DE602005012463D1 - Magetspeicherzellenfeld mit wahlfreiem Zugriff mit dünnen elektrisch leitfähigen Lese- und Schreibleitungen - Google Patents
Magetspeicherzellenfeld mit wahlfreiem Zugriff mit dünnen elektrisch leitfähigen Lese- und SchreibleitungenInfo
- Publication number
- DE602005012463D1 DE602005012463D1 DE602005012463T DE602005012463T DE602005012463D1 DE 602005012463 D1 DE602005012463 D1 DE 602005012463D1 DE 602005012463 T DE602005012463 T DE 602005012463T DE 602005012463 T DE602005012463 T DE 602005012463T DE 602005012463 D1 DE602005012463 D1 DE 602005012463D1
- Authority
- DE
- Germany
- Prior art keywords
- lines
- memory cell
- random access
- electrically conductive
- cell array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 238000005498 polishing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1653—Address circuits or decoders
- G11C11/1657—Word-line or row circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1659—Cell access
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/02—Disposition of storage elements, e.g. in the form of a matrix array
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Semiconductor Memories (AREA)
- Hall/Mr Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/892,668 US7067330B2 (en) | 2004-07-16 | 2004-07-16 | Magnetic random access memory array with thin conduction electrical read and write lines |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005012463D1 true DE602005012463D1 (de) | 2009-03-12 |
Family
ID=35124479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005012463T Active DE602005012463D1 (de) | 2004-07-16 | 2005-06-24 | Magetspeicherzellenfeld mit wahlfreiem Zugriff mit dünnen elektrisch leitfähigen Lese- und Schreibleitungen |
Country Status (7)
Country | Link |
---|---|
US (3) | US7067330B2 (de) |
EP (1) | EP1619689B1 (de) |
JP (1) | JP2006032973A (de) |
KR (2) | KR20060053836A (de) |
AT (1) | ATE421757T1 (de) |
DE (1) | DE602005012463D1 (de) |
TW (1) | TWI302705B (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004363527A (ja) * | 2003-04-11 | 2004-12-24 | Toshiba Corp | 磁気記憶装置、データ複写装置、データ複写システム、データ複写プログラム、及びデータ複写方法 |
US7067330B2 (en) * | 2004-07-16 | 2006-06-27 | Headway Technologies, Inc. | Magnetic random access memory array with thin conduction electrical read and write lines |
US20060128038A1 (en) * | 2004-12-06 | 2006-06-15 | Mahendra Pakala | Method and system for providing a highly textured magnetoresistance element and magnetic memory |
US7760474B1 (en) | 2006-07-14 | 2010-07-20 | Grandis, Inc. | Magnetic element utilizing free layer engineering |
US7663848B1 (en) | 2006-07-14 | 2010-02-16 | Grandis, Inc. | Magnetic memories utilizing a magnetic element having an engineered free layer |
US20090095985A1 (en) * | 2007-10-10 | 2009-04-16 | Samsung Electronics Co., Ltd. | Multi-layer electrode, cross point memory array and method of manufacturing the same |
US20090102015A1 (en) * | 2007-10-17 | 2009-04-23 | Ulrich Klostermann | Integrated Circuit, Memory Cell Array, Memory Cell, Memory Module, Method of Operating an Integrated Circuit, and Method of Manufacturing an Integrated Circuit |
DE102007049786A1 (de) * | 2007-10-17 | 2009-04-23 | Qimonda Ag | Integrierte Schaltung, Speicherzellenarray, Speicherzelle, Verfahren zum Betreiben einer integrierten Schaltung, sowie Verfahren zum Herstellen einer integrierten Schaltung |
US8659852B2 (en) | 2008-04-21 | 2014-02-25 | Seagate Technology Llc | Write-once magentic junction memory array |
US7852663B2 (en) * | 2008-05-23 | 2010-12-14 | Seagate Technology Llc | Nonvolatile programmable logic gates and adders |
US7855911B2 (en) * | 2008-05-23 | 2010-12-21 | Seagate Technology Llc | Reconfigurable magnetic logic device using spin torque |
US7881098B2 (en) | 2008-08-26 | 2011-02-01 | Seagate Technology Llc | Memory with separate read and write paths |
US7985994B2 (en) * | 2008-09-29 | 2011-07-26 | Seagate Technology Llc | Flux-closed STRAM with electronically reflective insulative spacer |
US8169810B2 (en) | 2008-10-08 | 2012-05-01 | Seagate Technology Llc | Magnetic memory with asymmetric energy barrier |
US7880209B2 (en) * | 2008-10-09 | 2011-02-01 | Seagate Technology Llc | MRAM cells including coupled free ferromagnetic layers for stabilization |
US8039913B2 (en) * | 2008-10-09 | 2011-10-18 | Seagate Technology Llc | Magnetic stack with laminated layer |
US8089132B2 (en) | 2008-10-09 | 2012-01-03 | Seagate Technology Llc | Magnetic memory with phonon glass electron crystal material |
US20100102405A1 (en) * | 2008-10-27 | 2010-04-29 | Seagate Technology Llc | St-ram employing a spin filter |
US8045366B2 (en) * | 2008-11-05 | 2011-10-25 | Seagate Technology Llc | STRAM with composite free magnetic element |
US8043732B2 (en) | 2008-11-11 | 2011-10-25 | Seagate Technology Llc | Memory cell with radial barrier |
US7826181B2 (en) * | 2008-11-12 | 2010-11-02 | Seagate Technology Llc | Magnetic memory with porous non-conductive current confinement layer |
US8289756B2 (en) | 2008-11-25 | 2012-10-16 | Seagate Technology Llc | Non volatile memory including stabilizing structures |
US7826259B2 (en) * | 2009-01-29 | 2010-11-02 | Seagate Technology Llc | Staggered STRAM cell |
US7999338B2 (en) | 2009-07-13 | 2011-08-16 | Seagate Technology Llc | Magnetic stack having reference layers with orthogonal magnetization orientation directions |
US20140003118A1 (en) | 2012-07-02 | 2014-01-02 | International Business Machines Corporation | Magnetic tunnel junction self-alignment in magnetic domain wall shift register memory devices |
KR102465539B1 (ko) | 2015-09-18 | 2022-11-11 | 삼성전자주식회사 | 자기 터널 접합 구조체를 포함하는 반도체 소자 및 그의 형성 방법 |
JP2017139399A (ja) * | 2016-02-05 | 2017-08-10 | Tdk株式会社 | 磁気メモリ |
JP6297104B2 (ja) | 2016-08-04 | 2018-03-20 | 株式会社東芝 | 磁気記憶装置及びその製造方法 |
JP6271655B1 (ja) * | 2016-08-05 | 2018-01-31 | 株式会社東芝 | 不揮発性メモリ |
US10693059B2 (en) * | 2018-02-20 | 2020-06-23 | International Business Machines Corporation | MTJ stack etch using IBE to achieve vertical profile |
US10944050B2 (en) | 2018-05-08 | 2021-03-09 | Applied Materials, Inc. | Magnetic tunnel junction structures and methods of manufacture thereof |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5650958A (en) * | 1996-03-18 | 1997-07-22 | International Business Machines Corporation | Magnetic tunnel junctions with controlled magnetic response |
JPH1196519A (ja) * | 1997-09-17 | 1999-04-09 | Alps Electric Co Ltd | スピンバルブ型薄膜素子およびその製造方法 |
JP4095200B2 (ja) * | 1998-05-19 | 2008-06-04 | キヤノン株式会社 | 巨大磁気抵抗効果を利用したメモリ素子 |
US6436526B1 (en) * | 1999-06-17 | 2002-08-20 | Matsushita Electric Industrial Co., Ltd. | Magneto-resistance effect element, magneto-resistance effect memory cell, MRAM and method for performing information write to or read from the magneto-resistance effect memory cell |
US6166948A (en) * | 1999-09-03 | 2000-12-26 | International Business Machines Corporation | Magnetic memory array with magnetic tunnel junction memory cells having flux-closed free layers |
US6233172B1 (en) * | 1999-12-17 | 2001-05-15 | Motorola, Inc. | Magnetic element with dual magnetic states and fabrication method thereof |
JP3593652B2 (ja) * | 2000-03-03 | 2004-11-24 | 富士通株式会社 | 磁気ランダムアクセスメモリ装置 |
US6211090B1 (en) * | 2000-03-21 | 2001-04-03 | Motorola, Inc. | Method of fabricating flux concentrating layer for use with magnetoresistive random access memories |
JP2002217382A (ja) * | 2001-01-18 | 2002-08-02 | Sharp Corp | 磁気メモリおよび磁気メモリの製造方法 |
DE10055936C2 (de) * | 2000-11-10 | 2003-08-28 | Infineon Technologies Ag | Magnetoresistiver Speicher (MRAM) und dessen Verwendung |
US6611455B2 (en) * | 2001-04-20 | 2003-08-26 | Canon Kabushiki Kaisha | Magnetic memory |
JP2003289133A (ja) * | 2002-03-28 | 2003-10-10 | Sony Corp | 磁気メモリ素子、そのメモリ素子を含む集積回路または磁気メモリ装置、その集積回路または磁気メモリ装置を組み込んだ電子機器 |
JP3993522B2 (ja) * | 2002-03-29 | 2007-10-17 | 株式会社東芝 | 磁気記憶装置の製造方法 |
US6815248B2 (en) | 2002-04-18 | 2004-11-09 | Infineon Technologies Ag | Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing |
US6783995B2 (en) | 2002-04-30 | 2004-08-31 | Micron Technology, Inc. | Protective layers for MRAM devices |
US6788605B2 (en) * | 2002-07-15 | 2004-09-07 | Hewlett-Packard Development Company, L.P. | Shared volatile and non-volatile memory |
JP4178867B2 (ja) * | 2002-08-02 | 2008-11-12 | ソニー株式会社 | 磁気抵抗効果素子及び磁気メモリ装置 |
JP2004071897A (ja) * | 2002-08-07 | 2004-03-04 | Sony Corp | 磁気抵抗効果素子及び磁気メモリ装置 |
JP4632625B2 (ja) | 2002-11-14 | 2011-02-16 | ルネサスエレクトロニクス株式会社 | 薄膜磁性体記憶装置 |
JP3863484B2 (ja) * | 2002-11-22 | 2006-12-27 | 株式会社東芝 | 磁気抵抗効果素子および磁気メモリ |
JP4664573B2 (ja) * | 2002-11-28 | 2011-04-06 | ルネサスエレクトロニクス株式会社 | 磁気半導体記憶装置 |
JP2004200459A (ja) * | 2002-12-19 | 2004-07-15 | Matsushita Electric Ind Co Ltd | トンネル磁気抵抗効果素子、磁気ヘッド、磁気記録装置、磁気メモリー |
WO2004059745A1 (ja) * | 2002-12-25 | 2004-07-15 | Matsushita Electric Industrial Co., Ltd. | 磁性スイッチ素子とそれを用いた磁気メモリ |
JP2004279183A (ja) * | 2003-03-14 | 2004-10-07 | Seiko Epson Corp | 測位装置、移動端末、測位方法、測位機能を発揮させるプログラム及び、測位機能を発揮させるプログラムを記録した情報記録媒体 |
US6834005B1 (en) * | 2003-06-10 | 2004-12-21 | International Business Machines Corporation | Shiftable magnetic shift register and method of using the same |
US6898132B2 (en) * | 2003-06-10 | 2005-05-24 | International Business Machines Corporation | System and method for writing to a magnetic shift register |
US6920062B2 (en) * | 2003-10-14 | 2005-07-19 | International Business Machines Corporation | System and method for reading data stored on a magnetic shift register |
US7067330B2 (en) * | 2004-07-16 | 2006-06-27 | Headway Technologies, Inc. | Magnetic random access memory array with thin conduction electrical read and write lines |
US7132707B2 (en) * | 2004-08-03 | 2006-11-07 | Headway Technologies, Inc. | Magnetic random access memory array with proximate read and write lines cladded with magnetic material |
-
2004
