DE275662T1 - Beschichtungen auf glas. - Google Patents
Beschichtungen auf glas.Info
- Publication number
- DE275662T1 DE275662T1 DE198787310976T DE87310976T DE275662T1 DE 275662 T1 DE275662 T1 DE 275662T1 DE 198787310976 T DE198787310976 T DE 198787310976T DE 87310976 T DE87310976 T DE 87310976T DE 275662 T1 DE275662 T1 DE 275662T1
- Authority
- DE
- Germany
- Prior art keywords
- gaseous mixture
- undercoat
- glass surface
- glass
- underlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims abstract 11
- 239000008246 gaseous mixture Substances 0.000 claims abstract 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract 5
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims abstract 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract 4
- 229910000077 silane Inorganic materials 0.000 claims abstract 4
- 229910001413 alkali metal ion Inorganic materials 0.000 claims abstract 3
- 230000005012 migration Effects 0.000 claims abstract 3
- 238000013508 migration Methods 0.000 claims abstract 3
- 230000004888 barrier function Effects 0.000 claims abstract 2
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract 2
- 239000001569 carbon dioxide Substances 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims 9
- 150000002430 hydrocarbons Chemical class 0.000 claims 3
- 238000002834 transmittance Methods 0.000 claims 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- 150000001336 alkenes Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000002585 base Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000000197 pyrolysis Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
Claims (9)
1. Verfahren zur Ausbildung einer Unterschicht auf
einer Glasoberfläche, bei welchem eine gasförmige Mischung aus einem Silan, einer ungesättigten Kohlenwasserstoffverbindung
und Kohlendioxid bei einer Temperatur von 600° C bis 750° C auf die heiße
Glasoberfläche geleitet wird, wodurch eine durchsichtige Schicht, die Silikon und Sauerstoff enthält,
auf die Glasoberfläche aufgebracht wird.
2. Verfahren nach Anspruch 1, bei welchem in einem zusätzlichen Schritt auf die Unterschicht eine
Schicht aufgebracht wird, die für die Wanderung von Alkalimetallionen aus dem Glas empfindlich ist.
3. Verfahren nach Anspurch 1, bei welchem in einem zusätzlichen Schritt eine Infrarot reflektierende
und/oder elektrisch leitende Schicht auf die Unterschicht aufgebracht wird.
0275862
4. Verfahren nach einem der vorangehenden Ansprüche, wobei die zur Absetzung der Unterschicht verwendete
ungesättigte Kohlenwasserstoffverbindung ein Olefin ist, das 2 bis 4 Kohlenstoffatome enthält.
5. Verfahren nach Anspruch 4, wobei die ungesättigte KohlenwasserstoffVerbindung Ethylen ist.
6. Verfahren nach einem der vorangehenden Ansprüche, wobei die in der zum Aufbringen der Unterschicht
verwendeten gasförmigen Mischung vorhandenen Anteile und die Strömungsgeschwindigkeit der gasförmigen
Mischung über die heiße Glasoberfläche derart geregelt werden, daß eine Unterschicht mit
einer Dicke im Bereich von 60 nm bis 80 nm und einem Brechungsindex im Bereich von 1,6 bis 1,8
aufgebracht wird.
7. Verfahren nach einem der vorangehenden Ansprüche, wobei die in der zum Aufbringen der Unterschicht
verwendeten gasförmigen Mischung vorhandenen Anteile und die Strömungsgeschwindigkeit der gasförmigen
Mischung über die heiße Glasoberfläche derart geregelt werden, daß eine Unterschicht aufgebracht
wird, deren Dicke und Brechungsindex so beschaffen sind, daß das mit der Unterschicht
beschichtete Glas eine Lichtdurchlässigkeit aufweist, deren Abweichung von der Lichtdurchlässigkeit
des unbeschichteten Glases innerhalb 2 % liegt, und die eine wirksame Sperre, wie sie
hierin festgelegt ist, gegen die Wanderung von Alkalimetallionen aus dem Glas ergibt.
8. Verfahren nach einem der vorangehenden Ansprüche, wobei das Verhältnis von ungesättigtem Kohlenwasserstoff
zu Silan in dem zum Aufbringen der Unterschicht verwendeten gasförmigen Gemisch im Bereich
von 2 : 1 bis 5 : 1,bezogen auf das Volumen,liegt.
9. Verfahren nach einem der vorangehenden Ansprüche, wobei das Verhältnis von ungesättigtem Kohlendioxid
zu Silan in dem zum Aufbringen der Unterschicht verwendeten gasförmigen Gemisch im Bereich
von 2 : 1 bis 8 : 1, bezogen auf das Volumen, liegt.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB868630918A GB8630918D0 (en) | 1986-12-24 | 1986-12-24 | Coatings on glass |
Publications (1)
Publication Number | Publication Date |
---|---|
DE275662T1 true DE275662T1 (de) | 1988-11-24 |
Family
ID=10609602
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787310976T Expired - Fee Related DE3766095D1 (de) | 1986-12-24 | 1987-12-14 | Beschichtungen auf glas. |
DE198787310976T Pending DE275662T1 (de) | 1986-12-24 | 1987-12-14 | Beschichtungen auf glas. |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787310976T Expired - Fee Related DE3766095D1 (de) | 1986-12-24 | 1987-12-14 | Beschichtungen auf glas. |
Country Status (26)
Country | Link |
---|---|
US (1) | US4828880A (de) |
EP (1) | EP0275662B1 (de) |
JP (1) | JPH0674158B2 (de) |
KR (1) | KR950002332B1 (de) |
CN (1) | CN1018636B (de) |
AT (1) | ATE58114T1 (de) |
AU (1) | AU593966B2 (de) |
BR (1) | BR8707035A (de) |
CA (1) | CA1327143C (de) |
CS (1) | CS274417B2 (de) |
DD (1) | DD264911A5 (de) |
DE (2) | DE3766095D1 (de) |
DK (1) | DK170066B1 (de) |
ES (1) | ES2003853B3 (de) |
FI (1) | FI85460C (de) |
GB (2) | GB8630918D0 (de) |
GR (1) | GR3002521T3 (de) |
IE (1) | IE60946B1 (de) |
IN (1) | IN170516B (de) |
MX (1) | MX170772B (de) |
NO (1) | NO171970C (de) |
PT (1) | PT86460B (de) |
RU (1) | RU1830053C (de) |
TR (1) | TR23524A (de) |
UA (1) | UA11076A (de) |
ZA (1) | ZA879553B (de) |
Families Citing this family (73)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8814922D0 (en) * | 1988-06-23 | 1988-07-27 | Pilkington Plc | Coatings on glass |
FR2638893B1 (fr) * | 1988-11-10 | 1990-12-14 | Thomson Tubes Electroniques | Substrat electriquement isolant |
ATE136253T1 (de) * | 1989-02-21 | 1996-04-15 | Libbey Owens Ford Co | Gegenstände aus beschichtetem glas |
US5221352A (en) * | 1989-06-19 | 1993-06-22 | Glaverbel | Apparatus for pyrolytically forming an oxide coating on a hot glass substrate |
GB8914047D0 (en) * | 1989-06-19 | 1989-08-09 | Glaverbel | Method of and apparatus for pyrolytically forming an oxide coating on a hot glass substrate |
FR2657866A1 (fr) * | 1990-02-07 | 1991-08-09 | Saint Gobain Vitrage Int | Procede de formation d'une couche d'oxycarbure de silicium sur du verre, verre obtenu et son utilisation dans des vitrages a couche semi-conductrice. |
GB2247691B (en) * | 1990-08-31 | 1994-11-23 | Glaverbel | Method of coating glass |
GB2248243B (en) * | 1990-09-01 | 1994-06-22 | Glaverbel | Coated glass and method of manufacturing same |
GB9019117D0 (en) * | 1990-09-01 | 1990-10-17 | Glaverbel | Coated glass and method of manufacturing same |
KR920020223A (ko) * | 1991-04-04 | 1992-11-20 | 세야 히로미찌 | 무진주광택 투명체 |
FR2675139B1 (fr) * | 1991-04-09 | 1993-11-26 | Saint Gobain Vitrage Internal | Depot de couches pyrolysees a performances ameliorees et vitrage revetu d'une telle couche. |
CA2084247A1 (en) * | 1992-03-18 | 1993-09-19 | Francis Paul Fehlner | Lcd panel production |
ES2096864T3 (es) * | 1992-07-11 | 1997-03-16 | Pilkington Uk Ltd | Procedimiento para la preparacion de revestimientos reflectantes sobre vidrio y espejos preparados a partir del mismo. |
FR2695118B1 (fr) * | 1992-09-02 | 1994-10-07 | Air Liquide | Procédé de formation d'une couche barrière sur une surface d'un objet en verre. |
US5665424A (en) * | 1994-03-11 | 1997-09-09 | Sherman; Dan | Method for making glass articles having a permanent protective coating |
US5723172A (en) * | 1994-03-11 | 1998-03-03 | Dan Sherman | Method for forming a protective coating on glass |
US5578103A (en) * | 1994-08-17 | 1996-11-26 | Corning Incorporated | Alkali metal ion migration control |
DE4432235A1 (de) * | 1994-09-10 | 1996-03-14 | Bayerische Motoren Werke Ag | Kratzfeste Beschichtung auf einem thermisch beständigen Substrat und Verfahren zu ihrer Herstellung |
CA2159296C (en) * | 1994-10-14 | 2007-01-30 | Michel J. Soubeyrand | Glass coating method and glass coated thereby |
CN1051534C (zh) * | 1994-11-22 | 2000-04-19 | 秦皇岛开发区蓝光玻璃新技术公司 | 浮法在线生产镀膜玻璃的方法 |
GB9500330D0 (en) * | 1995-01-09 | 1995-03-01 | Pilkington Plc | Coatings on glass |
US5773086A (en) * | 1996-08-13 | 1998-06-30 | Libbey-Owens-Ford Co. | Method of coating flat glass with indium oxide |
GB9619134D0 (en) * | 1996-09-13 | 1996-10-23 | Pilkington Plc | Improvements in or related to coated glass |
JP3700358B2 (ja) | 1996-12-18 | 2005-09-28 | 日本板硝子株式会社 | 防曇防汚ガラス物品 |
US6055828A (en) * | 1997-12-30 | 2000-05-02 | Closure Medical Corporation | Treatment methods for glass medical adhesive applicators |
US6287990B1 (en) | 1998-02-11 | 2001-09-11 | Applied Materials, Inc. | CVD plasma assisted low dielectric constant films |
US6303523B2 (en) | 1998-02-11 | 2001-10-16 | Applied Materials, Inc. | Plasma processes for depositing low dielectric constant films |
US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
US6054379A (en) * | 1998-02-11 | 2000-04-25 | Applied Materials, Inc. | Method of depositing a low k dielectric with organo silane |
US6593247B1 (en) | 1998-02-11 | 2003-07-15 | Applied Materials, Inc. | Method of depositing low k films using an oxidizing plasma |
US6660656B2 (en) | 1998-02-11 | 2003-12-09 | Applied Materials Inc. | Plasma processes for depositing low dielectric constant films |
GB9806027D0 (en) | 1998-03-20 | 1998-05-20 | Glaverbel | Coated substrate with high reflectance |
US6881505B2 (en) | 1998-03-20 | 2005-04-19 | Glaverbel | Coated substrate with high reflectance |
US7776460B2 (en) * | 1998-03-20 | 2010-08-17 | Agc Glass Europe | Coated substrate with high reflectance |
US6667553B2 (en) | 1998-05-29 | 2003-12-23 | Dow Corning Corporation | H:SiOC coated substrates |
US6159871A (en) | 1998-05-29 | 2000-12-12 | Dow Corning Corporation | Method for producing hydrogenated silicon oxycarbide films having low dielectric constant |
US6218018B1 (en) | 1998-08-21 | 2001-04-17 | Atofina Chemicals, Inc. | Solar control coated glass |
US6596398B1 (en) | 1998-08-21 | 2003-07-22 | Atofina Chemicals, Inc. | Solar control coated glass |
GB9826293D0 (en) | 1998-12-01 | 1999-01-20 | Pilkington Plc | Inprovements in coating glass |
GB9913315D0 (en) | 1999-06-08 | 1999-08-11 | Pilkington Plc | Improved process for coating glass |
GB2355273A (en) * | 1999-10-12 | 2001-04-18 | Pilkington Plc | Coating glass |
US6399489B1 (en) | 1999-11-01 | 2002-06-04 | Applied Materials, Inc. | Barrier layer deposition using HDP-CVD |
US6709721B2 (en) | 2001-03-28 | 2004-03-23 | Applied Materials Inc. | Purge heater design and process development for the improvement of low k film properties |
US6521295B1 (en) * | 2001-04-17 | 2003-02-18 | Pilkington North America, Inc. | Chemical vapor deposition of antimony-doped metal oxide and the coated article made thereby |
US6926926B2 (en) * | 2001-09-10 | 2005-08-09 | Applied Materials, Inc. | Silicon carbide deposited by high density plasma chemical-vapor deposition with bias |
WO2003031362A1 (en) | 2001-10-05 | 2003-04-17 | Dow Global Technologies Inc. | Coated glass for use in displays and other electronic devices |
DE10158925A1 (de) * | 2001-11-23 | 2003-06-26 | Fraunhofer Ges Forschung | Oxidkeramische Faserverbundwerkstoffe und ihre Verwendung |
CN100373559C (zh) * | 2002-01-15 | 2008-03-05 | 东京毅力科创株式会社 | 形成含硅绝缘膜的cvd方法和装置 |
US6919133B2 (en) | 2002-03-01 | 2005-07-19 | Cardinal Cg Company | Thin film coating having transparent base layer |
DE10344442B3 (de) * | 2003-09-25 | 2004-10-28 | Schott Glas | Gargerätetür mit einer Innenscheibe aus Borosilikat-Glas und Gargerät mit einer derartigen Tür |
US7482060B2 (en) * | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
US7372610B2 (en) | 2005-02-23 | 2008-05-13 | Sage Electrochromics, Inc. | Electrochromic devices and methods |
GB0505074D0 (en) * | 2005-03-14 | 2005-04-20 | Pilkington Plc | Coatings |
CN1321926C (zh) * | 2005-11-08 | 2007-06-20 | 浙江大学蓝星新材料技术有限公司 | 浮法在线生产涂层玻璃的方法 |
WO2007081045A1 (ja) * | 2006-01-16 | 2007-07-19 | Nippon Sheet Glass Company, Limited | 薄膜形成ガラス板 |
DE102006062092B4 (de) * | 2006-12-29 | 2014-02-13 | Anton Näbauer | In Bezug auf Wirkungsgrad und Zuverlässigkeit optimierte Solarmodule |
KR100910764B1 (ko) * | 2008-10-28 | 2009-08-04 | 박향률 | 차량 표면의 유리피막 코팅제 |
CN101618952B (zh) * | 2009-07-30 | 2011-08-17 | 杭州蓝星新材料技术有限公司 | 浮法在线生产透明导电膜玻璃的方法 |
FR2956659B1 (fr) | 2010-02-22 | 2014-10-10 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
FR2962852A1 (fr) | 2010-07-19 | 2012-01-20 | Saint Gobain | Electrode transparente pour cellule photovoltaique a haut rendement |
CN103649002A (zh) | 2011-07-12 | 2014-03-19 | 旭硝子株式会社 | 带层叠膜的玻璃基板的制造方法 |
JP5967088B2 (ja) | 2011-07-12 | 2016-08-10 | 旭硝子株式会社 | 積層膜付きガラス基板の製造方法 |
GB201114242D0 (en) | 2011-08-18 | 2011-10-05 | Pilkington Group Ltd | Tantalum oxide coatings |
FR2982606A1 (fr) * | 2011-11-16 | 2013-05-17 | Saint Gobain | Vitrage hydrophobe |
FR2982607A1 (fr) * | 2011-11-16 | 2013-05-17 | Saint Gobain | Materiau fonctionnel a haute durabilite |
FR2982608B1 (fr) | 2011-11-16 | 2013-11-22 | Saint Gobain | Couche barriere aux metaux alcalins a base de sioc |
CN102584023A (zh) * | 2012-02-22 | 2012-07-18 | 株洲旗滨集团股份有限公司 | 一种阳光控制镀膜玻璃的制备方法及其玻璃 |
CN102922824A (zh) * | 2012-11-08 | 2013-02-13 | 浙江大学 | 一种具有硅碳氧阻挡层薄膜的低辐射玻璃及其制备方法 |
DE102013111680A1 (de) * | 2013-10-23 | 2015-04-23 | Solarworld Innovations Gmbh | Solarzelle und Verfahren zum Herstellen einer Solarzelle |
CN106277818A (zh) * | 2015-05-11 | 2017-01-04 | 杭州合新科技有限公司 | 一种新型阳光控制镀膜玻璃及其制备工艺 |
EP3319915B2 (de) | 2015-07-07 | 2023-05-17 | AGC Glass Europe | Glassubstrat mit erhöhter witterungs- und chemikalienbeständigkeit |
WO2021171309A1 (en) * | 2020-02-26 | 2021-09-02 | Saint-Gobain Glass France | A heat treatable reflective coating and a coated article thereof |
GB2600168A (en) | 2020-10-26 | 2022-04-27 | Pilkington Group Ltd | Use of coated substrates |
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---|---|---|---|---|
US3306768A (en) * | 1964-01-08 | 1967-02-28 | Motorola Inc | Method of forming thin oxide films |
GB1136218A (en) * | 1965-12-14 | 1968-12-11 | Standard Telephones Cables Ltd | Improvements in or relating to the manufacture of semiconductor optical devices |
GB1450123A (en) * | 1973-11-27 | 1976-09-22 | Post Office | Doped vitreous silica |
GB2031756B (en) * | 1978-10-20 | 1983-03-09 | Gordon Roy Gerald | Non-iridescent glass structures and processes for their production |
US4328646A (en) * | 1978-11-27 | 1982-05-11 | Rca Corporation | Method for preparing an abrasive coating |
GB2078699B (en) * | 1980-06-20 | 1984-06-27 | Atomic Energy Authority Uk | Coating of metallic substrates |
JPS5826052A (ja) * | 1981-08-06 | 1983-02-16 | Asahi Glass Co Ltd | アルカリ拡散防止酸化ケイ素膜付ガラス体 |
GB8420534D0 (en) * | 1984-08-13 | 1984-09-19 | Pilkington Brothers Plc | Coated products |
JP2596452B2 (ja) * | 1988-07-08 | 1997-04-02 | 三菱電機株式会社 | エレベ−タの地震管制運転からの復旧方法 |
-
1986
- 1986-12-24 GB GB868630918A patent/GB8630918D0/en active Pending
-
1987
- 1987-12-14 EP EP87310976A patent/EP0275662B1/de not_active Expired - Lifetime
- 1987-12-14 DE DE8787310976T patent/DE3766095D1/de not_active Expired - Fee Related
- 1987-12-14 DE DE198787310976T patent/DE275662T1/de active Pending
- 1987-12-14 GB GB8729171A patent/GB2199848B/en not_active Expired - Fee Related
- 1987-12-14 ES ES87310976T patent/ES2003853B3/es not_active Expired - Lifetime
- 1987-12-14 AT AT87310976T patent/ATE58114T1/de not_active IP Right Cessation
- 1987-12-21 US US07/135,263 patent/US4828880A/en not_active Expired - Lifetime
- 1987-12-21 ZA ZA879553A patent/ZA879553B/xx unknown
- 1987-12-21 DD DD87310857A patent/DD264911A5/de not_active IP Right Cessation
- 1987-12-21 AU AU82885/87A patent/AU593966B2/en not_active Ceased
- 1987-12-21 IE IE348287A patent/IE60946B1/en not_active IP Right Cessation
- 1987-12-21 NO NO875344A patent/NO171970C/no unknown
- 1987-12-22 FI FI875657A patent/FI85460C/fi not_active IP Right Cessation
- 1987-12-22 IN IN918/MAS/87A patent/IN170516B/en unknown
- 1987-12-22 CA CA000555118A patent/CA1327143C/en not_active Expired - Fee Related
- 1987-12-23 DK DK685687A patent/DK170066B1/da not_active IP Right Cessation
- 1987-12-23 CS CS978987A patent/CS274417B2/cs not_active IP Right Cessation
- 1987-12-23 PT PT86460A patent/PT86460B/pt not_active IP Right Cessation
- 1987-12-23 UA UA4203918A patent/UA11076A/uk unknown
- 1987-12-23 BR BR8707035A patent/BR8707035A/pt not_active IP Right Cessation
- 1987-12-23 RU SU874203918A patent/RU1830053C/ru active
- 1987-12-23 KR KR1019870014786A patent/KR950002332B1/ko not_active IP Right Cessation
- 1987-12-24 MX MX009923A patent/MX170772B/es unknown
- 1987-12-24 TR TR26/88A patent/TR23524A/xx unknown
- 1987-12-24 CN CN87101283A patent/CN1018636B/zh not_active Expired
- 1987-12-24 JP JP62328170A patent/JPH0674158B2/ja not_active Expired - Fee Related
-
1990
- 1990-11-08 GR GR90400894T patent/GR3002521T3/el unknown
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