CN101582378B - 基板处理装置及其控制方法 - Google Patents

基板处理装置及其控制方法 Download PDF

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Publication number
CN101582378B
CN101582378B CN2009101454871A CN200910145487A CN101582378B CN 101582378 B CN101582378 B CN 101582378B CN 2009101454871 A CN2009101454871 A CN 2009101454871A CN 200910145487 A CN200910145487 A CN 200910145487A CN 101582378 B CN101582378 B CN 101582378B
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chamber
valve
communicating pipe
vacuum
pressure
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Chinese (zh)
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CN101582378A (zh
Inventor
工藤智之
小泽润
中村博
风间和典
守屋刚
中山博之
长池宏史
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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CN2009101454871A 2004-10-28 2005-10-28 基板处理装置及其控制方法 Active CN101582378B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004313475A JP4798981B2 (ja) 2004-10-28 2004-10-28 基板処理装置の制御方法，基板処理装置，基板処理装置の制御を行うプログラム
JP2004-313475 2004-10-28
JP2004313475 2004-10-28

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CNB2005101188343A Division CN100524609C (zh) 2004-10-28 2005-10-28 基板处理装置及其运行方法和控制方法

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CN101582378A CN101582378A (zh) 2009-11-18
CN101582378B true CN101582378B (zh) 2011-04-13

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CNB2005101188343A Active CN100524609C (zh) 2004-10-28 2005-10-28 基板处理装置及其运行方法和控制方法
CN2009101454871A Active CN101582378B (zh) 2004-10-28 2005-10-28 基板处理装置及其控制方法

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Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1911350A4 (en) 2005-08-02 2010-10-27 Nippon Soda Co AMIDINE COMPOUND AND HERBICIDE
WO2008144670A1 (en) * 2007-05-18 2008-11-27 Brooks Automation, Inc. Load lock fast pump vent
US10541157B2 (en) 2007-05-18 2020-01-21 Brooks Automation, Inc. Load lock fast pump vent
JP5281766B2 (ja) * 2007-07-31 2013-09-04 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
CN101451233B (zh) * 2007-11-28 2012-03-07 中国科学院沈阳科学仪器研制中心有限公司 矩形样品磁控溅射仪运动控制装置及其控制方法
JP5059583B2 (ja) * 2007-12-26 2012-10-24 東京エレクトロン株式会社 真空装置、真空処理システムおよび真空室の圧力制御方法
JP4983745B2 (ja) * 2008-08-01 2012-07-25 東京エレクトロン株式会社 圧力調整装置、これを用いた処理システム及び圧力調整方法
CN101783308B (zh) * 2009-01-16 2011-11-09 台湾积体电路制造股份有限公司 组合式晶片储存盒的储存机台
CN101958231A (zh) * 2010-05-06 2011-01-26 东莞宏威数码机械有限公司 气体环境缓冲装置
JP5079902B1 (ja) * 2011-05-13 2012-11-21 シャープ株式会社 反応室開放方法、及び気相成長装置
US20130239889A1 (en) * 2012-03-14 2013-09-19 Taiwan Semiconductor Manufacturing Co., Ltd. Valve purge assembly for semiconductor manufacturing tools
CN103021916B (zh) * 2012-12-05 2015-09-09 沈阳拓荆科技有限公司 晶圆传输系统
JP2014204017A (ja) * 2013-04-08 2014-10-27 シンフォニアテクノロジー株式会社 被処理体の受容装置
JP6505209B2 (ja) * 2014-09-05 2019-04-24 ホワ キム，テ 半導体製造チャンバー用のヒューム除去装置
JP6262634B2 (ja) * 2014-10-31 2018-01-17 東京エレクトロン株式会社 基板処理装置
US9817407B2 (en) * 2014-12-01 2017-11-14 Varian Semiconductor Equipment Associates, Inc. System and method of opening a load lock door valve at a desired pressure after venting
WO2019053836A1 (ja) * 2017-09-14 2019-03-21 株式会社日立ハイテクノロジーズ プラズマ処理装置およびウェットクリーニング方法
CN208521893U (zh) * 2017-12-14 2019-02-19 长鑫存储技术有限公司 半导体干式蚀刻机台
JP7358044B2 (ja) * 2018-02-09 2023-10-10 東京エレクトロン株式会社 基板処理装置
JP7378357B2 (ja) * 2020-06-17 2023-11-13 東京エレクトロン株式会社 基板処理装置およびガス供給配管のパージ方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1539027A (zh) * 2001-08-08 2004-10-20 ��ķ�о����޹�˾ 具有利用氮气吹扫的顶部通气口的快速循环腔室

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JPS6197544A (ja) * 1984-10-19 1986-05-16 Yamatake Honeywell Co Ltd 差圧発信器
JPH0671154A (ja) * 1991-07-17 1994-03-15 Tokyo Electron Ltd 真空室用ガス導入装置
JPH0679159A (ja) * 1991-07-17 1994-03-22 Tokyo Electron Ltd 真空室用ガス導入装置
JPH07225616A (ja) * 1994-02-15 1995-08-22 Hitachi Metals Ltd 逆流防止機能付マスフローコントローラ
JPH09280538A (ja) * 1996-04-12 1997-10-31 Mitsubishi Heavy Ind Ltd スーツブロワ
JPH09298136A (ja) * 1996-04-30 1997-11-18 Nissin Electric Co Ltd 基板処理方法およびその装置
JPH10321698A (ja) * 1997-05-21 1998-12-04 Tokyo Electron Ltd 基板処理方法及びその装置
JPH11162934A (ja) * 1997-11-21 1999-06-18 Sony Corp 半導体製造装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1539027A (zh) * 2001-08-08 2004-10-20 ��ķ�о����޹�˾ 具有利用氮气吹扫的顶部通气口的快速循环腔室

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JP2006128341A (ja) 2006-05-18
CN101582378A (zh) 2009-11-18
JP4798981B2 (ja) 2011-10-19
CN1790616A (zh) 2006-06-21
CN100524609C (zh) 2009-08-05

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