CN110160614B - 用于透析机储液器的载荷悬挂与称量系统 - Google Patents
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Abstract
一种用于便携式透析机的可拆卸储液器单元的载荷悬挂与称量系统,包括居中的挠曲组件。所述挠曲组件包括磁体和若干挠曲环,这些挠曲环允许磁体围绕固定电路板移动。随着磁体相对于电路板移动,电路板中的传感器感测磁场的变化。磁场变化产生电压输出,该电压输出被处理器用于产生重量计算值。挠曲组件的顶部附接至透析机的内部。整个储液器单元被附接至挠曲组件的底部的第一内架悬挂。在储液器单元上方布置单个挠曲组件,以提供更精确的重量测量值,同时还能防止组件被溢出的水损坏。
Description
本申请是申请日为2013年11月5日、申请号为201380072668.0(PCT/US2013/068506)、发明名称为“用于透析机储液器的载荷悬挂与称量系统”的发明专利申请的分案申请。
技术领域
本发明总体涉及便携式透析系统。更确切地说,本发明涉及一种用于便携式透析机的可拆卸储液器单元的载荷悬挂与称量系统。
背景技术
用于进行血液透析、血液透析滤过或血液滤过的血液净化系统涉及通过具有半透膜的交换器进行血液体外循环。这种系统还包括用于循环血液的液压系统和用于循环代替流体或透析液的液压系统,这种流体或透析液包括浓度接近于健康人体的血液中的电解质浓度的血液电解质。但是,大多数常规型的现有血液净化系统的尺寸相当巨大,并且难以操作。而且,这些系统的设计使其很笨重,不利于一次性部件的使用和安装。
利用医院中的已安装设备进行的标准透析治疗包括两个阶段,即,(a)透析,在此阶段中,有毒物质和渣滓(通常为小分子)从血穿过半透膜进入透析液;和(b)超滤,在此阶段中,血液回路与透析液回路之间的压差(更确切地说是后一个回路中的压降)导致水中的血液含量减少预定的量。
使用标准设备进行的透析过程除了需要患者长时间待在透析中心外,还往往很麻烦并且费用很高。虽然已经发展出了便携式透析系统,但是常规的便携式透析系统有一些缺点。首先,它们不是充分模块化的,因而系统的设置、移动、运输和维护不太容易。其次,系统没有经过足够的简化,因而患者难以可靠、准确地使用。系统的使用一次性部件的接口和方法在患者使用时易被误用和/或错用。真正有效的便携式透析系统应易于非卫生保健专用的用户轻松使用,并且对一次性输入和数据输入有充分限制,以防止误用。
还需要一种能够以安全、经济高效和可靠的方式有效地提供透析系统的功能的便携式系统。更准确地说,需要一种紧凑的透析流体储集系统,该系统能够满足透析过程的液体输送要求,同时在其中集成有多种其它的关键功能,例如流体加热、流体计量和监测、泄漏检测、以及中断检测。该储集系统必须一致并精确地称重,以确保储液器中的水量始终是已知的,并且可根据计算的水位施加体积控制。另外,由于储集系统需要由用户插入透析机中以及从透析机上拆卸,因此它必须配置为能够最大限度地降低由重量测量系统上的储液盘的不正确定位或漏水产生的重量测量值的变化。因此,需要一种能够有效地测量储集系统中的液位的重量测量系统。
为了满足这些需求,由本发明的申请人于2011年2月8日提交的标题为“PortableDialysis Machine(便携式透析机)”的美国专利申请13/023,490说明了一种透析机,其包括:控制器单元,其中,该控制器单元包括:具有内面的门;具有面板的外壳,该外壳和面板限定凹入区域,该凹入区域配置为接收所述门的所述内面;和,固定附接至所述面板的阀组接收装置;底座单元,其中,该底座单元包括:用于接收流体容器的平面;与所述平面集成的标尺;与所述平面通过热力相通的加热器;和,与所述平面通过电磁相通的钠传感器。该专利申请的内容通过完整引用结合在此。
所述透析机包括用于储存非灭菌水的储液器单元。在透析机开始工作时,水经过吸附过滤过程,然后经过透析过程,最终返回到储液器。所述透析机还包括用于柔性地接收和悬挂储液盘和测量水的重量的挠曲系统。该挠曲系统包括四个挠曲部分,每个挠曲部分处于长方形储液盘的一个角落处,并且集成有霍尔传感器。据发现,该四角型挠曲系统具有一些可以改进的功能。更准确地说,使用该四角型挠曲系统时,由于对四个挠曲单元的数据进行平均操作会引起系统振动和蠕变,因而可能导致称重不精确。因此,需要一种经过改进的、能够降低称重不精确性的储液器单元重量测量系统。
发明内容
本说明书针对一种用于称量和悬挂载荷的挠曲组件。在一个实施例中,该挠曲组件包括具有多个第一磁体的顶部组件、以及具有多个第二磁体的底部组件,其中,所述的多个第一磁体和多个第二磁体在挠曲组件内部产生磁场。该组件还包括布置在顶部组件和底部组件之间的电路板。该电路板具有多个磁场传感器和一处理器。所述组件具有附接至顶部组件并处于顶部组件和电路板之间的至少一个环(即,挠曲环)。所述挠曲环具有至少一个曲臂,该曲臂允许顶部组件相对于电路板并与底部组件一起移动,尤其是竖向移动。还有至少一个环(即,第二挠曲环)附接至底部组件,并布置在底部组件与电路板之间。第二挠曲环具有至少一个曲臂,该曲臂允许底部组件相对于电路板并与顶部组件一起移动,尤其是竖向移动。
在一个实施例中,所述挠曲组件包括布置在顶部组件与电路板之间的两个挠曲环以及布置在底部组件与电路板之间的两个挠曲环。
在一个实施例中,所述顶部组件适合于附接至透析机的附接点。所述附接点沿竖轴布置,并穿过所述透析机的中心。在一个实施例中,所述底部组件适合于附接至透析机的第一内架的附接点。所述第一内架的附接点沿竖轴布置,并穿过所述透析机的中心。
在一个实施例中,所述挠曲组件包括布置在所述至少一个挠曲环之中的每一个与所述电路板之间的至少一个隔圈元件。
在一个实施例中,所述挠曲组件还包括铜材,其中,所述铜材适合于对从挠曲组件悬挂并附接至底部组件的结构的机械振动产生磁性阻尼。
在一个实施例中,所述挠曲环包括铝。
本说明书还针对一种用于称量和悬挂透析机的储液器单元的载荷的方法,该方法包括以下步骤:提供挠曲组件,所述挠曲组件附接至沿所述透析机的竖轴布置的某个点,其中,所述挠曲组件包括具有多个第一磁体的顶部组件和具有多个第二磁体的底部组件。所述多个第一磁体和多个第二磁体在所述挠曲组件内产生磁场。在顶部组件与底部组件之间布置有电路板,并且该电路板包括多个磁场传感器和一个处理器。至少一个挠曲环附接至顶部组件,并布置在顶部组件与电路板之间。所述至少一个挠曲环具有至少一个曲臂,该曲臂允许顶部组件相对于电路板并与底部组件一起移动,尤其是竖向移动。至少一个第二挠曲环附接至底部组件,并布置在底部组件与电路板之间。所述至少一个第二挠曲环具有至少一个曲臂,该曲臂允许底部组件相对于电路板并与顶部组件一起移动,尤其是竖向移动。称重和悬挂过程还包括向所述挠曲组件的底部组件施加载荷的步骤,其中,施加的载荷拉在挠曲组件上,导致电路板周围的磁场发生位移,使用多个传感器感测磁场的位移,产生从传感器传送至处理器的电压输出,以及使用所述处理器根据所述电压输出确定重量测量值。
本说明书还针对一种用于称量和悬挂透析机中的载荷的系统,所述系统包括:附接至所述透析机的内部的挠曲组件,所述挠曲组件包括:包括多个第一磁体的顶部组件;包括多个第二磁体的底部组件,其中,所述多个第一磁体和所述多个第二磁体在所述挠曲组件内产生磁场;布置在所述顶部组件和所述底部组件之间并包括多个磁场传感器和一个处理器的电路板;附接至所述顶部组件并处于所述顶部组件与所述电路板之间的至少一个挠曲环,所述至少一个挠曲环包括至少一个曲臂,该曲臂允许所述顶部组件相对于所述电路板并与所述底部组件一起移动;和,附接至所述底部组件并处于所述底部组件与所述电路板之间的至少一个挠曲环,所述至少一个挠曲环包括至少一个曲臂,该曲臂允许所述底部组件相对于所述电路板并与所述顶部组件一起移动;附接至所述底部组件的第一内架,所述第一内架包括:附接至所述底部组件的顶板;配置为以可滑动的方式接收储液器单元的至少两条轨道;和,具有多个电接触元件的背板,所述电接触元件配置为与所述储液器单元的接触板物理接触和电接触;和,独立于所述第一内架和挠曲组件单独附接至所述透析机的内部的第二内架,所述第二内架包括:附接至所述透析机的顶部;配置为以可滑动的方式接收天花板架的至少两条轨道,所述天花板架包括:配置为安置在所述储液器单元内并包含液体的衬袋;用于从所述储液器单元排出所述液体的至少一根管;和,用于使所述液体返回至所述储液器单元的至少一根管。
在一个实施例中,所述系统包括布置在所述顶部组件与所述电路板之间的两个挠曲环以及布置在所述底部组件与所述电路板之间的两个挠曲环。
在一个实施例中,所述挠曲组件的顶部组件适合于附接至透析机的附接点,其中,所述附接点沿竖轴布置,并穿过所述透析机的中心。在一个实施例中,所述挠曲组件的底部组件适合于附接至透析机的第一内架,其中,第一内架的所述附接点沿竖轴布置,并穿过所述透析机的中心。
在一个实施例中,所述挠曲组件包括布置在所述至少一个挠曲环之中的每一个与所述电路板之间的至少一个隔圈元件。
在一个实施例中,所述挠曲组件还包括铜材,其中,所述铜材适合于对从挠曲组件悬挂并附接至底部组件的结构的机械振动产生磁性阻尼。
在一个实施例中,所述挠曲组件的挠曲环包括铝。
本说明书还针对一种具有用于称量和悬挂载荷的组件的透析系统。所述组件包括:1)第一部件,其包括多个第一磁体,例如1、2、3、4、5、6、7、8、9、10个或更多个磁体;2)第二部件,其包括多个第二磁体,例如1、2、3、4、5、6、7、8、9、10个或更多个磁体,其中,多个第一磁体和多个第二磁体在所述组件内产生磁场;和3)电路板,其布置在第一部件和第二部件之间,并包括一处理器以及用于根据所述磁场的变化输出电压的多个磁场传感器,例如1、2、3、4、5、6、7、8、9、10个或更多个传感器,其中,所述处理器配置为从所述传感器接收电压输出,并根据该电压输出来输出重量测量值。
可选地,所述透析系统还包括附接至第一部件并处于第一部件与电路板之间的至少一个挠曲结构,所述至少一个挠曲结构包括允许第一部件相对于电路板移动的至少一个弯曲构件。所述透析系统还包括附接至第二部件并处于第二部件与电路板之间的至少一个挠曲结构,所述至少一个挠曲结构包括允许第二部件相对于电路板移动的至少一个弯曲构件。
可选地,所述透析系统还包括附接至第二部件的第一内架,所述第一内架具有附接至第二部件的顶板、配置为以可滑动的方式接收储液器单元的至少两条轨道、以及具有多个电接触元件的板,所述多个电接触元件配置为与储液器单元上的接触板物理接触和电接触。
本发明的上述实施方式和其它实施方式将通过附图和下文的详细说明来更深入地描述。
附图说明
通过参照附图做出的下述详细说明,能够更好地理解本发明的这些特性和优点以及其它特性和优点。在附图中:
图1A是处于分解状态的挠曲组件的一个实施例的示意图,示出了该组件的各个部件;
图1B是图1A的处于分解状态的挠曲组件的实施例的示意图,进一步示出了用于在透析机内安装该组件的标尺支架和盘固定座;
图2是挠曲组件的星形顶部中心环的一个实施例的示意图,示出了三根辐条,在每根辐条的端部中布置有磁体;
图3是挠曲组件的圆形下部螺纹中心环的一个实施例的示意图,示出了布置在环的外周中的三个磁体;
图4A是挠曲组件的挠曲环的一个实施例的示意图;
图4B是本发明的一个实施例的承载18公斤载荷的挠曲环的最小和最大应力点的示意图;
图4C是本发明的一个实施例的承载18公斤载荷的挠曲环的最小和最大应变点的示意图;
图4D是本发明的一个实施例的承载18公斤载荷的挠曲环的最小和最大位移点的示意图;
图5是2024-T3铝材在室温下的应力与应变曲线关系的示意图;
图6A是挠曲组件的储液器组件控制器板的一个实施例的示意图,示出了板的底面;
图6B是图6A的挠曲组件的储液器组件控制器板的实施例的示意图,示出了板的顶面;
图7是已组装好的挠曲组件的一个实施例的俯视图;
图8是已组装好的挠曲组件的一个实施例的截面侧视图;
图9是透析机的已组装好的挠曲组件和标尺支架的一个实施例的斜向俯视图;
图10是图9的已组装好的挠曲组件和标尺支架的实施例的截面侧视图;
图11是透析机的已组装好的挠曲组件和盘吊架的一个实施例的斜向仰视图;
图12是图11的已组装好的挠曲组件和盘吊架的实施例的截面侧视图;
图13A是透析机的一个实施例的前视图,示出了其中的挠曲组件以及第一和第二框;
图13B是图13A的透析机的一个实施例的侧视图,示出了其中的挠曲组件以及第一和第二框;
图14A是挠曲组件的磁体和霍尔传感器的一个实施例的框图,示出了在该组件处于未加载状态时零磁性平面的相对位置;
图14B是挠曲组件的磁体和霍尔传感器的一个实施例的框图,示出了在该组件载有空储液盘时零磁性平面的相对位置;
图14C是挠曲组件的磁体和霍尔传感器的一个实施例的框图,示出了在该组件载有半满储液盘时零磁性平面的相对位置;和,
图14D是挠曲组件的磁体和霍尔传感器的一个实施例的框图,示出了在该组件载有满储液盘时零磁性平面的相对位置。
具体实施方式
本说明书针对一种用于便携式透析机的储液器单元的载荷悬挂与称量系统。在一个实施例中,所述系统包括单个居中布置的挠曲组件,而不是分别布置在长方形储液器单元的每个角处的四个独立的挠曲部分,因而该系统能够消除因对独立的挠曲数据进行平均处理而引起的称重不精确性。在一个实施例中,所述挠曲组件安装到限定透析机中的底座单元的框架的顶部下表面上。在一个实施例中,所述挠曲组件包括安装板、磁体、挠曲环、隔圈和电路板。电路板上的廉价霍尔传感器以阻性方式感测由磁体的移动产生的磁场变化,以计算重量测量值。电路板和霍尔传感器是固定不动的,而两组磁体(一组在板的上方,另一组在板的下方)相对于板沿竖向移动,并且相对于彼此固定不动。在施加重物时,随着这些磁体的移动,霍尔传感器感测磁场变化。磁场的变化导致霍尔传感器的电压输出。电路板上的处理器对电压输出进行处理,以确定重量。使用具有一个运动轴线的挠曲组件提供一个标尺系统,该标尺系统成本低、可靠、稳固、并且易于组装和集成到透析机中。
用于支撑储液器单元的第一内架安装到挠曲组件的下侧上。在一个实施例中,所述第一内架包括顶板、容纳电接触元件的背板、以及悬挂储液器单元的两条轨道。储液器单元滑动到第一内架的轨道上,并停置在透析机中,从而储液器单元的插入侧上的电接触板与第一内架的电接触元件物理接触并对正。通过与第一内架集成并布置在储液器单元的上方,挠曲组件提供精确、一致的储液器内容物重量测量值,并避免被从储液器中溢出的液体损坏。
本说明书公开了多个实施例。以下公开内容之目的是使本领域普通技术人员能够实践所述的实施例。在本说明书中使用的语言应按本文中所用的术语的含义理解,不应理解为排除任何特定的实施方式或用于限制所附的权利要求。在不脱离本发明的精神和范围的前提下,在此定义的总体原则也可适用于其它实施方式和应用。而且,所用的术语和用语仅用于说明示例性实施方式的目的,不应理解为限制性的。因此,本说明书应按涵盖与所揭示的原理和特性相符的众多可替代方案、修改方案和等效方案的最宽范围来理解。为了清楚起见,未详细说明与本发明相关的技术领域中所公知的技术材料的细节,以免使本发明变得难以理解。
图1A和1B是处于分解状态的挠曲组件100的一个实施例的示意图,示出了组件100的各个部件。从图1B能够看出,组件100连接至标尺支撑板102,该标尺支撑板102适合于通过顶部环夹110连接至透析机的框架。在一个实施例中,顶部环夹110通过穿过支架102并进入夹子110的孔中的六个螺钉104固定至标尺支架102。两个柱销107插入到挠曲组件100的顶部中心环105中,从而提供用于使挠曲组件100的部件对位并固定在一起的装置。
请参考图1A和1B,顶部中心环105在其中心有孔,用于中心螺钉106穿过。中心螺钉106从挠曲组件100的底部穿至中心环135,从而把整个挠曲组件100固定在一起。顶部环夹110由螺钉111固定至底部螺纹环夹130。顶部环夹110优选安装到透析机的外壳架上,该外壳架是中央架,透析机的至少一个底部单元的外壳形成在该中央架的周围,从而确保施加在系统上的任何载荷都被通过载荷与悬挂组件直接传递至透析机内的最结实结构上,以避免载荷作用在脆弱的结构上,例如储液器组件控制器板125。
在一个实施例中,顶部中心环105是辐条结构,包括内部中心轮毂和从其延伸的三根辐条。顶部环夹110是环形的,并包括多个螺钉111,螺钉111穿过沿组件100的其余部件的外周的孔,并固定至相应的底部环夹130。挠曲组件100在底部中心环135处固定至第一内架198。请参考图1B,第一内架198包括盘固定座137,盘固定座137在其中心附近有四个螺钉孔139。螺钉穿过盘固定座137中的孔139,并固定至底部螺纹中心环135内的相应螺钉孔中。
在一个实施例中,除了用于附接至挠曲组件的顶板构件外,第一内架198还包括用于悬挂储液器单元的两条轨道以及具有电接触元件的背板。在一个实施例中,储液器单元包括布置在其插入侧的电接触板,当储液器单元被完全插入透析机中时,该电接触板与第一内架的接触元件接触。第二内架悬挂天花板架,该天花板架包括用于容纳储液器中的液体的袋子,以及用于从储液器排出液体和使液体返回至储液器的配管。第二内架独立于第一内架单独附接至透析机,并且不参与重量测量值的计算。
载荷称量和悬挂组件100(又称为挠曲组件100)还包括多个挠曲结构。挠曲结构是具有基本平坦的部分以及处于与该基本平坦部分正交的平面中的构件、臂、结构或其它挠曲或弯曲部件的任何部件。在一个实施例中,所述挠曲结构是挠曲环115,该挠曲环115具有布置在居中的储液器组件控制器板125上方的至少一个挠曲环115A和布置在板125下方的至少一个挠曲环115B。在一个优选实施例中,两个挠曲环115A布置在居中的储液器组件控制器板125的上方,两个挠曲环115B布置在板125的下方。从图1A和1B能够看出,挠曲环115A、115B由布置在板125上方的上隔圈121和布置在板125下方的下隔圈122从储液器组件控制器板125隔开。挠曲环115A、115B容纳在顶部环夹110与储液器组件控制器板125上方的上隔圈121之间以及底部环夹130与板125下方的下隔圈122之间。在储液器组件控制器板125的中心孔中还容纳有中心隔圈120。
虽然图1A和1B所示的挠曲组件100仅有处于储液器组件控制器板125上方的一个环形隔圈121以及处于储液器组件控制器板125下方的一个隔圈122,但是可以使用任意数目的间隔装置,并且虽然间隔装置优选是圆形或环形的,但是间隔装置也可为不同的形状。间隔装置配置为把挠曲组件的部件正确配装在一起。在一个实施例中,间隔装置由通用的铝材制成。在一个优选实施例中,隔圈是环形的,在中心处有间隙孔,以确保挠曲臂与储液器组件控制器板之间有间隙。在一个实施例中,上隔圈121的厚度为0.1至0.3英寸,下隔圈122的厚度小于上隔圈的厚度,在0.05至0.2英寸范围之内。
在一个实施例中,挠曲环115具有曲臂,当储液器的重量发生变化时,该曲臂允许磁体在挠曲组件100内移动,尤其是竖向移动。表征磁场变化的信号被储液器组件控制器板125处理,以产生重量测量值。磁体通过粘胶固定至挠曲组件100的顶部中心环105上和底部中心环135上。
图2是挠曲组件的星形顶部中心环205的一个实施例的示意图,示出了三根辐条210,每根辐条连接至圆形轮毂219,在每根辐条210的端部内布置和/或嵌入有一个磁体215。图中还示出了柱销孔209和中心螺钉孔208。磁体215在每根辐条210的端部处按120°彼此间隔布置。
图3是挠曲组件的圆形底部螺纹中心环335的一个实施例的示意图,示出了布置在环335的外周中的三个磁体315。当从底部环335的中心测量时,这些磁体是按120°彼此间隔布置的。图中还示出了用于接收螺钉339、柱销309和中心螺钉308的孔。底部中心环335把附接的储液器结构的载荷传递至整个组件。在其它不同的实施例中,在顶部中心环和底部中心环中利用的磁体可多于或少于三个,只要每个环包含相同数目的磁体,并且磁体对正同一个竖轴。
在一个实施例中,顶部中心环和底部螺纹中心环中的每个磁体215、315是钕制(NdFeB)N42级盘状磁体,其实测直径为0.5英寸,厚度为0.125英寸。在一个实施例中,在组装前,磁体215、315被加热预定时间,以通过加热来处理随着时间的推移自然发生的不可逆的磁损耗。在一个实施例中,在组装前,对磁体烘烤100小时以上。在挠曲组件组装好后,立即把顶部中心环和底部螺纹中心环相对布置好,使得顶部中心环的每个磁体215处于底部中心环的相应磁体315的正上方。在组装好的系统中,优选在顶部中心环的每个磁体215与底部中心环的每个相应磁体315之间形成恒定的间距或间隙。在一个实施例中,所述恒定间隙在标称平面内在0.4至1.0之间,更具体地说,大约为0.7英寸。
使用在此所公开的挠曲组件会导致对现有技术出现的机械振动进行磁性阻尼。更确切地说,利用臂的形状以及磁体的布置,可对所有磁体的读数进行平均处理,从而改善整个组件的平衡。磁体的布置还有利于在系统的移动和振动过程中对测量进行平均。另外,如下文所述,电路板的覆铜产生磁场,该磁场可对由组件内的涡流导致的振动产生阻尼作用。
图4A是挠曲组件的挠曲环400的一个实施例的示意图。在一个实施例中,每个挠曲环400包括三根梁或曲臂405,当重量施加在挠曲组件上时,这些梁或曲臂405在同一个平面内弯曲,并允许环415的中心在竖向平面内位移。每根臂405在一端连接至大致为三角形的轮毂415,在另一端连接至圆形外环425。每根臂405优选具有第一直线部405A,该第一直线部405A的一端连接至环425,另一端终止在曲线部405B。曲线部405B连接至第二直线部405C,第二部405C的另一端终止在第二曲线部405D,第二曲线部405D附接至中心轮毂415。每个挠曲环包括处于圆形外环中的多个螺钉孔410,螺钉穿过这些螺钉孔410,从而把挠曲组件的部件固定在一起。在其它实施例中,可根据磁体的布置位置和数目采用有变化的挠曲环形状。在一个实施例中,挠曲环400由2024-T3铝材制成,并且不含不锈钢,因为不锈钢不能防止材料在施加的力的作用下随着时间的蠕变或变形。2024-T3铝材具有50000-55000PSI的高屈服强度和大约10600000PSI的弹性模量。在一个实施例中,所述挠曲组件能够计算25公斤以下的重量测量值。在一个实施例中,储液器内容物的工作重量在17和18公斤之间。
图4B示出了本发明的一个实施例的承载18公斤载荷的挠曲环400上的最小应力点450和最大应力点455。在一个实施例中,使用两组挠曲环(每组两个相邻挠曲环)的平行配置,每个挠曲环由2024-T3铝材制成,并按如图4B所示配置,18公斤中心载荷在点450处产生0.0PSI最小应力,在点455处产生37860.0PSI最大应力,或者大约37600PSI最大应力。当从每个环的外周向内移动时,观察到的最大应力点455在每个臂的第一U形弯的位置。最小应力点450在环的外周上。在每个挠曲臂中,在第一直线部405A和环425、第一曲线部405B、以及第二曲线部405D之间的附接点处观察到可测应力。
图4C示出了本发明的一个实施例的承载18公斤载荷的挠曲环400上的最小应变点460和最大应变点465。在一个实施例中,使用两组挠曲环(每组两个相邻挠曲环)的平行配置,每个挠曲环由2024-T3铝材制成,并按如图4C所示配置,18公斤中心载荷在点460处产生1.290e-018最小应变,在点465处产生大约2.620e-003最大应变,或者大约0.0026英寸/英寸最大应变。当从每个环的外周向内移动时,观察到的最大应变点465在每个臂的第一曲线弯的位置。最小应变点460在环的外周上。在每个挠曲臂中,在第一直线部405A和环425、第一曲线部405B、以及第二曲线部405D之间的附接点处观察到可测应力。
图4D示出了本发明的一个实施例的承载18公斤载荷的挠曲环400上的最小位移点470和最大位移点475。在一个实施例中,使用两组挠曲环(每组两个相邻挠曲环)的并行配置,每个挠曲环由2024-T3铝材制成,并按如图4D所示配置,18公斤中心载荷在点470处产生3.937e-032最小位移,在点475处产生大约1.581e-001最大位移,或者大约0.158英寸最大位移。最大位移点475在环的中心处。最小位移点470在环的外周上。在一个实施例中,当使用大约17公斤载荷时,环的位移大约为0.130英寸。
在一个实施例中,挠曲环的最大应力为37000PSI,最大应力时的最大应变为0.0026英寸/英寸,三角形中心轮毂处的最大位移为0.158英寸。在一个优选实施例中,挠曲组件包括位于储液器组件控制器板上方的一组挠曲环和位于该板的下方的一组挠曲环,每组具有直接叠置的两个挠曲环。如图4A至4D所示的挠曲环的形状非常适合于在臂之间均等分配并最大限度地减小应力和应变,同时使最大位移在中心处,因而可提供更精确的重量测量值。另外,使用多个挠曲环能减少蠕变的发生。最大限度地减少蠕变能延长挠曲组件的寿命。
图5是2024-T3铝材在室温下的应力与应变曲线关系的示意图。从预测和实验结果曲线505能够看出,随着应力增大至400兆帕(MPa),应变以指数方式增大,然后,随着应力接近600MPa,应变曲线开始变平。当应力超过400MPa时曲线随应变增大保持线性的特点表明,2024-T3铝材在高应力下的应变增大不大,这使其成为一种抵抗蠕变的理想材料。
挠曲环的片或臂并行布置,以最大限度地减小挠曲组件的平面外力矩。在不同实施例中,每个挠曲环的厚度在0.01至0.1英寸范围之内。在一个实施例中,每个挠曲环的厚度为0.05英寸。中心隔圈、顶部中心环和底部中心环通过两个柱销连接至三角形中心轮毂,从而当储液器组件控制器板固定时,包含磁体的组件的部件可移动。
图6A和6B是挠曲组件的储液器组件控制器板600的一个实施例的示意图,分别示出了该板的底部表面601和顶部表面603。请参考图6A和6B,储液器组件控制器板600包括位于其中心处的圆形开口610,当挠曲组件组装好时,该圆形开口610接收中心隔圈。板600还包括沿环绕中心圆形开口610的圆周轨迹布置的多个螺钉孔605。螺钉穿过这些孔605,从而把挠曲组件的部件固定在一起。请参考图6A,储液器组件控制器板600的底面601包括三对霍尔传感器615。在不同的实施例中,根据包含在组件中的磁体的数目,可使用多于或少于三对霍尔传感器。霍尔传感器对615从包含在顶部中心环和底部中心环内的磁体的磁性中轴线偏置。霍尔传感器对615按120°彼此间隔布置,以补偿储液盘重心的不平衡。在一个实施例中,霍尔传感器对615具有1.3毫伏/高斯的灵敏度。
在一个实施例中,储液器组件控制器板的尺寸为11英寸宽乘以12英寸深,并包含按120°彼此间隔布置的气温传感器。在一个实施例中,储液器组件控制器板还包括涡流阻尼器,该涡流阻尼器是由板的覆铜中产生的磁场产生的,用于起到振动阻尼作用。由板的覆铜产生的磁场主要围绕挠曲组件。随着磁体移动和磁场发生变化,会产生涡流,这种涡流会产生振动,因而会在重量测量值中造成误差。电路板的覆铜产生磁场,该磁场消除或衰减涡流,从而消除振动。
图7是已组装好的挠曲组件700的一个实施例的俯视图。在此图中能够看到储液器组件控制器板703的顶面、顶部环夹710、顶部中心环705、以及最上方的挠曲环715。在图中还示出了六个外周螺钉711、一个中心螺钉706、以及两个柱销707,它们把挠曲组件700固定在一起。
图8是已组装好的挠曲组件800的一个实施例的截面侧视图。顶部中心环805、顶部环夹810、多个上磁体813之中的一个、上挠曲环组814、以及上隔圈821位于储液器组件控制器板825的上方。中心隔圈820位于储液器组件控制器板825的中心开口中。下隔圈822、下挠曲环组815、多个下磁体816之中的一个、底部螺纹环夹830、以及底部中心环835位于储液器组件控制器板的下方。六个固定螺钉811从顶部和在外周处进入并穿过组件800。中心螺钉806在组件800的中心处进入并穿过组件800,包括中心隔圈820。两个柱销807也在组件800的中心处进入并穿过组件800。为了把第二内架固定至挠曲组件800上,四个螺钉840穿过第二内架(未示出)的中心构件,并穿入底部中心环835。
图9是透析机的已完全组装好的挠曲组件900和标尺支架902的一个实施例的斜向俯视图。螺钉904穿过标尺支架902的顶部,并穿入挠曲组件900的顶部环夹910。图10是图9的已完全组装好的挠曲组件1000和标尺支架1002的实施例的截面侧视图。螺钉1004穿过标尺支架1002的顶部并穿入顶部环夹1010,把挠曲组件1000固定至标尺支架1002,该标尺支架1002优选与限定透析机外壳的主框架一体形成。
图11是透析机的已完全组装好的挠曲组件1100和盘吊架1137的一个实施例的斜向仰视图。螺钉1140向上穿过盘吊架1137并穿入挠曲组件1100的底部螺纹中心环1135。图12是图11的已完全组装好的挠曲组件1200和盘吊架1237的实施例的截面侧视图。螺钉1240穿过盘吊架1237的底部,并穿入底部螺纹中心环1235,从而把挠曲组件1200固定至盘或储液器吊架1237上。
图13A和13B分别是透析机的一个实施例的前视图和侧视图,示出了在此所公开的挠曲组件1312以及其中的第一内架1360和第二内架1365。透析机的前面和侧面已制成透明的,并且储液器单元已经卸下,以便更好地观察。透析机包括顶部1301和底部1303。在一个实施例中,底部1303容纳挠曲组件1312以及配套的部件。第二内架1365附接至限定透析机底部1303的外壳的框架的顶部的底面。第二内架1365包括顶板、两个带有用于使第一内架1360的顶板穿过的开口1366的侧壁、以及一对水平轨道1348。在一个实施例中,第二内架1365的水平轨道1348从透析机前面附近的点沿透析机的从前到后轴线延伸至透析机背面附近的点。
在此公开的挠曲组件1312附接至限定透析机底部1303的外壳的框架的顶部的底面。在一个实施例中,第一内架1360的顶板连接至挠曲组件1312的底部。第一内架包括顶板、两个带有水平轨道1345的侧面、以及带有电接触元件1333的背板1332。在一个实施例中,第一内架1360的水平轨道1345从透析机前面附近的点沿透析机的从前到后轴线延伸至透析机背面附近的点。在一个实施例中,背板1332是长方形的,并包含电接触元件1333,该电接触元件1333与储液器单元的插入侧上的电接触板对正并接触。第一内架1360包括一对轨道1345,每个轨道沿透析机的一个侧面延伸。每个轨道1345在其后端处连接至背板1332。在插入时,储液器单元悬挂在第一内架1360的轨道1345上。
挠曲组件的三对霍尔传感器固定在静态磁场中。当该组件用于测量储液器的内容物时,磁场沿竖轴移动,并且这种移动用于计算储液器内容物的重量。在施加重量之前,使用零电压输出对组件进行校准。上下磁体的磁场互斥,并在中心线处产生一个零磁性平面。磁体的磁极朝向确保电压输出会随着重量的施加以及磁体相对于霍尔传感器移动而增大。电路板上的处理器利用一个电压函数把电压变化转换为重量测量值。应理解,重量是电压变化的一个函数,通过绘制不同重量与不同电压电平和/或电压变化量的关系图,能够实验性地导出该函数。实验性地导出的曲线图会产生一个把实测电压电平或实测电压变化量与重量值关联起来的可实现的函数,从而允许处理器根据输入电压电平或电压变化来精确地计算重量。
在一个实施例中,霍尔传感器输出与电压变化量成正比的模拟信号。该输出被模-数转换器(ADC)转换为数字输出,以获得更高的分辨率。在一个实施例中,储液器单元的内容物的重量(单位为克)通过以下公式计算:
重量=w3+w2+w1+w0 [公式1]
其中,w0=k0;
w1=k1*霍尔传感器的ADC值(Hall);
w2=k2*ADC电压基准(Vref)值;并且,
w3=k3*ADC(Hall)*ADC(Vref)
k0至k3是常数,在不同实施例中,它们具有下列值:k0=-7925.4+/-0.10;k1=328.741e-3+/-1.0e-6;k2=-73.688e-3+/-1.0e-6;并且,k3=935.35e-9+/-10e-12。
图14A是挠曲组件的磁体1405、1410和霍尔传感器1415的一个实施例的框图,示出了在该组件不承受载荷时零磁性平面1450的相对位置。上磁体1405和下磁体1410都保持与它们之间的中心点的恒定距离,例如0.1至0.5英寸范围内的一个具体值,从而形成一个恒定的零磁性平面1450。当盘没有加载时,储液器组件控制器板1425上的霍尔传感器1415具有从其底面至下磁体1410的预定间隙,例如0.1至0.3英寸范围内的一个具体值,并且处于零磁性平面1450下方的预定距离处,例如0.05至0.25英寸。
图14B是挠曲组件的磁体1405、1410和霍尔传感器1415的一个实施例的框图,示出了在该组件载有空储液盘时零磁性平面1450的相对位置。空盘所施加的载荷约为7公斤,这是皮重。上磁体1405和下磁体1410保持与它们之间的中心点相同的恒定距离,如上文所述,从而形成一个恒定的零磁性平面1450。当加载一个空盘时,储液器组件控制器板1425上的霍尔传感器1415具有一个不同的位置,该位置更靠近零磁性平面1450。例如,在加载任何载荷之前,从霍尔传感器1415至零磁性平面1450的距离是0.107英寸,当在组件上加载一个空盘时,该距离减小至0.05英寸。
图14C是挠曲组件的磁体1405、1410和霍尔传感器1415的一个实施例的框图,示出了在该组件载有半满储液盘时零磁性平面1450的相对位置。半满盘所施加的载荷约为12.5公斤。上磁体1405和下磁体1410保持距它们之间的中心点的相同恒定距离(如上文所述),从而形成一个恒定的零磁性平面1450。当加载半满盘时,储液器组件控制器板1425上的霍尔传感器1415几乎直接位于零磁性平面1450上。
图14D是挠曲组件的磁体1405、1410和霍尔传感器1415的一个实施例的框图,示出了在该组件载有满储液盘时零磁性平面1450的相对位置。满盘所施加的载荷约为18公斤。上磁体1405和下磁体1410保持距它们之间的中心点的相同恒定距离(如上文所述),从而形成一个恒定的零磁性平面1450。当加载满盘时,储液器组件控制器板1425具有从其顶面至上磁体1405的0.206英寸间隙,并且霍尔传感器1415处于零磁性平面1450上方的0.05英寸位置。
上述例子仅是本发明的系统的众多应用的一些示例。虽然在上文中仅说明了本发明的一些实施例,但是应理解,在不脱离本发明的精神或范围的前提下,本发明也可按许多其它特定的形式实现。因此,本文中的例子和实施例仅是示例性的,而非限制性的,可在所附权利要求书限定的范围之内对本发明进行修改。
Claims (46)
1.一种在透析机内用于悬挂载荷的悬挂系统,所述系统包括:
具有多个第一构件的框架,所述框架限定所述透析机的一部分围绕形成的结构;
通过第一连接器附接至所述多个第一构件中的至少一个的顶部构件;
通过第二连接器附接至多个第二构件的底部构件,所述多个第二构件被配置为悬挂流体容器;以及
定位在所述顶部构件与所述底部构件之间的电路板;
其中,所述顶部构件、底部构件和电路板被配置成将载荷通过顶部构件和底部构件传递至所述框架,避免作用在电路板上。
2.如权利要求1所述的系统,其中,所述顶部构件还包括多个第一磁体,所述底部构件还包括多个第二磁体,其中,所述多个第一磁体和多个第二磁体在所述系统内产生磁场。
3.如权利要求2所述的系统,其中,所述电路板还包括多个传感器和一处理器,所述传感器被配置成当悬挂于所述底部构件的流体容器施加载荷时基于感测的所述电路板周围的所述磁场的移动输出一电压,所述处理器被配置成基于输出的电压输出重量测量值。
4.如权利要求2或3所述的系统,其中,所述多个第一磁体与所述多个第二磁体具有相同数量的磁体。
5.如权利要求2或3所述的系统,其中,所述磁体包括钕磁体且所述磁体在所述系统组装之前被加热预定时间,以通过加热来处理随着时间的推移自然发生的不可逆的磁损耗。
6.如权利要求1-3中任一所述的系统,其中,所述多个第二构件包括被配置成可滑动地接收流体容器的至少两个轨道。
7.如权利要求6所述的系统,其中,所述至少两个轨道中的每一个沿着所述透析机的从前至后的轴线延伸,且包括前端和后端,且其中,所述多个第二构件还包括连接到所述至少两个轨道的所述后端的背板。
8.如权利要求1-3、7中任一所述的系统,其中,所述系统还包括附接至所述顶部构件的至少一个挠曲结构,其中所述至少一个挠曲结构处于所述顶部构件与所述电路板之间,且与所述电路板物理接触,其中,所述至少一个挠曲结构包括允许所述顶部构件相对于所述电路板并与所述底部构件一起移动的至少一个挠曲构件。
9.如权利要求8所述的系统,其中,所述系统还包括附接至所述底部构件的至少一个挠曲结构,其中所述至少一个挠曲结构处于所述底部构件与所述电路板之间,且与所述电路板物理接触,其中,所述至少一个挠曲结构包括允许所述底部构件相对于所述电路板并与所述顶部构件一起移动的至少一个挠曲构件。
10.如权利要求9所述的系统,其中,附接至所述顶部构件的所述至少一个挠曲结构是挠曲环,并且所述至少一个挠曲构件是曲臂;附接至所述底部构件的所述至少一个挠曲结构是挠曲环,并且所述至少一个挠曲构件是曲臂。
11.如权利要求10所述的系统,其中,每个挠曲环包括当所述载荷被悬挂时能绕着所述环的中心部分在相同的平面上移位的三个曲臂。
12.如权利要求10或11所述的系统,其中,所述系统还包括位于所述顶部构件与所述电路板之间的另一个挠曲环以及位于所述底部构件与所述电路板之间的另一个挠曲环。
13.如权利要求12所述的系统,其中,所述挠曲环的所述曲臂平行地设置,以最小化所述系统的平面外力矩。
14.如权利要求10、11、13中任一所述的系统,其中,所述系统包括布置在所述至少一个挠曲环之中的每一个与所述电路板之间的至少一个隔圈元件。
15.如权利要求1-3、7、9-11、13中任一所述的系统,其中,所述第一连接器适合于在沿着延伸穿过所述透析机的中心的竖轴的一位置处安装到所述框架的所述多个第一构件中的所述至少一个。
16.如权利要求1-3、7、9-11、13中任一所述的系统,其中,所述第二连接器适合于在沿着延伸穿过所述透析机的中心的竖轴的一位置处附接所述多个第二构件。
17.如权利要求1-3、7、9-11、13中任一所述的系统,其中,所述电路板还包括铜材,其中,所述铜材适合于对从所述系统悬挂并附接至底部构件的所述载荷的机械振动产生磁性阻尼。
18.如权利要求1-3、7、9-11、13中任一所述的系统,其中,所述系统还包括用于将底部构件固定到顶部构件以使所述顶部构件和所述底部构件能相对于所述电路板一起移动的第三连接器。
19.一种在透析机内用于悬挂载荷的方法,包括以下步骤:
提供附接至沿着所述透析机的竖轴的一位置处的悬挂系统,所述系统包括:
具有多个第一构件的框架,所述框架限定所述透析机的一部分围绕形成的结构;
顶部构件,所述顶部构件包括用于将所述顶部构件附接至所述框架的所述多个第一构件中的至少一个的第一连接器;
底部构件,所述底部构件包括用于将所述底部构件附接至被配置成悬挂流体容器的多个第二构件的第二连接器;以及
定位在所述顶部构件与所述底部构件之间的电路板;
其中,所述顶部构件、底部构件和电路板被配置成附接至所述框架,使得施加在所述底部构件上的载荷通过所述底部构件和所述顶部构件直接传递至所述框架,而所述载荷不会作用在所述电路板上;以及
通过将流体容器定位在所述多个第二构件上向所述系统的底部构件施加载荷。
20.如权利要求19所述的用于悬挂载荷的方法,其中,所述顶部构件还包括多个第一磁体,所述底部构件还包括多个第二磁体,其中,所述多个第一磁体和多个第二磁体在所述系统内产生磁场,所述电路板还包括多个传感器和一处理器,所述传感器被配置成当悬挂于所述底部构件的流体容器施加载荷时基于感测的所述电路板周围的所述磁场的移动输出一电压,所述处理器被配置成基于输出的电压输出重量测量值,所述方法还包括使用所述传感器的所述输出的电压计算所述流体容器的内容物的重量的步骤。
21.如权利要求20所述的用于悬挂载荷的方法,其中,所述悬挂系统还包括:
附接至所述顶部构件的至少一个挠曲结构,其中所述至少一个挠曲结构处于所述顶部构件与所述电路板之间,且与所述电路板物理接触,其中,所述至少一个挠曲结构包括允许所述顶部构件相对于所述电路板并与所述底部构件一起移动的至少一个挠曲构件;以及
附接至所述底部构件的至少一个挠曲结构,其中所述至少一个挠曲结构处于所述底部构件与所述电路板之间,且与所述电路板物理接触,其中,所述至少一个挠曲结构包括允许所述底部构件相对于所述电路板并与所述顶部构件一起移动的至少一个挠曲构件。
22.如权利要求21所述的用于悬挂载荷的方法,其中,所述悬挂系统还包括用于将底部构件固定到顶部构件以使所述顶部构件和所述底部构件能相对于所述电路板一起移动的第三连接器。
23.一种在透析机内用于悬挂和称重载荷的系统,所述系统包括:
框架,其限定所述透析机的一部分围绕形成的结构;
第一内架,其被配置成接收和悬挂流体容器,其中,第一内架与所述框架物理隔开;以及
挠曲组件,其包括:顶部组件、底部组件和位于顶部组件与底部组件之间的电路板,其中,所述顶部组件附接至所述框架,所述底部组件附接至第一内架,所述顶部组件、底部组件和电路板被配置成将载荷从第一内架传递至所述框架,避免作用在所述电路板上。
24.如权利要求23所述的系统,其中,所述顶部组件包括多个第一磁体,所述底部组件包括多个第二磁体,所述多个第一磁体和所述多个第二磁体在挠曲组件内产生磁场。
25.如权利要求24所述的系统,其中,所述多个第一磁体中的每一个都处于同一平面内,并且分别彼此隔开120度,其中,所述多个第二磁体中的每一个都处于同一平面内,并且分别彼此隔开120度。
26.如权利要求25所述的系统,其中,所述多个第一磁体或所述多个第二磁体中的至少一个包括钕磁体。
27.如权利要求23所述的系统,其中,电路板包括至少一个磁场传感器和处理器,电路板配置为能够检测磁场。
28.如权利要求27所述的系统,其中,所述至少一个磁场传感器配置为能够感测磁场的位移,并配置为能够基于所述位移产生电压输出,并且配置为能够将所述电压输出发送至处理器。
29.如权利要求28所述的系统,其中,处理器配置为能够接收电压输出,并基于所述电压输出产生重量测量值。
30.如权利要求23所述的系统,其中,所述系统还包括附接至顶部组件并位于顶部组件与电路板之间的至少一个挠曲结构,其中,所述至少一个挠曲结构包括挠曲构件,所述挠曲构件配置成允许顶部组件相对于电路板移动。
31.如权利要求30所述的系统,其中,所述至少一个挠曲结构包括挠曲环和至少一个曲臂。
32.如权利要求31所述的系统,其中,挠曲环包括三个曲臂,所述三个曲臂包括所述至少一个曲臂,其中,当悬挂载荷时,所述三个曲臂能够在同一平面内绕挠曲环的中心点移位。
33.如权利要求23所述的系统,其中,所述系统还包括附接至底部组件并位于底部组件与电路板之间的至少一个挠曲结构,其中,所述至少一个挠曲结构包括挠曲构件,所述挠曲构件配置成允许底部组件相对于电路板移动。
34.如权利要求33所述的系统,其中,所述至少一个挠曲结构包括挠曲环和至少一个曲臂。
35.如权利要求34所述的系统,其中,挠曲环包括三个曲臂,所述三个曲臂包括所述至少一个曲臂,其中,当悬挂载荷时,所述三个曲臂能够在同一平面内绕挠曲环的中心点移位。
36.如权利要求23所述的系统,其中,电路板还包括铜,其中,铜适于对悬挂的载荷的机械振动产生磁性阻尼。
37.如权利要求23所述的系统,其中,第一内架沿透析机的竖直轴线附接至一点。
38.如权利要求23所述的系统,其中,电路板包括至少一个霍尔传感器对。
39.如权利要求38所述的系统,其中,所述至少一个霍尔传感器对具有1.3毫伏/高斯的灵敏度。
40.如权利要求23所述的系统,其中,电路板包括至少三个霍尔传感器对,其中,所述三个霍尔传感器对分别彼此隔开120°地布置。
41.如权利要求23所述的系统,其中,框架限定透析机的底部的外壳。
42.如权利要求23所述的系统,其中,第一内架包括顶板、具有水平轨道的两侧以及具有电接触元件的背板。
43.一种透析系统,其具有用于称量和悬挂载荷的组件,所述组件包括:
第一部件,其包括多个第一磁体;
第二部件,其包括多个第二磁体,其中,所述多个第一磁体和所述多个第二磁体在所述组件内产生磁场;以及
电路板,其布置在所述第一部件和所述第二部件之间,并包括处理器和用于根据所述磁场在一载荷施加至所述组件的第二部件时产生的变化输出电压的多个磁场传感器,避免载荷作用在电路板上,其中,所述处理器配置为能够基于该电压输出来输出重量测量值,其中,施加的所述载荷拉在所述组件上,使得所述电路板周围的所述磁场发生位移,所述多个磁场传感器中的至少一个感测磁场的位移,以产生所述电压输出。
44.如权利要求43所述的透析系统,所述透析系统还包括附接至所述第一部件并位于所述第一部件与所述电路板之间的至少一个挠曲结构,所述至少一个挠曲结构包括允许所述第一部件相对于所述电路板移动的至少一个弯曲构件。
45.如权利要求44所述的透析系统,所述透析系统还包括附接至所述第二部件并位于所述第二部件与所述电路板之间的至少一个挠曲结构,所述至少一个挠曲结构包括允许所述第二部件相对于所述电路板移动的至少一个弯曲构件。
46.如权利要求43所述的透析系统,所述透析系统还包括附接至所述第二部件的第一内架,所述第一内架具有:附接至所述第二部件的顶板,配置为以可滑动的方式接收储液器单元的至少两条轨道;以及具有多个电接触元件的板,所述电接触元件配置为与所述储液器单元上的接触板物理接触和电接触。
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