CN100596020C - 压电振动片和压电器件 - Google Patents

压电振动片和压电器件 Download PDF

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Publication number
CN100596020C
CN100596020C CN200510109468A CN200510109468A CN100596020C CN 100596020 C CN100596020 C CN 100596020C CN 200510109468 A CN200510109468 A CN 200510109468A CN 200510109468 A CN200510109468 A CN 200510109468A CN 100596020 C CN100596020 C CN 100596020C
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CN
China
Prior art keywords
arm
width
vibration piece
piezoelectric
piezoelectric vibration
Prior art date
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Expired - Fee Related
Application number
CN200510109468A
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English (en)
Chinese (zh)
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CN1764067A (zh
Inventor
棚谷英雄
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Seiko Epson Corp
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Seiko Epson Corp
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Publication date
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Publication of CN1764067A publication Critical patent/CN1764067A/zh
Application granted granted Critical
Publication of CN100596020C publication Critical patent/CN100596020C/zh
Anticipated expiration legal-status Critical
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    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/19—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of quartz
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5607—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating tuning forks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
    • H03B5/30—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element being electromechanical resonator
    • H03B5/32—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element being electromechanical resonator being a piezoelectric resonator
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H03H9/0504—Holders or supports for bulk acoustic wave devices
    • H03H9/0514—Holders or supports for bulk acoustic wave devices consisting of mounting pads or bumps
    • H03H9/0519—Holders or supports for bulk acoustic wave devices consisting of mounting pads or bumps for cantilever
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H03H9/0595—Holders or supports the holder support and resonator being formed in one body
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H03H9/10—Mounting in enclosures
    • H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
    • H03H9/1014—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
    • H03H9/1021—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/21—Crystal tuning forks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H2003/026—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the tuning fork type
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414—Resonance frequency
    • H03H2003/0492—Resonance frequency during the manufacture of a tuning-fork

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
CN200510109468A 2004-10-20 2005-10-20 压电振动片和压电器件 Expired - Fee Related CN100596020C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004305621 2004-10-20
JP2004305621 2004-10-20
JP2005129906A JP4301200B2 (ja) 2004-10-20 2005-04-27 圧電振動片および圧電デバイス
JP2005129906 2005-04-27

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201010004779.6A Division CN101820263B (zh) 2004-10-20 2005-10-20 压电振动片和压电器件

Publications (2)

Publication Number Publication Date
CN1764067A CN1764067A (zh) 2006-04-26
CN100596020C true CN100596020C (zh) 2010-03-24

Family

ID=35645609

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201010004779.6A Expired - Fee Related CN101820263B (zh) 2004-10-20 2005-10-20 压电振动片和压电器件
CN200510109468A Expired - Fee Related CN100596020C (zh) 2004-10-20 2005-10-20 压电振动片和压电器件

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201010004779.6A Expired - Fee Related CN101820263B (zh) 2004-10-20 2005-10-20 压电振动片和压电器件

Country Status (6)

Country Link
US (1) US7521846B2 (enExample)
EP (4) EP1845616B1 (enExample)
JP (1) JP4301200B2 (enExample)
KR (3) KR100802865B1 (enExample)
CN (2) CN101820263B (enExample)
DE (2) DE602005023823D1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
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CN103453897A (zh) * 2012-06-04 2013-12-18 精工爱普生株式会社 振动片、电子装置以及电子设备
CN104901647A (zh) * 2014-03-07 2015-09-09 精工电子水晶科技股份有限公司 压电振动片及压电振动器
CN106559057A (zh) * 2015-09-30 2017-04-05 京瓷晶体元件有限公司 音叉式晶体片、音叉式晶体元件、晶体设备和音叉式晶体元件的制造方法

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US10284143B2 (en) * 2002-03-06 2019-05-07 Piedek Technical Laboratory Quartz crystal unit, quartz crystal oscillator and electronic apparatus
JP4277818B2 (ja) * 2005-03-22 2009-06-10 セイコーエプソン株式会社 圧電振動片および圧電デバイス
JP4609196B2 (ja) * 2005-06-20 2011-01-12 セイコーエプソン株式会社 圧電振動片および圧電デバイスならびに電子機器および携帯電話装置
US7694734B2 (en) * 2005-10-31 2010-04-13 Baker Hughes Incorporated Method and apparatus for insulating a resonator downhole
JP5208373B2 (ja) * 2006-04-12 2013-06-12 パナソニック株式会社 慣性力センサ
JP4414987B2 (ja) * 2006-07-27 2010-02-17 日本電波工業株式会社 圧電振動子の製造方法、圧電振動子及び電子部品
US7579748B2 (en) 2006-08-18 2009-08-25 Epson Toyocom Corporation Piezoelectric device and method for manufacturing thereof
JP5115092B2 (ja) * 2006-08-18 2013-01-09 セイコーエプソン株式会社 圧電振動片、圧電デバイス、及び発振器
JP5500220B2 (ja) * 2006-08-18 2014-05-21 セイコーエプソン株式会社 振動片、振動子、発振器、及びセンサー
JP2008060952A (ja) 2006-08-31 2008-03-13 Kyocera Kinseki Corp 音叉型水晶振動板とその製造方法
JP5045054B2 (ja) * 2006-10-11 2012-10-10 セイコーエプソン株式会社 圧電デバイス
JP4993080B2 (ja) * 2007-01-22 2012-08-08 セイコーエプソン株式会社 音叉型圧電振動片
JP5045890B2 (ja) * 2007-02-28 2012-10-10 セイコーエプソン株式会社 圧電振動片
US7863803B2 (en) * 2007-05-30 2011-01-04 Epson Toyocom Corporation Tuning fork resonator element and tuning fork resonator
JP4905859B2 (ja) * 2007-07-11 2012-03-28 セイコーエプソン株式会社 圧電デバイスおよび圧電デバイスの製造方法
EP2017960B1 (fr) * 2007-07-19 2009-12-30 ETA SA Manufacture Horlogère Suisse Résonateur piézo-électrique ayant des capacités motionnelles optimisées
JP5216288B2 (ja) * 2007-09-25 2013-06-19 日本電波工業株式会社 圧電振動片の製造方法、圧電デバイスの製造方法
JP5062413B2 (ja) * 2007-11-08 2012-10-31 セイコーエプソン株式会社 音叉型圧電振動片及び音叉型圧電振動子
JP4629094B2 (ja) 2007-12-28 2011-02-09 日本電波工業株式会社 圧電振動片、圧電デバイス及びそれらの製造方法
JP4594412B2 (ja) 2008-05-22 2010-12-08 日本電波工業株式会社 圧電振動片および圧電デバイス
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JP4709884B2 (ja) * 2008-09-29 2011-06-29 日本電波工業株式会社 圧電振動片および圧電デバイス
JP4714770B2 (ja) * 2008-10-06 2011-06-29 日本電波工業株式会社 音叉型圧電振動片及び音叉型圧電振動片の製造方法
JP5155275B2 (ja) * 2008-10-16 2013-03-06 日本電波工業株式会社 音叉型圧電振動片、圧電フレーム及び圧電デバイス
JP4709260B2 (ja) * 2008-10-16 2011-06-22 日本電波工業株式会社 圧電振動片および圧電デバイス
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