DE60307214D1 - Verfahren zur Herstellung eines resistiven 1T1R Speicherzellenfeldes - Google Patents

Verfahren zur Herstellung eines resistiven 1T1R Speicherzellenfeldes

Info

Publication number
DE60307214D1
DE60307214D1 DE60307214T DE60307214T DE60307214D1 DE 60307214 D1 DE60307214 D1 DE 60307214D1 DE 60307214 T DE60307214 T DE 60307214T DE 60307214 T DE60307214 T DE 60307214T DE 60307214 D1 DE60307214 D1 DE 60307214D1
Authority
DE
Germany
Prior art keywords
resistive
producing
memory cell
cell array
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60307214T
Other languages
English (en)
Other versions
DE60307214T2 (de
Inventor
Sheng Teng Hsu
Wei-Wei Zhuang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of DE60307214D1 publication Critical patent/DE60307214D1/de
Application granted granted Critical
Publication of DE60307214T2 publication Critical patent/DE60307214T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F12/00Accessing, addressing or allocating within memory systems or architectures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0007Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/30Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • H10B63/82Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays the switching components having a common active material layer
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/30Resistive cell, memory material aspects
    • G11C2213/31Material having complex metal oxide, e.g. perovskite structure
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/79Array wherein the access device being a transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/883Oxides or nitrides
    • H10N70/8836Complex metal oxides, e.g. perovskites, spinels

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Memories (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Hall/Mr Elements (AREA)
DE60307214T 2002-09-26 2003-06-25 Verfahren zur Herstellung eines resistiven 1T1R Speicherzellenfeldes Expired - Lifetime DE60307214T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/256,362 US6583003B1 (en) 2002-09-26 2002-09-26 Method of fabricating 1T1R resistive memory array
US256362 2002-09-26

Publications (2)

Publication Number Publication Date
DE60307214D1 true DE60307214D1 (de) 2006-09-14
DE60307214T2 DE60307214T2 (de) 2007-06-21

Family

ID=22971969

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60307214T Expired - Lifetime DE60307214T2 (de) 2002-09-26 2003-06-25 Verfahren zur Herstellung eines resistiven 1T1R Speicherzellenfeldes

Country Status (7)

Country Link
US (2) US6583003B1 (de)
EP (1) EP1431982B1 (de)
JP (1) JP2004119958A (de)
KR (1) KR100515182B1 (de)
CN (1) CN1288744C (de)
DE (1) DE60307214T2 (de)
TW (1) TWI244701B (de)

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US7256415B2 (en) 2005-05-31 2007-08-14 International Business Machines Corporation Memory device and method of manufacturing the device by simultaneously conditioning transition metal oxide layers in a plurality of memory cells
US20070009821A1 (en) * 2005-07-08 2007-01-11 Charlotte Cutler Devices containing multi-bit data
US7362604B2 (en) * 2005-07-11 2008-04-22 Sandisk 3D Llc Apparatus and method for programming an array of nonvolatile memory cells including switchable resistor memory elements
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Also Published As

Publication number Publication date
TWI244701B (en) 2005-12-01
JP2004119958A (ja) 2004-04-15
US6583003B1 (en) 2003-06-24
CN1288744C (zh) 2006-12-06
KR20040027297A (ko) 2004-04-01
TW200405476A (en) 2004-04-01
CN1485901A (zh) 2004-03-31
US20040061180A1 (en) 2004-04-01
DE60307214T2 (de) 2007-06-21
KR100515182B1 (ko) 2005-09-16
US6841833B2 (en) 2005-01-11
EP1431982B1 (de) 2006-08-02
EP1431982A1 (de) 2004-06-23

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