CN107250912A - 光敏组合物和色彩转换膜 - Google Patents
光敏组合物和色彩转换膜 Download PDFInfo
- Publication number
- CN107250912A CN107250912A CN201680011819.5A CN201680011819A CN107250912A CN 107250912 A CN107250912 A CN 107250912A CN 201680011819 A CN201680011819 A CN 201680011819A CN 107250912 A CN107250912 A CN 107250912A
- Authority
- CN
- China
- Prior art keywords
- photosensitive composition
- color conversion
- conversion coatings
- methyl
- coatings film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
Abstract
Description
X | R1 | R2 | R3 | Y |
S | OC4H9 | H | H | BF4 |
S | OC4H9 | OCH3 | OCH3 | BF4 |
S | H | OCH3 | OCH3 | BF4 |
S | N(CH3)2 | H | H | ClO2 |
O | OC4H9 | H | H | SbF6 |
Claims (21)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15000575.9 | 2015-02-27 | ||
EP15000575 | 2015-02-27 | ||
PCT/EP2016/000193 WO2016134820A1 (en) | 2015-02-27 | 2016-02-05 | A photosensitive composition and color converting film |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107250912A true CN107250912A (zh) | 2017-10-13 |
CN107250912B CN107250912B (zh) | 2021-06-22 |
Family
ID=52633038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201680011819.5A Active CN107250912B (zh) | 2015-02-27 | 2016-02-05 | 光敏组合物和色彩转换膜 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10509319B2 (zh) |
EP (1) | EP3262465B1 (zh) |
JP (1) | JP7032931B2 (zh) |
KR (1) | KR102638805B1 (zh) |
CN (1) | CN107250912B (zh) |
TW (1) | TW201642025A (zh) |
WO (1) | WO2016134820A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108139666A (zh) * | 2015-09-29 | 2018-06-08 | 默克专利有限公司 | 光敏组合物和色彩转换膜 |
CN109563404A (zh) * | 2016-08-01 | 2019-04-02 | 默克专利股份有限公司 | 光敏组合物、颜色转换介质、光学器件及其制备方法 |
CN111176004A (zh) * | 2020-03-12 | 2020-05-19 | Tcl华星光电技术有限公司 | 一种背光模组及显示装置 |
CN111386330A (zh) * | 2017-11-30 | 2020-07-07 | 默克专利股份有限公司 | 包含半导体性发光纳米颗粒的组合物 |
CN113671614A (zh) * | 2021-08-17 | 2021-11-19 | 深圳市华星光电半导体显示技术有限公司 | 一种彩色滤光片的制作方法及彩色滤光片 |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3262465B1 (en) | 2015-02-27 | 2019-05-15 | Merck Patent GmbH | A photosensitive composition and color converting film |
US10712483B2 (en) * | 2015-08-24 | 2020-07-14 | Samsung Electronics Co., Ltd. | Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same |
KR102631400B1 (ko) | 2015-10-22 | 2024-01-29 | 삼성전자주식회사 | 감광성 조성물, 이로부터 제조된 양자점-폴리머 복합체 패턴, 및 이를 포함하는 전자 소자 |
KR102527764B1 (ko) * | 2015-12-17 | 2023-05-02 | 삼성전자주식회사 | 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴 |
KR102640897B1 (ko) * | 2016-09-13 | 2024-02-26 | 엘지디스플레이 주식회사 | 양자막대, 그 합성 방법 및 양자막대 표시장치 |
KR102028970B1 (ko) * | 2016-10-26 | 2019-10-07 | 동우 화인켐 주식회사 | 금속산화물 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 |
KR102521519B1 (ko) * | 2016-10-26 | 2023-04-13 | 동우 화인켐 주식회사 | 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 |
KR102126686B1 (ko) * | 2016-11-04 | 2020-06-25 | 주식회사 엘지화학 | 코팅 조성물 |
JP6815577B2 (ja) * | 2016-11-16 | 2021-01-20 | Nsマテリアルズ株式会社 | シート部材、バックライト装置、及び、表示装置 |
KR102500396B1 (ko) * | 2016-11-28 | 2023-02-15 | 메르크 파텐트 게엠베하 | 나노사이즈의 발광 재료를 포함하는 조성물 |