- 2004-07-16 US US10/892,668 patent/US7067330B2/en not_active Expired - Fee Related
- 2004-12-01 US US11/001,382 patent/US7394122B2/en not_active Expired - Fee Related
-
2005
- 2005-06-24 DE DE602005012463T patent/DE602005012463D1/de active Active
- 2005-06-24 AT AT05368012T patent/ATE421757T1/de not_active IP Right Cessation
- 2005-06-24 EP EP05368012A patent/EP1619689B1/de not_active Not-in-force
- 2005-07-12 TW TW094123592A patent/TWI302705B/zh not_active IP Right Cessation
- 2005-07-15 KR KR1020050064316A patent/KR20060053836A/ko not_active Application Discontinuation
- 2005-07-19 JP JP2005209292A patent/JP2006032973A/ja active Pending
-
2006
- 2006-05-22 US US11/438,179 patent/US7394123B2/en not_active Expired - Fee Related
-
2009
- 2009-01-30 KR KR1020090007547A patent/KR100948009B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US7394122B2 (en) | 2008-07-01 |
JP2006032973A (ja) | 2006-02-02 |
US7067330B2 (en) | 2006-06-27 |
KR20060053836A (ko) | 2006-05-22 |
EP1619689A1 (de) | 2006-01-25 |
US20060014346A1 (en) | 2006-01-19 |
KR20090028591A (ko) | 2009-03-18 |
US20060211155A1 (en) | 2006-09-21 |
TWI302705B (en) | 2008-11-01 |
ATE421757T1 (de) | 2009-02-15 |
US20060014306A1 (en) | 2006-01-19 |
KR100948009B1 (ko) | 2010-03-18 |
TW200614233A (en) | 2006-05-01 |
EP1619689B1 (de) | 2009-01-21 |
US7394123B2 (en) | 2008-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602005012463D1 (de) | Magetspeicherzellenfeld mit wahlfreiem Zugriff mit dünnen elektrisch leitfähigen Lese- und Schreibleitungen | |
US7579197B1 (en) | Method of forming a magnetic tunnel junction structure | |
CN1713299B (zh) | 磁性存储单元以及制造磁性存储单元的方法 | |
US7936596B2 (en) | Magnetic tunnel junction cell including multiple magnetic domains | |
US9437809B2 (en) | Memory cell having nonmagnetic filament contact and methods of operating and fabricating the same | |
JP2019114816A (ja) | 磁気抵抗ランダムアクセスメモリの製造方法 | |
EP1653475B1 (de) | Magnetische Multibit-Direktzugriffspeicheranordnung und deren Schreibverfahren | |
US8213216B2 (en) | Shared bit line and source line resistive sense memory structure | |
CN102881819A (zh) | 具有提高的磁性层厚度余量的磁存储器件 | |
KR20110103463A (ko) | Stt-mram 셀 구조들 | |
US9960348B2 (en) | In-situ annealing to improve the tunneling magneto-resistance of magnetic tunnel junctions | |
US8139397B2 (en) | Spatial correlation of reference cells in resistive memory array | |
TW201913656A (zh) | 記憶體裝置、用於提供所述記憶體裝置的方法以及三維可堆疊記憶體裝置 | |
US20160133831A1 (en) | Method of forming metal oxide layer and magnetic memory device including the same | |
TW201837909A (zh) | 用於高速自旋轉矩磁性隨機存取記憶體之工程屏障層介面 | |
US7095069B2 (en) | Magnetoresistive random access memory, and manufacturing method thereof | |
JP3906172B2 (ja) | 磁気ランダムアクセスメモリおよびその製造方法 | |
JP2010205931A (ja) | 磁気記憶デバイスの製造方法及び磁気記憶装置 | |
US6787372B1 (en) | Method for manufacturing MTJ cell of magnetic random access memory | |
US20020109167A1 (en) | Memory device and method of fabrication thereof | |
KR20030001106A (ko) | 원자층 증착법을 이용한 자기저항식 랜덤 액세스 메모리용나노 소자 형성 방법 | |
KR100433936B1 (ko) | 자기저항식 랜덤 액세스 메모리의 자성 터널링 접합층 형성 방법 | |
KR20050041535A (ko) | 알루미늄 산화막을 이용한 자기 랜덤 엑세스 메모리 소자및 그 제조방법 | |
KR20230145155A (ko) | 이방성 향상 더스트 층을 포함하는 전압 제어형 자기 이방성 메모리 디바이스 및 이를 형성하기 위한 방법들 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |