DE69222979D1 - Verfahren zur Herstellung von Mikrolinsen - Google Patents

Verfahren zur Herstellung von Mikrolinsen

Info

Publication number
DE69222979D1
DE69222979D1 DE69222979T DE69222979T DE69222979D1 DE 69222979 D1 DE69222979 D1 DE 69222979D1 DE 69222979 T DE69222979 T DE 69222979T DE 69222979 T DE69222979 T DE 69222979T DE 69222979 D1 DE69222979 D1 DE 69222979D1
Authority
DE
Germany
Prior art keywords
microlenses
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69222979T
Other languages
English (en)
Other versions
DE69222979T2 (de
Inventor
Toshiro Tsumori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE69222979D1 publication Critical patent/DE69222979D1/de
Publication of DE69222979T2 publication Critical patent/DE69222979T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
DE69222979T 1991-06-04 1992-06-02 Verfahren zur Herstellung von Mikrolinsen Expired - Fee Related DE69222979T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3161040A JP3067114B2 (ja) 1991-06-04 1991-06-04 マイクロレンズ形成方法

Publications (2)

Publication Number Publication Date
DE69222979D1 true DE69222979D1 (de) 1997-12-11
DE69222979T2 DE69222979T2 (de) 1998-05-28

Family

ID=15727456

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69222979T Expired - Fee Related DE69222979T2 (de) 1991-06-04 1992-06-02 Verfahren zur Herstellung von Mikrolinsen

Country Status (5)

Country Link
US (1) US5324623A (de)
EP (1) EP0517163B1 (de)
JP (1) JP3067114B2 (de)
KR (1) KR100233417B1 (de)
DE (1) DE69222979T2 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
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US5719588A (en) * 1991-03-08 1998-02-17 Nashua Corporation Viewing device
US5536455A (en) * 1994-01-03 1996-07-16 Omron Corporation Method of manufacturing lens array
US5498444A (en) * 1994-02-28 1996-03-12 Microfab Technologies, Inc. Method for producing micro-optical components
DE19602736A1 (de) * 1996-01-26 1997-07-31 Inst Mikrotechnik Mainz Gmbh Verfahren und Vorrichtung zur Herstellung von optischen Linsen und optischen Linsenarrays
US6043481A (en) * 1997-04-30 2000-03-28 Hewlett-Packard Company Optoelectronic array device having a light transmissive spacer layer with a ridged pattern and method of making same
US6271900B1 (en) * 1998-03-31 2001-08-07 Intel Corporation Integrated microlens and color filter structure
US6027595A (en) * 1998-07-02 2000-02-22 Samsung Electronics Co., Ltd. Method of making optical replicas by stamping in photoresist and replicas formed thereby
JP4208305B2 (ja) * 1998-09-17 2009-01-14 株式会社東芝 マスクパターンの形成方法
CN1331586A (zh) * 1998-12-18 2002-01-16 阿尔扎有限公司 透明的透皮烟碱输送装置
US6249034B1 (en) * 1999-03-29 2001-06-19 Intel Corporation Microlens formed of negative photoresist
US6805902B1 (en) 2000-02-28 2004-10-19 Microfab Technologies, Inc. Precision micro-optical elements and the method of making precision micro-optical elements
CN1239925C (zh) * 2000-07-31 2006-02-01 罗切斯特光电器件公司 用于光受控扩展的结构化屏
US7092165B2 (en) * 2000-07-31 2006-08-15 Corning Incorporated Microlens arrays having high focusing efficiency
US6835535B2 (en) 2000-07-31 2004-12-28 Corning Incorporated Microlens arrays having high focusing efficiency
JP2002221606A (ja) * 2001-01-24 2002-08-09 Sony Corp 光学レンズとその製造方法、光学レンズアレイの製造方法、フォーカスエラー信号生成方法および光学ピックアップ装置
ATE408850T1 (de) * 2001-04-10 2008-10-15 Harvard College Mikrolinse zur projektionslithographie und ihr herstellungsverfahren
US6969472B2 (en) * 2001-04-19 2005-11-29 Lsi Logic Corporation Method of fabricating sub-micron hemispherical and hemicylidrical structures from non-spherically shaped templates
KR100453970B1 (ko) * 2001-11-27 2004-10-20 전자부품연구원 윈도우 구조의 제조 방법 및 이 윈도우 구조를 고정하기위한 장치
US6642068B1 (en) 2002-05-03 2003-11-04 Donald J. Hayes Method for producing a fiber optic switch
US7008757B2 (en) * 2002-12-17 2006-03-07 Lucent Technologies Inc. Patterned structures of high refractive index materials
US20050208432A1 (en) * 2004-03-19 2005-09-22 Sharp Laboratories Of America, Inc. Methods of forming a microlens array over a substrate
US20050211665A1 (en) * 2004-03-26 2005-09-29 Sharp Laboratories Of America, Inc. Methods of forming a microlens array
US7097778B2 (en) * 2004-04-28 2006-08-29 Chunghwa Telecom Co., Ltd. Process for fabricating a micro-optical lens
US20060029890A1 (en) * 2004-08-09 2006-02-09 Sharp Laboratories Of America, Inc. Lens formation by pattern transfer of a photoresist profile
US20060046204A1 (en) * 2004-08-31 2006-03-02 Sharp Laboratories Of America, Inc. Directly patternable microlens
US7029944B1 (en) * 2004-09-30 2006-04-18 Sharp Laboratories Of America, Inc. Methods of forming a microlens array over a substrate employing a CMP stop
JP2006140370A (ja) * 2004-11-15 2006-06-01 Oki Electric Ind Co Ltd マイクロレンズの製造方法
KR100685878B1 (ko) * 2004-12-30 2007-02-23 동부일렉트로닉스 주식회사 버티컬 씨모스 이미지센서 및 그의 제조방법
KR100665871B1 (ko) * 2005-04-21 2007-01-10 미래나노텍(주) 액정표시장치의 백라이트 어셈블리
US7297473B2 (en) * 2005-11-08 2007-11-20 Sharp Laboratories Of America, Inc. Method of forming a microlens array having a high fill factor
US7368779B2 (en) * 2006-01-04 2008-05-06 Taiwan Semiconductor Manufacturing Co., Ltd. Hemi-spherical structure and method for fabricating the same
US7190526B1 (en) 2006-05-02 2007-03-13 Sharp Laboratories Of America, Inc. Step-over lithography to produce parabolic photoresist profiles for microlens formation
KR100786800B1 (ko) * 2006-08-02 2007-12-18 한국과학기술원 사진현상형 하이브리드 재료를 이용한 미세광학소자의제작방법
US7838174B2 (en) 2007-01-24 2010-11-23 Sharp Laboratories Of America, Inc. Method of fabricating grayscale mask using smart cut® wafer bonding process
US7682761B2 (en) * 2007-02-20 2010-03-23 Sharp Laboratories Of America, Inc. Method of fabricating a grayscale mask using a wafer bonding process
WO2010007915A1 (ja) * 2008-07-16 2010-01-21 日産化学工業株式会社 ポジ型レジスト組成物及びマイクロレンズの製造方法
JP5611445B2 (ja) 2010-03-31 2014-10-22 エーファウ・グループ・ゲーエムベーハー マイクロレンズの製造方法及び製造装置
WO2012028163A1 (de) 2010-09-02 2012-03-08 Ev Group Gmbh Stempelwerkzeug, vorrichtung und verfahren zum herstellen eines linsenwafers
US8610227B2 (en) * 2010-10-13 2013-12-17 Taiwan Semiconductor Manufacturing Co., Ltd. Formation of embedded micro-lens
EP2632673B1 (de) 2010-10-26 2014-06-18 EV Group GmbH Verfahren und vorrichtung zum herstellen eines linsenwafers
SG2014012967A (en) 2012-05-30 2014-09-26 Ev Group E Thallner Gmbh Method and device for producing a plurality of microlenses
CN102902156A (zh) * 2012-05-30 2013-01-30 长春理工大学 一种自由曲面光学微镜阵列的制作方法
CN113419301A (zh) * 2021-07-21 2021-09-21 上海芯物科技有限公司 一种微透镜阵列的制备方法及晶圆

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4689291A (en) * 1985-08-30 1987-08-25 Xerox Corporation Pedestal-type microlens fabrication process
US4839250A (en) * 1987-08-10 1989-06-13 Polaroid Corporation, Patent Department Method of replicating volume phase reflection holograms
US4999234A (en) * 1987-08-10 1991-03-12 Polaroid Corporation Holographic optical data storage medium
EP0368482A1 (de) * 1988-10-14 1990-05-16 Secretary Of State For Trade And Industry In Her Britannic Majesty's Gov. Of The U.K. Of Great Britain And Northern Ireland Methode zur Herstellung eines Produkts, das eine Vielzahl feiner Linien aufweist
US5230990A (en) * 1990-10-09 1993-07-27 Brother Kogyo Kabushiki Kaisha Method for producing an optical waveguide array using a resist master

Also Published As

Publication number Publication date
DE69222979T2 (de) 1998-05-28
JP3067114B2 (ja) 2000-07-17
US5324623A (en) 1994-06-28
JPH04359472A (ja) 1992-12-11
EP0517163A1 (de) 1992-12-09
EP0517163B1 (de) 1997-11-05
KR100233417B1 (ko) 1999-12-01
KR930001443A (ko) 1993-01-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee