DE69129561T2 - Verfahren zur Herstellung von Mustern - Google Patents

Verfahren zur Herstellung von Mustern

Info

Publication number
DE69129561T2
DE69129561T2 DE69129561T DE69129561T DE69129561T2 DE 69129561 T2 DE69129561 T2 DE 69129561T2 DE 69129561 T DE69129561 T DE 69129561T DE 69129561 T DE69129561 T DE 69129561T DE 69129561 T2 DE69129561 T2 DE 69129561T2
Authority
DE
Germany
Prior art keywords
samples
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129561T
Other languages
English (en)
Other versions
DE69129561D1 (de
Inventor
Koizumi Taichi
Yoshiyuki Tani
Sasago Masaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69129561D1 publication Critical patent/DE69129561D1/de
Publication of DE69129561T2 publication Critical patent/DE69129561T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69129561T 1990-03-27 1991-03-27 Verfahren zur Herstellung von Mustern Expired - Fee Related DE69129561T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2077864A JP2661317B2 (ja) 1990-03-27 1990-03-27 パターン形成方法

Publications (2)

Publication Number Publication Date
DE69129561D1 DE69129561D1 (de) 1998-07-16
DE69129561T2 true DE69129561T2 (de) 1999-01-21

Family

ID=13645924

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69129561T Expired - Fee Related DE69129561T2 (de) 1990-03-27 1991-03-27 Verfahren zur Herstellung von Mustern
DE69131732T Expired - Fee Related DE69131732T2 (de) 1990-03-27 1991-03-27 Verfahren zur Erzeugung eines Musters

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69131732T Expired - Fee Related DE69131732T2 (de) 1990-03-27 1991-03-27 Verfahren zur Erzeugung eines Musters

Country Status (4)

Country Link
US (1) US5275921A (de)
EP (2) EP0449272B1 (de)
JP (1) JP2661317B2 (de)
DE (2) DE69129561T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
US5561194A (en) * 1995-03-29 1996-10-01 International Business Machines Corporation Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US6642664B2 (en) 2001-03-21 2003-11-04 Koninklijke Philips Electronics N.V. Method of producing a screen for a color display tube
WO2005007730A1 (ja) * 2003-07-18 2005-01-27 Oji Paper Co., Ltd. シート状発泡体およびその製造方法
US20050187364A1 (en) * 2004-02-19 2005-08-25 Norman Herron Polymers having pendant triarylmethane groups and electronic devices made with such polymers

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925077A (en) * 1974-03-01 1975-12-09 Horizons Inc Photoresist for holography and laser recording with bleachout dyes
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS6358440A (ja) * 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd 感光性組成物
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
US4996136A (en) * 1988-02-25 1991-02-26 At&T Bell Laboratories Radiation sensitive materials and devices made therewith
JP2692241B2 (ja) * 1988-02-26 1997-12-17 三菱電機株式会社 レジストパターンの形成方法
EP0422628A3 (en) * 1989-10-13 1992-02-26 E.I. Du Pont De Nemours And Company Photosensitive element
JPH03253858A (ja) * 1990-03-05 1991-11-12 Nippon Telegr & Teleph Corp <Ntt> パターン形成材料及びパターン形成方法

Also Published As

Publication number Publication date
JP2661317B2 (ja) 1997-10-08
DE69131732D1 (de) 1999-11-25
EP0766141B1 (de) 1999-10-20
US5275921A (en) 1994-01-04
JPH03276157A (ja) 1991-12-06
EP0766141A3 (de) 1997-07-09
EP0449272B1 (de) 1998-06-10
EP0449272A3 (en) 1992-03-25
EP0766141A2 (de) 1997-04-02
DE69129561D1 (de) 1998-07-16
DE69131732T2 (de) 2000-06-08
EP0449272A2 (de) 1991-10-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee