DE69426463D1 - Mikrowellenplasmareaktor - Google Patents

Mikrowellenplasmareaktor

Info

Publication number
DE69426463D1
DE69426463D1 DE69426463T DE69426463T DE69426463D1 DE 69426463 D1 DE69426463 D1 DE 69426463D1 DE 69426463 T DE69426463 T DE 69426463T DE 69426463 T DE69426463 T DE 69426463T DE 69426463 D1 DE69426463 D1 DE 69426463D1
Authority
DE
Germany
Prior art keywords
plasma reactor
microwave plasma
microwave
reactor
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69426463T
Other languages
English (en)
Other versions
DE69426463T2 (de
Inventor
Mathew M Besen
Evelio Sevillano
Donald K Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Science and Technology Inc
Original Assignee
Applied Science and Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/072,272 external-priority patent/US5556475A/en
Application filed by Applied Science and Technology Inc filed Critical Applied Science and Technology Inc
Application granted granted Critical
Publication of DE69426463D1 publication Critical patent/DE69426463D1/de
Publication of DE69426463T2 publication Critical patent/DE69426463T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
DE69426463T 1993-06-04 1994-05-19 Mikrowellenplasmareaktor Expired - Lifetime DE69426463T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/072,272 US5556475A (en) 1993-06-04 1993-06-04 Microwave plasma reactor
US08/219,208 US5501740A (en) 1993-06-04 1994-03-29 Microwave plasma reactor
PCT/US1994/005619 WO1994029494A1 (en) 1993-06-04 1994-05-19 Microwave plasma reactor

Publications (2)

Publication Number Publication Date
DE69426463D1 true DE69426463D1 (de) 2001-01-25
DE69426463T2 DE69426463T2 (de) 2001-07-19

Family

ID=26753185

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69426463T Expired - Lifetime DE69426463T2 (de) 1993-06-04 1994-05-19 Mikrowellenplasmareaktor

Country Status (5)

Country Link
US (1) US5501740A (de)
EP (1) EP0737256B1 (de)
JP (1) JP3483147B2 (de)
DE (1) DE69426463T2 (de)
WO (1) WO1994029494A1 (de)

Families Citing this family (321)

* Cited by examiner, † Cited by third party
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GB201021860D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
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JP3483147B2 (ja) 2004-01-06
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