DE69129625T2 - Diamant auf substrat für elektronische anwendungen - Google Patents

Diamant auf substrat für elektronische anwendungen

Info

Publication number
DE69129625T2
DE69129625T2 DE69129625T DE69129625T DE69129625T2 DE 69129625 T2 DE69129625 T2 DE 69129625T2 DE 69129625 T DE69129625 T DE 69129625T DE 69129625 T DE69129625 T DE 69129625T DE 69129625 T2 DE69129625 T2 DE 69129625T2
Authority
DE
Germany
Prior art keywords
polycrystalline diamond
substrate
diamond layer
polycrystalline
diamond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129625T
Other languages
German (de)
English (en)
Other versions
DE69129625D1 (de
Inventor
Paul Dyer
Diwakar Garg
Robert Iampietro
Fred Kimock
Wilman Tsai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Morgan Chemical Products Inc Roseland Nj Us
Original Assignee
Monsanto Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Monsanto Co filed Critical Monsanto Co
Publication of DE69129625D1 publication Critical patent/DE69129625D1/de
Application granted granted Critical
Publication of DE69129625T2 publication Critical patent/DE69129625T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/279—Diamond only control of diamond crystallography
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Carbon And Carbon Compounds (AREA)
DE69129625T 1990-03-20 1991-03-18 Diamant auf substrat für elektronische anwendungen Expired - Fee Related DE69129625T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49716190A 1990-03-20 1990-03-20
PCT/US1991/001828 WO1991014572A1 (en) 1990-03-20 1991-03-18 Diamond-on-a-substrate for electronic applications

Publications (2)

Publication Number Publication Date
DE69129625D1 DE69129625D1 (de) 1998-07-23
DE69129625T2 true DE69129625T2 (de) 1998-11-12

Family

ID=23975715

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129625T Expired - Fee Related DE69129625T2 (de) 1990-03-20 1991-03-18 Diamant auf substrat für elektronische anwendungen

Country Status (6)

Country Link
US (1) US5126206A (enExample)
EP (1) EP0526468B1 (enExample)
JP (1) JP3136307B2 (enExample)
AT (1) ATE167428T1 (enExample)
DE (1) DE69129625T2 (enExample)
WO (1) WO1991014572A1 (enExample)

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US5575644A (en) * 1993-03-11 1996-11-19 American Orthodontics Orthodontic appliance
US5837081A (en) * 1993-04-07 1998-11-17 Applied Sciences, Inc. Method for making a carbon-carbon composite
US5389400A (en) 1993-04-07 1995-02-14 Applied Sciences, Inc. Method for making a diamond/carbon/carbon composite useful as an integral dielectric heat sink
JPH0794303A (ja) * 1993-05-04 1995-04-07 Kobe Steel Ltd 高配向性ダイヤモンド薄膜サーミスタ
JPH0794805A (ja) * 1993-05-14 1995-04-07 Kobe Steel Ltd 高配向性ダイヤモンド薄膜磁気検出素子及び磁気検出装置
JPH0786311A (ja) * 1993-05-14 1995-03-31 Kobe Steel Ltd 高配向性ダイヤモンド薄膜電界効果トランジスタ
US5371383A (en) * 1993-05-14 1994-12-06 Kobe Steel Usa Inc. Highly oriented diamond film field-effect transistor
JP3549227B2 (ja) * 1993-05-14 2004-08-04 株式会社神戸製鋼所 高配向性ダイヤモンド薄膜
US5442199A (en) * 1993-05-14 1995-08-15 Kobe Steel Usa, Inc. Diamond hetero-junction rectifying element
JP3755904B2 (ja) * 1993-05-14 2006-03-15 株式会社神戸製鋼所 ダイヤモンド整流素子
EP0637078A1 (en) * 1993-07-29 1995-02-01 Motorola, Inc. A semiconductor device with improved heat dissipation
US5354717A (en) * 1993-07-29 1994-10-11 Motorola, Inc. Method for making a substrate structure with improved heat dissipation
US5388027A (en) * 1993-07-29 1995-02-07 Motorola, Inc. Electronic circuit assembly with improved heatsinking
US5541566A (en) * 1994-02-28 1996-07-30 Olin Corporation Diamond-like carbon coating for magnetic cores
WO1995027806A1 (en) * 1994-04-06 1995-10-19 The Regents Of The University Of California Process to produce diamond films
US5559367A (en) * 1994-07-12 1996-09-24 International Business Machines Corporation Diamond-like carbon for use in VLSI and ULSI interconnect systems
US5525815A (en) * 1994-10-03 1996-06-11 General Electric Company Diamond film structure with high thermal conductivity
US5803967A (en) * 1995-05-31 1998-09-08 Kobe Steel Usa Inc. Method of forming diamond devices having textured and highly oriented diamond layers therein
US5858477A (en) * 1996-12-10 1999-01-12 Akashic Memories Corporation Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon
US6416865B1 (en) * 1998-10-30 2002-07-09 Sumitomo Electric Industries, Ltd. Hard carbon film and surface acoustic-wave substrate
US6120910A (en) * 1999-03-01 2000-09-19 Szenics; Jonathan M. Stringed musical instrument
KR20010039728A (ko) * 1999-07-22 2001-05-15 가와하라 하지메 이온 소스
JP2002338388A (ja) * 2001-02-15 2002-11-27 Ngk Insulators Ltd ダイヤモンドコート部材
US6541303B2 (en) * 2001-06-20 2003-04-01 Micron Technology, Inc. Method for conducting heat in a flip-chip assembly
US20040122515A1 (en) * 2002-11-21 2004-06-24 Xi Chu Prosthetic valves and methods of manufacturing
US20050025973A1 (en) * 2003-07-25 2005-02-03 Slutz David E. CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
EP1666413B1 (en) * 2003-08-01 2015-12-09 Toyo Tanso Co., Ltd. Tantalum carbide, method for producing tantalum carbide, tantalum carbide wiring and tantalum carbide electrode
US20060024140A1 (en) * 2004-07-30 2006-02-02 Wolff Edward C Removable tap chasers and tap systems including the same
US8637127B2 (en) 2005-06-27 2014-01-28 Kennametal Inc. Composite article with coolant channels and tool fabrication method
US7687156B2 (en) 2005-08-18 2010-03-30 Tdy Industries, Inc. Composite cutting inserts and methods of making the same
US7550841B2 (en) * 2006-03-23 2009-06-23 Intel Corporation Methods of forming a diamond micro-channel structure and resulting devices
WO2007127680A1 (en) 2006-04-27 2007-11-08 Tdy Industries, Inc. Modular fixed cutter earth-boring bits, modular fixed cutter earth-boring bit bodies, and related methods
JP5330255B2 (ja) * 2006-10-25 2013-10-30 ティーディーワイ・インダストリーズ・エルエルシー 改良された耐熱亀裂性を有する物品
JP2009076694A (ja) * 2007-09-20 2009-04-09 Panasonic Corp 窒化物半導体装置およびその製造方法
CA2725318A1 (en) 2008-06-02 2009-12-10 Tdy Industries, Inc. Cemented carbide-metallic alloy composites
US8790439B2 (en) 2008-06-02 2014-07-29 Kennametal Inc. Composite sintered powder metal articles
US8025112B2 (en) 2008-08-22 2011-09-27 Tdy Industries, Inc. Earth-boring bits and other parts including cemented carbide
US8272816B2 (en) 2009-05-12 2012-09-25 TDY Industries, LLC Composite cemented carbide rotary cutting tools and rotary cutting tool blanks
US8308096B2 (en) 2009-07-14 2012-11-13 TDY Industries, LLC Reinforced roll and method of making same
US9643236B2 (en) 2009-11-11 2017-05-09 Landis Solutions Llc Thread rolling die and method of making same
US8800848B2 (en) 2011-08-31 2014-08-12 Kennametal Inc. Methods of forming wear resistant layers on metallic surfaces
US9016406B2 (en) 2011-09-22 2015-04-28 Kennametal Inc. Cutting inserts for earth-boring bits
EP2954554B1 (de) * 2013-02-07 2017-04-12 CeramTec GmbH Mehrebenenmetallisierung auf einem keramiksubstrat
US20160161991A1 (en) * 2014-12-08 2016-06-09 Rubicon Technology, Inc. Ultra-Thin, Passively Cooled Sapphire Windows
US9558724B2 (en) * 2014-12-18 2017-01-31 Gerald T. Mearini Guitar pick having CVD diamond or DLC coating
GB201516814D0 (en) * 2015-09-23 2015-11-04 Element Six Technologies Ltd Method of fabricating a plurality of single crystal CVD synthetic diamonds

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JPS5930709A (ja) * 1982-08-13 1984-02-18 Toa Nenryo Kogyo Kk 炭素膜及び／又は炭素粒子の製造方法
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US4698256A (en) * 1984-04-02 1987-10-06 American Cyanamid Company Articles coated with adherent diamondlike carbon films
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US4643741A (en) * 1984-12-14 1987-02-17 Hongchang Yu Thermostable polycrystalline diamond body, method and mold for producing same
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Also Published As

Publication number Publication date
DE69129625D1 (de) 1998-07-23
WO1991014572A1 (en) 1991-10-03
EP0526468B1 (en) 1998-06-17
JPH05506064A (ja) 1993-09-02
US5126206A (en) 1992-06-30
ATE167428T1 (de) 1998-07-15
JP3136307B2 (ja) 2001-02-19
EP0526468A4 (enExample) 1994-02-09
EP0526468A1 (en) 1993-02-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MORGAN CHEMICAL PRODUCTS, INC., ROSELAND, N.J., US

8339 Ceased/non-payment of the annual fee