CN1244017A - 非易失性磁存储单元和器件 - Google Patents
非易失性磁存储单元和器件 Download PDFInfo
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- CN1244017A CN1244017A CN99110623A CN99110623A CN1244017A CN 1244017 A CN1244017 A CN 1244017A CN 99110623 A CN99110623 A CN 99110623A CN 99110623 A CN99110623 A CN 99110623A CN 1244017 A CN1244017 A CN 1244017A
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- 230000005291 magnetic effect Effects 0.000 title claims abstract description 91
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 91
- 239000004020 conductor Substances 0.000 claims abstract description 55
- 239000003302 ferromagnetic material Substances 0.000 claims abstract description 17
- 230000002457 bidirectional effect Effects 0.000 claims abstract description 10
- 230000006870 function Effects 0.000 claims description 22
- 238000009413 insulation Methods 0.000 claims description 15
- 229910001291 heusler alloy Inorganic materials 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 12
- 230000004044 response Effects 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- 229910052787 antimony Inorganic materials 0.000 claims description 10
- 229910052718 tin Inorganic materials 0.000 claims description 10
- 229910052738 indium Inorganic materials 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 238000003860 storage Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 229910052727 yttrium Inorganic materials 0.000 claims description 9
- 230000000295 complement effect Effects 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 230000008878 coupling Effects 0.000 claims description 6
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 claims description 5
- 230000010287 polarization Effects 0.000 abstract description 10
- 230000005641 tunneling Effects 0.000 abstract description 4
- 230000005415 magnetization Effects 0.000 description 18
- 239000003990 capacitor Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000005333 ferromagnetic domain Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- -1 Mgo Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000005290 antiferromagnetic effect Effects 0.000 description 1
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- 238000007600 charging Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
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- 230000005611 electricity Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
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- 238000000926 separation method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1659—Cell access
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
- H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
- H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Hall/Mr Elements (AREA)
- Semiconductor Memories (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
Claims (44)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/129827 | 1998-08-05 | ||
US09/129,827 US6034887A (en) | 1998-08-05 | 1998-08-05 | Non-volatile magnetic memory cell and devices |
US09/129,827 | 1998-08-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1244017A true CN1244017A (zh) | 2000-02-09 |
CN1221978C CN1221978C (zh) | 2005-10-05 |
Family
ID=22441784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB991106237A Expired - Lifetime CN1221978C (zh) | 1998-08-05 | 1999-07-21 | 非易失性磁存储单元和器件 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6034887A (zh) |
JP (1) | JP3533344B2 (zh) |
KR (1) | KR100530715B1 (zh) |
CN (1) | CN1221978C (zh) |
SG (1) | SG77261A1 (zh) |
TW (1) | TW418397B (zh) |
Cited By (20)
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---|---|---|---|---|
CN1308959C (zh) * | 2001-08-01 | 2007-04-04 | 惠普公司 | 包含偏移导体的磁随机存取存储器件 |
CN1316503C (zh) * | 2000-11-23 | 2007-05-16 | 因芬尼昂技术股份公司 | 集成内存以及制造和操作集成内存的方法 |
US7349247B2 (en) | 2001-12-27 | 2008-03-25 | Kabushiki Kaisha Toshiba | Multi-layer magnetic switching element comprising a magnetic semiconductor layer having magnetization induced by applied voltage |
CN100403444C (zh) * | 2002-09-28 | 2008-07-16 | 台湾积体电路制造股份有限公司 | 磁阻式随机存取存储器电路 |
CN100414716C (zh) * | 2002-12-25 | 2008-08-27 | 松下电器产业株式会社 | 磁性开关元件及使用该元件的磁性存储器 |
CN100463208C (zh) * | 2005-11-17 | 2009-02-18 | 旺宏电子股份有限公司 | 包括单字线晶体管的磁性存储元件的系统及其读取和编程方法 |
US7529119B2 (en) | 2004-12-30 | 2009-05-05 | Samsung Electronics Co., Ltd. | Magnetic logic device and methods of manufacturing and operating the same |
CN1524271B (zh) * | 2001-01-31 | 2010-04-28 | 艾沃思宾技术公司 | 内容可寻址磁性随机访问存储器 |
CN102099862A (zh) * | 2008-08-15 | 2011-06-15 | 高通股份有限公司 | 门电平可重配置的磁性逻辑 |
CN102456830A (zh) * | 2010-11-01 | 2012-05-16 | 希捷科技有限公司 | 具有垂直各向异性和增强层的磁性隧穿结单元 |
CN101202302B (zh) * | 2002-07-25 | 2012-08-15 | 科学技术振兴机构 | 基于自旋滤波器效应的自旋晶体管和利用自旋晶体管的非易失存储器 |
CN102867538A (zh) * | 2011-07-07 | 2013-01-09 | 三星电子株式会社 | 磁性结及其使用方法和磁存储器及系统 |
CN103151068A (zh) * | 2007-03-29 | 2013-06-12 | 高通股份有限公司 | 使用自旋转移力矩磁阻装置的软件可编程逻辑 |
CN103295630A (zh) * | 2012-02-13 | 2013-09-11 | 克罗科斯科技公司 | 基于高速磁随机存取存储器的三态cam |
CN103529727A (zh) * | 2013-09-17 | 2014-01-22 | 杭州电子科技大学 | 一种具有非易失性锁存功能的多通道数据缓冲接口芯片 |
CN103593497A (zh) * | 2012-08-13 | 2014-02-19 | 格罗方德半导体公司 | 计算以多磁为基础的设备及最佳化问题的解决方案的方法 |
CN104134455A (zh) * | 2014-07-17 | 2014-11-05 | 北京航空航天大学 | 一种磁逻辑器件的并联编程电路 |
CN104425002A (zh) * | 2013-09-11 | 2015-03-18 | 英特尔公司 | 时钟控制全自旋逻辑电路 |
CN108336137A (zh) * | 2018-01-31 | 2018-07-27 | 许昌学院 | 一种基于MnAs/GaAs界面半金属性的制备工艺 |
CN108470574A (zh) * | 2017-02-23 | 2018-08-31 | 桑迪士克科技有限责任公司 | 自旋累积扭矩磁阻随机存取存储器 |
Families Citing this family (89)
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US6741494B2 (en) * | 1995-04-21 | 2004-05-25 | Mark B. Johnson | Magnetoelectronic memory element with inductively coupled write wires |
US6140838A (en) * | 1995-04-21 | 2000-10-31 | Johnson; Mark B. | High density and high speed magneto-electronic logic family |
JP3050189B2 (ja) * | 1997-10-30 | 2000-06-12 | 日本電気株式会社 | 磁気抵抗効果素子及びその製造方法 |
US6259644B1 (en) * | 1997-11-20 | 2001-07-10 | Hewlett-Packard Co | Equipotential sense methods for resistive cross point memory cell arrays |
US6140139A (en) | 1998-12-22 | 2000-10-31 | Pageant Technologies, Inc. | Hall effect ferromagnetic random access memory device and its method of manufacture |
US6266267B1 (en) * | 1999-03-04 | 2001-07-24 | Pageant Technologies, Inc. | Single conductor inductive sensor for a non-volatile random access ferromagnetic memory |
US6229729B1 (en) | 1999-03-04 | 2001-05-08 | Pageant Technologies, Inc. (Micromem Technologies, Inc.) | Magneto resistor sensor with diode short for a non-volatile random access ferromagnetic memory |
US6330183B1 (en) * | 1999-03-04 | 2001-12-11 | Pageant Technologies, Inc. (Micromem Technologies, Inc.) | Dual conductor inductive sensor for a non-volatile random access ferromagnetic memory |
US6288929B1 (en) | 1999-03-04 | 2001-09-11 | Pageant Technologies, Inc. | Magneto resistor sensor with differential collectors for a non-volatile random access ferromagnetic memory |
US6430660B1 (en) * | 1999-05-21 | 2002-08-06 | International Business Machines Corporation | Unified memory hard disk drive system |
JP3593652B2 (ja) * | 2000-03-03 | 2004-11-24 | 富士通株式会社 | 磁気ランダムアクセスメモリ装置 |
US6388912B1 (en) * | 2000-03-30 | 2002-05-14 | Intel Corporation | Quantum magnetic memory |
JP4477199B2 (ja) * | 2000-06-16 | 2010-06-09 | 株式会社ルネサステクノロジ | 磁気ランダムアクセスメモリ、磁気ランダムアクセスメモリへのアクセス方法および磁気ランダムアクセスメモリの製造方法 |
US6363007B1 (en) * | 2000-08-14 | 2002-03-26 | Micron Technology, Inc. | Magneto-resistive memory with shared wordline and sense line |
DE10043947A1 (de) * | 2000-09-06 | 2002-04-04 | Infineon Technologies Ag | Integrierte Schaltungsanordnung |
JP4656720B2 (ja) * | 2000-09-25 | 2011-03-23 | ルネサスエレクトロニクス株式会社 | 薄膜磁性体記憶装置 |
JP4726290B2 (ja) * | 2000-10-17 | 2011-07-20 | ルネサスエレクトロニクス株式会社 | 半導体集積回路 |
DE10053206C1 (de) * | 2000-10-26 | 2002-01-17 | Siemens Ag | Logikschaltungsanordnung |
US6452240B1 (en) * | 2000-10-30 | 2002-09-17 | International Business Machines Corporation | Increased damping of magnetization in magnetic materials |
EP1345277A4 (en) * | 2000-12-21 | 2005-02-16 | Fujitsu Ltd | MAGNETORESISTIVE COMPONENT, MAGNETIC HEAD AND MAGNET PLATE PLAYER |
KR100390977B1 (ko) * | 2000-12-28 | 2003-07-12 | 주식회사 하이닉스반도체 | 반도체소자의 제조방법 |
JP3677455B2 (ja) | 2001-02-13 | 2005-08-03 | Necエレクトロニクス株式会社 | 不揮発性磁気記憶装置およびその製造方法 |
DE10110292C1 (de) * | 2001-02-26 | 2002-10-02 | Dresden Ev Inst Festkoerper | Stromabhängiges resistives Bauelement |
DE10113787C1 (de) * | 2001-03-21 | 2002-09-05 | Siemens Ag | Logikschaltungsanordnung |
JP2002299575A (ja) * | 2001-03-29 | 2002-10-11 | Toshiba Corp | 半導体記憶装置 |
US6657888B1 (en) * | 2001-05-11 | 2003-12-02 | Board Of Regents Of The University Of Nebraska | Application of high spin polarization materials in two terminal non-volatile bistable memory devices |
DE10123593C2 (de) * | 2001-05-15 | 2003-03-27 | Infineon Technologies Ag | Magnetische Speicheranordnung |
DE10123820C2 (de) * | 2001-05-16 | 2003-06-18 | Infineon Technologies Ag | Verfahren zur Herstellung eines TMR-Schichtsystems mit Diodencharakteristik und MRAM-Speicheranordnung |
JP2002368196A (ja) * | 2001-05-30 | 2002-12-20 | Internatl Business Mach Corp <Ibm> | メモリセル、記憶回路ブロック、データの書き込み方法及びデータの読み出し方法 |
US6510080B1 (en) * | 2001-08-28 | 2003-01-21 | Micron Technology Inc. | Three terminal magnetic random access memory |
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US6538917B1 (en) * | 2001-09-25 | 2003-03-25 | Hewlett-Packard Development Company, L.P. | Read methods for magneto-resistive device having soft reference layer |
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KR100827517B1 (ko) * | 2001-12-07 | 2008-05-06 | 주식회사 하이닉스반도체 | 자기 저항 램 |
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US6548849B1 (en) * | 2002-01-31 | 2003-04-15 | Sharp Laboratories Of America, Inc. | Magnetic yoke structures in MRAM devices to reduce programming power consumption and a method to make the same |
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- 1999-07-13 JP JP19853299A patent/JP3533344B2/ja not_active Expired - Fee Related
- 1999-07-21 CN CNB991106237A patent/CN1221978C/zh not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
JP3533344B2 (ja) | 2004-05-31 |
CN1221978C (zh) | 2005-10-05 |
SG77261A1 (en) | 2000-12-19 |
US6034887A (en) | 2000-03-07 |
TW418397B (en) | 2001-01-11 |
KR20000017086A (ko) | 2000-03-25 |
KR100530715B1 (ko) | 2005-11-28 |
JP2000082791A (ja) | 2000-03-21 |
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