CN101076883B - 制造互连元件的结构和方法,包括互连元件的多层线路板 - Google Patents
制造互连元件的结构和方法,包括互连元件的多层线路板 Download PDFInfo
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- CN101076883B CN101076883B CN2005800388158A CN200580038815A CN101076883B CN 101076883 B CN101076883 B CN 101076883B CN 2005800388158 A CN2005800388158 A CN 2005800388158A CN 200580038815 A CN200580038815 A CN 200580038815A CN 101076883 B CN101076883 B CN 101076883B
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- metal
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- interconnection
- interconnection element
- cylindrical body
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- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 229910052751 metal Inorganic materials 0.000 claims abstract description 220
- 239000002184 metal Substances 0.000 claims abstract description 220
- 238000000034 method Methods 0.000 claims abstract description 63
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 48
- 229910052802 copper Inorganic materials 0.000 claims description 46
- 239000010949 copper Substances 0.000 claims description 46
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 42
- 230000004888 barrier function Effects 0.000 claims description 41
- 238000007747 plating Methods 0.000 claims description 34
- 229910052759 nickel Inorganic materials 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 230000003628 erosive effect Effects 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 229920001169 thermoplastic Polymers 0.000 claims description 5
- 239000004416 thermosoftening plastic Substances 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 4
- 230000004927 fusion Effects 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 229920005989 resin Polymers 0.000 description 29
- 239000011347 resin Substances 0.000 description 29
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 14
- 229910052737 gold Inorganic materials 0.000 description 14
- 239000010931 gold Substances 0.000 description 14
- 238000000465 moulding Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 239000004696 Poly ether ether ketone Substances 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000004377 microelectronic Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920002959 polymer blend Polymers 0.000 description 2
- 238000013517 stratification Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- -1 Polyethylene Naphthalate Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229910000743 fusible alloy Inorganic materials 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
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-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
- H05K3/4617—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination characterized by laminating only or mainly similar single-sided circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5383—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0384—Etch stop layer, i.e. a buried barrier layer for preventing etching of layers under the etch stop layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0542—Continuous temporary metal layer over metal pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/205—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4647—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer around previously made via studs
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/931—Silicon carbide semiconductor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims (23)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004289722A JP2006108211A (ja) | 2004-10-01 | 2004-10-01 | 配線板と、その配線板を用いた多層配線基板と、その多層配線基板の製造方法 |
JP289722/2004 | 2004-10-01 | ||
PCT/US2005/035459 WO2006039633A2 (en) | 2004-10-01 | 2005-09-30 | Structure and method of making interconnect element, and multilayer wiring board including the interconnect element |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101076883A CN101076883A (zh) | 2007-11-21 |
CN101076883B true CN101076883B (zh) | 2011-01-19 |
Family
ID=35840405
