DE3851780T3 - Verfahren zur Herstellung von Glasgegenständen mit ultrahoher Reinheit und optischer Qualität. - Google Patents

Verfahren zur Herstellung von Glasgegenständen mit ultrahoher Reinheit und optischer Qualität.

Info

Publication number
DE3851780T3
DE3851780T3 DE3851780T DE3851780T DE3851780T3 DE 3851780 T3 DE3851780 T3 DE 3851780T3 DE 3851780 T DE3851780 T DE 3851780T DE 3851780 T DE3851780 T DE 3851780T DE 3851780 T3 DE3851780 T3 DE 3851780T3
Authority
DE
Germany
Prior art keywords
ultra
production
high purity
optical quality
glass objects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3851780T
Other languages
English (en)
Other versions
DE3851780T2 (de
DE3851780D1 (de
Inventor
Paul Maynard Schermerhorn
Michael Philip Teter
Robert Vernon Vandewoestine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Glass Works
Original Assignee
Corning Glass Works
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21978789&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3851780(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Glass Works filed Critical Corning Glass Works
Application granted granted Critical
Publication of DE3851780D1 publication Critical patent/DE3851780D1/de
Publication of DE3851780T2 publication Critical patent/DE3851780T2/de
Publication of DE3851780T3 publication Critical patent/DE3851780T3/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/0128—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass
    • C03B37/01282—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass by pressing or sintering, e.g. hot-pressing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
DE3851780T 1987-05-20 1988-05-10 Verfahren zur Herstellung von Glasgegenständen mit ultrahoher Reinheit und optischer Qualität. Expired - Fee Related DE3851780T3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/052,619 US4789389A (en) 1987-05-20 1987-05-20 Method for producing ultra-high purity, optical quality, glass articles

Publications (3)

Publication Number Publication Date
DE3851780D1 DE3851780D1 (de) 1994-11-17
DE3851780T2 DE3851780T2 (de) 1995-06-01
DE3851780T3 true DE3851780T3 (de) 2003-04-24

Family

ID=21978789

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3851780T Expired - Fee Related DE3851780T3 (de) 1987-05-20 1988-05-10 Verfahren zur Herstellung von Glasgegenständen mit ultrahoher Reinheit und optischer Qualität.

Country Status (7)

Country Link
US (1) US4789389A (de)
EP (2) EP0519521A3 (de)
JP (1) JP2663275B2 (de)
KR (1) KR950014100B1 (de)
CA (1) CA1339972C (de)
DE (1) DE3851780T3 (de)
HK (1) HK50295A (de)

