CN100476331C - 加热装置、涂布显影装置及加热方法 - Google Patents

加热装置、涂布显影装置及加热方法 Download PDF

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Publication number
CN100476331C
CN100476331C CNB2006100673740A CN200610067374A CN100476331C CN 100476331 C CN100476331 C CN 100476331C CN B2006100673740 A CNB2006100673740 A CN B2006100673740A CN 200610067374 A CN200610067374 A CN 200610067374A CN 100476331 C CN100476331 C CN 100476331C
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CN
China
Prior art keywords
substrate
heating
hot plate
mentioned
wafer
Prior art date
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Expired - Lifetime
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CNB2006100673740A
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English (en)
Chinese (zh)
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CN1837731A (zh
Inventor
福冈哲夫
北野高广
松冈伸明
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of CN1837731A publication Critical patent/CN1837731A/zh
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00—Charging; Discharging; Manipulation of charge
    • F27D3/0084—Charging; Manipulation of SC or SC wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Resistance Heating (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CNB2006100673740A 2005-03-25 2006-03-24 加热装置、涂布显影装置及加热方法 Expired - Lifetime CN100476331C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005088447A JP4421501B2 (ja) 2005-03-25 2005-03-25 加熱装置、塗布、現像装置及び加熱方法
JP2005088447 2005-03-25

Publications (2)

Publication Number Publication Date
CN1837731A CN1837731A (zh) 2006-09-27
CN100476331C true CN100476331C (zh) 2009-04-08

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ID=37015198

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2006100673740A Expired - Lifetime CN100476331C (zh) 2005-03-25 2006-03-24 加热装置、涂布显影装置及加热方法

Country Status (5)

Country Link
US (1) US8025925B2 (https=)
JP (1) JP4421501B2 (https=)
KR (1) KR101059309B1 (https=)
CN (1) CN100476331C (https=)
TW (1) TWI293780B (https=)

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JP4410147B2 (ja) 2005-05-09 2010-02-03 東京エレクトロン株式会社 加熱装置、塗布、現像装置及び加熱方法
JP4999415B2 (ja) * 2006-09-29 2012-08-15 東京エレクトロン株式会社 基板処理装置及び基板処理方法並びに基板処理装置の用力供給装置及び基板処理装置の用力供給方法
JP4895984B2 (ja) * 2007-11-29 2012-03-14 東京エレクトロン株式会社 塗布処理装置
JP2010045190A (ja) * 2008-08-12 2010-02-25 Tokyo Electron Ltd 加熱システム、塗布、現像装置及び塗布、現像方法並びに記憶媒体
JP2010192623A (ja) * 2009-02-17 2010-09-02 Renesas Electronics Corp 半導体装置の製造装置、その制御方法、及びその制御プログラム
US8847122B2 (en) * 2009-06-08 2014-09-30 Macronix International Co., Ltd. Method and apparatus for transferring substrate
JP2011086807A (ja) * 2009-10-16 2011-04-28 Tokyo Electron Ltd 減圧乾燥装置
WO2012096019A1 (ja) * 2011-01-10 2012-07-19 Ｓｃｉｖａｘ株式会社 温調装置およびこれを適用したインプリント装置
KR101255902B1 (ko) 2011-02-28 2013-04-17 삼성전기주식회사 기판 건조 장치 및 기판 건조 방법
US10242890B2 (en) * 2011-08-08 2019-03-26 Applied Materials, Inc. Substrate support with heater
CN103331243B (zh) * 2013-05-28 2016-01-27 上海华虹宏力半导体制造有限公司 涂布设备的热处理腔室
JP6229618B2 (ja) * 2014-08-11 2017-11-15 東京エレクトロン株式会社 熱処理装置、熱処理方法、及び記憶媒体
CN105374716A (zh) * 2015-11-20 2016-03-02 南通富士通微电子股份有限公司 防止磁性针飞针的顶针装置
JP6847610B2 (ja) * 2016-09-14 2021-03-24 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置
US11035619B2 (en) * 2016-12-09 2021-06-15 Taiwan Semiconductor Manufacturing Co., Ltd. Drainage for temperature and humidity controlling system
CN109143799B (zh) * 2017-06-15 2022-08-16 台湾积体电路制造股份有限公司 烘烤设备及烘烤方法
TWI645265B (zh) * 2017-06-15 2018-12-21 台灣積體電路製造股份有限公司 烘烤設備及烘烤方法
JP6955928B2 (ja) * 2017-07-27 2021-10-27 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
KR102290913B1 (ko) * 2017-12-01 2021-08-18 세메스 주식회사 기판 처리 장치
CN110201851B (zh) * 2019-06-21 2023-05-16 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 加热装置及喷雾式涂胶机
CN113140480A (zh) * 2020-01-19 2021-07-20 聚昌科技股份有限公司 具有提升温度均匀性上盖导流板的晶圆加热模块
KR102545752B1 (ko) * 2020-09-10 2023-06-20 세메스 주식회사 베이크 장치 및 기판 처리 장치
US12322612B2 (en) * 2021-07-12 2025-06-03 Changxin Memory Technologies, Inc. Heating device and heating method for semiconductor thermal process
JP7820243B2 (ja) * 2021-07-12 2026-02-25 東京エレクトロン株式会社 加熱装置及び加熱方法
TW202419364A (zh) * 2022-07-21 2024-05-16 日商東京威力科創股份有限公司 基板搬運系統及搬運模組
CN115502067B (zh) * 2022-10-25 2023-09-26 长鑫存储技术有限公司 加热装置

