DE69129314D1 - CVD-Verfahren zur Herstellung von Diamant - Google Patents

CVD-Verfahren zur Herstellung von Diamant

Info

Publication number
DE69129314D1
DE69129314D1 DE69129314T DE69129314T DE69129314D1 DE 69129314 D1 DE69129314 D1 DE 69129314D1 DE 69129314 T DE69129314 T DE 69129314T DE 69129314 T DE69129314 T DE 69129314T DE 69129314 D1 DE69129314 D1 DE 69129314D1
Authority
DE
Germany
Prior art keywords
diamond
production
cvd process
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129314T
Other languages
English (en)
Other versions
DE69129314T2 (de
Inventor
Naoji Fujimori
Akihiko Ikegaya
Takahiro Imai
Nobuhiro Ota
Takayuki Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP20697690A external-priority patent/JPH0492894A/ja
Priority claimed from JP21101690A external-priority patent/JPH0497988A/ja
Priority claimed from JP21101590A external-priority patent/JP2913796B2/ja
Priority claimed from JP22226290A external-priority patent/JP2921063B2/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69129314D1 publication Critical patent/DE69129314D1/de
Publication of DE69129314T2 publication Critical patent/DE69129314T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma & Fusion (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE1991629314 1990-08-03 1991-08-02 CVD-Verfahren zur Herstellung von Diamant Expired - Fee Related DE69129314T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP20697690A JPH0492894A (ja) 1990-08-03 1990-08-03 高熱伝導性気相合成ダイヤモンド
JP21101690A JPH0497988A (ja) 1990-08-09 1990-08-09 高熱伝導性ダイヤモンドの製造方法
JP21101590A JP2913796B2 (ja) 1990-08-09 1990-08-09 気相合成ダイヤモンド
JP22226290A JP2921063B2 (ja) 1990-08-22 1990-08-22 高品質ダイヤモンドの気相合成方法

Publications (2)

Publication Number Publication Date
DE69129314D1 true DE69129314D1 (de) 1998-06-04
DE69129314T2 DE69129314T2 (de) 1998-10-01

Family

ID=27476332

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991629314 Expired - Fee Related DE69129314T2 (de) 1990-08-03 1991-08-02 CVD-Verfahren zur Herstellung von Diamant

Country Status (2)

Country Link
EP (1) EP0469626B1 (de)
DE (1) DE69129314T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013031907A1 (ja) 2011-09-02 2013-03-07 住友電気工業株式会社 単結晶ダイヤモンドおよびその製造方法
GB201610053D0 (en) 2016-06-09 2016-07-27 Element Six Tech Ltd Synthetic diamond heat spreaders
CN111606323A (zh) * 2020-06-17 2020-09-01 南方科技大学 三层石墨烯及其制备方法
CN113388886A (zh) * 2021-07-30 2021-09-14 杨钧夫 一种纪念钻石的培育方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4434188A (en) * 1981-12-17 1984-02-28 National Institute For Researches In Inorganic Materials Method for synthesizing diamond
DE3884658T2 (de) * 1987-04-22 1994-04-28 Idemitsu Petrochemical Co Verfahren zur Diamantsynthese.
EP0327051B2 (de) * 1988-02-01 1997-09-17 Sumitomo Electric Industries Limited Diamant und seine Darstellung durch ein Verfahren mittels Abscheidung aus der Gasphase
JPH08757B2 (ja) * 1988-12-26 1996-01-10 住友電気工業株式会社 ダイヤモンドおよびその気相合成法
US5181899A (en) * 1992-02-14 1993-01-26 Lawrence Paper Company Adjustable slotter wheel and sheet feeder retrofit apparatus for box blank making machines

Also Published As

Publication number Publication date
EP0469626A2 (de) 1992-02-05
DE69129314T2 (de) 1998-10-01
EP0469626A3 (en) 1992-03-04
EP0469626B1 (de) 1998-04-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee