DE69123659T2 - Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern - Google Patents

Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern

Info

Publication number
DE69123659T2
DE69123659T2 DE69123659T DE69123659T DE69123659T2 DE 69123659 T2 DE69123659 T2 DE 69123659T2 DE 69123659 T DE69123659 T DE 69123659T DE 69123659 T DE69123659 T DE 69123659T DE 69123659 T2 DE69123659 T2 DE 69123659T2
Authority
DE
Germany
Prior art keywords
purity
production
quartz glass
glass bodies
porous quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69123659T
Other languages
English (en)
Other versions
DE69123659D1 (de
Inventor
Michael Sean Dobbins
Robert Ernest Mclay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24270461&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69123659(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of DE69123659D1 publication Critical patent/DE69123659D1/de
Publication of DE69123659T2 publication Critical patent/DE69123659T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
DE69123659T 1990-08-16 1991-02-21 Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern Expired - Fee Related DE69123659T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/568,230 US5043002A (en) 1990-08-16 1990-08-16 Method of making fused silica by decomposing siloxanes

Publications (2)

Publication Number Publication Date
DE69123659D1 DE69123659D1 (de) 1997-01-30
DE69123659T2 true DE69123659T2 (de) 1997-06-05

Family

ID=24270461

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69123659T Expired - Fee Related DE69123659T2 (de) 1990-08-16 1991-02-21 Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern

Country Status (6)

Country Link
US (2) US5043002A (de)
EP (1) EP0471139B1 (de)
JP (1) JP2683727B2 (de)
CA (1) CA2037102C (de)
DE (1) DE69123659T2 (de)
TW (1) TW224077B (de)

Families Citing this family (137)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
WO1994017003A1 (en) * 1990-09-21 1994-08-04 Allied-Signal Inc. Ceramic fiber reinforced silicon carboxide composite with adjustable dielectric properties
US5231059A (en) * 1990-09-21 1993-07-27 Allied-Signal Inc. Process for preparing black glass using cyclosiloxane precursors
US5266533A (en) * 1991-04-12 1993-11-30 Allied-Signal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
CA2141043A1 (en) * 1991-04-12 1994-02-17 Roger Y. Leung Black glss ceramic from rapid pyrolysis in oxygen-containing atmospheres
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
JPH05273426A (ja) * 1991-12-06 1993-10-22 Sumitomo Electric Ind Ltd 光導波膜の作製方法およびこれを用いた光導波路の作製方法
US5296012A (en) * 1992-12-28 1994-03-22 Corning Incorporated Method of making optical waveguide preforms
US5332702A (en) * 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
GB9312634D0 (en) * 1993-06-18 1993-08-04 Tsl Group Plc Improvements in vitreous silica manufacture
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5632797A (en) 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
DE69601749T3 (de) * 1995-06-07 2004-04-29 Corning Inc. Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten
JPH0967138A (ja) * 1995-06-22 1997-03-11 Toshiba Corp 半導体製造用石英及びその製造装置並びに製造方法
US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
WO1997010182A1 (en) * 1995-09-12 1997-03-20 Corning Incorporated Furnace, method of use, and optical product made by furnace in producing fused silica glass
EP0850202B1 (de) * 1995-09-12 2005-04-27 Corning Incorporated Boule-oscillationsmustern für die herstellung von geschmolzenem quarzglas
EP0850201B1 (de) * 1995-09-12 2003-07-16 Corning Incorporated Topf zum herstellen von silikaglas
CN1052464C (zh) * 1995-11-03 2000-05-17 康宁股份有限公司 抗氢致衰减的光纤
US5838866A (en) 1995-11-03 1998-11-17 Corning Incorporated Optical fiber resistant to hydrogen-induced attenuation
US6312656B1 (en) * 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
DE69633066D1 (de) 1995-12-19 2004-09-09 Corning Inc Verfahren und vorrichtung zur herstellung eines quarzglases durch verbrennung von flüssigen reagentien
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
EP0780345A1 (de) 1995-12-22 1997-06-25 Corning Incorporated Optisches Element für UV-Transmission
US5910371A (en) 1996-01-04 1999-06-08 Francel; Josef Composite glass article and method of manufacture
EP0881987A4 (de) * 1996-02-21 1999-05-12 Corning Inc Reine geschmolzene kieselsäure, ofen und ihre herstellung
WO1997032821A1 (en) * 1996-03-05 1997-09-12 Corning Incorporated Method of increasing the initial transmittance of optical glass
FR2759465B1 (fr) * 1996-04-30 1999-04-30 Corning Inc Procede de formation d'un circuit optique
DE69736563T2 (de) * 1996-08-29 2008-01-03 Corning Inc. Quartz mit niedriger kompaktierung unter hochenergiebestrahlung
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
EP0931018A4 (de) * 1996-10-08 2000-02-23 Corning Inc Verfahren zur inhibierung von siloxangelierten einsätze und gel inhibierter einsatz
KR20000057597A (ko) * 1996-12-16 2000-09-25 알프레드 엘. 미첼슨 광파 광회로 장치용 유기금속
EP0888398A4 (de) * 1996-12-16 1999-09-29 Corning Inc Germanium dotierter silicaeinsatz und verfahren
US6174509B1 (en) * 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
JP4350168B2 (ja) 1997-03-07 2009-10-21 コーニング インコーポレイテッド チタニアドープ溶融シリカの製造方法
AU743383B2 (en) * 1997-04-18 2002-01-24 Corning Incorporated Process for purifying siloxane
JP2001509469A (ja) * 1997-07-08 2001-07-24 コーニング インコーポレイテッド シリカガラスを形成するための塩化ゲルマニウムとシロキサンとからなる原料ならびにシリカガラス形成方法
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater
EP1007484A4 (de) * 1997-07-21 2000-09-20 Corning Inc Verfahren zum herstellen von dämpfe mit niedrigern strömung
KR100574123B1 (ko) * 1997-09-24 2006-04-25 코닝 인코포레이티드 용융 실리카-티타니아 유리의 제조방법
US6094940A (en) 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
JPH11116247A (ja) * 1997-10-09 1999-04-27 Nikon Corp 合成石英ガラス製造方法
EP1094990A1 (de) * 1998-04-22 2001-05-02 Corning Incorporated Verfahren zur herstellung von kieselsäure-titandioxid-gläsern mit ultraniedriger ausdehnung
US6546757B1 (en) 1998-07-28 2003-04-15 Brown University Research Foundation Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing
US6260385B1 (en) 1998-08-07 2001-07-17 Corning Incorporated Method and burner for forming silica-containing soot
ZA994171B (en) * 1998-08-07 2000-03-28 Corning Inc Method and apparatus for forming soot for the manufacture of glass.
EP0978487A3 (de) 1998-08-07 2001-02-21 Corning Incorporated Brenner mit abgedichtetem Kopf und ohne Vormischung für die Abscheidung von Quarzglas
US6672106B1 (en) 1998-08-07 2004-01-06 Corning Incorporated Method and apparatus for forming soot for the manufacture of glass
US6574991B1 (en) * 1998-08-13 2003-06-10 Corning Incorporated Pure fused silica, furnace and method
US5970751A (en) * 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
KR20010079889A (ko) * 1998-09-22 2001-08-22 알프레드 엘. 미첼슨 용융 실리카 유리의 보울을 생성하는 버너
US6207522B1 (en) 1998-11-23 2001-03-27 Microcoating Technologies Formation of thin film capacitors
US6336347B1 (en) 1998-12-28 2002-01-08 Pirelli Cavi E Sistemi S.P.A. Process for producing silica by decomposition of an organosilane
ES2248961T3 (es) * 1998-12-28 2006-03-16 PIRELLI & C. S.P.A. Procedimieto para la produccion de silice mediante descomposicion de un organolsilano.
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
NO310142B1 (no) * 1999-03-29 2001-05-28 Elkem Materials Fremgangsmåte for fremstilling av amorft silica fra silisium og fra silisiumholdige materialer
US6140546A (en) * 1999-06-04 2000-10-31 Phillips Petroleum Company Hydrocarbon dehydrocyclization process
JP3770542B2 (ja) 1999-07-22 2006-04-26 コーニング インコーポレイテッド 遠紫外軟ｘ線投影リソグラフィー法およびマスク装置
AU6208300A (en) 1999-07-22 2001-02-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements
WO2001017919A1 (en) * 1999-09-10 2001-03-15 Corning Incorporated Pure fused silica, furnace and method
US6410192B1 (en) * 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6176588B1 (en) 1999-12-14 2001-01-23 Corning Incorporated Low cost light weight mirror blank
US6314766B1 (en) 2000-01-19 2001-11-13 Corning Incorporated Apparatus for minimizing air infiltration in the production of fused silica glass
US6418756B1 (en) 2000-01-28 2002-07-16 Corning Incorporated Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
US6598425B1 (en) 2000-03-08 2003-07-29 Corning Incorporated Method for collecting soot
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6403508B1 (en) 2000-05-31 2002-06-11 Corning Incorporated Fused silica with constant induced absorption
US6387511B1 (en) * 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6988378B1 (en) 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US6378337B1 (en) 2000-09-15 2002-04-30 Corning Incorporated Method for producing bulk fused silica
WO2002026647A1 (en) * 2000-09-28 2002-04-04 Corning Incorporated Optical glass silica soot particles and method of making same
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
US7441416B2 (en) * 2000-12-19 2008-10-28 Prysmian Cavi E Sistemi Energia S.R.L. Method for manufacturing optical fibre preforms
WO2002049978A1 (en) * 2000-12-21 2002-06-27 Corning Incorporated Refractories for fused silica production furnaces
DE10065028A1 (de) * 2000-12-23 2002-07-18 Degussa Mit Kalium dotierte pyrogene Oxide
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
US20020174684A1 (en) * 2001-05-23 2002-11-28 Danielson Paul S. Fused silica furnace and method
WO2002098805A1 (en) * 2001-05-30 2002-12-12 Pirelli & C. S.P.A. Method and burner for manufacturing a glass optical fibre preform by vapour deposition
US20030039865A1 (en) * 2001-06-20 2003-02-27 Isonics Corporation Isotopically engineered optical materials
JP4154563B2 (ja) * 2001-07-23 2008-09-24 信越化学工業株式会社 シリカ含有複合酸化物球状微粒子及びその製造方法
JP2003040627A (ja) * 2001-07-30 2003-02-13 Mitsubishi Electric Corp 石英系ガラス用原料及び石英系ガラスの製造方法
EP1441992A1 (de) * 2001-09-27 2004-08-04 Corning Incorporated Verbesserte verfahren und öfen für die quarzgutherstellung
US6763683B2 (en) 2001-10-23 2004-07-20 Corning Incorporated Method for pure, fused oxide
US8037717B2 (en) * 2001-10-26 2011-10-18 Corning Incorporated Methods and apparatus for pulsed doping or drying a soot preform
US20030104209A1 (en) * 2001-11-30 2003-06-05 Bellman Robert A. Precursor and method of growing doped glass films
US6832493B2 (en) * 2002-02-27 2004-12-21 Corning Incorporated High purity glass bodies formed by zero shrinkage casting
US6829908B2 (en) * 2002-02-27 2004-12-14 Corning Incorporated Fabrication of inclusion free homogeneous glasses
US20030159466A1 (en) * 2002-02-27 2003-08-28 Bowden Bradley F. Dry pressing of spray dried soot to make EUV components
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
FI115134B (fi) * 2002-06-28 2005-03-15 Liekki Oy Menetelmä seostetun lasimateriaalin valmistamiseksi
WO2004048261A2 (en) * 2002-11-26 2004-06-10 Cabot Corporation Fumed metal oxide particles and process for producing the same
EP1580170B1 (de) * 2002-11-29 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas undgegenstand aus synthetischem quarzglas
DE10302914B4 (de) * 2003-01-24 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
US7329377B2 (en) * 2004-03-12 2008-02-12 Massachusetts Institute Of Technology Cyclic shrinkage of a templated 3D network material
JP2006119379A (ja) * 2004-10-21 2006-05-11 Sumitomo Electric Ind Ltd 光導波路デバイスの製造方法、および光導波路デバイス
DE102006022303B4 (de) 2006-05-11 2009-06-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas mit vorgegebenem Hydroxylgruppengehalt
DE102006034885A1 (de) 2006-07-25 2008-08-07 Daimlerchrysler Ag Wasserstoff- und Energiegewinnung durch thermische Umsetzung von Silanen
US20080050076A1 (en) * 2006-08-23 2008-02-28 Ming-Jun Li Low loss photonic waveguide having high index contrast glass layers
US7799711B2 (en) * 2007-08-31 2010-09-21 Corning Incorporated Photomachinable glass compositions having tunable photosensitivity
JP5003503B2 (ja) * 2008-01-17 2012-08-15 三菱電機株式会社 石英系ガラスの製造方法および光デバイスの製造方法
US8414970B2 (en) * 2008-02-15 2013-04-09 Guardian Industries Corp. Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
US8729158B2 (en) 2008-09-05 2014-05-20 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
US8038971B2 (en) 2008-09-05 2011-10-18 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
GB2478307A (en) 2010-03-02 2011-09-07 Heraeus Quartz Uk Ltd Manufacture of silica glass
US8840858B2 (en) 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
CN102320732A (zh) * 2011-08-25 2012-01-18 长飞光纤光缆有限公司 一种制备光纤预制棒的方法
CN103842303B (zh) 2011-09-29 2018-07-03 住友电气工业株式会社 玻璃微粒沉积体以及玻璃预制件的制造方法
DE102011119341A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119374A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119339A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011121190A1 (de) * 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS-Verdampfungsverfahren
TWI532815B (zh) * 2012-01-20 2016-05-11 先鋒材料科技股份有限公司 導熱、絕緣、耐燃及耐高溫之黏著劑及其組合物
DE102013202256B3 (de) * 2013-02-12 2014-07-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Titan-dotiertem synthetischen Quarzglas und dessen Verwendung
JP6236866B2 (ja) * 2013-05-15 2017-11-29 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー
DE102013209673B3 (de) 2013-05-24 2014-05-22 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas
DE102013110177A1 (de) 2013-09-16 2015-03-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Eisen-dotiertem Kieselglas
PL3484825T3 (pl) * 2016-07-18 2021-11-08 Prysmian S.P.A. Sposób wytwarzania preform z dwutlenku krzemu do zastosowania w produkcji włókien światłowodowych
CN106277750A (zh) * 2016-08-19 2017-01-04 中国建筑材料科学研究总院 石英玻璃的制备方法
EP3309126A1 (de) * 2016-10-11 2018-04-18 Evonik Degussa GmbH Verfahren zur herstellung von siliciumtetrachlorid durch carbochlorierung
US11434146B2 (en) 2017-01-09 2022-09-06 Evonik Operations Gmbh Method for producing metal oxides by means of spray pyrolysis
CN106915898B (zh) * 2017-04-11 2019-07-23 湖北菲利华石英玻璃股份有限公司 一种大规格二氧化硅疏松体的生产方法
EP3424883A1 (de) 2017-07-05 2019-01-09 Evonik Degussa GmbH Sprühverdampfung eines flüssigen rohstoffes zur herstellung von siliciumdioxid und metalloxiden
EP3495321A1 (de) 2017-12-07 2019-06-12 Evonik Degussa GmbH Herstellung von pulverförmigen, porösen kristallinen metallsilikaten mittels flammensprühpyrolyse
JP7428632B2 (ja) 2020-12-14 2024-02-06 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2272342A (en) 1934-08-27 1942-02-10 Corning Glass Works Method of making a transparent article of silica
US2269059A (en) 1938-05-14 1942-01-06 Corning Glass Works Method of preparing finely comminuted oxides
BE438752A (de) 1939-04-22
US3117838A (en) 1957-08-02 1964-01-14 Int Standard Electric Corp Manufacture of silica
US3086851A (en) 1957-10-10 1963-04-23 Degussa Burner for production of finely divided oxides
US3303115A (en) * 1962-05-31 1967-02-07 Corning Glass Works Methods for forming materials of high purity by fusion
US3416890A (en) 1965-12-16 1968-12-17 Owens Illinois Inc Process of producing oxides of metals and metalloids
US3823995A (en) * 1972-03-30 1974-07-16 Corning Glass Works Method of forming light focusing fiber waveguide
US3826560A (en) 1972-03-30 1974-07-30 Corning Glass Works Method of forming a light focusing fiber waveguide
US3806224A (en) * 1972-10-06 1974-04-23 Bell Telephone Labor Inc Optical transmission line
CA967173A (en) 1973-01-04 1975-05-06 Peter C. Schultz Fused oxide type glasses
US3932162A (en) * 1974-06-21 1976-01-13 Corning Glass Works Method of making glass optical waveguide
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
DE2546162B1 (de) 1975-10-15 1976-09-23 Jenaer Glaswerk Schott & Gen Lichtleitfaser mit Brechungsindexgradient zur Nachrichtenuebertragung
JPS5263213A (en) 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
JPS5423614A (en) * 1977-07-22 1979-02-22 Asahi Glass Co Ltd Method of forming metal oxide coating layer on glass sheet surface
US4156689A (en) 1978-02-13 1979-05-29 General Electric Company Purification of hydrosilanes and siloxanes
JPS54145642A (en) 1978-05-09 1979-11-14 Tokushiyu Muki Zairiyou Kenkiy Method of manufacturing heat resisting semiiinorganic compound
DE2909815C2 (de) * 1979-03-13 1984-11-22 Wacker-Chemie GmbH, 8000 München Verfahren zur Herstellung von hochdispersem Siliciumdioxid
GB2065633B (en) 1979-10-25 1984-03-21 Nippon Telegraph & Telephone Optical transmission fiber and process for producing the same
CA1188895A (en) * 1980-09-11 1985-06-18 Shoichi Suto Fabrication methods of doped silica glass and optical fiber preform by using the doped silica glass
JPS57170835A (en) * 1981-04-15 1982-10-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of single-mode optical fiber
JPS583981A (ja) * 1981-06-30 1983-01-10 Moai:Kk 鉄七宝製品の製造法
JPS58151318A (ja) 1982-02-26 1983-09-08 Shin Etsu Chem Co Ltd 合成シリカおよびこれを含有してなる電子部品封止用樹脂組成物
JPS58213638A (ja) * 1982-06-04 1983-12-12 Nippon Telegr & Teleph Corp <Ntt> 光学系ガラス製造法におけるド−プ方法
JPS59455A (ja) * 1982-06-23 1984-01-05 旭化成株式会社 壁パネル
SE446055B (sv) * 1982-07-01 1986-08-11 Landstingens Inkopscentral Ikontinensskydd eller bloja med vesentligen rektanguler form
JPS5911536A (ja) * 1982-07-10 1984-01-21 Victor Co Of Japan Ltd 情報信号の記録媒体
US4501602A (en) * 1982-09-15 1985-02-26 Corning Glass Works Process for making sintered glasses and ceramics
US4472510A (en) * 1982-12-23 1984-09-18 Dow Corning Corporation Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process
JPS59207845A (ja) * 1983-05-10 1984-11-26 Fujikura Ltd 光フアイバ母材の製法
JPS603017A (ja) * 1983-06-17 1985-01-09 Ricoh Co Ltd カナ漢字変換処理装置
JPS6090836A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 合成石英の製造方法
JPS6090837A (ja) 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPS6090838A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPH0624987B2 (ja) * 1984-07-13 1994-04-06 旭硝子株式会社 多孔質石英ガラス母材合成用バーナ
US4689420A (en) 1985-11-19 1987-08-25 Dow Corning Corporation Process for preparation of cyclopolydiorganosiloxanes
US4810673A (en) 1986-09-18 1989-03-07 Texas Instruments Incorporated Oxide deposition method
JPH0791072B2 (ja) * 1987-06-15 1995-10-04 株式会社フジクラ 希土類元素ド−プガラスの製造方法
JPH01183421A (ja) 1988-01-19 1989-07-21 Shin Etsu Chem Co Ltd 石英ガラスの製造方法
JPH02145448A (ja) * 1988-11-25 1990-06-04 Furukawa Electric Co Ltd:The 光フアイバ母材の製造方法
GB8905966D0 (en) * 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
JPH03198338A (ja) * 1989-12-27 1991-08-29 Handotai Process Kenkyusho:Kk 気相成長膜の形成方法および半導体装置
DE4026379A1 (de) * 1990-08-21 1992-02-27 Vaw Ver Aluminium Werke Ag Verfahren zur herstellung von schichtsilikaten des magadiit-typs

Also Published As

Publication number Publication date
JP2683727B2 (ja) 1997-12-03
EP0471139A3 (en) 1993-01-07
EP0471139B1 (de) 1996-12-18
US5043002A (en) 1991-08-27
JPH04270130A (ja) 1992-09-25
EP0471139A2 (de) 1992-02-19
CA2037102A1 (en) 1992-02-17
AU7535591A (en) 1992-02-27
TW224077B (de) 1994-05-21
DE69123659D1 (de) 1997-01-30
CA2037102C (en) 1997-10-21
USRE39535E1 (en) 2007-04-03
AU633206B2 (en) 1993-01-21

Similar Documents

Publication Publication Date Title
DE69123659T2 (de) Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern
DE69215791T2 (de) Verfahren zur Herstellung von Quarzglas
DE3851780T3 (de) Verfahren zur Herstellung von Glasgegenständen mit ultrahoher Reinheit und optischer Qualität.
DE69104280T2 (de) Verfahren zur Herstellung von hochreiner Isophthalsäure.
DE69502689D1 (de) Verfahren zur Herstellung von Polarisierendem Glas
DE69104461T2 (de) Verfahren zur Erzeugung von hochreinem Wasserstoff.
DE69119552D1 (de) Verfahren zur Herstellung von Diethern
DE3888094T2 (de) Verfahren zur Herstellung von geformten porösen Artikeln.
DE69522877T2 (de) Verfahren zur Herstellung von hochreinem Stickstoff
DE69834083D1 (de) Verfahren zur Herstellung von synthetischem Quarzglas
DE69317820D1 (de) Verfahren zur Herstellung hochreiner Monoalkylphosphine
DE69105615D1 (de) Verfahren zur Herstellung von hochreiner Isophthalsäure.
DE68923312D1 (de) Verfahren zur Herstellung von Caprolactam mit hoher Reinheit.
DE59404313D1 (de) Verfahren zur Herstellung von hochdisperser Kieselsäure
DE69005063T2 (de) Synthetisches Quarzglas und Verfahren zu dessen Herstellung.
DE69129561T2 (de) Verfahren zur Herstellung von Mustern
DE3888001T2 (de) Verfahren zur Herstellung von Siliziumdioxid-Glasschichten.
DE69228202D1 (de) Verfahren zur Herstellung von Glasrohlingen
DE3852992T2 (de) Verfahren zur Herstellung von Hylan und Hylanverbindungen.
DE69025415D1 (de) Verfahren zur Herstellung von Sicherheitsglas
DE69111743T2 (de) Verfahren zur Herstellung von gemustertem Flachglas.
DE69129314D1 (de) CVD-Verfahren zur Herstellung von Diamant
DE59307624D1 (de) Verfahren zur Herstellung von dotiertem Glas
DE59103196D1 (de) Verfahren zur Herstellung von Glaskörpern.
DE59108138D1 (de) Verfahren zur Herstellung von Indolen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee