JP4369348B2 - 基板及びその製造方法 - Google Patents
基板及びその製造方法 Download PDFInfo
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- JP4369348B2 JP4369348B2 JP2004323940A JP2004323940A JP4369348B2 JP 4369348 B2 JP4369348 B2 JP 4369348B2 JP 2004323940 A JP2004323940 A JP 2004323940A JP 2004323940 A JP2004323940 A JP 2004323940A JP 4369348 B2 JP4369348 B2 JP 4369348B2
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- 229910052751 metal Inorganic materials 0.000 claims description 79
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- 239000011162 core material Substances 0.000 claims description 68
- 239000000463 material Substances 0.000 claims description 59
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- 230000000149 penetrating effect Effects 0.000 claims description 18
- 238000009713 electroplating Methods 0.000 claims description 14
- 230000035515 penetration Effects 0.000 claims description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 33
- 239000010931 gold Substances 0.000 description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 20
- 229910052710 silicon Inorganic materials 0.000 description 20
- 239000010703 silicon Substances 0.000 description 20
- 229910000679 solder Inorganic materials 0.000 description 17
- 229910052763 palladium Inorganic materials 0.000 description 15
- 238000007772 electroless plating Methods 0.000 description 10
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- 229920005989 resin Polymers 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 239000002390 adhesive tape Substances 0.000 description 8
- 229910052727 yttrium Inorganic materials 0.000 description 8
- 229910017709 Ni Co Inorganic materials 0.000 description 7
- 229910003267 Ni-Co Inorganic materials 0.000 description 7
- 229910003262 Ni‐Co Inorganic materials 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
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- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
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- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
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Description
該基材の貫通孔に導電金属を充填して形成された貫通ビアと、を備えた基板であって、
前記貫通ビアは、前記貫通孔に設けられた貫通部と、該貫通部の両端に設けられ、前記基材の貫通孔から突出すると共に、前記貫通部の寸法よりも幅広の形状とされた突出部と、を有し、
前記突出部は、第1の突出部と、第2の突出部とを有し、
前記第1の突出部の端部に導電性部材を設け、
前記第1の突出部及び前記貫通部を貫通すると共に、前記貫通孔の略中心軸に位置するよう前記導電性部材により支持された導電性芯材を設け、
前記貫通ビアは、前記導電性芯材及び前記導電性部材に給電する電解めっき法により析出成長した導電金属により構成されることを特徴とする基板が提供される。
また、貫通孔の略中心軸に位置する導電性芯材を給電層として、導電性芯材から貫通孔を形成する基材の面に向けて導電金属を成長させることにより、貫通ビアにボイド(空洞)が発生することを抑制できる。また、貫通部の両端に貫通部の寸法よりも幅広の形状とされた突出部を設けることで、貫通部と対向する基材と貫通部との間から水分等が侵入することを防止して、貫通ビアの劣化を抑制することができる。
さらに、貫通孔の略中心軸に位置するよう導電性芯材を導電性部材で支持することができる。
支持板上に金属箔を貼り付ける金属箔貼付工程と、
前記金属箔上に、導電性部材を形成する導電性部材形成工程と、
前記金属箔上に、前記導電性部材を覆うと共に、接着性を有した感光性レジスト層を形成する感光性レジスト層形成工程と、
前記感光性レジスト層上に、前記貫通孔が形成された前記基材を配置する基材配置工程と、
前記貫通孔の内部に現像液を供給して前記感光性レジスト層を溶解することで、前記貫通孔の開口径よりも幅広形状とされた鍔状空間を形成する鍔状空間形成工程と、
前記鍔状空間形成工程後に、前記感光性レジスト層を硬化させる硬化工程と、
前記硬化工程後、前記貫通孔の開口径よりも幅広形状とされ、前記貫通孔を露出する開口部を有したドライフィルムレジストを形成するドライフィルムレジスト形成工程と、
前記ドライフィルムレジスト形成工程後、ワイヤボンディング法により、前記導電性部材に、前記貫通孔の略中心軸に位置する導電性芯材を形成する導電性芯材形成工程と、
前記金属箔に通電し、前記導電性芯材及び前記導電部材に給電することで、電解めっき法により、前記鍔状空間、前記貫通孔、及び前記開口部を導電金属で充填する導電金属充填工程と、
前記開口部から突出した前記導電金属を除去することで、前記鍔状空間に配置された第1の突出部、前記貫通孔に配置された貫通部、及び前記開口部に配置された第2の突出部を有した前記貫通ビアを形成する貫通ビア形成工程と、