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US4615755A (en) * 1985-08-07 1986-10-07 The Perkin-Elmer Corporation Wafer cooling and temperature control for a plasma etching system
JPH0691216A (ja) 1992-09-17 1994-04-05 Toshiba Corp 塗膜乾燥装置
US5803977A (en) * 1992-09-30 1998-09-08 Applied Materials, Inc. Apparatus for full wafer deposition
JPH10284360A (ja) * 1997-04-02 1998-10-23 Hitachi Ltd 基板温度制御装置及び方法
JP3333135B2 (ja) * 1998-06-25 2002-10-07 東京エレクトロン株式会社 熱処理装置及び熱処理方法
JP3764278B2 (ja) * 1998-07-13 2006-04-05 株式会社東芝 基板加熱装置、基板加熱方法及び基板処理方法
US6185370B1 (en) * 1998-09-09 2001-02-06 Tokyo Electron Limited Heating apparatus for heating an object to be processed
JP4014348B2 (ja) 2000-02-22 2007-11-28 東京エレクトロン株式会社 加熱処理装置
JP3545668B2 (ja) 2000-03-23 2004-07-21 東京エレクトロン株式会社 加熱装置及びその方法
US6399926B2 (en) * 2000-04-03 2002-06-04 Sigmameltec Ltd. Heat-treating apparatus capable of high temperature uniformity
US7094994B2 (en) * 2003-03-11 2006-08-22 Sony Corporation Heat treatment apparatus and method of semiconductor wafer
JP4087731B2 (ja) 2003-03-27 2008-05-21 芝浦メカトロニクス株式会社 乾燥処理装置及び乾燥処理方法
JP2005166354A (ja) * 2003-12-01 2005-06-23 Ngk Insulators Ltd セラミックヒーター

Also Published As

Publication number Publication date
US20060216665A1 (en) 2006-09-28
KR101059309B1 (ko) 2011-08-24
JP4421501B2 (ja) 2010-02-24
CN1837731A (zh) 2006-09-27
TWI293780B (en) 2008-02-21
US8025925B2 (en) 2011-09-27
JP2006269920A (ja) 2006-10-05
KR20060103217A (ko) 2006-09-28
TW200636819A (en) 2006-10-16

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Granted publication date: 20090408