DE3247345C2 - - Google Patents
Info
- Publication number
- DE3247345C2 DE3247345C2 DE3247345A DE3247345A DE3247345C2 DE 3247345 C2 DE3247345 C2 DE 3247345C2 DE 3247345 A DE3247345 A DE 3247345A DE 3247345 A DE3247345 A DE 3247345A DE 3247345 C2 DE3247345 C2 DE 3247345C2
- Authority
- DE
- Germany
- Prior art keywords
- nozzle
- blower
- nozzles
- substrate
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 85
- 239000011521 glass Substances 0.000 description 62
- 239000000758 substrate Substances 0.000 description 38
- 239000007789 gas Substances 0.000 description 30
- 238000000034 method Methods 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 25
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 25
- 239000012159 carrier gas Substances 0.000 description 24
- 238000000576 coating method Methods 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 19
- 239000003153 chemical reaction reagent Substances 0.000 description 16
- 238000006073 displacement reaction Methods 0.000 description 13
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 10
- 229910052731 fluorine Inorganic materials 0.000 description 10
- 239000011737 fluorine Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229910052787 antimony Inorganic materials 0.000 description 7
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000010298 pulverizing process Methods 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910003074 TiCl4 Inorganic materials 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 2
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000003292 diminished effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920006303 teflon fiber Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon Steel Or Casting Steel Manufacturing (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Aerodynamic Tests, Hydrodynamic Tests, Wind Tunnels, And Water Tanks (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Sampling And Sample Adjustment (AREA)
- Nozzles (AREA)
- Coating With Molten Metal (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH821181A CH643469A5 (fr) | 1981-12-22 | 1981-12-22 | Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3247345A1 DE3247345A1 (de) | 1983-06-30 |
| DE3247345C2 true DE3247345C2 (en, 2012) | 1992-01-23 |
Family
ID=4336860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19823247345 Granted DE3247345A1 (de) | 1981-12-22 | 1982-12-17 | Einrichtung zur kontinuierlichen ablagerung einer trockensubstanzschicht auf der oberflaeche eines auf hohe temperatur gebrachten substrats |
Country Status (23)
| Country | Link |
|---|---|
| US (1) | US4446815A (en, 2012) |
| JP (1) | JPS58114726A (en, 2012) |
| KR (1) | KR890000873B1 (en, 2012) |
| AU (1) | AU551974B2 (en, 2012) |
| BE (1) | BE895412A (en, 2012) |
| BR (1) | BR8207390A (en, 2012) |
| CA (1) | CA1197375A (en, 2012) |
| CH (1) | CH643469A5 (en, 2012) |
| CS (1) | CS235977B2 (en, 2012) |
| DD (1) | DD204907A5 (en, 2012) |
| DE (1) | DE3247345A1 (en, 2012) |
| DK (1) | DK161808C (en, 2012) |
| ES (1) | ES8400998A1 (en, 2012) |
| FR (1) | FR2518429B1 (en, 2012) |
| GB (1) | GB2113120B (en, 2012) |
| IT (1) | IT1155007B (en, 2012) |
| LU (1) | LU84539A1 (en, 2012) |
| MX (1) | MX157630A (en, 2012) |
| NL (1) | NL8204898A (en, 2012) |
| PL (1) | PL133525B1 (en, 2012) |
| SE (1) | SE451112B (en, 2012) |
| TR (1) | TR21862A (en, 2012) |
| ZA (1) | ZA829305B (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4325011A1 (de) * | 1993-07-28 | 1995-03-02 | Herlitz Michael | Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1985003460A1 (en) * | 1984-02-13 | 1985-08-15 | Schmitt Jerome J Iii | Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby |
| JPS6169961A (ja) * | 1984-09-13 | 1986-04-10 | Agency Of Ind Science & Technol | 霧化薄膜作製装置用ノズル |
| AT386762B (de) * | 1985-05-08 | 1988-10-10 | Zimmer Johannes | Verfahren und vorrichtung zum impraegnierenden und/oder beschichtenden auftragen auf eine warenbahn |
| US5160543A (en) * | 1985-12-20 | 1992-11-03 | Canon Kabushiki Kaisha | Device for forming a deposited film |
| US4928627A (en) * | 1985-12-23 | 1990-05-29 | Atochem North America, Inc. | Apparatus for coating a substrate |
| US5391232A (en) * | 1985-12-26 | 1995-02-21 | Canon Kabushiki Kaisha | Device for forming a deposited film |