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AU637646B2 (en) * 1989-12-20 1993-06-03 Sumitomo Electric Industries, Ltd. Method for producing rare earth element-doped glass by sol-gel process
EP0441622B1 (de) * 1990-02-07 1994-11-02 Shin-Etsu Chemical Co., Ltd. Epoxidharzzusammensetzungen, enthaltend hochtransparente Kieselsäure-Titandioxid-Glaskugeln
US5108477A (en) * 1990-05-21 1992-04-28 Corning Incorporated Method for making a glass article
US5254148A (en) * 1990-06-20 1993-10-19 Olympus Optical Company Limited Method of manufacturing distributed index optical elements
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US5236651A (en) * 1991-12-02 1993-08-17 Akzo N.V. Extrusion, collection, and drying of ceramic precursor gel to form dried gel particles
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US6309991B1 (en) 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
DE19936478A1 (de) * 1999-08-03 2001-02-15 Degussa Sinterwerkstoffe
CA2314957A1 (en) * 1999-08-06 2001-02-06 Shigeru Kawaguchi Method for fabricating planar optical waveguide devices
US6732549B1 (en) * 2000-08-01 2004-05-11 Lucent Technologies Inc. Multi-pass sintering of a sol-gel body through a hot zone
US6915665B2 (en) * 2000-10-31 2005-07-12 Corning Incorporated Method of inducing transmission in optical lithography preforms
US20030039865A1 (en) * 2001-06-20 2003-02-27 Isonics Corporation Isotopically engineered optical materials
US7069746B2 (en) 2001-10-22 2006-07-04 Degussa Ag Method for producing ultra-high purity, optical quality glass articles
EP1304313A1 (de) * 2001-10-22 2003-04-23 Degussa AG Verfahren zur Herstellung von ultrahochreinen Glasgegenständen mit optischer Qualität
WO2003037807A1 (fr) * 2001-10-30 2003-05-08 Nippon Sheet Glass Co., Ltd. Procede de production de verre de silice
KR100446512B1 (ko) * 2001-11-13 2004-09-04 삼성전자주식회사 솔-젤 공법을 이용한 실리카 글래스 제조 방법
US6988377B2 (en) * 2001-11-27 2006-01-24 Corning Incorporated Method for making extreme ultraviolet lithography structures
US6997015B2 (en) * 2001-11-27 2006-02-14 Corning Incorporated EUV lithography glass structures formed by extrusion consolidation process
US20040194511A1 (en) * 2002-02-01 2004-10-07 Chih-Hsing Cheng Sol-gel-derived halogen-doped glass
US20030221459A1 (en) * 2002-05-31 2003-12-04 Walczak Wanda J. Method for forming an optical waveguide fiber preform
JP2004131373A (ja) * 2002-09-09 2004-04-30 Corning Inc シリカ・チタニア極端紫外線光学素子の製造方法
AU2003284494A1 (en) * 2002-11-29 2004-06-23 Shin-Etsu Quartz Products Co., Ltd. Method for producing synthetic quartz glass and synthetic quartz glass article
US7155936B2 (en) 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
DE10342828A1 (de) * 2003-09-17 2005-04-14 Degussa Ag Hochreines, pyrogen hergestelltes Siliciumdioxid
CA2599536A1 (en) * 2005-02-25 2006-08-31 Japan Science And Technology Agency Glass composition containing bismuth and method of amplifying signal light therewith
GB0605461D0 (en) * 2006-03-17 2006-04-26 Saint Gobain Quartz Plc Manufacture of large articles in synthetic vitreous silica
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
US9034450B2 (en) 2011-08-31 2015-05-19 Corning Incorporated Binary silica-titania glass articles having a ternary doped silica-titania critical zone
DE102013110177A1 (de) * 2013-09-16 2015-03-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Eisen-dotiertem Kieselglas
JP6170968B2 (ja) * 2015-06-23 2017-07-26 株式会社フジクラ 光ファイバ母材の製造方法、及び光ファイバの製造方法
CN111032570B (zh) * 2017-08-31 2023-09-22 宇部爱科喜模株式会社 黑色粉体及其制造方法
US11733459B2 (en) * 2018-12-31 2023-08-22 Sterlite Technologies Limited Method for modification of surface of optical fiber preform
US11326271B2 (en) 2020-02-20 2022-05-10 Globalwafers Co., Ltd. Methods for forming a unitized crucible assembly
US11377751B2 (en) 2020-02-20 2022-07-05 Globalwafers Co., Ltd. Crucible molds

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Also Published As

Publication number Publication date
JPH01119539A (ja) 1989-05-11
KR950014100B1 (ko) 1995-11-21
US4789389A (en) 1988-12-06
EP0292179A2 (de) 1988-11-23
EP0292179A3 (en) 1990-01-03
DE3851780T2 (de) 1995-06-01
CA1339972C (en) 1998-07-28
EP0292179B1 (de) 1994-10-12
DE3851780D1 (de) 1994-11-17
JP2663275B2 (ja) 1997-10-15
HK50295A (en) 1995-04-13
EP0292179B2 (de) 2002-01-16
EP0519521A3 (en) 1993-09-15
EP0519521A2 (de) 1992-12-23
KR880013817A (ko) 1988-12-22

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings
8339 Ceased/non-payment of the annual fee