WO2018108767A1 (en) | 2016-12-15 | 2018-06-21 | Merck Patent Gmbh | Semiconducting light emitting nanoparticle |
WO2018146120A1 (en) | 2017-02-10 | 2018-08-16 | Merck Patent Gmbh | Semiconductor nanosized material |
JP2018205598A (ja) * | 2017-06-07 | 2018-12-27 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 感光性シロキサン組成物、およびそれを用いて形成した硬化膜 |
US11624025B2 (en) | 2017-06-08 | 2023-04-11 | Merck Patent Gmbh | Composition |
JP2019002961A (ja) * | 2017-06-12 | 2019-01-10 | 株式会社ポラテクノ | 液晶表示装置及び反射シート |
WO2019002239A1 (en) | 2017-06-29 | 2019-01-03 | Merck Patent Gmbh | COMPOSITION COMPRISING A SEMICONDUCTOR ELECTROLUMINESCENT NANOPARTICLE |
WO2019072884A1 (en) | 2017-10-13 | 2019-04-18 | Merck Patent Gmbh | SEMICONDUCTOR ELECTROLUMINESCENT NANOPARTICLE |
US10879431B2 (en) * | 2017-12-22 | 2020-12-29 | Lumileds Llc | Wavelength converting layer patterning for LED arrays |
KR102533686B1 (ko) * | 2018-01-18 | 2023-05-17 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
DE102018106465B4 (de) * | 2018-03-20 | 2024-03-21 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronisches Bauteil |
WO2019215059A1 (en) | 2018-05-09 | 2019-11-14 | Merck Patent Gmbh | Semiconducting nanoparticle |
WO2019224134A1 (en) | 2018-05-23 | 2019-11-28 | Merck Patent Gmbh | Semiconducting nanoparticle |
JP7109062B2 (ja) * | 2018-06-27 | 2022-07-29 | 国立大学法人電気通信大学 | 量子ドットシート、これを用いた光電子デバイス、及び量子ドットシートの作製方法 |
EP3830153B1 (en) * | 2018-08-03 | 2022-08-03 | Merck Patent GmbH | A composition |
JP7219950B2 (ja) * | 2018-09-28 | 2023-02-09 | 山陽色素株式会社 | 量子ドット分散体の製造方法及び量子ドット分散体 |
US11845889B2 (en) | 2018-10-15 | 2023-12-19 | Merck Patent Gmbh | Nanoparticle |
US11143909B2 (en) | 2018-11-12 | 2021-10-12 | Lg Chem, Ltd. | Colour conversion film, and back light unit and display device comprising same |
WO2020099284A1 (en) | 2018-11-14 | 2020-05-22 | Merck Patent Gmbh | Nanoparticle |
JP2022515136A (ja) | 2018-12-20 | 2022-02-17 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 表面改変された半電導性発光ナノ粒子、およびその調製のためのプロセス |
KR20210118444A (ko) | 2019-01-29 | 2021-09-30 | 메르크 파텐트 게엠베하 | 조성물 |
JP2022527600A (ja) | 2019-04-12 | 2022-06-02 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 組成物 |
KR20220002482A (ko) | 2019-04-26 | 2022-01-06 | 메르크 파텐트 게엠베하 | 나노입자 |
TWI808178B (zh) * | 2019-05-21 | 2023-07-11 | 隆達電子股份有限公司 | 波長轉換物質及發光裝置 |
WO2021069432A1 (en) | 2019-10-07 | 2021-04-15 | Merck Patent Gmbh | Vertically aligned liquid-crystal element having at least one light converting layer which shifts the wavelength of incident light to longer values |
EP4072992A1 (en) * | 2019-12-12 | 2022-10-19 | Merck Patent GmbH | Composition |
CN116018387A (zh) | 2020-09-04 | 2023-04-25 | 默克专利股份有限公司 | 装置 |
US20230392033A1 (en) | 2020-10-12 | 2023-12-07 | Merck Patent Gmbh | Composition |
EP4232518A2 (en) | 2020-10-21 | 2023-08-30 | Merck Patent GmbH | Composition |
EP4294883A1 (en) | 2021-02-19 | 2023-12-27 | Merck Patent GmbH | Composition |
EP4347726A1 (en) | 2021-06-01 | 2024-04-10 | Merck Patent GmbH | Composition |
US11626534B2 (en) | 2021-06-08 | 2023-04-11 | Sharp Kabushiki Kaisha | UV patternable matrix containing blue light emitting quantum dots |
CN118076701A (zh) | 2021-08-20 | 2024-05-24 | 默克专利股份有限公司 | 组合物 |
KR20240054343A (ko) | 2021-09-03 | 2024-04-25 | 메르크 파텐트 게엠베하 | 조성물 |
TW202328359A (zh) | 2021-09-03 | 2023-07-16 | 德商馬克專利公司 | 組合物 |
JP2024054515A (ja) * | 2022-10-05 | 2024-04-17 | 信越化学工業株式会社 | 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法、及び発光素子 |
WO2024100053A1 (en) | 2022-11-10 | 2024-05-16 | Merck Patent Gmbh | Composition |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1653391A (zh) * | 2002-04-17 | 2005-08-10 | 科莱恩有限公司 | 纳米压印光刻胶 |
CN1655057A (zh) * | 2003-10-21 | 2005-08-17 | 三星电子株式会社 | 光敏半导体纳米晶和包含其的光敏组合物及其用途 |
WO2009014858A2 (en) * | 2007-07-11 | 2009-01-29 | Motorola, Inc. | Method and apparatus for selectively patterning free standing quantom dot (fsqdt) polymer composites |
CN103709731A (zh) * | 2013-12-27 | 2014-04-09 | Tcl集团股份有限公司 | 量子点/聚氨酯纳米晶体复合物及制备方法和彩色转化膜 |
CN103728837A (zh) * | 2013-12-30 | 2014-04-16 | 京东方科技集团股份有限公司 | 感光树脂组合物及用感光树脂组合物制备量子点图案的方法 |
JP2014174406A (ja) * | 2013-03-11 | 2014-09-22 | Jsr Corp | 感放射線性樹脂組成物、硬化膜、発光表示素子および発光層の形成方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2006027956A1 (ja) * | 2004-09-08 | 2008-05-08 | 株式会社カネカ | 光学材料用樹脂組成物 |
US8941293B2 (en) * | 2006-05-11 | 2015-01-27 | Samsung Electronics Co., Ltd. | Solid state lighting devices comprising quantum dots |
AU2007276622B2 (en) * | 2006-07-18 | 2012-12-13 | Fuel Transfer Technologies | Portable fluid exchange system for concurrently pumping liquid from a source container to a destination container and pumping vapor from the destination container to the source container |
KR20120067543A (ko) | 2010-12-16 | 2012-06-26 | 삼성엘이디 주식회사 | 발광모듈 및 이를 이용한 백라이트 유닛 |
KR101282051B1 (ko) * | 2010-12-21 | 2013-07-04 | 한국과학기술원 | 형광색소 실록산 하이브리드 수지 |
WO2013093631A2 (en) | 2011-12-22 | 2013-06-27 | Nanoco Technologies, Inc. | Surface modified nanoparticles |
JP6325556B2 (ja) * | 2012-10-25 | 2018-05-16 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | シリコーン中の量子ドットのためのpdms系配位子 |
KR102243900B1 (ko) * | 2013-04-01 | 2021-04-22 | 렌슬러 폴리테크닉 인스티튜트 | 유기 인광체 작용화된 나노입자 및 이를 포함하는 조성물 |
JP6171927B2 (ja) | 2013-12-25 | 2017-08-02 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法 |
JP6363487B2 (ja) | 2014-12-10 | 2018-07-25 | 富士フイルム株式会社 | 波長変換部材、バックライトユニット、液晶表示装置、および波長変換部材の製造方法 |
CN105785718A (zh) | 2015-01-09 | 2016-07-20 | 三星显示有限公司 | 光敏树脂组合物、使用所述光敏树脂组合物的颜色转换面板和显示装置 |
EP3262465B1 (en) | 2015-02-27 | 2019-05-15 | Merck Patent GmbH | A photosensitive composition and color converting film |
CN110744287A (zh) * | 2019-11-13 | 2020-02-04 | 江苏都万电子科技有限公司 | 一种用于不锈钢钣金扣件的压合装置 |
-
2016
- 2016-02-05 EP EP16703714.2A patent/EP3262465B1/en active Active
- 2016-02-05 US US15/553,594 patent/US10509319B2/en active Active
- 2016-02-05 KR KR1020177027043A patent/KR102638805B1/ko active IP Right Grant
- 2016-02-05 JP JP2017545575A patent/JP7032931B2/ja active Active
- 2016-02-05 WO PCT/EP2016/000193 patent/WO2016134820A1/en active Application Filing
- 2016-02-05 CN CN201680011819.5A patent/CN107250912B/zh active Active