前記貫通ビア形成工程後、前記ドライフィルムレジストを除去するドライフィルムレジスト除去工程と、
前記ドライフィルムレジスト除去工程後、前記支持板を除去する支持板除去工程と、
前記支持板除去工程後、前記感光性レジスト層を除去する感光性レジスト層除去工程と、を含むことを特徴とする基板の製造方法が提供される。
(第1実施例)
始めに、図2及び図3を参照して、本発明の第1実施例の基板50の構成について説明する。図2は、本発明の第1実施例の基板の断面図であり、図3は、図2に示した基板のC−C線方向の断面図である。なお、図2において、Y,Y方向は導電性芯材58の長手方向、X,X方向はY,Y方向と直交する基材51の面方向をそれぞれ示している。
なお、拡散防止膜71には、Ni/PdやNi/Pd/Au(Niが外部接続端子に接続される側になる)等を用いても良い。
(第2実施例)
次に、図34を参照して、本発明の第2実施例の基板120について説明する。図34は、本発明の第2実施例の基板の断面図である。なお、図34に示した基板120において、図2に示した基板50と同一構成部分には同一の符号を付す。また、図34に示したGは、貫通孔122の中心軸(以下、「中心軸G」とする)を示している。
11 シリコン基材
12,52,122 貫通孔
13,53,65 絶縁層
13a,13b,51c 面
15,55,125 貫通ビア
15a,15b 端部
17,21,68,127 配線
18,22,69,128 外部接続端子
19,24,75,131 ソルダーレジスト
25 半導体素子
26 マザーボード
51 基材
51a,65a,101a 上面
51b 下面
57 貫通部
56 配線接続部
58,123 導電性芯材
59 接続パッド
61,71 拡散防止膜
63,72 Ni層
62,64,73 Au層
65b 側面
66 シード層
67,104,124 導電金属
76,95,102,103,106,109,132 開口部
91 支持板
92 接着テープ
93 金属箔
94,101,105,108,111 ドライフィルムレジスト
96 レジスト層
97 鍔状空間
114 耐熱テープ
A 基板形成領域
B 領域
D,G 中心軸
F 方向
L1〜L4 長さ
M1〜M4 厚さ
N 深さ
R1 直径
R2,W5 開口径
W1〜W4 幅
Claims (6)
- 貫通孔が形成された基材と、
該基材の貫通孔に導電金属を充填して形成された貫通ビアと、を備えた基板であって、
前記貫通ビアは、前記貫通孔に設けられた貫通部と、該貫通部の両端に設けられ、前記基材の貫通孔から突出すると共に、前記貫通部の寸法よりも幅広の形状とされた突出部と、を有し、
前記突出部は、第1の突出部と、第2の突出部とを有し、
前記第1の突出部の端部に導電性部材を設け、
前記第1の突出部及び前記貫通部を貫通すると共に、前記貫通孔の略中心軸に位置するよう前記導電性部材により支持された導電性芯材を設け、
前記貫通ビアは、前記導電性芯材及び前記導電性部材に給電する電解めっき法により析出成長した導電金属により構成されることを特徴とする基板。 - 前記貫通ビアの端部に、拡散防止膜を設けたことを特徴とする請求項1に記載の基板。
- 前記導電性芯材の長さは、前記貫通ビアの長さよりも小さいことを特徴とする請求項1または2に記載の基板。
- 前記導電性部材には、拡散防止膜を用いることを特徴とする請求項1ないし3のうち、いずれか1項に記載の基板。
- 前記第2の突出部には、外部接続端子を有した配線を接続することを特徴とする請求項1ないし4のうち、いずれか1項記載の基板。
- 貫通孔が形成された基材と、該基材の貫通孔に導電金属を充填して形成された貫通ビアと、を備えた基板の製造方法であって、
支持板上に金属箔を貼り付ける金属箔貼付工程と、
前記金属箔上に、導電性部材を形成する導電性部材形成工程と、
前記金属箔上に、前記導電性部材を覆うと共に、接着性を有した感光性レジスト層を形成する感光性レジスト層形成工程と、
前記感光性レジスト層上に、前記貫通孔が形成された前記基材を配置する基材配置工程と、
前記貫通孔の内部に現像液を供給して前記感光性レジスト層を溶解することで、前記貫通孔の開口径よりも幅広形状とされた鍔状空間を形成する鍔状空間形成工程と、
前記鍔状空間形成工程後に、前記感光性レジスト層を硬化させる硬化工程と、
前記硬化工程後、前記貫通孔の開口径よりも幅広形状とされ、前記貫通孔を露出する開口部を有したドライフィルムレジストを形成するドライフィルムレジスト形成工程と、
前記ドライフィルムレジスト形成工程後、ワイヤボンディング法により、前記導電性部材に、前記貫通孔の略中心軸に位置する導電性芯材を形成する導電性芯材形成工程と、
前記金属箔に通電し、前記導電性芯材及び前記導電部材に給電することで、電解めっき法により、前記鍔状空間、前記貫通孔、及び前記開口部を導電金属で充填する導電金属充填工程と、
前記開口部から突出した前記導電金属を除去することで、前記鍔状空間に配置された第1の突出部、前記貫通孔に配置された貫通部、及び前記開口部に配置された第2の突出部を有した前記貫通ビアを形成する貫通ビア形成工程と、
前記貫通ビア形成工程後、前記ドライフィルムレジストを除去するドライフィルムレジスト除去工程と、
前記ドライフィルムレジスト除去工程後、前記支持板を除去する支持板除去工程と、
前記支持板除去工程後、前記感光性レジスト層を除去する感光性レジスト層除去工程と、を含むことを特徴とする基板の製造方法。
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EP05256300A EP1656005A3 (en) | 2004-11-08 | 2005-10-10 | A substrate having a penetrating via and wiring connected to the penetrating via and a method for manufacturing the same |
US11/247,713 US7365436B2 (en) | 2004-11-08 | 2005-10-11 | Substrate having a penetrating via and wiring connected to the penetrating via and a method for manufacturing the same |
TW094135506A TWI384604B (zh) | 2004-11-08 | 2005-10-12 | 具有穿透通孔與經連接至該穿透通孔的佈線之基材及其製造方法 |
KR1020050096848A KR20060053282A (ko) | 2004-11-08 | 2005-10-14 | 관통 비아 및 그 관통 비아에 접속되는 배선을 갖는 기판과그 제조 방법 |
CNB2005101161406A CN100517679C (zh) | 2004-11-08 | 2005-10-24 | 具有贯穿通道和连接到贯穿通道的布线的衬底及其制造方法 |
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US20060097378A1 (en) | 2006-05-11 |
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