DE69937764D1 - Verfahren zur Herstellung eines Antireflektionsfilms - Google Patents
Verfahren zur Herstellung eines AntireflektionsfilmsInfo
- Publication number
- DE69937764D1 DE69937764D1 DE69937764T DE69937764T DE69937764D1 DE 69937764 D1 DE69937764 D1 DE 69937764D1 DE 69937764 T DE69937764 T DE 69937764T DE 69937764 T DE69937764 T DE 69937764T DE 69937764 D1 DE69937764 D1 DE 69937764D1
- Authority
- DE
- Germany
- Prior art keywords
- preparation
- reflection film
- reflection
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/254—Polymeric or resinous material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/27—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.]
- Y10T428/273—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.] of coating
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26828298 | 1998-09-22 | ||
JP26828298 | 1998-09-22 | ||
JP7158899 | 1999-03-17 | ||
JP7158899 | 1999-03-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69937764D1 true DE69937764D1 (de) | 2008-01-24 |
DE69937764T2 DE69937764T2 (de) | 2008-11-27 |
Family
ID=26412695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69937764T Expired - Lifetime DE69937764T2 (de) | 1998-09-22 | 1999-09-22 | Verfahren zur Herstellung eines Antireflektionsfilms |
Country Status (3)
Country | Link |
---|---|
US (1) | US7108810B2 (de) |
EP (2) | EP0989443A3 (de) |
DE (1) | DE69937764T2 (de) |
Families Citing this family (64)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6574039B1 (en) * | 1999-09-30 | 2003-06-03 | Nikon Corporation | Optical element with multilayer thin film and exposure apparatus with the element |
TWI230002B (en) * | 2000-10-17 | 2005-03-21 | Nissha Printing | Antireflective molded product and its manufacture method, mold for antireflective molded product |
JP4220248B2 (ja) | 2001-04-17 | 2009-02-04 | ブルーワー サイエンス アイ エヌ シー. | 改善されたスピンボウル適合性を有する反射防止コーティング組成物 |
JP2003133070A (ja) * | 2001-10-30 | 2003-05-09 | Seiko Epson Corp | 積層膜の製造方法、電気光学装置、電気光学装置の製造方法、有機エレクトロルミネッセンス装置の製造方法、及び電子機器 |
JP2003142262A (ja) * | 2001-11-06 | 2003-05-16 | Seiko Epson Corp | 電気光学装置、膜状部材、積層膜、低屈折率膜、多層積層膜、電子機器 |
AU2002357842A1 (en) * | 2001-12-13 | 2003-06-23 | E Ink Corporation | Electrophoretic electronic displays with films having a low index of refraction |
JP4182467B2 (ja) * | 2001-12-27 | 2008-11-19 | セイコーエプソン株式会社 | 回路基板、電気光学装置及び電子機器 |
DE10200760A1 (de) * | 2002-01-10 | 2003-07-24 | Clariant Gmbh | Nanokompositmaterial zur Herstellung von Brechzahlgradientenfolien |
KR20040071306A (ko) * | 2002-01-11 | 2004-08-11 | 후지 샤신 필름 가부시기가이샤 | 섬광방지 광학 필름, 편광 플레이트 및 이를 사용한디스플레이 유닛 |
JP4217032B2 (ja) * | 2002-06-17 | 2009-01-28 | オリンパス株式会社 | 光学素子 |
JP2004046592A (ja) | 2002-07-12 | 2004-02-12 | Fujitsu Ltd | コンテンツ管理システム |
JP2004294616A (ja) * | 2003-03-26 | 2004-10-21 | Fuji Photo Film Co Ltd | 防眩性反射防止フィルムの製造方法及び装置並びに防眩性反射防止フィルム |
SG112034A1 (en) | 2003-11-06 | 2005-06-29 | Asml Netherlands Bv | Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
EP1530222B1 (de) * | 2003-11-06 | 2009-10-14 | ASML Netherlands B.V. | Optisches Element, lithographische Vorrichtung mit einem solchen und Verfahren zur Herstellung eines Bauteils |
TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
EP1557891A3 (de) * | 2004-01-20 | 2006-10-04 | LG Electronics Inc. | Organische elektrolumineszente Vorrichtung und Herstellungsverfahren |
KR20050090203A (ko) * | 2004-03-08 | 2005-09-13 | 삼성전자주식회사 | 광학 부재, 이를 갖는 백라이트 어셈블리 및 이를 갖는표시장치 |
US20050207016A1 (en) * | 2004-03-15 | 2005-09-22 | Fuji Photo Film Co., Ltd. | Antireflection film, polarizing plate and liquid crystal display |
DE102004020245A1 (de) * | 2004-04-22 | 2005-12-22 | Schott Ag | Organisches, elektro-optisches Element mit erhöhter Auskoppeleffizienz |
US7749567B2 (en) * | 2005-02-28 | 2010-07-06 | Sumitomo Chemical Company, Limited | Process for producing a layered article |
GB2425546A (en) * | 2005-04-28 | 2006-11-01 | Lafarge Roofing Technical Centers Ltd | Roof ridge tile |
KR20080007611A (ko) | 2005-05-17 | 2008-01-22 | 스미또모 가가꾸 가부시키가이샤 | 유기 전계 발광용 고분자 조성물 |
US7705346B2 (en) * | 2005-06-06 | 2010-04-27 | Xerox Corporation | Barrier layer for an organic electronic device |
US20060290272A1 (en) * | 2005-06-23 | 2006-12-28 | Osram Opto Semiconductors Gmbh | Enhancement of light extraction using gel layers with excavations |
DE102005030862B4 (de) * | 2005-07-01 | 2009-12-24 | Sintec Keramik Gmbh | Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper |
KR101072865B1 (ko) | 2006-07-28 | 2011-10-17 | 일포드 이미징 스위스 지엠비에취 | 광학적 응용을 위한 가요성 재료 |
CN101501533B (zh) * | 2006-07-28 | 2012-02-15 | 依福德成像瑞士有限公司 | 用于光学用途的挠性材料 |
DE102007059721A1 (de) * | 2007-12-12 | 2009-06-18 | Böck, Klaus | Abdeckfolie für Silo |
JP4961369B2 (ja) * | 2008-02-27 | 2012-06-27 | 富士フイルム株式会社 | 光学フィルム、偏光板、画像表示装置および光学フィルムの製造方法 |
DE102008018866A1 (de) | 2008-04-15 | 2009-10-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Reflexionsminderndes Interferenzschichtsystem und Verfahren zu dessen Herstellung |
JP5656431B2 (ja) * | 2009-03-31 | 2015-01-21 | 富士フイルム株式会社 | 反射防止フィルム、偏光板、画像表示装置、及び低屈折率層形成用塗布組成物 |
US9291752B2 (en) | 2013-08-19 | 2016-03-22 | 3M Innovative Properties Company | Retroreflecting optical construction |
EP2419266B1 (de) * | 2009-04-15 | 2017-03-08 | 3M Innovative Properties Company | Rückstrahlende folie mit beschichtung mit niedrigem brechungsindex |
IN2011CN07418A (de) | 2009-04-15 | 2015-08-21 | 3M Innovative Properties Co | |
CN102459440B (zh) | 2009-04-15 | 2013-11-06 | 3M创新有限公司 | 用于纳米空隙制品的方法和设备 |
WO2010120864A1 (en) | 2009-04-15 | 2010-10-21 | 3M Innovative Properties Company | Optical film |
US9464179B2 (en) | 2009-04-15 | 2016-10-11 | 3M Innovative Properties Company | Process and apparatus for a nanovoided article |
JP2010256458A (ja) * | 2009-04-22 | 2010-11-11 | Fujifilm Corp | 光取出し部材用微粒子分散物、コーティング組成物、光取出し部材、及び有機電界発光表示装置 |
JP5503935B2 (ja) * | 2009-09-30 | 2014-05-28 | 富士フイルム株式会社 | ハードコートフィルム、反射防止フィルム、偏光板及び画像表示装置 |
US8982468B2 (en) * | 2009-10-24 | 2015-03-17 | 3M Innovative Properties Company | Voided diffuser |
JP5932652B2 (ja) * | 2009-10-24 | 2016-06-08 | スリーエム イノベイティブ プロパティズ カンパニー | 光学構造物 |
US9328265B2 (en) * | 2009-12-04 | 2016-05-03 | 3M Innovative Properties Company | Nano-porous adhesive tie layer |
JP5773576B2 (ja) * | 2010-04-01 | 2015-09-02 | キヤノン株式会社 | 反射防止構造および光学機器 |
CN102858528B (zh) | 2010-04-15 | 2016-05-11 | 3M创新有限公司 | 包括光学活性区域和光学非活性区域的回射制品 |
WO2011129832A1 (en) | 2010-04-15 | 2011-10-20 | 3M Innovative Properties Company | Retroreflective articles including optically active areas and optically inactive areas |
MX341289B (es) | 2010-04-15 | 2016-08-12 | 3M Innovative Properties Co | Articulos retrorreflectantes que incluyen areas opticamente activas y areas opticamente inactivas. |
JP6100684B2 (ja) | 2010-05-07 | 2017-03-22 | スリーエム イノベイティブ プロパティズ カンパニー | マイクロ構造化表面を含む反射防止フィルム |
US9103046B2 (en) | 2010-07-07 | 2015-08-11 | Southwest Research Institute | Electrophoretic formation of nanostructured composites |
JP5804683B2 (ja) * | 2010-09-14 | 2015-11-04 | キヤノン株式会社 | 光学素子および、それを有する光学装置 |
BR112013008304A2 (pt) * | 2010-10-06 | 2016-06-14 | 3M Innovative Properties Co | artigos que compreende um substrato transparente, e dispositivo de absorção de energia de luz que compreende o artigo |
WO2012047749A1 (en) | 2010-10-06 | 2012-04-12 | 3M Innovative Properties Company | Anti-reflective articles with nanosilica-based coatings and barrier layer |
CN102531408B (zh) * | 2010-12-30 | 2014-10-01 | 阿特斯(中国)投资有限公司 | 具有增透膜的玻璃及其制造方法 |
EP2679645B1 (de) * | 2011-02-21 | 2021-04-14 | Asahi Kasei Kabushiki Kaisha | Beschichtungsmaterial mit einer organisch/anorganischen zusammensetzung, organisch/anorganischer film und reflexionsminderndes element |
US9573842B2 (en) * | 2011-05-27 | 2017-02-21 | Corning Incorporated | Transparent glass substrate having antiglare surface |
WO2014046021A1 (ja) * | 2012-09-20 | 2014-03-27 | シャープ株式会社 | 反射防止フィルム及びその製造方法、並びに、表示装置 |
JP6277490B2 (ja) * | 2014-02-10 | 2018-02-14 | パナソニックIpマネジメント株式会社 | 塗膜物の製造装置 |
JPWO2016047059A1 (ja) * | 2014-09-22 | 2017-07-06 | パナソニックIpマネジメント株式会社 | 反射防止部材 |
JP6536212B2 (ja) * | 2015-06-23 | 2019-07-03 | セイコーエプソン株式会社 | 波長変換素子、光源装置およびプロジェクター |
US20180081084A1 (en) * | 2016-09-21 | 2018-03-22 | Honeywell International Inc. | Anti-reflective coatings and methods for optical lenses |
US11226403B2 (en) | 2017-07-12 | 2022-01-18 | GM Global Technology Operations LLC | Chip-scale coherent lidar with integrated high power laser diode |
US10615568B2 (en) * | 2017-07-12 | 2020-04-07 | GM Global Technology Operations LLC | Antireflection structure for integrated laser diode/photonic chip interface |
JP6580101B2 (ja) | 2017-09-29 | 2019-09-25 | 日東電工株式会社 | 空隙層、積層体、空隙層の製造方法、光学部材および光学装置 |
JPWO2020067134A1 (ja) * | 2018-09-25 | 2021-09-02 | 日本電気硝子株式会社 | 透明物品 |
WO2020142189A1 (en) * | 2018-12-31 | 2020-07-09 | Saint-Gobain Performance Plastics Corporation | Composite film with anti-reflective coating |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3141957A1 (de) * | 1981-10-22 | 1983-08-18 | Klaus Dr. 8264 Waldkraiburg Scholz | Verfahren und mittel zur beseitigung optischer reflexe auf glatten oberflaechen |
EP0247599B1 (de) * | 1986-05-29 | 1993-08-04 | Sumitomo Chemical Company, Limited | Nicht-reflektierende Scheibe für eine Anzeigeeinheit |
US5742118A (en) | 1988-09-09 | 1998-04-21 | Hitachi, Ltd. | Ultrafine particle film, process for producing the same, transparent plate and image display plate |
JPH05299034A (ja) * | 1991-06-07 | 1993-11-12 | Sony Corp | 陰極線管及びその表示面用塗布液 |
DE4125857A1 (de) * | 1991-08-03 | 1993-02-04 | Roehm Gmbh | Mattierte polymethacrylat-folie |
EP0533030B1 (de) | 1991-09-20 | 1995-06-21 | Hitachi, Ltd. | Verfahren und Vorrichtung für Herstellung einer Antireflektionsbeschichtung einer Kathodenstrahlröhre |
US5198267A (en) | 1991-09-20 | 1993-03-30 | Allied-Signal Inc. | Fluoropolymer blend anti-reflection coatings and coated articles |
CA2114459C (en) | 1993-01-29 | 1999-09-07 | Shigeaki Mizushima | Liquid crystal display apparatus with a substrate having a rough alignment layer, and a method for producing the same |
US5909314A (en) * | 1994-02-15 | 1999-06-01 | Dai Nippon Printing Co., Ltd. | Optical functional materials and process for producing the same |
JP4034365B2 (ja) | 1995-03-09 | 2008-01-16 | 大日本印刷株式会社 | 超微粒子含有反射防止フィルム、偏光板及び液晶表示装置 |
US5847795A (en) | 1995-07-27 | 1998-12-08 | Canon Kabushiki Kaisha | Liquid crystal display apparatus and anti-reflection film applicable thereto |
JP3206713B2 (ja) * | 1995-10-27 | 2001-09-10 | 株式会社巴川製紙所 | 防眩材料及びそれを使用した偏光フィルム |
EP0778476A3 (de) * | 1995-12-07 | 1998-09-09 | Fuji Photo Film Co., Ltd. | Antireflektionsschicht und Anzeigegerät mit dieser Schicht |
DE69715933T2 (de) | 1996-02-08 | 2003-08-07 | Teijin Ltd | Haftender Polyesterverbundstoff |
US5820957A (en) | 1996-05-06 | 1998-10-13 | Minnesota Mining And Manufacturing Company | Anti-reflective films and methods |
JP3478678B2 (ja) | 1996-08-26 | 2003-12-15 | キヤノン株式会社 | 電着塗装部材および電着塗料 |
JPH1069866A (ja) | 1996-08-29 | 1998-03-10 | Hitachi Ltd | 陰極線管 |
US5919555A (en) | 1996-11-06 | 1999-07-06 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
US5945209A (en) | 1996-11-07 | 1999-08-31 | Fuji Photo Film Co., Ltd. | Anti-reflection film and plasma display panel |
US6129980A (en) | 1997-07-11 | 2000-10-10 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
US6261665B1 (en) * | 1997-09-16 | 2001-07-17 | Tomoegawa Paper Co., Ltd. | Anti-reflection material and method for producing the same |
JP4101339B2 (ja) | 1997-09-25 | 2008-06-18 | 大日本印刷株式会社 | 光拡散フィルム、その製造方法、拡散層付偏光板及び液晶表示装置 |
US6166855A (en) | 1998-06-05 | 2000-12-26 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
WO2000016136A1 (en) | 1998-09-14 | 2000-03-23 | Digilens, Inc. | Holographic illumination system and holographic projection system |
US6157504A (en) | 1998-10-20 | 2000-12-05 | Fuji Photo Film Co., Ltd. | Optical filter comprising transparent support and filter layer having two absorption maximums |
KR100657536B1 (ko) * | 1999-06-17 | 2006-12-14 | 후지 샤신 필름 가부시기가이샤 | 광학 필터 |
-
1999
- 1999-09-22 EP EP99118708A patent/EP0989443A3/de not_active Ceased
- 1999-09-22 EP EP06020277A patent/EP1754994B1/de not_active Expired - Lifetime
- 1999-09-22 DE DE69937764T patent/DE69937764T2/de not_active Expired - Lifetime
-
2002
- 2002-11-06 US US10/288,508 patent/US7108810B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7108810B2 (en) | 2006-09-19 |
US20030077437A1 (en) | 2003-04-24 |
EP1754994B1 (de) | 2007-12-12 |
EP1754994A1 (de) | 2007-02-21 |
DE69937764T2 (de) | 2008-11-27 |
EP0989443A2 (de) | 2000-03-29 |
EP0989443A3 (de) | 2004-03-31 |
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