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800388158A Expired - Fee Related CN101076883B (zh) | 2004-10-01 | 2005-09-30 | 制造互连元件的结构和方法,包括互连元件的多层线路板 |
Country Status (5)
Country | Link |
---|---|
US (2) | US7923828B2 (zh) |
JP (2) | JP2006108211A (zh) |
KR (1) | KR20070059186A (zh) |
CN (1) | CN101076883B (zh) |
WO (1) | WO2006039633A2 (zh) |
Families Citing this family (47)
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US7993972B2 (en) * | 2008-03-04 | 2011-08-09 | Stats Chippac, Ltd. | Wafer level die integration and method therefor |
JP2007311642A (ja) * | 2006-05-19 | 2007-11-29 | Sharp Corp | 多層プリント配線板の製造方法 |
US7682972B2 (en) * | 2006-06-01 | 2010-03-23 | Amitec-Advanced Multilayer Interconnect Technoloiges Ltd. | Advanced multilayer coreless support structures and method for their fabrication |
CN101507373A (zh) * | 2006-06-30 | 2009-08-12 | 日本电气株式会社 | 布线板、使用布线板的半导体器件、及其制造方法 |
KR100757910B1 (ko) * | 2006-07-06 | 2007-09-11 | 삼성전기주식회사 | 매립패턴기판 및 그 제조방법 |
KR100894178B1 (ko) * | 2007-09-28 | 2009-04-22 | 삼성전기주식회사 | 인쇄회로기판 제조방법 |
JP5289880B2 (ja) * | 2007-10-12 | 2013-09-11 | 新光電気工業株式会社 | 配線基板 |
WO2010073800A1 (ja) | 2008-12-22 | 2010-07-01 | 富士通株式会社 | 電子部品とその製造方法 |
TW201032687A (en) * | 2009-02-27 | 2010-09-01 | Hon Hai Prec Ind Co Ltd | Method for leveling surface of LGA substrate |
KR101776299B1 (ko) * | 2010-07-02 | 2017-09-07 | 엘지이노텍 주식회사 | 인쇄회로기판 및 그 제조방법 |
JP5677179B2 (ja) * | 2011-04-20 | 2015-02-25 | 株式会社フジクラ | 多層回路基板およびその製造方法 |
JP6065359B2 (ja) * | 2011-11-24 | 2017-01-25 | 凸版印刷株式会社 | 貫通電極付き配線基板の製造方法 |
TWI694557B (zh) * | 2012-03-26 | 2020-05-21 | 先進封裝技術私人有限公司 | 半導體基板、半導體封裝件及其製造方法 |
US9440135B2 (en) * | 2012-05-29 | 2016-09-13 | Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd. | Multilayer electronic structures with integral vias extending in in-plane direction |
KR20140008923A (ko) * | 2012-07-13 | 2014-01-22 | 삼성전기주식회사 | 코어리스 인쇄회로기판 및 그 제조 방법 |
US8997342B2 (en) * | 2012-10-15 | 2015-04-07 | Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd. | Method of fabrication, a multilayer electronic structure and structures in accordance with the method |
US8866286B2 (en) * | 2012-12-13 | 2014-10-21 | Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd. | Single layer coreless substrate |
NL2010077C2 (en) | 2013-01-02 | 2014-07-03 | Univ Delft Tech | Through-polymer via (tpv) and method to manufacture such a via. |
WO2014121300A2 (en) * | 2013-02-04 | 2014-08-07 | American Semiconductor, Inc. | Photonic data transfer assembly |
US20140264938A1 (en) * | 2013-03-14 | 2014-09-18 | Douglas R. Hackler, Sr. | Flexible Interconnect |
JP6150587B2 (ja) * | 2013-03-29 | 2017-06-21 | 東京応化工業株式会社 | パターン形成方法、構造体、櫛型電極の製造方法、及び二次電池 |
US9049791B2 (en) * | 2013-06-07 | 2015-06-02 | Zhuhai Advanced Chip Carriers & Electronic Substrates Solutions Technologies Co. Ltd. | Terminations and couplings between chips and substrates |
CN104244614A (zh) * | 2013-06-21 | 2014-12-24 | 富葵精密组件(深圳)有限公司 | 多层电路板及其制作方法 |
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JP2016143727A (ja) * | 2015-01-30 | 2016-08-08 | イビデン株式会社 | プリント配線板およびその製造方法 |
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US9806058B2 (en) * | 2015-07-02 | 2017-10-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chip package having die structures of different heights and method of forming same |
US10535633B2 (en) | 2015-07-02 | 2020-01-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chip package having die structures of different heights and method of forming same |
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Also Published As
Publication number | Publication date |
---|---|
WO2006039633A2 (en) | 2006-04-13 |
JP2006108211A (ja) | 2006-04-20 |
JP5084509B2 (ja) | 2012-11-28 |
US8859420B2 (en) | 2014-10-14 |
US20060079127A1 (en) | 2006-04-13 |
CN101076883A (zh) | 2007-11-21 |
US20110252637A1 (en) | 2011-10-20 |
US7923828B2 (en) | 2011-04-12 |
KR20070059186A (ko) | 2007-06-11 |
WO2006039633A3 (en) | 2006-08-24 |
JP2008515241A (ja) | 2008-05-08 |
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