JPS54127424A - Improved deposition method - Google Patents

Improved deposition method

Info

Publication number
JPS54127424A
JPS54127424A JP2723879A JP2723879A JPS54127424A JP S54127424 A JPS54127424 A JP S54127424A JP 2723879 A JP2723879 A JP 2723879A JP 2723879 A JP2723879 A JP 2723879A JP S54127424 A JPS54127424 A JP S54127424A
Authority
JP
Japan
Prior art keywords
deposition method
improved deposition
improved
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2723879A
Other languages
Japanese (ja)
Other versions
JPS635343B2 (en
Inventor
Jierarudo Goodon Roi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/884,432 external-priority patent/US4206252A/en
Application filed by Individual filed Critical Individual
Publication of JPS54127424A publication Critical patent/JPS54127424A/en
Publication of JPS635343B2 publication Critical patent/JPS635343B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/229—Non-specific enumeration
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/36—Underside coating of a glass sheet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2723879A 1978-03-08 1979-03-08 Improved deposition method Granted JPS54127424A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/884,432 US4206252A (en) 1977-04-04 1978-03-08 Deposition method for coating glass and the like

Publications (2)

Publication Number Publication Date
JPS54127424A true JPS54127424A (en) 1979-10-03
JPS635343B2 JPS635343B2 (en) 1988-02-03

Family

ID=25384616

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2723879A Granted JPS54127424A (en) 1978-03-08 1979-03-08 Improved deposition method
JP61293328A Granted JPS62191448A (en) 1978-03-08 1986-12-09 Glass structure

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP61293328A Granted JPS62191448A (en) 1978-03-08 1986-12-09 Glass structure

Country Status (19)

Country Link
JP (2) JPS54127424A (en)
AR (1) AR216975A1 (en)
AU (1) AU526605B2 (en)
BE (1) BE874614A (en)
BR (1) BR7901379A (en)
CA (1) CA1134214A (en)
CH (1) CH638762A5 (en)
DE (1) DE2908412C2 (en)
DK (1) DK94879A (en)
ES (2) ES478393A1 (en)
FI (1) FI790781A (en)
FR (1) FR2419335A1 (en)
GB (1) GB2015983B (en)
IE (1) IE48228B1 (en)
IT (1) IT1119685B (en)
MX (1) MX151883A (en)
NL (1) NL7901875A (en)
NO (1) NO145947C (en)
SE (1) SE445449B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100942A (en) * 1980-12-10 1982-06-23 Asahi Glass Co Ltd Substrate coated with silicon oxide
JPS58112374A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS58112375A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS58501946A (en) * 1981-11-20 1983-11-17 ゴ−ドン　ロイ　ジエラルド Coating method using reactants containing alkoxy-substituted silicon
JPS60502002A (en) * 1983-08-01 1985-11-21 ゴ−ドン　ロイ　ジエラルド Coating method for producing non-pearlescent glass structures
JP2000211948A (en) * 1998-12-21 2000-08-02 Saint Gobain Vitrage Transparent substrate bearing antireflective coating film
JP2010532281A (en) * 2007-06-13 2010-10-07 ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド Transparency for instruments

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4291167A (en) 1980-07-28 1981-09-22 Nalco Chemical Company Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane
GB8624825D0 (en) * 1986-10-16 1986-11-19 Glaverbel Vehicle windows
US5221352A (en) * 1989-06-19 1993-06-22 Glaverbel Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
US5122391A (en) * 1991-03-13 1992-06-16 Watkins-Johnson Company Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
CH690511A5 (en) * 1994-09-01 2000-09-29 Balzers Hochvakuum An optical component and method for manufacturing such.
DE4433206A1 (en) * 1994-09-17 1996-03-21 Goldschmidt Ag Th Process for the pyrolytic coating of glass, glass ceramic and enamel products
FR2736632B1 (en) 1995-07-12 1997-10-24 Saint Gobain Vitrage GLAZING PROVIDED WITH A CONDUCTIVE AND / OR LOW-EMISSIVE LAYER
TW328971B (en) * 1995-10-30 1998-04-01 Dow Corning Method for depositing Si-O containing coatings
US5698262A (en) 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
DE19624838A1 (en) * 1996-06-21 1998-01-08 Schueller Glasbeschichtung Gmb Insulating anti-reflective coating and process for its production
US6303523B2 (en) 1998-02-11 2001-10-16 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6287990B1 (en) 1998-02-11 2001-09-11 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6054379A (en) 1998-02-11 2000-04-25 Applied Materials, Inc. Method of depositing a low k dielectric with organo silane
US6667553B2 (en) 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
US6159871A (en) * 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6797388B1 (en) * 1999-03-18 2004-09-28 Ppg Industries Ohio, Inc. Methods of making low haze coatings and the coatings and coated articles made thereby
US6709721B2 (en) 2001-03-28 2004-03-23 Applied Materials Inc. Purge heater design and process development for the improvement of low k film properties
JP4924070B2 (en) * 2007-02-06 2012-04-25 ブラザー工業株式会社 Printing device
FR2956659B1 (en) 2010-02-22 2014-10-10 Saint Gobain LAYER COATED VERTICAL SUBSTRATE WITH IMPROVED MECHANICAL STRENGTH
FR2962852A1 (en) 2010-07-19 2012-01-20 Saint Gobain TRANSPARENT ELECTRODE FOR HIGH-PERFORMANCE PHOTOVOLTAIC CELL
US20140227512A1 (en) * 2011-09-30 2014-08-14 Arkema Inc. Deposition of silicon oxide by atmospheric pressure chemical vapor deposition
FR2983350A1 (en) * 2011-11-30 2013-05-31 Saint Gobain Transparent electrode for use in front face substrate of photovoltaic cell, has tin and silicon mixed oxide layer with specific thickness, and positioned between electroconducting layer and photovoltaic material

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4989717A (en) * 1972-12-15 1974-08-27
JPS5244829A (en) * 1975-06-11 1977-04-08 Pilkington Brothers Ltd Method and apparatus for covering glass
JPS52124440A (en) * 1976-04-13 1977-10-19 Bfg Glassgroup Method of forming metal or metal compound on surface of glass substrate and device used for forming such coat

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE841625C (en) * 1942-02-01 1952-06-16 Leitz Ernst Gmbh Process for the production of reflection-reducing layers, e.g. B. on glass
DE742463C (en) * 1942-07-15 1944-01-18 Jenaer Glaswerk Schott & Gen Layer for changing the reflectivity from a plurality of alternately superimposed partial layers made of two substances with different refractive indices
US2602032A (en) * 1946-08-19 1952-07-01 Libbey Owens Ford Glass Co Electrically conducting surface and method for producing same
US2617745A (en) * 1951-12-19 1952-11-11 Pittsburgh Plate Glass Co Method of producing an electroconductive article
US2962388A (en) * 1954-03-12 1960-11-29 Metallgesellschaft Ag Process for the production of titanium carbide coatings
GB1115884A (en) * 1966-03-25 1968-05-29 Standard Telephones Cables Ltd Method for depositing on a substrate coherent solid layers
FR1524729A (en) * 1966-05-27 1968-05-10 Dow Corning Method and apparatus for the continuous production of semiconductor materials
US3808035A (en) * 1970-12-09 1974-04-30 M Stelter Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like
GB1507465A (en) * 1974-06-14 1978-04-12 Pilkington Brothers Ltd Coating glass

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4989717A (en) * 1972-12-15 1974-08-27
JPS5244829A (en) * 1975-06-11 1977-04-08 Pilkington Brothers Ltd Method and apparatus for covering glass
JPS52124440A (en) * 1976-04-13 1977-10-19 Bfg Glassgroup Method of forming metal or metal compound on surface of glass substrate and device used for forming such coat

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100942A (en) * 1980-12-10 1982-06-23 Asahi Glass Co Ltd Substrate coated with silicon oxide
JPS58501946A (en) * 1981-11-20 1983-11-17 ゴ−ドン　ロイ　ジエラルド Coating method using reactants containing alkoxy-substituted silicon
JPS58112374A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS58112375A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS6246075B2 (en) * 1981-12-25 1987-09-30 Fuji Denki Sogo Kenkyusho Kk
JPS6246074B2 (en) * 1981-12-25 1987-09-30 Fuji Denki Sogo Kenkyusho Kk
JPS60502002A (en) * 1983-08-01 1985-11-21 ゴ−ドン　ロイ　ジエラルド Coating method for producing non-pearlescent glass structures
JP2589289B2 (en) * 1983-08-01 1997-03-12 ロイ ジエラルド ゴ−ドン Coating method for producing non-pearlescent glass structures
JP2000211948A (en) * 1998-12-21 2000-08-02 Saint Gobain Vitrage Transparent substrate bearing antireflective coating film
JP2011032168A (en) * 1998-12-21 2011-02-17 Saint-Gobain Glass France Transparent substrate comprising antireflection coating
JP2010532281A (en) * 2007-06-13 2010-10-07 ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド Transparency for instruments

Also Published As

Publication number Publication date
FR2419335B1 (en) 1985-03-22
NO790762L (en) 1979-09-11
GB2015983B (en) 1983-02-02
IT1119685B (en) 1986-03-10
AU4401479A (en) 1979-09-20
ES482440A1 (en) 1980-02-16
SE7902052L (en) 1979-09-09
IE790235L (en) 1979-09-08
JPH0157061B2 (en) 1989-12-04
IT7967488A0 (en) 1979-03-07
NO145947C (en) 1982-06-30
BR7901379A (en) 1979-10-02
CH638762A5 (en) 1983-10-14
FR2419335A1 (en) 1979-10-05
DK94879A (en) 1979-09-09
JPS635343B2 (en) 1988-02-03
MX151883A (en) 1985-04-23
JPS62191448A (en) 1987-08-21
IE48228B1 (en) 1984-11-14
CA1134214A (en) 1982-10-26
NO145947B (en) 1982-03-22
SE445449B (en) 1986-06-23
BE874614A (en) 1979-09-05
GB2015983A (en) 1979-09-19
DE2908412C2 (en) 1994-01-27
NL7901875A (en) 1979-09-11
DE2908412A1 (en) 1979-09-20
ES478393A1 (en) 1980-01-16
AR216975A1 (en) 1980-02-15
AU526605B2 (en) 1983-01-20
FI790781A (en) 1979-09-09

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