CN100517679C - 具有贯穿通道和连接到贯穿通道的布线的衬底及其制造方法 - Google Patents
具有贯穿通道和连接到贯穿通道的布线的衬底及其制造方法 Download PDFInfo
- Publication number
- CN100517679C CN100517679C CNB2005101161406A CN200510116140A CN100517679C CN 100517679 C CN100517679 C CN 100517679C CN B2005101161406 A CNB2005101161406 A CN B2005101161406A CN 200510116140 A CN200510116140 A CN 200510116140A CN 100517679 C CN100517679 C CN 100517679C
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- Prior art keywords
- layer
- hole
- substrate
- conductive core
- wiring
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- Expired - Fee Related
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
- H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/01—Manufacture or treatment
- H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/007—Manufacture or processing of a substrate for a printed circuit board supported by a temporary or sacrificial carrier
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
- H05K3/4605—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated made from inorganic insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
- H05K3/4608—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated comprising an electrically conductive base or core
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
- H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
- H10W20/0245—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising use of blind vias during the manufacture
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
- H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
- H10W20/0261—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias characterised by the filling method or the material of the conductive fill
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/20—Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09563—Metal filled via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/096—Vertically aligned vias, holes or stacked vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/10287—Metal wires as connectors or conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/205—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4046—Through-connections; Vertical interconnect access [VIA] connections using auxiliary conductive elements, e.g. metallic spheres, eyelets, pieces of wire
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/031—Manufacture or treatment of conductive parts of the interconnections
- H10W20/056—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches
- H10W20/057—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches by selectively depositing, e.g. by using selective CVD or plating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07251—Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Electroplating Methods And Accessories (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004323940A JP4369348B2 (ja) | 2004-11-08 | 2004-11-08 | 基板及びその製造方法 |
| JP2004323940 | 2004-11-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1779964A CN1779964A (zh) | 2006-05-31 |
| CN100517679C true CN100517679C (zh) | 2009-07-22 |
Family
ID=35841853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101161406A Expired - Fee Related CN100517679C (zh) | 2004-11-08 | 2005-10-24 | 具有贯穿通道和连接到贯穿通道的布线的衬底及其制造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7365436B2 (https=) |
| EP (1) | EP1656005A3 (https=) |
| JP (1) | JP4369348B2 (https=) |
| KR (1) | KR20060053282A (https=) |
| CN (1) | CN100517679C (https=) |
| TW (1) | TWI384604B (https=) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5194537B2 (ja) * | 2007-04-23 | 2013-05-08 | 株式会社デンソー | 半導体装置およびその製造方法 |
| TWI341554B (en) * | 2007-08-02 | 2011-05-01 | Enthone | Copper metallization of through silicon via |
| US7868362B2 (en) * | 2007-10-16 | 2011-01-11 | Honeywell International Inc. | SOI on package hypersensitive sensor |
| JP2009224492A (ja) * | 2008-03-14 | 2009-10-01 | Oki Semiconductor Co Ltd | 半導体装置及びその製造方法 |
| TWI392069B (zh) * | 2009-11-24 | 2013-04-01 | 日月光半導體製造股份有限公司 | 封裝結構及其封裝製程 |
| US20110186940A1 (en) * | 2010-02-03 | 2011-08-04 | Honeywell International Inc. | Neutron sensor with thin interconnect stack |
| WO2011137450A1 (en) * | 2010-04-30 | 2011-11-03 | Sonavation, Inc. | Method for making integrated circuit device using copper metallization on 1-3 pzt composite |
| JP5730654B2 (ja) * | 2010-06-24 | 2015-06-10 | 新光電気工業株式会社 | 配線基板及びその製造方法 |
| US8310021B2 (en) | 2010-07-13 | 2012-11-13 | Honeywell International Inc. | Neutron detector with wafer-to-wafer bonding |
| US8440554B1 (en) * | 2010-08-02 | 2013-05-14 | Amkor Technology, Inc. | Through via connected backside embedded circuit features structure and method |
| TWI446420B (zh) | 2010-08-27 | 2014-07-21 | 日月光半導體製造股份有限公司 | 用於半導體製程之載體分離方法 |
| TWI445152B (zh) | 2010-08-30 | 2014-07-11 | 日月光半導體製造股份有限公司 | 半導體結構及其製作方法 |
| US9007273B2 (en) | 2010-09-09 | 2015-04-14 | Advances Semiconductor Engineering, Inc. | Semiconductor package integrated with conformal shield and antenna |
| TWI434387B (zh) | 2010-10-11 | 2014-04-11 | 日月光半導體製造股份有限公司 | 具有穿導孔之半導體裝置及具有穿導孔之半導體裝置之封裝結構及其製造方法 |
| TWI527174B (zh) | 2010-11-19 | 2016-03-21 | 日月光半導體製造股份有限公司 | 具有半導體元件之封裝結構 |
| TWI445155B (zh) | 2011-01-06 | 2014-07-11 | 日月光半導體製造股份有限公司 | 堆疊式封裝結構及其製造方法 |
| US8853819B2 (en) | 2011-01-07 | 2014-10-07 | Advanced Semiconductor Engineering, Inc. | Semiconductor structure with passive element network and manufacturing method thereof |
| JP5714361B2 (ja) * | 2011-03-01 | 2015-05-07 | 日本碍子株式会社 | 端子電極形成方法及びそれを用いた圧電/電歪素子の製造方法 |
| US8623763B2 (en) * | 2011-06-01 | 2014-01-07 | Texas Instruments Incorporated | Protective layer for protecting TSV tips during thermo-compressive bonding |
| US8541883B2 (en) | 2011-11-29 | 2013-09-24 | Advanced Semiconductor Engineering, Inc. | Semiconductor device having shielded conductive vias |
| US8975157B2 (en) | 2012-02-08 | 2015-03-10 | Advanced Semiconductor Engineering, Inc. | Carrier bonding and detaching processes for a semiconductor wafer |
| US8963316B2 (en) | 2012-02-15 | 2015-02-24 | Advanced Semiconductor Engineering, Inc. | Semiconductor device and method for manufacturing the same |
| US8786060B2 (en) | 2012-05-04 | 2014-07-22 | Advanced Semiconductor Engineering, Inc. | Semiconductor package integrated with conformal shield and antenna |
| US9653123B2 (en) * | 2012-07-20 | 2017-05-16 | Marvell International Ltd. | Direct data connectors for a sealed device and methods for forming a direct data connector for a sealed device |
| US9153542B2 (en) | 2012-08-01 | 2015-10-06 | Advanced Semiconductor Engineering, Inc. | Semiconductor package having an antenna and manufacturing method thereof |
| US8937387B2 (en) | 2012-11-07 | 2015-01-20 | Advanced Semiconductor Engineering, Inc. | Semiconductor device with conductive vias |
| US8952542B2 (en) | 2012-11-14 | 2015-02-10 | Advanced Semiconductor Engineering, Inc. | Method for dicing a semiconductor wafer having through silicon vias and resultant structures |
| US9123780B2 (en) | 2012-12-19 | 2015-09-01 | Invensas Corporation | Method and structures for heat dissipating interposers |
| US9406552B2 (en) | 2012-12-20 | 2016-08-02 | Advanced Semiconductor Engineering, Inc. | Semiconductor device having conductive via and manufacturing process |
| US8841751B2 (en) | 2013-01-23 | 2014-09-23 | Advanced Semiconductor Engineering, Inc. | Through silicon vias for semiconductor devices and manufacturing method thereof |
| US9978688B2 (en) | 2013-02-28 | 2018-05-22 | Advanced Semiconductor Engineering, Inc. | Semiconductor package having a waveguide antenna and manufacturing method thereof |
| US9089268B2 (en) | 2013-03-13 | 2015-07-28 | Advanced Semiconductor Engineering, Inc. | Neural sensing device and method for making the same |
| US8987734B2 (en) | 2013-03-15 | 2015-03-24 | Advanced Semiconductor Engineering, Inc. | Semiconductor wafer, semiconductor process and semiconductor package |
| US9173583B2 (en) | 2013-03-15 | 2015-11-03 | Advanced Semiconductor Engineering, Inc. | Neural sensing device and method for making the same |
| US9412806B2 (en) | 2014-06-13 | 2016-08-09 | Invensas Corporation | Making multilayer 3D capacitors using arrays of upstanding rods or ridges |
| JP2016039512A (ja) * | 2014-08-08 | 2016-03-22 | キヤノン株式会社 | 電極が貫通配線と繋がったデバイス、及びその製造方法 |
| US9397038B1 (en) * | 2015-02-27 | 2016-07-19 | Invensas Corporation | Microelectronic components with features wrapping around protrusions of conductive vias protruding from through-holes passing through substrates |
| US9881884B2 (en) | 2015-08-14 | 2018-01-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device structure and method for forming the same |
| KR101886134B1 (ko) * | 2016-07-26 | 2018-08-07 | 주식회사 신성씨앤티 | 멤스 센서 및 그 제조 방법 |
| US10872864B2 (en) * | 2017-06-30 | 2020-12-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor package and method |
| KR102609629B1 (ko) * | 2021-07-22 | 2023-12-04 | 한국전자기술연구원 | 고주파 전력 증폭기용 반도체 패키지, 그의 실장 구조 및 그의 제조 방법 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6259039B1 (en) * | 1998-12-29 | 2001-07-10 | Intel Corporation | Surface mount connector with pins in vias |
| US6365974B1 (en) * | 1999-03-23 | 2002-04-02 | Texas Instruments Incorporated | Flex circuit substrate for an integrated circuit package |
| US6700079B2 (en) * | 2001-08-13 | 2004-03-02 | Autosplice, Inc. | Discrete solder ball contact and circuit board assembly utilizing same |
| CN1521847A (zh) * | 2003-02-13 | 2004-08-18 | �¹������ҵ��ʽ���� | 电子部件封装构件及其制造方法 |
| US6784377B2 (en) * | 2001-05-10 | 2004-08-31 | International Business Machines Corporation | Method and structure for repairing or modifying surface connections on circuit boards |
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| US4170819A (en) * | 1978-04-10 | 1979-10-16 | International Business Machines Corporation | Method of making conductive via holes in printed circuit boards |
| JPH01258457A (ja) | 1988-04-08 | 1989-10-16 | Nec Corp | 半導体集積回路の実装構造およびその製造方法 |
| US6195883B1 (en) * | 1998-03-25 | 2001-03-06 | International Business Machines Corporation | Full additive process with filled plated through holes |
| KR100214545B1 (ko) * | 1996-12-28 | 1999-08-02 | 구본준 | 칩 사이즈 반도체 패키지의 제조 방법 |
| US6833613B1 (en) * | 1997-12-18 | 2004-12-21 | Micron Technology, Inc. | Stacked semiconductor package having laser machined contacts |
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| US6849805B2 (en) * | 2000-12-28 | 2005-02-01 | Canon Kabushiki Kaisha | Printed wiring board and electronic apparatus |
| US6734568B2 (en) * | 2001-08-29 | 2004-05-11 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing the same |
| KR100435813B1 (ko) * | 2001-12-06 | 2004-06-12 | 삼성전자주식회사 | 금속 바를 이용하는 멀티 칩 패키지와 그 제조 방법 |
| US7091589B2 (en) | 2002-12-11 | 2006-08-15 | Dai Nippon Printing Co., Ltd. | Multilayer wiring board and manufacture method thereof |
| US7408258B2 (en) * | 2003-08-20 | 2008-08-05 | Salmon Technologies, Llc | Interconnection circuit and electronic module utilizing same |
-
2004
- 2004-11-08 JP JP2004323940A patent/JP4369348B2/ja not_active Expired - Fee Related
-
2005
- 2005-10-10 EP EP05256300A patent/EP1656005A3/en not_active Withdrawn
- 2005-10-11 US US11/247,713 patent/US7365436B2/en not_active Expired - Lifetime
- 2005-10-12 TW TW094135506A patent/TWI384604B/zh not_active IP Right Cessation
- 2005-10-14 KR KR1020050096848A patent/KR20060053282A/ko not_active Withdrawn
- 2005-10-24 CN CNB2005101161406A patent/CN100517679C/zh not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6259039B1 (en) * | 1998-12-29 | 2001-07-10 | Intel Corporation | Surface mount connector with pins in vias |
| US6365974B1 (en) * | 1999-03-23 | 2002-04-02 | Texas Instruments Incorporated | Flex circuit substrate for an integrated circuit package |
| US6784377B2 (en) * | 2001-05-10 | 2004-08-31 | International Business Machines Corporation | Method and structure for repairing or modifying surface connections on circuit boards |
| US6700079B2 (en) * | 2001-08-13 | 2004-03-02 | Autosplice, Inc. | Discrete solder ball contact and circuit board assembly utilizing same |
| CN1521847A (zh) * | 2003-02-13 | 2004-08-18 | �¹������ҵ��ʽ���� | 电子部件封装构件及其制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1656005A3 (en) | 2007-11-14 |
| CN1779964A (zh) | 2006-05-31 |
| JP2006135175A (ja) | 2006-05-25 |
| TWI384604B (zh) | 2013-02-01 |
| EP1656005A2 (en) | 2006-05-10 |
| TW200620615A (en) | 2006-06-16 |
| US7365436B2 (en) | 2008-04-29 |
| US20060097378A1 (en) | 2006-05-11 |
| JP4369348B2 (ja) | 2009-11-18 |
| KR20060053282A (ko) | 2006-05-19 |
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