CN101229025B - 淋浴装置 - Google Patents

淋浴装置 Download PDF

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CN101229025B
CN101229025B CN2008100095557A CN200810009555A CN101229025B CN 101229025 B CN101229025 B CN 101229025B CN 2008100095557 A CN2008100095557 A CN 2008100095557A CN 200810009555 A CN200810009555 A CN 200810009555A CN 101229025 B CN101229025 B CN 101229025B
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shower
bath
static position
moving
water
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CN101229025A (zh
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G·格伦克
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Hansgrohe SE
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    • E—FIXED CONSTRUCTIONS
    • E03—WATER SUPPLY; SEWERAGE
    • E03C—DOMESTIC PLUMBING INSTALLATIONS FOR FRESH WATER OR WASTE WATER; SINKS
    • E03C1/00—Domestic plumbing installations for fresh water or waste water; Sinks
    • E03C1/02—Plumbing installations for fresh water
    • E03C1/04—Water-basin installations specially adapted to wash-basins or baths
    • E03C1/0408—Water installations especially for showers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/70—Arrangements for moving spray heads automatically to or from the working position
    • B05B15/72—Arrangements for moving spray heads automatically to or from the working position using hydraulic or pneumatic means
    • B05B15/74—Arrangements for moving spray heads automatically to or from the working position using hydraulic or pneumatic means driven by the discharged fluid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • B05B1/16—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening having selectively- effective outlets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • B05B1/18—Roses; Shower heads

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Hydrology & Water Resources (AREA)
  • Public Health (AREA)
  • Water Supply & Treatment (AREA)
  • Bathtubs, Showers, And Their Attachments (AREA)
  • Nozzles (AREA)

Abstract

一种靠近天花板水平安装的具有喷射喷嘴的淋浴装置，该淋浴装置被构造为可在静态位置和活动位置之间转动，其中喷射喷嘴的至少一部分在活动位置时凸出。为转动淋浴器的支架，提供一利用流入淋浴器的水流的力来转动淋浴器支架的操作设备。

Description

淋浴装置
技术领域
本发明涉及安装在墙壁或天花板上至少有一个可移动淋浴器的淋浴设备。
背景技术
众所周知，将手持的淋浴器附接到一个把柄，可能具有一个可调的滑块。该手持的淋浴器可以被移动、转动或在支架上旋转，通过这种方式可以改变手持淋浴器的喷水溅射方向。
从DE 29813597 U1中可以获知一种具有一个延伸的支架的淋浴系统，其特征为具有可移动的淋浴臂。该淋浴臂被铰接成围绕支架上部区域内的一个水平轴线，并且它可以从一个垂直的静态旋转位置旋转到水平的活动位置。
发明内容
该发明基于创造一个淋浴装置的任务，如开始所述，该发明可以防止出现现有技术中存在的问题，且其特别是以在淋浴装置上具有能用一种新颖、有利的方式移动的淋浴器为特征。
利用具有权利要求1中特征的淋浴装置来实现上述任务。该发明的有利的且优选的实施方式为权利要求所要求保护的主题并将随后进行更详细的解释。权利要求的措词成为说明书的内容、并且通过明确直接的引用而结合到本文中。
该淋浴器可以在静态位置和活动位置之间移动。在静态位置，淋浴器被很大程度上包围在淋浴装置中或者在淋浴装置的外表面或表面之后，其中它也可以构成外表面的一部分，且可以因此位于与外表面大致齐平或等高处。在活动位置，淋浴器脱离淋浴装置进行移动或旋转，因此它的活动可以延伸到淋浴装置的外表面或表面之外。与该发明相一致，该淋浴装置以具有一个操作设备为特征，该设备可以用于至少将淋浴器从静态位置移动到活动位置，其中，该操作设备可通过流入淋浴器的水流驱动或激活。有利的是通过流入淋浴器的水流确保充分地提供给移动淋浴器所需的大部分或整个驱动力。这种自激活动淋浴器不需要操作人员去干涉。通常为该淋浴设备设计一个配件就足以满足要求，并且特别的，相应地操作设置在淋浴装置上的其它的淋浴器单元和该可移动淋浴器之间的调节配件，则该可移动淋浴器不仅可以分配水，还可以被移动到活动位置。移动方式的细节，与可以精密设计静态位置和活动位置的方式一样，将在随后的描述中详细阐明。
以这样一种方式来设计该操作设备即通过流入其的水流使可移动淋浴器从静态位置直接移动到活动位置而不会停留在任何中间位置，这种方式具有优势。据此提供终点止挡件以便指定至静态位置和活动位置的最大移动。这样就可以保证除了在它本身短暂的移动阶段期间，该可移动淋浴器总是定位在静态位置或活动位置。这样就有可能可靠的避免具有不好界定的喷射方向和水输出的中间位置。在该发明的具体的实施方式中，当水开始流入可移动淋浴器时，在水实际流出以前该淋浴器首先完全地或接近地被移动到该活动位置，这样就能以尤为有效的方式保证定义一个最佳的喷射方向。
在本发明的另外的实施方式里，该操作设备设计成这样，当停止供水时，该淋浴器自动的从活动位置移动到静态位置，因此如以前一样不活动。至于相反的运动，可以提供复位力或回动弹簧通过弹力来移动淋浴器。为了能从静态位置到活动位置，通过水流及/或操作设备克服该力。有利的是可以在水流流经的区域以外，例如一个干燥的区域，设置回动弹簧。有利的是可以将其设计成塑料弹簧，并且特别有利的是可将其设计成片弹簧或类似的形式。可选的，可利用偏移的淋浴器通过重力实现复位。
根据本发明的优选的实施方式，该淋浴器以旋转运动的方式在静态位置和活动位置之间来回移动。旋转运动的旋转轴可以经过淋浴器的喷头，其中，它可以有效的安排喷头，使喷头在静态位置要低于在活动位置。从而有可能使水流入淋浴器，从而基本上沿着旋转轴流动。为了实现这些，比如一个管道或管线就可以组成淋浴器附着的旋转轴。在这种情况下，在淋浴装置的供水管和通向淋浴器的管道或管线之间密封来形成用于旋转的密封的进口。
有利的是静态位置和活动位置之间的旋转运动特征为具有在大约5度到45度的一个旋转角度，从而允许具有相对较小的转动角度。但也可以具有较大的旋转角度。
在本发明的另一个实施方式中，可移动淋浴器可以利用流入的水流的压力以基本上直线的方式从淋浴设备中移出。这时，比如可以采用柔韧的软管来供水。在本发明的备选的实施方式中，该供水管可以设计成伸缩套管。该管可以借助于流入的水流所形成的压力而伸长、而且该伸长运动随后使淋浴器移动，在接下来会更加详细的进行解释。
根据本发明的一个实施方式，处在静态位置的淋浴器或流水面或喷头构成淋浴设备的表面或外表面的一部分，其中淋浴设备的表面或外面优选地基本上是平的或等高的。该淋浴器及/或喷头至少部分地可接触(accessible)及/或可见，也就是稍微嵌入或在里面旋转。该特征具有优势，比如现在较多利用弹性材料比如硅制成的喷嘴，甚至在停用状态下也可以被接触以进行清洁。可选的，它们是可见的但也被包围在淋浴设备的表面或外表面，也就是缩在其中。
但是依照本发明的另一个实施方式，该淋浴器，及/或其喷射喷嘴在淋浴设备的静态位置也是被包围在淋浴设备里，但在这种情况下，它们从外部不可见及/或不能被容易进入。这时，当淋浴器处在静态位置时，可以使淋浴设备的表面或外表面在淋浴器区域极大程度上关闭。该特征具有优势，可移动淋浴器在初看起来不易发现或不可见，在被驱动时，其出人意料地从淋浴设备中出现或移出。这样，出于卫生原因该设计的淋浴器关闭，从美学的角度看该设计具有简洁的风格。
该淋浴器可以单独或与其他的可移动淋浴器一起安装在淋浴器支架上。该淋浴器支架也是以可移动的方式安装在淋浴设备上，并确保该淋浴器可以在静态位置和活动位置之间移动。如果在淋浴器支架上设置多个淋浴器，有利是可以将多个淋浴器以直线方式相邻设置，尤其是以平行于如前所述的旋转移动情况下的旋转轴的直线方式相邻设置。整个淋浴设备可以配置单个淋浴器支架或有可能地配置多个这样的支架。另外，淋浴器支架在旋转轴方向上可以比在横向方向上长，尤其在包括多个淋浴器时。采用这种方式，所有的可移动淋浴器的旋转运动相同。
在一方面，操作设备可设计这样一种方式，即流入淋浴设备的水流为操作设备的进口配置的水箱壁施加压力，以移动水箱壁。水箱壁同时移动淋浴器，尤其是通过铰链部件。另外，有利地，以这种方式设计水箱，即流入淋浴器的水流不会在可移动水箱壁的后边或周围流动，也就是在可移动水箱壁的区域水箱也是防水的。这里，该水箱壁可以是与其它任何水箱封闭隔开的分离的可移动部分。该水箱壁可以是以突出物形式可移动的或可以移动突出物，这样就可以移动或转动淋浴器。例如，如果淋浴设备安装在天花板上，水箱壁就能从上边对淋浴器的支架施加压力以向下转动支架或者从淋浴设备向外转动安装在淋浴器支架上的其中一个淋浴器。当停止供水时，如前所述的复位力或者回动弹簧可以将淋浴器的支架转动回到静态位置，从而也使水箱壁后退。
另一方面，该操作设备可以以在淋浴器的水流进口处具有一同步部件为特征。流入淋浴器的水流流过或在该部件的周围流动，从而将该部件从一静态位置移动到工作位置。该同步部件同淋浴器一起操作，或者利用铰链部件移动，采用这种方式淋浴器就可以与该同步部件精确地移动，特别是至少在从静态位置移动到活动位置时。因此，该同步部件设置在紧跟水流的位置而且可以，比如，设计成球形或椭圆形。特别地，该同步部件也可以在静态位置基本上密封进口且当水流流入淋浴器的时候被移动。
除了可移动淋浴器，该淋浴设备也可以以具有其他的淋浴器设备为特征。那些淋浴器设备可以设计成固定的或不可移动的方式且可以像可移动淋浴器那样通过调节器或组合部件进行操作。
在本发明的实施方式中，淋浴器相对较小，比如具有3厘米到10厘米之间的直径。其特征为可以具有少量的喷射喷头，比如2个到10个或15个。有利的，如前所述的淋浴器的支架特征为具有排列成一行的多个可移动淋浴器，比如4个淋浴器。
这些以及附加的特征来自权利要求，也来自于描述和技术附图，由此具体的技术特征可以单独执行，也可以将本发明的实施例或其他领域的技术予以组合的形式，形成有利的和有专利性的实施方式，属于本发明所要求保护的内容。本发明各个部分的细分以及中间的标题不能限制那些描述的一般有效性。
附图说明
下面用图解的方法在附图中更详细地描述本发明的实施方式的一个例子。
附图描述：
图1，当淋浴设备安装在天花板或靠近天花板的位置时，根据本发明的淋浴设备的仰视图，
图2，图1中的淋浴设备的放大的截面图，包括可移动淋浴器的侧截面，
图3，图1中描述的淋浴设备的纵向截面的放大细节图，其中的淋浴器处于静态位置以及
图4，当旋转到活动位置之后图3中的淋浴器。
具体实施方式
图1示出了依照本发明的包括壳体12和壳体底部13的平面和大表面设计的淋浴装置11的仰视图。淋浴装置11的左端装配有固定部件14，该部件可以将淋浴装置固定在高于淋浴器的墙壁上或是天花板的下方，因此，壳体底部13可以很大程度地保持水平。
该淋浴装置11的壳体底部13装配了一些淋浴器设备，即具有多个喷射喷头的圆形淋浴器16、一个特别长的狭缝状定量淋浴器17以及在他们之间的一个可移动的淋浴器装置19。该可移动淋浴器装置19特征为具有4个可移动淋浴器20，其中每个具有九个喷射喷头21，喷头都在一个可移动或旋转的淋浴器支架23上装配在一起。所有的淋浴器设备16，17和19基本上是向下或至少是向下倾斜喷水。
图2示出了该淋浴器支架23和淋浴装置11在该位置上的纵向剖面图。从这个图中可以看出该可移动淋浴器20及其喷射喷头21并没有凸出或者说没有充分的凸出壳体底部13，因此它们没有被真正的隐藏但至少是被包围了。该图也描述了进口25被装设为分别位于远处左边和远处右边的可移动的淋浴器20上的淋浴器支架23的左右供水。额外的进口26都向内定位为朝向该临近的淋浴器20。进口25也设置在管状部件28中，其中管状部件28以密封的方式设置在淋浴装置11和壳体12中、以及在淋浴器支架23中。该管状部件28用作淋浴器支架23的旋转轴从而具有用作进口25和机械旋转轴的双重功能。
图3和图4示出了旋转移动。这些描述了经过放大的以沿着旋转方向和管状部件28的轴线的视线的细节图。在图3和图4中象征性地描述了与纸面垂直的旋转轴29。
在供水管30里具有水箱31使水流入可移动淋浴器20。该水箱特征为在水箱的底部或底端具有活塞32，并且该活塞密封在壳体12中可上下移动。为了准确地控制移动，活塞32特征为顶端有一个装进壳体的导向柱塞34，其底端是一个宽的较短的凸出端35。该凸出端35与淋浴器支架23的上部左边缘相对。
现在，如果待从可移动淋浴器20及其喷射喷头21释放出来的水流流经供水管线30，则其流入水箱31。水压向下压迫活塞32，借此可以看到活塞的外面总是同壳体12密封连接而且水不会流经该处。在与图4的比较可以看出，活塞32的向下运动以及与此相连的凸出端35的向下运动使淋浴器支架23发生转动。在此，该水箱31中的活塞32被移动到它的最大的向下位置并且淋浴器支架23也挤压壳体12，以此来限制该旋转运动并限定该活动位置。图3描述了静态位置。经过围绕旋转轴29的旋转运动，与实际的淋浴器20的一部分一样，在图4左边描述的至少可移动淋浴器20的喷射喷头21、以及实际的淋浴器20的一部分，均超出了壳体底部13。从而它们变得可见且可以看到它们开始起作用。此外，还有可能由此改变喷头的喷射方向，从垂直向下的方向到一倾斜的方向。这里的旋转角度大约是15°，但它还可以更大或更小。
在本发明的实施方式中有可能，尤其是在图2左边和右边所示的两个进口25，提供两个相互分离的进口，根据图3和图4，进口25中的其中之一贯穿操作设备37，从而当水流过时使可移动淋浴器发生旋转，且进口25中的另一个直接到达淋浴器20并没有穿过操作设备37。该两个进口可通过设置在到固定部件14的路径上的配件上的不同的调节器来供水。
从图3和图4可以清楚地看出，旋转轴29的重新定位可以使可移动淋浴器20以及喷射喷头21具有更大的转动或者能可选地消除转动。
这里并没有描述产生用来使淋浴器20及/或淋浴器支架23从图4所示的活动位置复位到图3所示的静态位置的压力的回动弹簧。但是，专家可以发现这些简单且不言自明的设计。
另外，有可能设计使旋转轴29在淋浴器支架23的平衡点或中心点的稍微向左处，这样当停止供水时，重力会使淋浴器支架23产生从活动位置到静态位置的反向旋转并同时向上推压水箱31中的活塞32。
由于根据图3和图4可容易地进行一些可调整的修改，有可能给水箱里的活塞设置开口，这样活塞就可以被流过的水流移动，但也同时处于流入可移动淋浴器的水的路径中。然而，该活塞应当在底端利用入口或供水管同淋浴器相连，这样密封会稍微复杂一些，但虽然如此也是完全可行的。
通过转换和重新定向也可以想象到使图3的活塞32穿过一更长的启动行程就能够使淋浴器支架23和可移动淋浴器20具有更宽的转动角度。甚至有可能使这些淋浴器转动180°，从而处于静态位置时显示出一平面的外表面，这样淋浴装置的支架底端就看起来被关闭了。在活动位置，喷射喷头变得可见且水从淋浴装置中排出。

Claims (17)

1.可固定在墙上或天花板上的至少具有一个可移动淋浴器(20)的淋浴装置(11)，其中，淋浴器(20)构造成可在静态位置和活动位置之间移动，在静态位置时该淋浴器基本成为淋浴装置(11)外表面(13)的一部分或被包围在该外表面之下，在活动位置时，该淋浴器从淋浴装置(11)中向外部移动或旋转且延伸出该外表面(13)，其中还具有一操作设备(37)将淋浴器(20)从静态位置移动到活动位置，其中，该操作设备(37)通过流入淋浴器(20)的水来驱动或激活；
其中当处于静态位置时，淋浴器(20)或淋浴器(20)的喷射喷头(21)构成该淋浴装置(11)的平面或外表面(13)的部分；
其中流入淋浴器(20)的水对位于操作设备(37)的一个进口(30)里边的水箱(31)的壁(32)施加压力从而移动水箱壁(32)，其中该水箱壁(32)的移动使淋浴器(20)发生移动；
其中水箱壁(32)是一个分离的可移动部分，封闭其他的水箱(31)，该可移动部分以一种凸出端(35)的形式可移动，并且在它的移动过程中，移动或旋转淋浴器(20)，从而从上面挤压淋浴器支架(23)，以便旋转它。
2.如权利要求1所述的淋浴装置，其中操作设备(37)以这样一种方式设计，由流入淋浴器(20)的水驱动或激活，操作设备可以将淋浴器(20)从静态位置直接移动到动态位置而不会停在任何中间位置，其中终点止挡件为每次运动限定最大动作。
3.如权利要求1或2所述的淋浴装置，其中该操作设备(37)以这样一种方式设计，当水停止向淋浴器中流入时，该淋浴器(20)从活动位置自动移动到静态位置。
4.如权利要求3所述的淋浴装置，其中所述的从活动位置到静态位置的自动移动由回动弹簧的弹力来驱动。
5.如权利要求4所述的淋浴装置，其中该回动弹簧设置在水流过区域的外边。
6.如权利要求1所述的淋浴装置，其中该淋浴器(20)在静态位置和活动位置之间的移动为绕着旋转轴的转动，该旋转轴经过淋浴器(20)的喷射喷头(21)。
7.如权利要求6所述的淋浴装置，其中流入淋浴器(20)的水基本上沿着旋转轴(29)穿过形成该旋转轴(29)的管道(28)。
8.如权利要求1所述的淋浴装置，其中当处于静态位置时，淋浴器(20)或淋浴器(20)的喷射喷头(21)被包围在淋浴装置(11)的表面或外表面(13)之下并至少部分地可接触或可见。
9.如权利要求1所述的淋浴装置，淋浴器(20)或淋浴器(20)的喷射喷头(21)在处于静态位置时被包围在淋浴装置(11)的表面或外表面(13)之下并且不可接触或不可见。
10.如权利要求9所述的淋浴装置，其中当处在静态位置时，淋浴装置(11)的表面或外表面(13)在淋浴器(20)的区域被基本封闭。
11.如权利要求1所述的淋浴装置，其中淋浴器(20)设置在淋浴器支架(23)上并且该淋浴器支架(23)通过可在静态位置和活动位置运动的可移动的方式固定在淋浴装置(11)上。
12.如权利要求11所述的淋浴装置，其中在淋浴器支架(23)上设置多个淋浴器(20)，且其中这些淋浴器以直线方式相邻设置。
13.如权利要求11所述的淋浴装置，其中淋浴器支架(23)沿旋转轴(29)方向上要比在横向方向上要长很多，其中多个淋浴器(20)相邻且平行于旋转轴(29)设置。
14.如权利要求1所述的淋浴装置，其中在操作设备(37)中的进口(30)里具有一同步部件使水流入淋浴器(20)，这样该同步部件被流入的水流从一静态位置移动到一操作位置，并且其中该同步部件可操作地连接于淋浴器(20)，通过自身移动的方式来移动淋浴器(20)。
15.如权利要求1所述的淋浴装置，其中额外安装的淋浴器设备(16，17)是固定或是不可移动的淋浴器设备。
16.如权利要求15所述的淋浴装置，其中该流入的水流经由一个可调节的装置被分流在可移动淋浴器(20)和其他各种淋浴器设备(16，17)之间。
17.如权利要求1所述的淋浴装置，其中该带有喷射喷头(21)的可移动淋浴器(20)与整个淋浴装置相比相对较小。
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Families Citing this family (355)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10378106B2 (en) 2008-11-14 2019-08-13 Asm Ip Holding B.V. Method of forming insulation film by modified PEALD
US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
US8802201B2 (en) 2009-08-14 2014-08-12 Asm America, Inc. Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
DE102010023686A1 (de) * 2010-06-14 2011-12-15 Grohe Ag Brausevorrichtung
ITMI20110542A1 (it) * 2011-04-01 2012-10-02 Calflex S R L Soffione multigetto per doccia
US9312155B2 (en) 2011-06-06 2016-04-12 Asm Japan K.K. High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
US9793148B2 (en) 2011-06-22 2017-10-17 Asm Japan K.K. Method for positioning wafers in multiple wafer transport
US10364496B2 (en) 2011-06-27 2019-07-30 Asm Ip Holding B.V. Dual section module having shared and unshared mass flow controllers
US10854498B2 (en) 2011-07-15 2020-12-01 Asm Ip Holding B.V. Wafer-supporting device and method for producing same
US20130023129A1 (en) 2011-07-20 2013-01-24 Asm America, Inc. Pressure transmitter for a semiconductor processing environment
US9017481B1 (en) 2011-10-28 2015-04-28 Asm America, Inc. Process feed management for semiconductor substrate processing
US8946830B2 (en) 2012-04-04 2015-02-03 Asm Ip Holdings B.V. Metal oxide protective layer for a semiconductor device
US9558931B2 (en) 2012-07-27 2017-01-31 Asm Ip Holding B.V. System and method for gas-phase sulfur passivation of a semiconductor surface
US9659799B2 (en) 2012-08-28 2017-05-23 Asm Ip Holding B.V. Systems and methods for dynamic semiconductor process scheduling
US9021985B2 (en) 2012-09-12 2015-05-05 Asm Ip Holdings B.V. Process gas management for an inductively-coupled plasma deposition reactor
US9324811B2 (en) 2012-09-26 2016-04-26 Asm Ip Holding B.V. Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
US10714315B2 (en) 2012-10-12 2020-07-14 Asm Ip Holdings B.V. Semiconductor reaction chamber showerhead
US9640416B2 (en) 2012-12-26 2017-05-02 Asm Ip Holding B.V. Single-and dual-chamber module-attachable wafer-handling chamber
US20160376700A1 (en) 2013-02-01 2016-12-29 Asm Ip Holding B.V. System for treatment of deposition reactor
US9484191B2 (en) 2013-03-08 2016-11-01 Asm Ip Holding B.V. Pulsed remote plasma method and system
US9589770B2 (en) 2013-03-08 2017-03-07 Asm Ip Holding B.V. Method and systems for in-situ formation of intermediate reactive species
US8993054B2 (en) 2013-07-12 2015-03-31 Asm Ip Holding B.V. Method and system to reduce outgassing in a reaction chamber
US9018111B2 (en) 2013-07-22 2015-04-28 Asm Ip Holding B.V. Semiconductor reaction chamber with plasma capabilities
US9793115B2 (en) 2013-08-14 2017-10-17 Asm Ip Holding B.V. Structures and devices including germanium-tin films and methods of forming same
US9240412B2 (en) 2013-09-27 2016-01-19 Asm Ip Holding B.V. Semiconductor structure and device and methods of forming same using selective epitaxial process
US9556516B2 (en) 2013-10-09 2017-01-31 ASM IP Holding B.V Method for forming Ti-containing film by PEALD using TDMAT or TDEAT
US10179947B2 (en) 2013-11-26 2019-01-15 Asm Ip Holding B.V. Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition
USD724701S1 (en) * 2014-02-04 2015-03-17 ASM IP Holding, B.V. Shower plate
USD732644S1 (en) * 2014-02-04 2015-06-23 Asm Ip Holding B.V. Top plate
USD732145S1 (en) * 2014-02-04 2015-06-16 Asm Ip Holding B.V. Shower plate
US10683571B2 (en) 2014-02-25 2020-06-16 Asm Ip Holding B.V. Gas supply manifold and method of supplying gases to chamber using same
US9447498B2 (en) 2014-03-18 2016-09-20 Asm Ip Holding B.V. Method for performing uniform processing in gas system-sharing multiple reaction chambers
US10167557B2 (en) 2014-03-18 2019-01-01 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en) 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
US9404587B2 (en) 2014-04-24 2016-08-02 ASM IP Holding B.V Lockout tagout for semiconductor vacuum valve
US10858737B2 (en) 2014-07-28 2020-12-08 Asm Ip Holding B.V. Showerhead assembly and components thereof
US9543180B2 (en) 2014-08-01 2017-01-10 Asm Ip Holding B.V. Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum
US9890456B2 (en) 2014-08-21 2018-02-13 Asm Ip Holding B.V. Method and system for in situ formation of gas-phase compounds
US9657845B2 (en) 2014-10-07 2017-05-23 Asm Ip Holding B.V. Variable conductance gas distribution apparatus and method
US10941490B2 (en) 2014-10-07 2021-03-09 Asm Ip Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
KR102300403B1 (ko) 2014-11-19 2021-09-09 에이에스엠 아이피 홀딩 비.브이. 박막 증착 방법
KR102263121B1 (ko) 2014-12-22 2021-06-09 에이에스엠 아이피 홀딩 비.브이. 반도체 소자 및 그 제조 방법
US9868125B2 (en) 2015-01-19 2018-01-16 Moen Incorporated Multifunction pivoting body spray
US9478415B2 (en) 2015-02-13 2016-10-25 Asm Ip Holding B.V. Method for forming film having low resistance and shallow junction depth
USD767717S1 (en) * 2015-03-06 2016-09-27 Grohe Ag Shower head
US10529542B2 (en) 2015-03-11 2020-01-07 Asm Ip Holdings B.V. Cross-flow reactor and method
US10276355B2 (en) 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
KR101683225B1 (ko) * 2015-06-02 2016-12-07 하기호 모듈 타입의 샤워기 헤드 어셈블리
US10458018B2 (en) 2015-06-26 2019-10-29 Asm Ip Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
US10600673B2 (en) 2015-07-07 2020-03-24 Asm Ip Holding B.V. Magnetic susceptor to baseplate seal
US10043661B2 (en) 2015-07-13 2018-08-07 Asm Ip Holding B.V. Method for protecting layer by forming hydrocarbon-based extremely thin film
US9899291B2 (en) 2015-07-13 2018-02-20 Asm Ip Holding B.V. Method for protecting layer by forming hydrocarbon-based extremely thin film
US10083836B2 (en) 2015-07-24 2018-09-25 Asm Ip Holding B.V. Formation of boron-doped titanium metal films with high work function
US10087525B2 (en) 2015-08-04 2018-10-02 Asm Ip Holding B.V. Variable gap hard stop design
US9647114B2 (en) 2015-08-14 2017-05-09 Asm Ip Holding B.V. Methods of forming highly p-type doped germanium tin films and structures and devices including the films
US9711345B2 (en) 2015-08-25 2017-07-18 Asm Ip Holding B.V. Method for forming aluminum nitride-based film by PEALD
US9960072B2 (en) 2015-09-29 2018-05-01 Asm Ip Holding B.V. Variable adjustment for precise matching of multiple chamber cavity housings
US9909214B2 (en) 2015-10-15 2018-03-06 Asm Ip Holding B.V. Method for depositing dielectric film in trenches by PEALD
US10211308B2 (en) 2015-10-21 2019-02-19 Asm Ip Holding B.V. NbMC layers
US10322384B2 (en) 2015-11-09 2019-06-18 Asm Ip Holding B.V. Counter flow mixer for process chamber
US9455138B1 (en) 2015-11-10 2016-09-27 Asm Ip Holding B.V. Method for forming dielectric film in trenches by PEALD using H-containing gas
US9905420B2 (en) 2015-12-01 2018-02-27 Asm Ip Holding B.V. Methods of forming silicon germanium tin films and structures and devices including the films
US9607837B1 (en) 2015-12-21 2017-03-28 Asm Ip Holding B.V. Method for forming silicon oxide cap layer for solid state diffusion process
US9627221B1 (en) 2015-12-28 2017-04-18 Asm Ip Holding B.V. Continuous process incorporating atomic layer etching
US9735024B2 (en) 2015-12-28 2017-08-15 Asm Ip Holding B.V. Method of atomic layer etching using functional group-containing fluorocarbon
US11139308B2 (en) 2015-12-29 2021-10-05 Asm Ip Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
US9754779B1 (en) 2016-02-19 2017-09-05 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10529554B2 (en) 2016-02-19 2020-01-07 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10468251B2 (en) 2016-02-19 2019-11-05 Asm Ip Holding B.V. Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
US10501866B2 (en) 2016-03-09 2019-12-10 Asm Ip Holding B.V. Gas distribution apparatus for improved film uniformity in an epitaxial system
US10343920B2 (en) 2016-03-18 2019-07-09 Asm Ip Holding B.V. Aligned carbon nanotubes
US9892913B2 (en) 2016-03-24 2018-02-13 Asm Ip Holding B.V. Radial and thickness control via biased multi-port injection settings
US10190213B2 (en) 2016-04-21 2019-01-29 Asm Ip Holding B.V. Deposition of metal borides
US10865475B2 (en) 2016-04-21 2020-12-15 Asm Ip Holding B.V. Deposition of metal borides and silicides
US10087522B2 (en) 2016-04-21 2018-10-02 Asm Ip Holding B.V. Deposition of metal borides
US10032628B2 (en) 2016-05-02 2018-07-24 Asm Ip Holding B.V. Source/drain performance through conformal solid state doping
US10367080B2 (en) 2016-05-02 2019-07-30 Asm Ip Holding B.V. Method of forming a germanium oxynitride film
KR102592471B1 (ko) 2016-05-17 2023-10-20 에이에스엠 아이피 홀딩 비.브이. 금속 배선 형성 방법 및 이를 이용한 반도체 장치의 제조 방법
US11453943B2 (en) 2016-05-25 2022-09-27 Asm Ip Holding B.V. Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
USD785766S1 (en) 2016-06-15 2017-05-02 Asm Ip Holding B.V. Shower plate
CN105877566B (zh) * 2016-06-21 2019-02-05 龙岩学院 一种浴室内的老人防摔装置
US10388509B2 (en) 2016-06-28 2019-08-20 Asm Ip Holding B.V. Formation of epitaxial layers via dislocation filtering
USD829306S1 (en) 2016-07-06 2018-09-25 Asm Ip Holding B.V. Shower plate
US10612137B2 (en) 2016-07-08 2020-04-07 Asm Ip Holdings B.V. Organic reactants for atomic layer deposition
US9859151B1 (en) 2016-07-08 2018-01-02 Asm Ip Holding B.V. Selective film deposition method to form air gaps
US9793135B1 (en) 2016-07-14 2017-10-17 ASM IP Holding B.V Method of cyclic dry etching using etchant film
US10714385B2 (en) 2016-07-19 2020-07-14 Asm Ip Holding B.V. Selective deposition of tungsten
KR102354490B1 (ko) 2016-07-27 2022-01-21 에이에스엠 아이피 홀딩 비.브이. 기판 처리 방법
US10177025B2 (en) 2016-07-28 2019-01-08 Asm Ip Holding B.V. Method and apparatus for filling a gap
US9812320B1 (en) 2016-07-28 2017-11-07 Asm Ip Holding B.V. Method and apparatus for filling a gap
US10395919B2 (en) 2016-07-28 2019-08-27 Asm Ip Holding B.V. Method and apparatus for filling a gap
US9887082B1 (en) 2016-07-28 2018-02-06 Asm Ip Holding B.V. Method and apparatus for filling a gap
KR102532607B1 (ko) 2016-07-28 2023-05-15 에이에스엠 아이피 홀딩 비.브이. 기판 가공 장치 및 그 동작 방법
US10090316B2 (en) 2016-09-01 2018-10-02 Asm Ip Holding B.V. 3D stacked multilayer semiconductor memory using doped select transistor channel
US10410943B2 (en) 2016-10-13 2019-09-10 Asm Ip Holding B.V. Method for passivating a surface of a semiconductor and related systems
US10643826B2 (en) 2016-10-26 2020-05-05 Asm Ip Holdings B.V. Methods for thermally calibrating reaction chambers
US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
US10229833B2 (en) 2016-11-01 2019-03-12 Asm Ip Holding B.V. Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10714350B2 (en) 2016-11-01 2020-07-14 ASM IP Holdings, B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10435790B2 (en) 2016-11-01 2019-10-08 Asm Ip Holding B.V. Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
US10643904B2 (en) 2016-11-01 2020-05-05 Asm Ip Holdings B.V. Methods for forming a semiconductor device and related semiconductor device structures
US10134757B2 (en) 2016-11-07 2018-11-20 Asm Ip Holding B.V. Method of processing a substrate and a device manufactured by using the method
KR102546317B1 (ko) 2016-11-15 2023-06-21 에이에스엠 아이피 홀딩 비.브이. 기체 공급 유닛 및 이를 포함하는 기판 처리 장치
US10340135B2 (en) 2016-11-28 2019-07-02 Asm Ip Holding B.V. Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
KR20180068582A (ko) 2016-12-14 2018-06-22 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
US9916980B1 (en) 2016-12-15 2018-03-13 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11581186B2 (en) 2016-12-15 2023-02-14 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
KR20180070971A (ko) 2016-12-19 2018-06-27 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
US10269558B2 (en) 2016-12-22 2019-04-23 Asm Ip Holding B.V. Method of forming a structure on a substrate
US10867788B2 (en) 2016-12-28 2020-12-15 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11390950B2 (en) 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process
US10655221B2 (en) 2017-02-09 2020-05-19 Asm Ip Holding B.V. Method for depositing oxide film by thermal ALD and PEALD
US10468261B2 (en) 2017-02-15 2019-11-05 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
DE102017203946B4 (de) * 2017-03-09 2019-11-07 Hansgrohe Se Schwenkbrause mit Absperrventil
DE102017203945B3 (de) * 2017-03-09 2018-03-29 Hansgrohe Se Schwenkbrause mit fluiddruckgetriebenem Schwenkkörper
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US10283353B2 (en) 2017-03-29 2019-05-07 Asm Ip Holding B.V. Method of reforming insulating film deposited on substrate with recess pattern
US10103040B1 (en) 2017-03-31 2018-10-16 Asm Ip Holding B.V. Apparatus and method for manufacturing a semiconductor device
USD830981S1 (en) 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus
KR102457289B1 (ko) 2017-04-25 2022-10-21 에이에스엠 아이피 홀딩 비.브이. 박막 증착 방법 및 반도체 장치의 제조 방법
US10892156B2 (en) 2017-05-08 2021-01-12 Asm Ip Holding B.V. Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US10446393B2 (en) 2017-05-08 2019-10-15 Asm Ip Holding B.V. Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
US10770286B2 (en) 2017-05-08 2020-09-08 Asm Ip Holdings B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10504742B2 (en) 2017-05-31 2019-12-10 Asm Ip Holding B.V. Method of atomic layer etching using hydrogen plasma
US10886123B2 (en) 2017-06-02 2021-01-05 Asm Ip Holding B.V. Methods for forming low temperature semiconductor layers and related semiconductor device structures
US12040200B2 (en) 2017-06-20 2024-07-16 Asm Ip Holding B.V. Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US11306395B2 (en) 2017-06-28 2022-04-19 Asm Ip Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US10685834B2 (en) 2017-07-05 2020-06-16 Asm Ip Holdings B.V. Methods for forming a silicon germanium tin layer and related semiconductor device structures
KR20190009245A (ko) 2017-07-18 2019-01-28 에이에스엠 아이피 홀딩 비.브이. 반도체 소자 구조물 형성 방법 및 관련된 반도체 소자 구조물
US10541333B2 (en) 2017-07-19 2020-01-21 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11374112B2 (en) 2017-07-19 2022-06-28 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11018002B2 (en) 2017-07-19 2021-05-25 Asm Ip Holding B.V. Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US10312055B2 (en) 2017-07-26 2019-06-04 Asm Ip Holding B.V. Method of depositing film by PEALD using negative bias
US10590535B2 (en) 2017-07-26 2020-03-17 Asm Ip Holdings B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10605530B2 (en) 2017-07-26 2020-03-31 Asm Ip Holding B.V. Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace
US10692741B2 (en) 2017-08-08 2020-06-23 Asm Ip Holdings B.V. Radiation shield
US10770336B2 (en) 2017-08-08 2020-09-08 Asm Ip Holding B.V. Substrate lift mechanism and reactor including same
US11769682B2 (en) 2017-08-09 2023-09-26 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11139191B2 (en) 2017-08-09 2021-10-05 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US10249524B2 (en) 2017-08-09 2019-04-02 Asm Ip Holding B.V. Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US10236177B1 (en) 2017-08-22 2019-03-19 ASM IP Holding B.V.. Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures
USD900036S1 (en) 2017-08-24 2020-10-27 Asm Ip Holding B.V. Heater electrical connector and adapter
US11830730B2 (en) 2017-08-29 2023-11-28 Asm Ip Holding B.V. Layer forming method and apparatus
US11295980B2 (en) 2017-08-30 2022-04-05 Asm Ip Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
KR102491945B1 (ko) 2017-08-30 2023-01-26 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
US11056344B2 (en) 2017-08-30 2021-07-06 Asm Ip Holding B.V. Layer forming method
KR102401446B1 (ko) 2017-08-31 2022-05-24 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
US10607895B2 (en) 2017-09-18 2020-03-31 Asm Ip Holdings B.V. Method for forming a semiconductor device structure comprising a gate fill metal
KR102630301B1 (ko) 2017-09-21 2024-01-29 에이에스엠 아이피 홀딩 비.브이. 침투성 재료의 순차 침투 합성 방법 처리 및 이를 이용하여 형성된 구조물 및 장치
US10844484B2 (en) 2017-09-22 2020-11-24 Asm Ip Holding B.V. Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US10658205B2 (en) 2017-09-28 2020-05-19 Asm Ip Holdings B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10403504B2 (en) 2017-10-05 2019-09-03 Asm Ip Holding B.V. Method for selectively depositing a metallic film on a substrate
US10319588B2 (en) 2017-10-10 2019-06-11 Asm Ip Holding B.V. Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10923344B2 (en) 2017-10-30 2021-02-16 Asm Ip Holding B.V. Methods for forming a semiconductor structure and related semiconductor structures
US10910262B2 (en) 2017-11-16 2021-02-02 Asm Ip Holding B.V. Method of selectively depositing a capping layer structure on a semiconductor device structure
KR102443047B1 (ko) 2017-11-16 2022-09-14 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치 방법 및 그에 의해 제조된 장치
US11022879B2 (en) 2017-11-24 2021-06-01 Asm Ip Holding B.V. Method of forming an enhanced unexposed photoresist layer
KR102633318B1 (ko) 2017-11-27 2024-02-05 에이에스엠 아이피 홀딩 비.브이. 청정 소형 구역을 포함한 장치
WO2019103613A1 (en) 2017-11-27 2019-05-31 Asm Ip Holding B.V. A storage device for storing wafer cassettes for use with a batch furnace
US10290508B1 (en) 2017-12-05 2019-05-14 Asm Ip Holding B.V. Method for forming vertical spacers for spacer-defined patterning
US10872771B2 (en) 2018-01-16 2020-12-22 Asm Ip Holding B. V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
TWI799494B (zh) 2018-01-19 2023-04-21 荷蘭商Ａｓｍ 智慧財產控股公司 沈積方法
CN111630203A (zh) 2018-01-19 2020-09-04 Asm Ip私人控股有限公司 通过等离子体辅助沉积来沉积间隙填充层的方法
USD903477S1 (en) 2018-01-24 2020-12-01 Asm Ip Holdings B.V. Metal clamp
US11018047B2 (en) 2018-01-25 2021-05-25 Asm Ip Holding B.V. Hybrid lift pin
US10535516B2 (en) 2018-02-01 2020-01-14 Asm Ip Holdings B.V. Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures
USD880437S1 (en) 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US11081345B2 (en) 2018-02-06 2021-08-03 Asm Ip Holding B.V. Method of post-deposition treatment for silicon oxide film
WO2019158960A1 (en) 2018-02-14 2019-08-22 Asm Ip Holding B.V. A method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10896820B2 (en) 2018-02-14 2021-01-19 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10731249B2 (en) 2018-02-15 2020-08-04 Asm Ip Holding B.V. Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
KR102636427B1 (ko) 2018-02-20 2024-02-13 에이에스엠 아이피 홀딩 비.브이. 기판 처리 방법 및 장치
US10658181B2 (en) 2018-02-20 2020-05-19 Asm Ip Holding B.V. Method of spacer-defined direct patterning in semiconductor fabrication
US10975470B2 (en) 2018-02-23 2021-04-13 Asm Ip Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11473195B2 (en) 2018-03-01 2022-10-18 Asm Ip Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
US11629406B2 (en) 2018-03-09 2023-04-18 Asm Ip Holding B.V. Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11114283B2 (en) 2018-03-16 2021-09-07 Asm Ip Holding B.V. Reactor, system including the reactor, and methods of manufacturing and using same
KR102646467B1 (ko) 2018-03-27 2024-03-11 에이에스엠 아이피 홀딩 비.브이. 기판 상에 전극을 형성하는 방법 및 전극을 포함하는 반도체 소자 구조
US11230766B2 (en) 2018-03-29 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
US11088002B2 (en) 2018-03-29 2021-08-10 Asm Ip Holding B.V. Substrate rack and a substrate processing system and method
US10510536B2 (en) 2018-03-29 2019-12-17 Asm Ip Holding B.V. Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber
KR102501472B1 (ko) 2018-03-30 2023-02-20 에이에스엠 아이피 홀딩 비.브이. 기판 처리 방법
US12025484B2 (en) 2018-05-08 2024-07-02 Asm Ip Holding B.V. Thin film forming method
KR20190128558A (ko) 2018-05-08 2019-11-18 에이에스엠 아이피 홀딩 비.브이. 기판 상에 산화물 막을 주기적 증착 공정에 의해 증착하기 위한 방법 및 관련 소자 구조
TW202349473A (zh) 2018-05-11 2023-12-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於基板上形成摻雜金屬碳化物薄膜之方法及相關半導體元件結構
DE102018208124A1 (de) * 2018-05-23 2019-11-28 Hansgrohe Se Fluidauslaufvorrichtung mit Teleskoprohrauslauf
KR102596988B1 (ko) 2018-05-28 2023-10-31 에이에스엠 아이피 홀딩 비.브이. 기판 처리 방법 및 그에 의해 제조된 장치
US11270899B2 (en) 2018-06-04 2022-03-08 Asm Ip Holding B.V. Wafer handling chamber with moisture reduction
US11718913B2 (en) 2018-06-04 2023-08-08 Asm Ip Holding B.V. Gas distribution system and reactor system including same
US11286562B2 (en) 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
US10797133B2 (en) 2018-06-21 2020-10-06 Asm Ip Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
KR102568797B1 (ko) 2018-06-21 2023-08-21 에이에스엠 아이피 홀딩 비.브이. 기판 처리 시스템
TW202409324A (zh) 2018-06-27 2024-03-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於形成含金屬材料之循環沉積製程
TW202405221A (zh) 2018-06-27 2024-02-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於形成含金屬材料及包含含金屬材料的膜及結構之循環沉積方法
US10612136B2 (en) 2018-06-29 2020-04-07 ASM IP Holding, B.V. Temperature-controlled flange and reactor system including same
TWI751420B (zh) 2018-06-29 2022-01-01 荷蘭商Ａｓｍ知識產權私人控股有限公司 薄膜沉積方法
US10388513B1 (en) 2018-07-03 2019-08-20 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10755922B2 (en) 2018-07-03 2020-08-25 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10767789B2 (en) 2018-07-16 2020-09-08 Asm Ip Holding B.V. Diaphragm valves, valve components, and methods for forming valve components
US10483099B1 (en) 2018-07-26 2019-11-19 Asm Ip Holding B.V. Method for forming thermally stable organosilicon polymer film
US11053591B2 (en) 2018-08-06 2021-07-06 Asm Ip Holding B.V. Multi-port gas injection system and reactor system including same
US10883175B2 (en) 2018-08-09 2021-01-05 Asm Ip Holding B.V. Vertical furnace for processing substrates and a liner for use therein
US10829852B2 (en) 2018-08-16 2020-11-10 Asm Ip Holding B.V. Gas distribution device for a wafer processing apparatus
US11430674B2 (en) 2018-08-22 2022-08-30 Asm Ip Holding B.V. Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
KR20200030162A (ko) 2018-09-11 2020-03-20 에이에스엠 아이피 홀딩 비.브이. 박막 증착 방법
US11024523B2 (en) 2018-09-11 2021-06-01 Asm Ip Holding B.V. Substrate processing apparatus and method
US11049751B2 (en) 2018-09-14 2021-06-29 Asm Ip Holding B.V. Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
CN110970344A (zh) 2018-10-01 2020-04-07 Asm Ip控股有限公司 衬底保持设备、包含所述设备的系统及其使用方法
US11232963B2 (en) 2018-10-03 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102592699B1 (ko) 2018-10-08 2023-10-23 에이에스엠 아이피 홀딩 비.브이. 기판 지지 유닛 및 이를 포함하는 박막 증착 장치와 기판 처리 장치
US10847365B2 (en) 2018-10-11 2020-11-24 Asm Ip Holding B.V. Method of forming conformal silicon carbide film by cyclic CVD
US10811256B2 (en) 2018-10-16 2020-10-20 Asm Ip Holding B.V. Method for etching a carbon-containing feature
KR102546322B1 (ko) 2018-10-19 2023-06-21 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치 및 기판 처리 방법
KR102605121B1 (ko) 2018-10-19 2023-11-23 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치 및 기판 처리 방법
USD948463S1 (en) 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US10381219B1 (en) 2018-10-25 2019-08-13 Asm Ip Holding B.V. Methods for forming a silicon nitride film
US11087997B2 (en) 2018-10-31 2021-08-10 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
KR20200051105A (ko) 2018-11-02 2020-05-13 에이에스엠 아이피 홀딩 비.브이. 기판 지지 유닛 및 이를 포함하는 기판 처리 장치
US11572620B2 (en) 2018-11-06 2023-02-07 Asm Ip Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
US11031242B2 (en) 2018-11-07 2021-06-08 Asm Ip Holding B.V. Methods for depositing a boron doped silicon germanium film
US10847366B2 (en) 2018-11-16 2020-11-24 Asm Ip Holding B.V. Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US10818758B2 (en) 2018-11-16 2020-10-27 Asm Ip Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10559458B1 (en) 2018-11-26 2020-02-11 Asm Ip Holding B.V. Method of forming oxynitride film
US12040199B2 (en) 2018-11-28 2024-07-16 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
US11217444B2 (en) 2018-11-30 2022-01-04 Asm Ip Holding B.V. Method for forming an ultraviolet radiation responsive metal oxide-containing film
KR102636428B1 (ko) 2018-12-04 2024-02-13 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치를 세정하는 방법
US11158513B2 (en) 2018-12-13 2021-10-26 Asm Ip Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
JP7504584B2 (ja) 2018-12-14 2024-06-24 エーエスエム・アイピー・ホールディング・ベー・フェー 窒化ガリウムの選択的堆積を用いてデバイス構造体を形成する方法及びそのためのシステム
TWI819180B (zh) 2019-01-17 2023-10-21 荷蘭商Ａｓｍ 智慧財產控股公司 藉由循環沈積製程於基板上形成含過渡金屬膜之方法
KR20200091543A (ko) 2019-01-22 2020-07-31 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
CN111524788B (zh) 2019-02-01 2023-11-24 Asm Ip私人控股有限公司 氧化硅的拓扑选择性膜形成的方法
US11482533B2 (en) 2019-02-20 2022-10-25 Asm Ip Holding B.V. Apparatus and methods for plug fill deposition in 3-D NAND applications
KR102626263B1 (ko) 2019-02-20 2024-01-16 에이에스엠 아이피 홀딩 비.브이. 처리 단계를 포함하는 주기적 증착 방법 및 이를 위한 장치
JP2020136678A (ja) 2019-02-20 2020-08-31 エーエスエム・アイピー・ホールディング・ベー・フェー 基材表面内に形成された凹部を充填するための方法および装置
JP7509548B2 (ja) 2019-02-20 2024-07-02 エーエスエム・アイピー・ホールディング・ベー・フェー 基材表面内に形成された凹部を充填するための周期的堆積方法および装置
JP2020133004A (ja) 2019-02-22 2020-08-31 エーエスエム・アイピー・ホールディング・ベー・フェー 基材を処理するための基材処理装置および方法
KR20200108242A (ko) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. 실리콘 질화물 층을 선택적으로 증착하는 방법, 및 선택적으로 증착된 실리콘 질화물 층을 포함하는 구조체
KR20200108243A (ko) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. SiOC 층을 포함한 구조체 및 이의 형성 방법
KR20200108248A (ko) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. SiOCN 층을 포함한 구조체 및 이의 형성 방법
KR20200116033A (ko) 2019-03-28 2020-10-08 에이에스엠 아이피 홀딩 비.브이. 도어 개방기 및 이를 구비한 기판 처리 장치
KR20200116855A (ko) 2019-04-01 2020-10-13 에이에스엠 아이피 홀딩 비.브이. 반도체 소자를 제조하는 방법
KR20200123380A (ko) 2019-04-19 2020-10-29 에이에스엠 아이피 홀딩 비.브이. 층 형성 방법 및 장치
KR20200125453A (ko) 2019-04-24 2020-11-04 에이에스엠 아이피 홀딩 비.브이. 기상 반응기 시스템 및 이를 사용하는 방법
KR20200130121A (ko) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. 딥 튜브가 있는 화학물질 공급원 용기
KR20200130118A (ko) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. 비정질 탄소 중합체 막을 개질하는 방법
KR20200130652A (ko) 2019-05-10 2020-11-19 에이에스엠 아이피 홀딩 비.브이. 표면 상에 재료를 증착하는 방법 및 본 방법에 따라 형성된 구조
JP2020188255A (ja) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー．ブイ． ウェハボートハンドリング装置、縦型バッチ炉および方法
JP2020188254A (ja) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー．ブイ． ウェハボートハンドリング装置、縦型バッチ炉および方法
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD947913S1 (en) 2019-05-17 2022-04-05 Asm Ip Holding B.V. Susceptor shaft
USD935572S1 (en) 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
USD922229S1 (en) 2019-06-05 2021-06-15 Asm Ip Holding B.V. Device for controlling a temperature of a gas supply unit
KR20200141002A (ko) 2019-06-06 2020-12-17 에이에스엠 아이피 홀딩 비.브이. 배기 가스 분석을 포함한 기상 반응기 시스템을 사용하는 방법
KR20200143254A (ko) 2019-06-11 2020-12-23 에이에스엠 아이피 홀딩 비.브이. 개질 가스를 사용하여 전자 구조를 형성하는 방법, 상기 방법을 수행하기 위한 시스템, 및 상기 방법을 사용하여 형성되는 구조
USD944946S1 (en) 2019-06-14 2022-03-01 Asm Ip Holding B.V. Shower plate
USD931978S1 (en) 2019-06-27 2021-09-28 Asm Ip Holding B.V. Showerhead vacuum transport
KR20210005515A (ko) 2019-07-03 2021-01-14 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치용 온도 제어 조립체 및 이를 사용하는 방법
JP7499079B2 (ja) 2019-07-09 2024-06-13 エーエスエム・アイピー・ホールディング・ベー・フェー 同軸導波管を用いたプラズマ装置、基板処理方法
CN112216646A (zh) 2019-07-10 2021-01-12 Asm Ip私人控股有限公司 基板支撑组件及包括其的基板处理装置
KR20210010307A (ko) 2019-07-16 2021-01-27 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
KR20210010820A (ko) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. 실리콘 게르마늄 구조를 형성하는 방법
KR20210010816A (ko) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. 라디칼 보조 점화 플라즈마 시스템 및 방법
US11643724B2 (en) 2019-07-18 2023-05-09 Asm Ip Holding B.V. Method of forming structures using a neutral beam
TWI839544B (zh) 2019-07-19 2024-04-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 形成形貌受控的非晶碳聚合物膜之方法
TW202113936A (zh) 2019-07-29 2021-04-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於利用n型摻雜物及/或替代摻雜物選擇性沉積以達成高摻雜物併入之方法
CN112309899A (zh) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 基板处理设备
CN112309900A (zh) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 基板处理设备
US11227782B2 (en) 2019-07-31 2022-01-18 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587815B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587814B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
CN112323048B (zh) 2019-08-05 2024-02-09 Asm Ip私人控股有限公司 用于化学源容器的液位传感器
USD965524S1 (en) 2019-08-19 2022-10-04 Asm Ip Holding B.V. Susceptor support
USD965044S1 (en) 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
JP2021031769A (ja) 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー．ブイ． 成膜原料混合ガス生成装置及び成膜装置
KR20210024423A (ko) 2019-08-22 2021-03-05 에이에스엠 아이피 홀딩 비.브이. 홀을 구비한 구조체를 형성하기 위한 방법
USD949319S1 (en) 2019-08-22 2022-04-19 Asm Ip Holding B.V. Exhaust duct
USD940837S1 (en) 2019-08-22 2022-01-11 Asm Ip Holding B.V. Electrode
USD979506S1 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
USD930782S1 (en) 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
KR20210024420A (ko) 2019-08-23 2021-03-05 에이에스엠 아이피 홀딩 비.브이. 비스(디에틸아미노)실란을 사용하여 peald에 의해 개선된 품질을 갖는 실리콘 산화물 막을 증착하기 위한 방법
US11286558B2 (en) 2019-08-23 2022-03-29 Asm Ip Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
KR20210029090A (ko) 2019-09-04 2021-03-15 에이에스엠 아이피 홀딩 비.브이. 희생 캡핑 층을 이용한 선택적 증착 방법
KR20210029663A (ko) 2019-09-05 2021-03-16 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
US11562901B2 (en) 2019-09-25 2023-01-24 Asm Ip Holding B.V. Substrate processing method
CN112593212B (zh) 2019-10-02 2023-12-22 Asm Ip私人控股有限公司 通过循环等离子体增强沉积工艺形成拓扑选择性氧化硅膜的方法
CN112635282A (zh) 2019-10-08 2021-04-09 Asm Ip私人控股有限公司 具有连接板的基板处理装置、基板处理方法
KR20210042810A (ko) 2019-10-08 2021-04-20 에이에스엠 아이피 홀딩 비.브이. 활성 종을 이용하기 위한 가스 분배 어셈블리를 포함한 반응기 시스템 및 이를 사용하는 방법
KR20210043460A (ko) 2019-10-10 2021-04-21 에이에스엠 아이피 홀딩 비.브이. 포토레지스트 하부층을 형성하기 위한 방법 및 이를 포함한 구조체
US12009241B2 (en) 2019-10-14 2024-06-11 Asm Ip Holding B.V. Vertical batch furnace assembly with detector to detect cassette
TWI834919B (zh) 2019-10-16 2024-03-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氧化矽之拓撲選擇性膜形成之方法
US11637014B2 (en) 2019-10-17 2023-04-25 Asm Ip Holding B.V. Methods for selective deposition of doped semiconductor material
KR20210047808A (ko) 2019-10-21 2021-04-30 에이에스엠 아이피 홀딩 비.브이. 막을 선택적으로 에칭하기 위한 장치 및 방법
KR20210050453A (ko) 2019-10-25 2021-05-07 에이에스엠 아이피 홀딩 비.브이. 기판 표면 상의 갭 피처를 충진하는 방법 및 이와 관련된 반도체 소자 구조
US11646205B2 (en) 2019-10-29 2023-05-09 Asm Ip Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
KR20210054983A (ko) 2019-11-05 2021-05-14 에이에스엠 아이피 홀딩 비.브이. 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템
US11501968B2 (en) 2019-11-15 2022-11-15 Asm Ip Holding B.V. Method for providing a semiconductor device with silicon filled gaps
KR20210062561A (ko) 2019-11-20 2021-05-31 에이에스엠 아이피 홀딩 비.브이. 기판의 표면 상에 탄소 함유 물질을 증착하는 방법, 상기 방법을 사용하여 형성된 구조물, 및 상기 구조물을 형성하기 위한 시스템
CN112951697A (zh) 2019-11-26 2021-06-11 Asm Ip私人控股有限公司 基板处理设备
US11450529B2 (en) 2019-11-26 2022-09-20 Asm Ip Holding B.V. Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
CN112885693A (zh) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 基板处理设备
CN112885692A (zh) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 基板处理设备
JP2021090042A (ja) 2019-12-02 2021-06-10 エーエスエム アイピー ホールディング ビー．ブイ． 基板処理装置、基板処理方法
KR20210070898A (ko) 2019-12-04 2021-06-15 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
KR20210078405A (ko) 2019-12-17 2021-06-28 에이에스엠 아이피 홀딩 비.브이. 바나듐 나이트라이드 층을 형성하는 방법 및 바나듐 나이트라이드 층을 포함하는 구조
US11527403B2 (en) 2019-12-19 2022-12-13 Asm Ip Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
TW202140135A (zh) 2020-01-06 2021-11-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氣體供應總成以及閥板總成
KR20210089079A (ko) 2020-01-06 2021-07-15 에이에스엠 아이피 홀딩 비.브이. 채널형 리프트 핀
US11993847B2 (en) 2020-01-08 2024-05-28 Asm Ip Holding B.V. Injector
KR102675856B1 (ko) 2020-01-20 2024-06-17 에이에스엠 아이피 홀딩 비.브이. 박막 형성 방법 및 박막 표면 개질 방법
TW202130846A (zh) 2020-02-03 2021-08-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 形成包括釩或銦層的結構之方法
KR20210100010A (ko) 2020-02-04 2021-08-13 에이에스엠 아이피 홀딩 비.브이. 대형 물품의 투과율 측정을 위한 방법 및 장치
US11776846B2 (en) 2020-02-07 2023-10-03 Asm Ip Holding B.V. Methods for depositing gap filling fluids and related systems and devices
US11781243B2 (en) 2020-02-17 2023-10-10 Asm Ip Holding B.V. Method for depositing low temperature phosphorous-doped silicon
TW202203344A (zh) 2020-02-28 2022-01-16 荷蘭商Ａｓｍ Ｉｐ控股公司 專用於零件清潔的系統
KR20210116240A (ko) 2020-03-11 2021-09-27 에이에스엠 아이피 홀딩 비.브이. 조절성 접합부를 갖는 기판 핸들링 장치
US11876356B2 (en) 2020-03-11 2024-01-16 Asm Ip Holding B.V. Lockout tagout assembly and system and method of using same
CN113394086A (zh) 2020-03-12 2021-09-14 Asm Ip私人控股有限公司 用于制造具有目标拓扑轮廓的层结构的方法
KR20210124042A (ko) 2020-04-02 2021-10-14 에이에스엠 아이피 홀딩 비.브이. 박막 형성 방법
TW202146689A (zh) 2020-04-03 2021-12-16 荷蘭商Ａｓｍ Ｉｐ控股公司 阻障層形成方法及半導體裝置的製造方法
TW202145344A (zh) 2020-04-08 2021-12-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於選擇性蝕刻氧化矽膜之設備及方法
US11821078B2 (en) 2020-04-15 2023-11-21 Asm Ip Holding B.V. Method for forming precoat film and method for forming silicon-containing film
US11996289B2 (en) 2020-04-16 2024-05-28 Asm Ip Holding B.V. Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
KR20210132600A (ko) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. 바나듐, 질소 및 추가 원소를 포함한 층을 증착하기 위한 방법 및 시스템
KR20210132605A (ko) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. 냉각 가스 공급부를 포함한 수직형 배치 퍼니스 어셈블리
CN113555279A (zh) 2020-04-24 2021-10-26 Asm Ip私人控股有限公司 形成含氮化钒的层的方法及包含其的结构
KR20210134226A (ko) 2020-04-29 2021-11-09 에이에스엠 아이피 홀딩 비.브이. 고체 소스 전구체 용기
KR20210134869A (ko) 2020-05-01 2021-11-11 에이에스엠 아이피 홀딩 비.브이. Foup 핸들러를 이용한 foup의 빠른 교환
KR20210141379A (ko) 2020-05-13 2021-11-23 에이에스엠 아이피 홀딩 비.브이. 반응기 시스템용 레이저 정렬 고정구
KR20210143653A (ko) 2020-05-19 2021-11-29 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
KR20210145078A (ko) 2020-05-21 2021-12-01 에이에스엠 아이피 홀딩 비.브이. 다수의 탄소 층을 포함한 구조체 및 이를 형성하고 사용하는 방법
KR20210145080A (ko) 2020-05-22 2021-12-01 에이에스엠 아이피 홀딩 비.브이. 과산화수소를 사용하여 박막을 증착하기 위한 장치
TW202201602A (zh) 2020-05-29 2022-01-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基板處理方法
TW202218133A (zh) 2020-06-24 2022-05-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 形成含矽層之方法
TW202217953A (zh) 2020-06-30 2022-05-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基板處理方法
TW202202649A (zh) 2020-07-08 2022-01-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基板處理方法
KR20220010438A (ko) 2020-07-17 2022-01-25 에이에스엠 아이피 홀딩 비.브이. 포토리소그래피에 사용하기 위한 구조체 및 방법
TW202204662A (zh) 2020-07-20 2022-02-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於沉積鉬層之方法及系統
US12040177B2 (en) 2020-08-18 2024-07-16 Asm Ip Holding B.V. Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
KR20220027026A (ko) 2020-08-26 2022-03-07 에이에스엠 아이피 홀딩 비.브이. 금속 실리콘 산화물 및 금속 실리콘 산질화물 층을 형성하기 위한 방법 및 시스템
USD990534S1 (en) 2020-09-11 2023-06-27 Asm Ip Holding B.V. Weighted lift pin
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
US12009224B2 (en) 2020-09-29 2024-06-11 Asm Ip Holding B.V. Apparatus and method for etching metal nitrides
TW202229613A (zh) 2020-10-14 2022-08-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 於階梯式結構上沉積材料的方法
KR20220053482A (ko) 2020-10-22 2022-04-29 에이에스엠 아이피 홀딩 비.브이. 바나듐 금속을 증착하는 방법, 구조체, 소자 및 증착 어셈블리
TW202223136A (zh) 2020-10-28 2022-06-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於在基板上形成層之方法、及半導體處理系統
TW202235649A (zh) 2020-11-24 2022-09-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 填充間隙之方法與相關之系統及裝置
KR20220076343A (ko) 2020-11-30 2022-06-08 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치의 반응 챔버 내에 배열되도록 구성된 인젝터
CN114639631A (zh) 2020-12-16 2022-06-17 Asm Ip私人控股有限公司 跳动和摆动测量固定装置
TW202231903A (zh) 2020-12-22 2022-08-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 過渡金屬沉積方法、過渡金屬層、用於沉積過渡金屬於基板上的沉積總成
USD980814S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD1023959S1 (en) 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD981973S1 (en) 2021-05-11 2023-03-28 Asm Ip Holding B.V. Reactor wall for substrate processing apparatus
USD990441S1 (en) 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3716192A (en) * 1971-05-27 1973-02-13 Moist O Matic Division Of Toro Extended range sprinkler head
CN1565751A (zh) * 2003-06-20 2005-01-19 林夏斌 墙壁式双旋转升降淋浴花洒
CN2691713Y (zh) * 2004-04-23 2005-04-13 曾宪平 多功能洗浴喷头

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3600322A1 (de) * 1986-01-08 1987-07-09 Robert Lukesch Duschkabine zur unterstuetzung der koerperpflege
JPH03110228A (ja) * 1989-09-25 1991-05-10 Takagi Ind Co Ltd 湯水混合噴出装置
US5205490A (en) * 1991-11-08 1993-04-27 Kohler Co. Body spray nozzle
US5321860A (en) * 1991-11-08 1994-06-21 Kohler Co. Shower enclosure assembly
US6134722A (en) * 1994-07-13 2000-10-24 Kohler Co. Recirculating bath fixture
US5678258A (en) * 1995-09-29 1997-10-21 Healy; Thomas K. Multiple showerhead apparatus
PL181301B1 (pl) * 1996-05-13 2001-07-31 Giovanni Luigi Sartor U rzadzenie natryskowe oscylujace PL PL
CA2192601C (fr) 1996-12-11 1997-03-24 Denis Carrier Douche therapeutique a effet enveloppant
US5774907A (en) * 1997-05-05 1998-07-07 Doggwiler; Marc Shower wall back scrubber and massager
DE29813597U1 (de) 1998-07-17 1998-10-22 Schönborn, Klaus, 42579 Heiligenhaus Duschsystem
US6042027A (en) * 1998-12-18 2000-03-28 Sandvik; Arne Paul Shower head
JP2001254425A (ja) * 2000-03-14 2001-09-21 Aisin Seiki Co Ltd 衛生洗浄装置
JP3747893B2 (ja) * 2002-02-06 2006-02-22 東陶機器株式会社 シャワー装置
DE20211120U1 (de) * 2002-07-23 2002-10-24 Wanger, Michael, 80687 München Drehbare Duschvorrichtung
DE10253849A1 (de) * 2002-11-15 2004-06-03 Hansgrohe Ag Duschanordnung
US6973682B2 (en) * 2003-04-19 2005-12-13 Eli Zhadanov Device for showering and the like
EP1811884B1 (en) * 2004-10-21 2018-02-14 Bullfrog International, L.C. Spas and bathing systems with upgradeable and interchangeable jet stations
ITMI20050301A1 (it) 2005-02-25 2006-08-26 American Standard Europ Sprl Dispositivo a doccia
US7455247B2 (en) * 2005-03-01 2008-11-25 Kohler Co. Bodyspray having adjustable spray orientation
US20060218719A1 (en) * 2005-03-16 2006-10-05 Alsons Corporation Spine shaped shower unit
US7219376B1 (en) * 2006-05-18 2007-05-22 Zhou Huasong Automatic elevating shower
DE202006010115U1 (de) 2006-06-29 2006-10-05 Zhou, Huasong, Xiamen Automatische Hebe- und Senkvorrichtung für Duschsäule oder Wasserhahn

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3716192A (en) * 1971-05-27 1973-02-13 Moist O Matic Division Of Toro Extended range sprinkler head
CN1565751A (zh) * 2003-06-20 2005-01-19 林夏斌 墙壁式双旋转升降淋浴花洒
CN2691713Y (zh) * 2004-04-23 2005-04-13 曾宪平 多功能洗浴喷头

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DE102007003416A1 (de) 2008-07-17
ES2480946T3 (es) 2014-07-29
EP1947251B1 (de) 2014-04-30
EP1947251A2 (de) 2008-07-23
EP1947251A3 (de) 2009-05-06
CN101229025A (zh) 2008-07-30
US8196234B2 (en) 2012-06-12

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