GB2015983A - Improved Deposition Method - Google Patents

Improved Deposition Method

Info

Publication number
GB2015983A
GB2015983A GB7908105A GB7908105A GB2015983A GB 2015983 A GB2015983 A GB 2015983A GB 7908105 A GB7908105 A GB 7908105A GB 7908105 A GB7908105 A GB 7908105A GB 2015983 A GB2015983 A GB 2015983A
Authority
GB
United Kingdom
Prior art keywords
coating
coatings
glass
refractive index
iridescence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7908105A
Other versions
GB2015983B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/884,432 external-priority patent/US4206252A/en
Application filed by Individual filed Critical Individual
Publication of GB2015983A publication Critical patent/GB2015983A/en
Application granted granted Critical
Publication of GB2015983B publication Critical patent/GB2015983B/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/245Oxides by deposition from the vapour phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/211SnO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/229Non-specific enumeration
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/152Deposition methods from the vapour phase by cvd
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/36Underside coating of a glass sheet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

This invention relates to transparent glass window structures of the type bearing a first coating 6 of infra-red reflective material, which is advantageously less than about 0.85 microns in thickness, wherein the observance of iridescence resulting from such a first coating is markedly reduced by the provision of a layer 4 of continuously varying refractive index between the glass 2 and the coating 6, such that the refractive index increases continuously from the glass to the first coating, thereby preventing the observation of iridescence. The coatings are applied by passing the substrate through a reaction zone in parallel with a reactive gas mixture which contains components for forming the two coatings, wherein the reaction to form the first coating proceeds more rapidly. A particular advantage of the invention is its efficacy with clear and lightly tinted glasses wherein the problem of iridescent color has had its greatest commercial impact. <IMAGE>
GB7908105A 1978-03-08 1979-03-07 Deposition method Expired GB2015983B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/884,432 US4206252A (en) 1977-04-04 1978-03-08 Deposition method for coating glass and the like

Publications (2)

Publication Number Publication Date
GB2015983A true GB2015983A (en) 1979-09-19
GB2015983B GB2015983B (en) 1983-02-02

Family

ID=25384616

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7908105A Expired GB2015983B (en) 1978-03-08 1979-03-07 Deposition method

Country Status (19)

Country Link
JP (2) JPS54127424A (en)
AR (1) AR216975A1 (en)
AU (1) AU526605B2 (en)
BE (1) BE874614A (en)
BR (1) BR7901379A (en)
CA (1) CA1134214A (en)
CH (1) CH638762A5 (en)
DE (1) DE2908412C2 (en)
DK (1) DK94879A (en)
ES (2) ES478393A1 (en)
FI (1) FI790781A (en)
FR (1) FR2419335A1 (en)
GB (1) GB2015983B (en)
IE (1) IE48228B1 (en)
IT (1) IT1119685B (en)
MX (1) MX151883A (en)
NL (1) NL7901875A (en)
NO (1) NO145947C (en)
SE (1) SE445449B (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4291167A (en) 1980-07-28 1981-09-22 Nalco Chemical Company Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane
FR2516815A1 (en) * 1981-11-20 1983-05-27 Gordon Roy Gerald IMPROVED CHEMICAL COATING DEPOSITION PROCESS
GB2196349A (en) * 1986-10-16 1988-04-27 Glaverbel Vehicle windows and method of manufacturing same
EP0503382A1 (en) * 1991-03-13 1992-09-16 Watkins-Johnson Company Method and apparatus for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
US5221352A (en) * 1989-06-19 1993-06-22 Glaverbel Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
GB2292751A (en) * 1994-09-01 1996-03-06 Balzers Hochvakuum Optical device with a coating having a continuously varying refractive index
WO1997003029A1 (en) * 1995-07-12 1997-01-30 Saint-Gobain Vitrage Glazing including a conductive and/or low-emissive layer
EP0774533A1 (en) * 1995-10-30 1997-05-21 Dow Corning Corporation Method for depositing Si-O containing coatings
US6159871A (en) * 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6287990B1 (en) 1998-02-11 2001-09-11 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6303523B2 (en) 1998-02-11 2001-10-16 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6667553B2 (en) 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
US6709721B2 (en) 2001-03-28 2004-03-23 Applied Materials Inc. Purge heater design and process development for the improvement of low k film properties
US6730593B2 (en) 1998-02-11 2004-05-04 Applied Materials Inc. Method of depositing a low K dielectric with organo silane

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100942A (en) * 1980-12-10 1982-06-23 Asahi Glass Co Ltd Substrate coated with silicon oxide
JPS58112374A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS58112375A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
US4595634A (en) * 1983-08-01 1986-06-17 Gordon Roy G Coating process for making non-iridescent glass
DE4433206A1 (en) * 1994-09-17 1996-03-21 Goldschmidt Ag Th Process for the pyrolytic coating of glass, glass ceramic and enamel products
US5698262A (en) 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
DE19624838A1 (en) * 1996-06-21 1998-01-08 Schueller Glasbeschichtung Gmb Insulating anti-reflective coating and process for its production
FR2787440B1 (en) * 1998-12-21 2001-12-07 Saint Gobain Vitrage TRANSPARENT SUBSTRATE HAVING AN ANTI-REFLECTIVE COATING
US6797388B1 (en) * 1999-03-18 2004-09-28 Ppg Industries Ohio, Inc. Methods of making low haze coatings and the coatings and coated articles made thereby
JP4924070B2 (en) * 2007-02-06 2012-04-25 ブラザー工業株式会社 Printing device
US8728634B2 (en) * 2007-06-13 2014-05-20 Ppg Industries Ohio, Inc. Appliance transparency
FR2956659B1 (en) 2010-02-22 2014-10-10 Saint Gobain LAYER COATED VERTICAL SUBSTRATE WITH IMPROVED MECHANICAL STRENGTH
FR2962852A1 (en) 2010-07-19 2012-01-20 Saint Gobain TRANSPARENT ELECTRODE FOR HIGH-PERFORMANCE PHOTOVOLTAIC CELL
EP2761054B1 (en) * 2011-09-30 2019-08-14 Arkema, Inc. Deposition of silicon oxide by atmospheric pressure chemical vapor deposition
FR2983350A1 (en) * 2011-11-30 2013-05-31 Saint Gobain Transparent electrode for use in front face substrate of photovoltaic cell, has tin and silicon mixed oxide layer with specific thickness, and positioned between electroconducting layer and photovoltaic material

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE841625C (en) * 1942-02-01 1952-06-16 Leitz Ernst Gmbh Process for the production of reflection-reducing layers, e.g. B. on glass
DE742463C (en) * 1942-07-15 1944-01-18 Jenaer Glaswerk Schott & Gen Layer for changing the reflectivity from a plurality of alternately superimposed partial layers made of two substances with different refractive indices
US2602032A (en) * 1946-08-19 1952-07-01 Libbey Owens Ford Glass Co Electrically conducting surface and method for producing same
US2617745A (en) * 1951-12-19 1952-11-11 Pittsburgh Plate Glass Co Method of producing an electroconductive article
US2962388A (en) * 1954-03-12 1960-11-29 Metallgesellschaft Ag Process for the production of titanium carbide coatings
GB1115884A (en) * 1966-03-25 1968-05-29 Standard Telephones Cables Ltd Method for depositing on a substrate coherent solid layers
FR1524729A (en) * 1966-05-27 1968-05-10 Dow Corning Method and apparatus for the continuous production of semiconductor materials
US3808035A (en) * 1970-12-09 1974-04-30 M Stelter Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like
FR2210675B1 (en) * 1972-12-15 1978-05-12 Ppg Industries Inc
GB1507465A (en) * 1974-06-14 1978-04-12 Pilkington Brothers Ltd Coating glass
GB1507996A (en) * 1975-06-11 1978-04-19 Pilkington Brothers Ltd Coating glass
GB1524326A (en) * 1976-04-13 1978-09-13 Bfg Glassgroup Coating of glass

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4291167A (en) 1980-07-28 1981-09-22 Nalco Chemical Company Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane
FR2516815A1 (en) * 1981-11-20 1983-05-27 Gordon Roy Gerald IMPROVED CHEMICAL COATING DEPOSITION PROCESS
GB2196349A (en) * 1986-10-16 1988-04-27 Glaverbel Vehicle windows and method of manufacturing same
US4910088A (en) * 1986-10-16 1990-03-20 Glaverbel Vehicle windows
GB2196349B (en) * 1986-10-16 1991-06-19 Glaverbel Vehicle windows and method of manufacturing same
US5221352A (en) * 1989-06-19 1993-06-22 Glaverbel Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
EP0503382A1 (en) * 1991-03-13 1992-09-16 Watkins-Johnson Company Method and apparatus for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
GB2292751A (en) * 1994-09-01 1996-03-06 Balzers Hochvakuum Optical device with a coating having a continuously varying refractive index
US5648147A (en) * 1994-09-01 1997-07-15 Balzers Aktiengesellschaft optical device and method for coating an optical substrate
GB2292751B (en) * 1994-09-01 1998-03-11 Balzers Hochvakuum Optical device and method for coating an optical substrate
US6354109B1 (en) 1995-07-12 2002-03-12 Saint-Gobain Glass France Process and apparatus for providing a film with a gradient
WO1997003029A1 (en) * 1995-07-12 1997-01-30 Saint-Gobain Vitrage Glazing including a conductive and/or low-emissive layer
US6174599B1 (en) 1995-07-12 2001-01-16 Saint-Gobain Vitrage Glazing panel provided with a conductive and/or low emissivity film
EP0774533A1 (en) * 1995-10-30 1997-05-21 Dow Corning Corporation Method for depositing Si-O containing coatings
US6537929B1 (en) 1998-02-11 2003-03-25 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6303523B2 (en) 1998-02-11 2001-10-16 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6348725B2 (en) 1998-02-11 2002-02-19 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6287990B1 (en) 1998-02-11 2001-09-11 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6541282B1 (en) 1998-02-11 2003-04-01 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6562690B1 (en) 1998-02-11 2003-05-13 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6730593B2 (en) 1998-02-11 2004-05-04 Applied Materials Inc. Method of depositing a low K dielectric with organo silane
US6159871A (en) * 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6593655B1 (en) 1998-05-29 2003-07-15 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6667553B2 (en) 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
US6709721B2 (en) 2001-03-28 2004-03-23 Applied Materials Inc. Purge heater design and process development for the improvement of low k film properties

Also Published As

Publication number Publication date
IE790235L (en) 1979-09-08
NL7901875A (en) 1979-09-11
NO145947B (en) 1982-03-22
DE2908412C2 (en) 1994-01-27
NO790762L (en) 1979-09-11
SE7902052L (en) 1979-09-09
JPS635343B2 (en) 1988-02-03
BR7901379A (en) 1979-10-02
NO145947C (en) 1982-06-30
FR2419335A1 (en) 1979-10-05
JPS54127424A (en) 1979-10-03
GB2015983B (en) 1983-02-02
DK94879A (en) 1979-09-09
AU526605B2 (en) 1983-01-20
SE445449B (en) 1986-06-23
FR2419335B1 (en) 1985-03-22
ES482440A1 (en) 1980-02-16
JPS62191448A (en) 1987-08-21
CH638762A5 (en) 1983-10-14
IE48228B1 (en) 1984-11-14
DE2908412A1 (en) 1979-09-20
MX151883A (en) 1985-04-23
AU4401479A (en) 1979-09-20
FI790781A (en) 1979-09-09
JPH0157061B2 (en) 1989-12-04
BE874614A (en) 1979-09-05
CA1134214A (en) 1982-10-26
IT1119685B (en) 1986-03-10
AR216975A1 (en) 1980-02-15
ES478393A1 (en) 1980-01-16
IT7967488A0 (en) 1979-03-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19980307