DE69002564T2 - Mit diamanten bedecktes glied und verfahren zur herstellung. - Google Patents
Mit diamanten bedecktes glied und verfahren zur herstellung.Info
- Publication number
- DE69002564T2 DE69002564T2 DE1990602564 DE69002564T DE69002564T2 DE 69002564 T2 DE69002564 T2 DE 69002564T2 DE 1990602564 DE1990602564 DE 1990602564 DE 69002564 T DE69002564 T DE 69002564T DE 69002564 T2 DE69002564 T2 DE 69002564T2
- Authority
- DE
- Germany
- Prior art keywords
- diamonds
- producing
- same
- link covered
- link
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/279—Diamond only control of diamond crystallography
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5934989 | 1989-03-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69002564D1 DE69002564D1 (de) | 1993-09-09 |
DE69002564T2 true DE69002564T2 (de) | 1994-03-10 |
Family
ID=13110721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1990602564 Expired - Fee Related DE69002564T2 (de) | 1989-03-10 | 1990-03-09 | Mit diamanten bedecktes glied und verfahren zur herstellung. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5135807A (de) |
EP (1) | EP0413834B1 (de) |
KR (1) | KR920700306A (de) |
CA (1) | CA2029873A1 (de) |
DE (1) | DE69002564T2 (de) |
WO (1) | WO1990010725A1 (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5550318A (en) * | 1990-04-17 | 1996-08-27 | Dekalb Genetics Corporation | Methods and compositions for the production of stably transformed, fertile monocot plants and cells thereof |
US5484956A (en) * | 1990-01-22 | 1996-01-16 | Dekalb Genetics Corporation | Fertile transgenic Zea mays plant comprising heterologous DNA encoding Bacillus thuringiensis endotoxin |
US5500393A (en) * | 1990-05-21 | 1996-03-19 | Sumitomo Electric Industries, Ltd. | Method for fabricating a schottky junction |
CA2044543C (en) * | 1990-08-10 | 1999-12-14 | Louis Kimball Bigelow | Multi-layer superhard film structure |
US5411758A (en) * | 1991-10-09 | 1995-05-02 | Norton Company | Method of making synthetic diamond wear component |
US5260141A (en) * | 1991-11-29 | 1993-11-09 | Regents Of The University Of Minnesota | Diamond coated products |
CA2089288A1 (en) * | 1992-03-20 | 1993-09-21 | David E. Slutz | Multilayer cvd diamond films |
US5565249A (en) * | 1992-05-07 | 1996-10-15 | Fujitsu Limited | Method for producing diamond by a DC plasma jet |
US5249554A (en) * | 1993-01-08 | 1993-10-05 | Ford Motor Company | Powertrain component with adherent film having a graded composition |
US5433977A (en) * | 1993-05-21 | 1995-07-18 | Trustees Of Boston University | Enhanced adherence of diamond coatings by combustion flame CVD |
US5674572A (en) * | 1993-05-21 | 1997-10-07 | Trustees Of Boston University | Enhanced adherence of diamond coatings employing pretreatment process |
DE4434428A1 (de) * | 1994-09-27 | 1996-03-28 | Widia Gmbh | Verbundkörper, Verwendung dieses Verbundkörpers und Verfahren zu seiner Herstellung |
US6063149A (en) * | 1995-02-24 | 2000-05-16 | Zimmer; Jerry W. | Graded grain size diamond layer |
JP4047382B2 (ja) * | 1995-08-04 | 2008-02-13 | マイクロコーティング テクノロジーズ | 超臨界付近および超臨界の流体溶液の溶射を用いた化学蒸着および粉体形成 |
US6447843B1 (en) | 1997-03-27 | 2002-09-10 | Saint-Gobain Industrial Ceramics, Inc. | Synthetic diamond wear component and method |
GB9801166D0 (en) * | 1998-01-20 | 1998-03-18 | De Beers Ind Diamond | Bonding diamond to a substrate |
EP1003196A1 (de) * | 1998-11-19 | 2000-05-24 | Nec Corporation | Kohlenstoffmaterial und Verfahren zur Herstellung, Feldemissionskaltkathode die dieses Material verwendet und Verfahren zur Herstellung |
EP1644551A1 (de) * | 2001-09-06 | 2006-04-12 | Böhlerit ges.m.b.H. & CO.KG | Beschichter mehrphasiger körper |
CA2419752A1 (en) * | 2002-02-26 | 2003-08-26 | Smith International, Inc. | Elongate ultra hard particle reinforced ultra hard materials and ceramics, tools and parts incorporating the same, and method of making the same |
US8197701B2 (en) * | 2007-07-13 | 2012-06-12 | Advanced Diamond Technologies, Inc. | Diamond film deposition and probes |
DE102010038077B4 (de) * | 2010-10-08 | 2018-05-30 | Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) | Wendeschneidplatte und Verfahren zu deren Herstellung |
US20140349117A1 (en) * | 2013-05-27 | 2014-11-27 | Surmet Corporation | Wear-Resistant, High Durability Industrial Ceramic Cutting Edges and Tools made from Sintered Polycrystalline Composites Based on Aluminum Nitride |
EP3144412A1 (de) * | 2015-09-15 | 2017-03-22 | HILTI Aktiengesellschaft | Schneidplatte und herstellungsverfahren |
US11518680B2 (en) | 2017-08-15 | 2022-12-06 | Sumitomo Electric Industries, Ltd. | Body obtained by processing solid carbon-containing material, producing method thereof, and producing apparatus thereof |
EP3670710A4 (de) * | 2017-08-15 | 2021-03-24 | Sumitomo Electric Industries, Ltd. | Durch verarbeitung eines festen kohlenstoffhaltigen materials erhaltener körper und herstellungsverfahren dafür |
CN112301324B (zh) * | 2020-09-21 | 2023-04-14 | 贾春德 | 一种在钢铁基体上镀金刚石膜的方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58126972A (ja) * | 1982-01-22 | 1983-07-28 | Sumitomo Electric Ind Ltd | ダイヤモンド被覆超硬合金工具 |
SE442305B (sv) * | 1984-06-27 | 1985-12-16 | Santrade Ltd | Forfarande for kemisk gasutfellning (cvd) for framstellning av en diamantbelagd sammansatt kropp samt anvendning av kroppen |
JPS6210301A (ja) * | 1985-07-06 | 1987-01-19 | 財団法人鉄道総合技術研究所 | 電気転てつ機のフエイルセイフ電子制御方法 |
JPS6232268A (ja) * | 1985-08-01 | 1987-02-12 | Nippon Ranko Kk | 負圧調整器 |
JPS63215597A (ja) * | 1987-02-27 | 1988-09-08 | Matsushita Electric Ind Co Ltd | ダイヤモンド薄膜又はダイヤモンド状薄膜の製造方法 |
JPS63286575A (ja) * | 1987-05-19 | 1988-11-24 | Idemitsu Petrochem Co Ltd | 硬質炭素膜の製造方法 |
JP2603257B2 (ja) * | 1987-06-05 | 1997-04-23 | 株式会社神戸製鋼所 | ダイヤモンド多層薄膜 |
JPH06111281A (ja) * | 1992-10-01 | 1994-04-22 | Tdk Corp | 磁気記録媒体 |
JPH06328575A (ja) * | 1993-05-25 | 1994-11-29 | Hitachi Mach & Eng Ltd | カレンダー構造及びその使用方法 |
-
1990
- 1990-03-09 CA CA 2029873 patent/CA2029873A1/en not_active Abandoned
- 1990-03-09 US US07/601,790 patent/US5135807A/en not_active Expired - Lifetime
- 1990-03-09 KR KR1019900702421A patent/KR920700306A/ko not_active Application Discontinuation
- 1990-03-09 WO PCT/JP1990/000308 patent/WO1990010725A1/ja active IP Right Grant
- 1990-03-09 EP EP90904443A patent/EP0413834B1/de not_active Expired - Lifetime
- 1990-03-09 DE DE1990602564 patent/DE69002564T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0413834B1 (de) | 1993-08-04 |
WO1990010725A1 (en) | 1990-09-20 |
KR920700306A (ko) | 1992-02-19 |
EP0413834A1 (de) | 1991-02-27 |
CA2029873A1 (en) | 1990-09-11 |
US5135807A (en) | 1992-08-04 |
DE69002564D1 (de) | 1993-09-09 |
EP0413834A4 (en) | 1991-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: NGK SPARK PLUG CO., LTD., NAGOYA, AICHI, JP |
|
8339 | Ceased/non-payment of the annual fee |