CN101930176B - 着色感光性组合物 - Google Patents

着色感光性组合物 Download PDF

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Publication number
CN101930176B
CN101930176B CN201010217886.7A CN201010217886A CN101930176B CN 101930176 B CN101930176 B CN 101930176B CN 201010217886 A CN201010217886 A CN 201010217886A CN 101930176 B CN101930176 B CN 101930176B
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CN
China
Prior art keywords
formula
compound
carbon number
methyl
represent
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CN201010217886.7A
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English (en)
Chinese (zh)
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CN101930176A (zh
Inventor
城内由子
赤坂哲郎
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Publication of CN101930176A publication Critical patent/CN101930176A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN201010217886.7A 2009-06-24 2010-06-22 着色感光性组合物 Active CN101930176B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009149534 2009-06-24
JP2009-149534 2009-06-24

Publications (2)

Publication Number Publication Date
CN101930176A CN101930176A (zh) 2010-12-29
CN101930176B true CN101930176B (zh) 2015-05-13

Family

ID=43369421

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201010217886.7A Active CN101930176B (zh) 2009-06-24 2010-06-22 着色感光性组合物

Country Status (4)

Country Link
JP (1) JP5621337B2 (ja)
KR (1) KR101721996B1 (ja)
CN (1) CN101930176B (ja)
TW (1) TWI512397B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101632461B1 (ko) * 2011-08-05 2016-06-21 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
KR101574089B1 (ko) 2011-12-23 2015-12-03 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101413077B1 (ko) * 2011-12-30 2014-07-01 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터
TWI592751B (zh) * 2012-05-29 2017-07-21 住友化學股份有限公司 著色硬化性樹脂組成物
JP6115281B2 (ja) 2012-06-07 2017-04-19 Jsr株式会社 着色組成物、カラーフィルタ及び表示素子
KR102066287B1 (ko) * 2012-06-11 2020-01-14 스미또모 가가꾸 가부시키가이샤 착색 감광성 수지 조성물
JP6155809B2 (ja) * 2013-04-26 2017-07-05 東洋インキＳｃホールディングス株式会社 感光性着色組成物及びそれを用いたカラーフィルタ
CN106094432A (zh) * 2015-03-30 2016-11-09 住友化学株式会社 着色固化性树脂组合物
TWI748947B (zh) * 2015-03-30 2021-12-11 日商住友化學股份有限公司 著色硬化性樹脂組合物
JP7184518B2 (ja) * 2016-02-12 2022-12-06 三菱ケミカル株式会社 着色スペーサー形成用感光性着色組成物、硬化物、着色スペーサー、画像表示装置
JP2017203899A (ja) * 2016-05-12 2017-11-16 Dic株式会社 カラーフィルタ用有機顔料組成物及びカラーフィルタ
JP7374985B2 (ja) 2019-02-28 2023-11-07 住友化学株式会社 シアン色着色硬化性組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5472490A (en) * 1993-04-23 1995-12-05 Toyo Ink Manufacturing Co., Ltd. Pigment composition, printing ink and coating composition
CN1742058A (zh) * 2003-01-30 2006-03-01 新日铁化学株式会社 颜料分散体、滤色器用组合物及滤色器
CN101178540A (zh) * 2006-11-08 2008-05-14 富士胶片株式会社 绿色感光性树脂组合物、感光性转印材料、滤色片基板及显示装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0753889A (ja) * 1993-08-10 1995-02-28 Toyo Ink Mfg Co Ltd 銅フタロシアニン顔料の製造方法および該製造方法より得られる銅フタロシアニン顔料を含む印刷インキもしくは塗料組成物
JP3247784B2 (ja) * 1993-12-22 2002-01-21 株式会社リコー 水性インク及びこれを用いた記録方法
JP2001049158A (ja) * 1999-08-09 2001-02-20 Seiko Epson Corp 顔料塊状体及びその製造方法、それを含む顔料分散液並びにそれを用いたインクジェット用記録液
JP4461681B2 (ja) * 2002-01-29 2010-05-12 東洋インキ製造株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
JP4133137B2 (ja) * 2002-09-06 2008-08-13 東洋インキ製造株式会社 感光性着色組成物
JP4002516B2 (ja) * 2003-01-29 2007-11-07 富士フイルム株式会社 染料含有硬化性組成物、カラーフィルタ及びその製造方法
JP2004325660A (ja) * 2003-04-23 2004-11-18 Fuji Photo Film Co Ltd 染料含有硬化性組成物、カラーフィルタおよびその製造方法
JP4313646B2 (ja) * 2003-10-31 2009-08-12 東洋インキ製造株式会社 青色着色組成物およびカラーフィルタ
US7276111B2 (en) * 2004-02-09 2007-10-02 Seiko Epson Corporation Ink composition, inkjet recording method and recorded matter
JP2005250000A (ja) * 2004-03-03 2005-09-15 Canon Inc マゼンタトナー
GB0419972D0 (en) 2004-09-09 2004-10-13 Avecia Ltd Phthalocyanine inks and their use in ink-jet printing
JP4899768B2 (ja) * 2005-10-19 2012-03-21 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5472490A (en) * 1993-04-23 1995-12-05 Toyo Ink Manufacturing Co., Ltd. Pigment composition, printing ink and coating composition
CN1742058A (zh) * 2003-01-30 2006-03-01 新日铁化学株式会社 颜料分散体、滤色器用组合物及滤色器
CN101178540A (zh) * 2006-11-08 2008-05-14 富士胶片株式会社 绿色感光性树脂组合物、感光性转印材料、滤色片基板及显示装置

Also Published As

Publication number Publication date
KR101721996B1 (ko) 2017-03-31
JP5621337B2 (ja) 2014-11-12
CN101930176A (zh) 2010-12-29
JP2011028236A (ja) 2011-02-10
TW201106102A (en) 2011-02-16
TWI512397B (zh) 2015-12-11
KR20100138779A (ko) 2010-12-31

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