DE69123659D1 - Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern - Google Patents

Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern

Info

Publication number
DE69123659D1
DE69123659D1 DE69123659T DE69123659T DE69123659D1 DE 69123659 D1 DE69123659 D1 DE 69123659D1 DE 69123659 T DE69123659 T DE 69123659T DE 69123659 T DE69123659 T DE 69123659T DE 69123659 D1 DE69123659 D1 DE 69123659D1
Authority
DE
Germany
Prior art keywords
purity
production
quartz glass
glass bodies
porous quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69123659T
Other languages
English (en)
Other versions
DE69123659T2 (de
Inventor
Michael Sean Dobbins
Robert Ernest Mclay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24270461&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69123659(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of DE69123659D1 publication Critical patent/DE69123659D1/de
Publication of DE69123659T2 publication Critical patent/DE69123659T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
DE69123659T 1990-08-16 1991-02-21 Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern Expired - Fee Related DE69123659T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/568,230 US5043002A (en) 1990-08-16 1990-08-16 Method of making fused silica by decomposing siloxanes

Publications (2)

Publication Number Publication Date
DE69123659D1 true DE69123659D1 (de) 1997-01-30
DE69123659T2 DE69123659T2 (de) 1997-06-05

Family

ID=24270461

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69123659T Expired - Fee Related DE69123659T2 (de) 1990-08-16 1991-02-21 Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern

Country Status (6)

Country Link
US (2) US5043002A (de)
EP (1) EP0471139B1 (de)
JP (1) JP2683727B2 (de)
CA (1) CA2037102C (de)
DE (1) DE69123659T2 (de)
TW (1) TW224077B (de)

Families Citing this family (137)

* Cited by examiner, † Cited by third party
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US5231059A (en) * 1990-09-21 1993-07-27 Allied-Signal Inc. Process for preparing black glass using cyclosiloxane precursors
WO1994017003A1 (en) * 1990-09-21 1994-08-04 Allied-Signal Inc. Ceramic fiber reinforced silicon carboxide composite with adjustable dielectric properties
JP2597474B2 (ja) * 1991-04-12 1997-04-09 アライド−シグナル・インコーポレーテッド ブラックガラスの製造方法
US5266533A (en) * 1991-04-12 1993-11-30 Allied-Signal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
JPH05273426A (ja) * 1991-12-06 1993-10-22 Sumitomo Electric Ind Ltd 光導波膜の作製方法およびこれを用いた光導波路の作製方法
US5296012A (en) * 1992-12-28 1994-03-22 Corning Incorporated Method of making optical waveguide preforms
US5332702A (en) * 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
GB9312634D0 (en) * 1993-06-18 1993-08-04 Tsl Group Plc Improvements in vitreous silica manufacture
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5632797A (en) * 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP0747327B2 (de) * 1995-06-07 2003-08-27 Corning Incorporated Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten
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US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
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US5838866A (en) 1995-11-03 1998-11-17 Corning Incorporated Optical fiber resistant to hydrogen-induced attenuation
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US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US6312656B1 (en) 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
DE69633066D1 (de) 1995-12-19 2004-09-09 Corning Inc Verfahren und vorrichtung zur herstellung eines quarzglases durch verbrennung von flüssigen reagentien
EP0780345A1 (de) 1995-12-22 1997-06-25 Corning Incorporated Optisches Element für UV-Transmission
US5910371A (en) 1996-01-04 1999-06-08 Francel; Josef Composite glass article and method of manufacture
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EP0885176A4 (de) * 1996-03-05 1999-03-17 Corning Inc Verfahren zur verbesserung der anfangsübertragung von optischem glas
FR2759465B1 (fr) * 1996-04-30 1999-04-30 Corning Inc Procede de formation d'un circuit optique
KR20000035913A (ko) * 1996-08-29 2000-06-26 알프레드 엘. 미첼슨 용융 실리카에서 레이저-유도 압축을 결정하는 방법
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
CN1232436A (zh) * 1996-10-08 1999-10-20 康宁股份有限公司 抑制硅氧烷原料胶凝的方法和抑制胶凝的原料
WO1998027140A1 (en) 1996-12-16 1998-06-25 Corning Incorporated Germanium doped silica forming feedstock and method
KR20000057597A (ko) * 1996-12-16 2000-09-25 알프레드 엘. 미첼슨 광파 광회로 장치용 유기금속
US6174509B1 (en) * 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
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DE69830899D1 (de) * 1997-04-18 2005-08-25 Corning Inc Corning Verfahren zur reinigung von siloxan
CN1259109A (zh) * 1997-07-08 2000-07-05 康宁股份有限公司 用于制备石英玻璃的氯化锗和硅氧烷原料和方法
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater
WO1999003787A1 (en) * 1997-07-21 1999-01-28 Corning Incorporated Methods and apparatus for producing low flow rates of feedstock vapors
KR100574123B1 (ko) * 1997-09-24 2006-04-25 코닝 인코포레이티드 용융 실리카-티타니아 유리의 제조방법
US6094940A (en) 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
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US6546757B1 (en) 1998-07-28 2003-04-15 Brown University Research Foundation Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing
US6672106B1 (en) 1998-08-07 2004-01-06 Corning Incorporated Method and apparatus for forming soot for the manufacture of glass
US6260385B1 (en) 1998-08-07 2001-07-17 Corning Incorporated Method and burner for forming silica-containing soot
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US6336347B1 (en) 1998-12-28 2002-01-08 Pirelli Cavi E Sistemi S.P.A. Process for producing silica by decomposition of an organosilane
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
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US6140546A (en) * 1999-06-04 2000-10-31 Phillips Petroleum Company Hydrocarbon dehydrocyclization process
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WO2001007967A1 (en) 1999-07-22 2001-02-01 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method and mask devices
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US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6176588B1 (en) 1999-12-14 2001-01-23 Corning Incorporated Low cost light weight mirror blank
US6314766B1 (en) * 2000-01-19 2001-11-13 Corning Incorporated Apparatus for minimizing air infiltration in the production of fused silica glass
US6418756B1 (en) 2000-01-28 2002-07-16 Corning Incorporated Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
US6598425B1 (en) 2000-03-08 2003-07-29 Corning Incorporated Method for collecting soot
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US6403508B1 (en) 2000-05-31 2002-06-11 Corning Incorporated Fused silica with constant induced absorption
US6387511B1 (en) * 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6988378B1 (en) 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US6378337B1 (en) 2000-09-15 2002-04-30 Corning Incorporated Method for producing bulk fused silica
WO2002026647A1 (en) * 2000-09-28 2002-04-04 Corning Incorporated Optical glass silica soot particles and method of making same
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
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WO2002049978A1 (en) * 2000-12-21 2002-06-27 Corning Incorporated Refractories for fused silica production furnaces
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US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
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EP0471139B1 (de) 1996-12-18
US5043002A (en) 1991-08-27
DE69123659T2 (de) 1997-06-05
AU7535591A (en) 1992-02-27
CA2037102C (en) 1997-10-21
AU633206B2 (en) 1993-01-21
EP0471139A2 (de) 1992-02-19
TW224077B (de) 1994-05-21
EP0471139A3 (en) 1993-01-07

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