경화성 조성물.
  16. 화학선을 흡수할 수 있고 중합성 또는 가교 결합성 화합물의 유리 라디칼 중합 또는 가교결합을 개시하는 유리 라디칼을 생성할 수 있는 이온성 염료-대이온 화합물과 유리 라디칼 부가중합성 또는 가교결합성 화합물로 이루어지는 광경화성 조성물의 층을 표면에 피복시킨 지지체로 이루어진 감광성 재료.
  17. 제16항에 있어서, 노출전에 이온성 염료-대이온 화합물이 안정한 비-천이 화합물인 감광성 재료.
  18. 제16항에 있어서, 이온성 염료-대이온 화합물이 부가중합성 또는 가교결합성 화합물에 가용성인 감광성 재료.
  19. 제16항에 있어서, 이온성 염료-대이온 화합물이 이를 빛에 노출시킴에 따라서 염료가 대이온에 의해 소광되는 단일 상태로 여기됨을 특징으로 하는 감광성 재료.
  20. 제16항에 있어서, 이온성 염료-대이온 화합물을 빛에 노출시킨 후, 전자가 염료에서 대이온으로 또는 대이온에서 염료로 이동하고, 전자이동속도가 확산에 의해 조절되는 속도보다 큰 감광성 재료.
  21. 제16항에 있어서, 착화합물이 음이온성 염료 착화합물인 감광성 재료.
  22. 제21항에 있어서, 이온성 염료가 크산텐 및 옥소놀 염료로 이루어진 그룹중에서 선택되는 감광성 재료.
  23. 제16항에 있어서, 광중합성 또는 가교결합성 화합물이 에틸렌성 불포화 화합물인 감광성 재료.
  24. 제21항에 있어서, 이온성 염료-대이온 화합물이 음이온성 염료 요오도늄 이온 화합물 또는 음이온성 염료 피릴륨 이온 화합물인 감광성 재료.
  25. 제24항에 있어서, 염료가 크산텐인 감광성 재료.
  26. 제16항에 있어서, 이온성 염료-대이온 화합물이 양이온성 염료-보레이트 음이온 화합물인 감광성 재료.
  27. 제26항에 있어서, 양이온성 염료-보레이트 음이온 화합물이 하기 일반식(Ⅰ)로 표시되는 감광성 재료.
    상기식에서, D는 양이온성 염료잔기이고, R1,R2,R3및 R4는 동일하거나 상이하며, 알킬, 아릴, 아르알킬, 알크아릴, 알케닐, 알키닐, 알리사이클릭, 헤테로사이클릭 및 알릴 그룹중에서 선택된다.
  28. 제27항에 있어서, 양이온성 염료가 양이온성 메틴, 폴리메틴, 트리아릴메탄, 인돌린, 아진, 티아진 크산텐 옥사진 및 아크리딘 염료로 이루어진 그룹주에서 선택되는 감광성 재료.
  29. 제28항에 있어서, 양이온성 염료가 양이온성 시아닌, 카보시아닌, 헤미시아닌, 로다민 및 아제메틴 염료로 이루어진 그룹중에서 선택되는 감광성 재료.
  30. 제29항에 있어서, R1,R2,R3및 R4중 적어도 하나가 알킬 그룹이고, 적어도 하나는 아릴 그룹인 감광성 재료.
  31. 화학선을 흡수할 수 있고 중합성 또는 가교결합성 화합물의 유리 라디칼 중합 또는 가교 결합을 개시하는 유리 라디칼을 생성할 수 있는 이온성 염료-대이온 화합물과 유리 라디칼 부가중합성 또는 가교결합성 화합물로 이루어지는 광경화성 조성물을 포함하는 내부상을 함유하며 연합된 영상형성제를 함유하는 마이크로 캡슐의 층을 한쪽 표면에 피복시킨 지지체로 이루어진 감광성 재료.
  32. 제31항에 있어서, 노출전 이온성 염료-대이온 화합물이 안정한 비-천이화합물인 감광성 재료.
  33. 제31항에 있어서, 이온성 염료-대이온 화합물이 부가중합성 또는 가교 결합성 화합물인 감광성 재료.
  34. 제31항에 있어서, 이온성 염료-대이온 화합물이 이를 빛에 노출시킴에 다라서 염료가 대이온에 소광되는 단일 상태로 여기됨을 특징으로 하는 감광성 재료.
  35. 제31항에 있어서, 이온성 염료-대이온 화합물을 빛에 노출시킨 후, 전자가 염료로부터 대이온으로는 또는 대이온으로부터 염료로 이동하며, 전자 이동속도가 확산에 의해 조절되는 속도보다 큰 감광성 재료.
  36. 제31항에 있어서, 이온성 염료-대이온 화합물이 음이온성 염료 착화합물인 감광성 재료.
  37. 제36항에 있어서, 음이온성 염료가 크산텐 및 옥소놀 염료로 이루어진 그룹중에서 선택되는 감광성 재료.
  38. 제31항에 있어서, 광중합성 또는 광가교 결합성 화합물이 에틸렌성 불포화 화합물인 감광성 재료.
  39. 제38항에 있어서, 이온성 염료-대이온 화합물이 음이온성 염료-요오도늄 화합물 또는 음이온성 염료-피릴륨 화합물인 감광성 재료.
  40. 제39항에 있어서, 영상-형성제가 거의 무색인 색소생성 물질인 감광성 재료.
  41. 제31항에 있어서, 이온성 염료-대이온 화합물이 양이온성 염료-보레이트 음이온 화합물인 감광성 재료.
  42. 제41항에 있어서, 양이온성 염료-보레이트 음이온 화합물이 다음 일반식(Ⅰ)로 표시되는 감광성 재료.
    상기식에서, D는 양이온성 염료잔기이고, R1,R2,R3및 R4는 동일하거나 상이하며, 알킬, 아릴, 아르알킬, 알크아릴, 알케닐, 알키닐, 알리사이클릭, 헤테로사이클릭 및 알릴 그룹중에서 선택된다.
  43. 제42항에 있어서, 양이온성 염료가 양이온성 메틴, 폴리메틴, 트리아릴메탄, 인돌린, 티아진, 크산텐 옥사진 및 아크리딘 염료로 이루어진 그룹중에서 선택되는 감광성 재료.
  44. 제43항에 있어서, 양이온성 염료가 양이온성 시아닌, 카보시아닌, 헤미시아닌, 로다민 및 아제메틴 염료로 이루어진 그룹중에서 선택되는 감광성 재료.
  45. 제44항에 있어서, R1,R2,R3및 R4중 적어도 하나가 알킬 그룹이고, 적어도 하나는 아릴 그룹인 감광성 재료.
  46. 제31항에 있어서, 언급한 재료가 전색영상 형성에 유용하며, 마이크로캡슐은 이와 연합된 시안 영상-형성제를 갖는 마이크로캡슐 제1세트, 마젠타 영상-형성제를 갖는 마이크로캡술 제2세트 및 황색 영상-형성제를 갖는 마이크로캡슐 제3세트를 포함하며 이때 언급한 마이크로캡슐 제1, 제2 및 제3세트 중 적어도 하나는 언급한 이온성 염료-대이온 화합물을 함유하는 광경화성 조성물을 포함하는 감광성 재료.
  47. 제46항에 있어서, 마이크로 캡슐을 각기 제1, 제2 및 제3세트의 마이크로캡슐을 경화시키는 3개의 별개의 화학선 파장에 영상 노출시키고, 마이크로캡슐이 균일한 파괴력을 받게 하는 단계로 이루어진 방법에 의한 영상 형성에 유용한 감광성 재료.
  48. 제47항에 있어서, 언급한 파장중 적어도 하나가 400nm 이상인 감광성 재료.
  49. 제48항에 있어서, 언급한 3개의 별개 파장이 적색, 녹색 및 청색광인 감광성 재료.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019860009769A 1985-11-20 1986-11-19 개시제로서 이온성 염료 화합물을 함유하는 감광성 재료 KR940002538B1 (ko)

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US80001485A 1985-11-20 1985-11-20
US800014 1985-11-20
US800,014 1985-11-20
US86036786A 1986-05-06 1986-05-06
US860367 1986-05-06
US860,367 1986-05-06
US917,873 1986-10-10
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US917873 1986-10-10

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