| AT396340B (de) * | 1986-11-17 | 1993-08-25 | Zimmer Johannes | Verfahren und vorrichtung zum impraegnierenden und/oder beschichtenden auftragen fluessiger, gegebenenfalls verschaeumter substanzen |
| US4793282A (en) * | 1987-05-18 | 1988-12-27 | Libbey-Owens-Ford Co. | Distributor beam for chemical vapor deposition on glass |
| US5906688A (en) * | 1989-01-11 | 1999-05-25 | Ohmi; Tadahiro | Method of forming a passivation film |
| US5313982A (en) * | 1988-07-08 | 1994-05-24 | Tadahiro Ohmi | Gas supply piping device for a process apparatus |
| US5591267A (en) * | 1988-01-11 | 1997-01-07 | Ohmi; Tadahiro | Reduced pressure device |
| JPH0647073B2 (ja) | 1988-07-08 | 1994-06-22 | 忠弘 大見 | プロセス装置用ガス供給配管装置 |
| GB8824102D0 (en) * | 1988-10-14 | 1988-11-23 | Pilkington Plc | Apparatus for coating glass |
| US5789086A (en) * | 1990-03-05 | 1998-08-04 | Ohmi; Tadahiro | Stainless steel surface having passivation film |
| US5136975A (en) * | 1990-06-21 | 1992-08-11 | Watkins-Johnson Company | Injector and method for delivering gaseous chemicals to a surface |
| US6379466B1 (en) * | 1992-01-17 | 2002-04-30 | Applied Materials, Inc. | Temperature controlled gas distribution plate |
| GB9300400D0 (en) * | 1993-01-11 | 1993-03-03 | Glaverbel | A device and method for forming a coating by pyrolysis |
| US5356718A (en) | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
| US5599387A (en) * | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
| US5863337A (en) * | 1993-02-16 | 1999-01-26 | Ppg Industries, Inc. | Apparatus for coating a moving glass substrate |
| US5425810A (en) * | 1994-05-11 | 1995-06-20 | Internation Business Machines Corporation | Removable gas injectors for use in chemical vapor deposition of aluminium oxide |
| TW359943B (en) * | 1994-07-18 | 1999-06-01 | Silicon Valley Group Thermal | Single body injector and method for delivering gases to a surface |
| US6200389B1 (en) | 1994-07-18 | 2001-03-13 | Silicon Valley Group Thermal Systems Llc | Single body injector and deposition chamber |
| US6022414A (en) * | 1994-07-18 | 2000-02-08 | Semiconductor Equipment Group, Llc | Single body injector and method for delivering gases to a surface |
| FR2724923B1 (fr) * | 1994-09-27 | 1996-12-20 | Saint Gobain Vitrage | Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s) |
| TW356554B (en) * | 1995-10-23 | 1999-04-21 | Watkins Johnson Co | Gas injection system for semiconductor processing |
| US5698262A (en) * | 1996-05-06 | 1997-12-16 | Libbey-Owens-Ford Co. | Method for forming tin oxide coating on glass |
| US6055927A (en) * | 1997-01-14 | 2000-05-02 | Applied Komatsu Technology, Inc. | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
| US5938851A (en) * | 1997-04-14 | 1999-08-17 | Wj Semiconductor Equipment Group, Inc. | Exhaust vent assembly for chemical vapor deposition systems |
| US6103015A (en) * | 1998-01-19 | 2000-08-15 | Libbey-Owens-Ford Co. | Symmetrical CVD coater with lower upstream exhaust toe |
| US20010040230A1 (en) * | 1999-11-30 | 2001-11-15 | Woo Sik Yoo | Compact gate valve |
| US6302965B1 (en) * | 2000-08-15 | 2001-10-16 | Applied Materials, Inc. | Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces |
| US6698718B2 (en) | 2001-08-29 | 2004-03-02 | Wafermasters, Inc. | Rotary valve |
| JP4124046B2 (ja) * | 2003-07-10 | 2008-07-23 | 株式会社大阪チタニウムテクノロジーズ | 金属酸化物被膜の成膜方法および蒸着装置 |
| DE102006043543B4 (de) * | 2006-09-12 | 2012-05-10 | Innovent E.V. | Homogenisator für der Beschichtung von Oberflächen dienende Gasströme |
| DE102006043542B4 (de) * | 2006-09-12 | 2012-05-16 | Innovent E.V. | Verfahren zum Beschichten von Oberflächen |
| JP2008169437A (ja) * | 2007-01-11 | 2008-07-24 | Mitsubishi Heavy Ind Ltd | 製膜装置 |
| KR20110014653A (ko) * | 2008-05-19 | 2011-02-11 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 전자 소자에서 증기 코팅 장치 및 방법 |
| US20100212591A1 (en) * | 2008-05-30 | 2010-08-26 | Alta Devices, Inc. | Reactor lid assembly for vapor deposition |
| EP3483919A1 (en) * | 2008-12-04 | 2019-05-15 | Veeco Instruments Inc. | Chemical vapor deposition flow inlet elements and methods |
| US8931431B2 (en) | 2009-03-25 | 2015-01-13 | The Regents Of The University Of Michigan | Nozzle geometry for organic vapor jet printing |
| WO2013019285A2 (en) | 2011-03-23 | 2013-02-07 | Pilkington Group Limited | Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus |
| TW201309611A (zh) | 2011-07-12 | 2013-03-01 | Asahi Glass Co Ltd | 附積層膜之玻璃基板之製造方法 |
| WO2013008897A1 (ja) | 2011-07-12 | 2013-01-17 | 旭硝子株式会社 | 積層膜付きガラス基板の製造方法 |
| CN104310796A (zh) * | 2014-09-26 | 2015-01-28 | 蓝思科技（长沙）有限公司 | 一种玻璃材料表面as膜方法及其装置 |
| DE102014117492A1 (de) * | 2014-11-28 | 2016-06-02 | Aixtron Se | Vorrichtung zum Abscheiden einer Schicht auf einem Substrat |
| US11588140B2 (en) * | 2018-01-12 | 2023-02-21 | Universal Display Corporation | Organic vapor jet print head for depositing thin film features with high thickness uniformity |
| DE102021133627A1 (de) | 2021-12-17 | 2023-06-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung zum Beschichten eines bandförmigen Substrates mit einer Parylene-Schicht |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH544156A (de) * | 1971-04-16 | 1973-11-15 | Bbc Brown Boveri & Cie | Verfahren zur Herstellung von oxydischen Halbleiterschichten und Vorrichtung zur Durchführung des Verfahrens |
| US3888649A (en) * | 1972-12-15 | 1975-06-10 | Ppg Industries Inc | Nozzle for chemical vapor deposition of coatings |
| US3850679A (en) * | 1972-12-15 | 1974-11-26 | Ppg Industries Inc | Chemical vapor deposition of coatings |
| US4088471A (en) * | 1974-06-14 | 1978-05-09 | Pilkington Brothers Limited | Apparatus for coating glass |
| FR2288068A1 (fr) * | 1974-10-15 | 1976-05-14 | Boussois Sa | Procede et dispositif pour deposer par pulverisation d'un liquide une couche mince a la surface d'un materiau en feuille, notamment pour le traitement a chaud d'une feuille de verre |
| GB1507996A (en) * | 1975-06-11 | 1978-04-19 | Pilkington Brothers Ltd | Coating glass |
| GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
| GB1516032A (en) * | 1976-04-13 | 1978-06-28 | Bfg Glassgroup | Coating of glass |
| CH628600A5 (fr) * | 1979-02-14 | 1982-03-15 | Siv Soc Italiana Vetro | Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede. |
| MX152941A (es) * | 1979-07-31 | 1986-07-04 | Siv Soc Italiana Vetro | Mejoras en procedimiento para depositar sobre un substrato de vidrio ceramico u otra substancia mineral un revestimiento adherente de oxido de estano |
| IT1134153B (it) * | 1979-11-21 | 1986-07-31 | Siv Soc Italiana Vetro | Ugello per depositare in continuo su un substrato uno strato di una materia solida |
| GB2068937B (en) * | 1980-01-31 | 1984-02-29 | Bfg Glassgroup | Coating hot glass with metals or metal compounds especially oxides |
-
1981
- 1981-12-22 CH CH821181A patent/CH643469A5/fr not_active IP Right Cessation
-
1982
- 1982-12-11 KR KR8205558A patent/KR890000873B1/ko not_active Expired
- 1982-12-14 US US06/449,773 patent/US4446815A/en not_active Expired - Fee Related
- 1982-12-14 AU AU91469/82A patent/AU551974B2/en not_active Ceased
- 1982-12-17 DE DE19823247345 patent/DE3247345A1/de active Granted
- 1982-12-17 IT IT24840/82A patent/IT1155007B/it active
- 1982-12-17 CA CA000417975A patent/CA1197375A/en not_active Expired
- 1982-12-17 MX MX195702A patent/MX157630A/es unknown
- 1982-12-17 ZA ZA829305A patent/ZA829305B/xx unknown
- 1982-12-20 FR FR8221345A patent/FR2518429B1/fr not_active Expired
- 1982-12-20 DD DD82246273A patent/DD204907A5/de not_active IP Right Cessation
- 1982-12-20 GB GB08236146A patent/GB2113120B/en not_active Expired
- 1982-12-20 SE SE8207254A patent/SE451112B/sv not_active IP Right Cessation
- 1982-12-20 LU LU84539A patent/LU84539A1/fr unknown
- 1982-12-20 NL NL8204898A patent/NL8204898A/nl not_active Application Discontinuation
- 1982-12-20 BE BE0/209771A patent/BE895412A/fr not_active IP Right Cessation
- 1982-12-20 DK DK562382A patent/DK161808C/da not_active IP Right Cessation
- 1982-12-20 BR BR8207390A patent/BR8207390A/pt not_active IP Right Cessation
- 1982-12-21 JP JP57223125A patent/JPS58114726A/ja active Granted
- 1982-12-21 PL PL1982239652A patent/PL133525B1/pl unknown
- 1982-12-21 TR TR21862A patent/TR21862A/xx unknown
- 1982-12-21 ES ES518406A patent/ES8400998A1/es not_active Expired
- 1982-12-22 CS CS829554A patent/CS235977B2/cs unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4325011A1 (de) * | 1993-07-28 | 1995-03-02 | Herlitz Michael | Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben |
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