- 2016-02-26 TW TW105106001A patent/TW201642025A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1653391A (zh) * | 2002-04-17 | 2005-08-10 | 科莱恩有限公司 | 纳米压印光刻胶 |
CN1655057A (zh) * | 2003-10-21 | 2005-08-17 | 三星电子株式会社 | 光敏半导体纳米晶和包含其的光敏组合物及其用途 |
WO2009014858A2 (en) * | 2007-07-11 | 2009-01-29 | Motorola, Inc. | Method and apparatus for selectively patterning free standing quantom dot (fsqdt) polymer composites |
JP2014174406A (ja) * | 2013-03-11 | 2014-09-22 | Jsr Corp | 感放射線性樹脂組成物、硬化膜、発光表示素子および発光層の形成方法 |
CN103709731A (zh) * | 2013-12-27 | 2014-04-09 | Tcl集团股份有限公司 | 量子点/聚氨酯纳米晶体复合物及制备方法和彩色转化膜 |
CN103728837A (zh) * | 2013-12-30 | 2014-04-16 | 京东方科技集团股份有限公司 | 感光树脂组合物及用感光树脂组合物制备量子点图案的方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108139666A (zh) * | 2015-09-29 | 2018-06-08 | 默克专利有限公司 | 光敏组合物和色彩转换膜 |
CN109563404A (zh) * | 2016-08-01 | 2019-04-02 | 默克专利股份有限公司 | 光敏组合物、颜色转换介质、光学器件及其制备方法 |
CN109563404B (zh) * | 2016-08-01 | 2022-08-12 | 默克专利股份有限公司 | 光敏组合物、颜色转换介质、光学器件及其制备方法 |
CN111386330A (zh) * | 2017-11-30 | 2020-07-07 | 默克专利股份有限公司 | 包含半导体性发光纳米颗粒的组合物 |
CN111176004A (zh) * | 2020-03-12 | 2020-05-19 | Tcl华星光电技术有限公司 | 一种背光模组及显示装置 |
CN111176004B (zh) * | 2020-03-12 | 2022-02-22 | Tcl华星光电技术有限公司 | 一种背光模组及显示装置 |
CN113671614A (zh) * | 2021-08-17 | 2021-11-19 | 深圳市华星光电半导体显示技术有限公司 | 一种彩色滤光片的制作方法及彩色滤光片 |
Also Published As
Publication number | Publication date |
---|---|
EP3262465B1 (en) | 2019-05-15 |
US20180046080A1 (en) | 2018-02-15 |
KR20170128366A (ko) | 2017-11-22 |
JP7032931B2 (ja) | 2022-03-09 |
TW201642025A (zh) | 2016-12-01 |
CN107250912B (zh) | 2021-06-22 |
JP2018512614A (ja) | 2018-05-17 |
KR102638805B1 (ko) | 2024-02-20 |
EP3262465A1 (en) | 2018-01-03 |
WO2016134820A1 (en) | 2016-09-01 |
US10509319B2 (en) | 2019-12-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107250912A (zh) | 光敏组合物和色彩转换膜 | |
US11269255B2 (en) | Photosensitive composition and color converting film | |
JP2018531421A6 (ja) | 感光性組成物および色変換フィルム | |
CN109563404B (zh) | 光敏组合物、颜色转换介质、光学器件及其制备方法 | |
CN108883622A (zh) | 颜色转换片和光学器件 | |
JP2023539909A (ja) | デバイス | |
JP2021533230A (ja) | 組成物 | |
KR102598243B1 (ko) | 화상표시장치용 격벽, 이를 제조하는 방법 및 상기 격벽을 포함하는 화상표시장치 | |
KR102660289B1 (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 표시장치 | |
KR102191853B1 (ko) | 감광성 수지 조성물, 이를 이용하여 제조된 디스플레이 격벽 구조물 및 이를 포함하는 표시장치 | |
JP2021033093A (ja) | 半導体ナノ粒子含有組成物、波長変換膜及び発光表示素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20201117 Address after: Darmstadt Applicant after: MERCK PATENT GmbH Address before: Darmstadt Applicant before: MERCK PATENT GmbH Applicant before: AZ Electronic Materials Co.,Ltd. Effective date of registration: 20201117 Address after: Darmstadt Applicant after: MERCK PATENT GmbH Applicant after: AZ Electronic Materials Co.,Ltd. Address before: Darmstadt Applicant before: MERCK PATENT GmbH Applicant before: Wisdom Buy Effective date of registration: 20201117 Address after: Darmstadt Applicant after: MERCK PATENT GmbH Applicant after: Wisdom Buy Address before: Darmstadt Applicant before: MERCK PATENT GmbH Applicant before: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. |
|
GR01 | Patent grant | ||
GR01 | Patent grant |