CN100459048C - 用于真空处理装置的真空室 - Google Patents

用于真空处理装置的真空室 Download PDF

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Publication number
CN100459048C
CN100459048C CNB2004100714332A CN200410071433A CN100459048C CN 100459048 C CN100459048 C CN 100459048C CN B2004100714332 A CNB2004100714332 A CN B2004100714332A CN 200410071433 A CN200410071433 A CN 200410071433A CN 100459048 C CN100459048 C CN 100459048C
Authority
CN
China
Prior art keywords
chamber
main body
opening
vacuum chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2004100714332A
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English (en)
Chinese (zh)
Other versions
CN1574232A (zh
Inventor
浜田安雄
咲本泰
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Ulvac Inc
Original Assignee
Ulvac Inc
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Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of CN1574232A publication Critical patent/CN1574232A/zh
Application granted granted Critical
Publication of CN100459048C publication Critical patent/CN100459048C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C13/00—Assembling; Repairing; Cleaning
    • G02C13/008—Devices specially adapted for cleaning contact lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
CNB2004100714332A 2003-05-08 2004-05-08 用于真空处理装置的真空室 Expired - Lifetime CN100459048C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP129754/2003 2003-05-08
JP2003129754A JP2004335743A (ja) 2003-05-08 2003-05-08 真空処理装置用真空チャンバー

Related Child Applications (3)

Application Number Title Priority Date Filing Date
CN2007101399288A Division CN101419902B (zh) 2003-05-08 2004-05-08 多室真空处理装置
CN2005101285606A Division CN1776008B (zh) 2003-05-08 2004-05-08 真空室及其分割方法
CN2007101399292A Division CN101359579B (zh) 2003-05-08 2004-05-08 真空室

Publications (2)

Publication Number Publication Date
CN1574232A CN1574232A (zh) 2005-02-02
CN100459048C true CN100459048C (zh) 2009-02-04

Family

ID=33505463

Family Applications (4)

Application Number Title Priority Date Filing Date
CN2005101285606A Expired - Lifetime CN1776008B (zh) 2003-05-08 2004-05-08 真空室及其分割方法
CNB2004100714332A Expired - Lifetime CN100459048C (zh) 2003-05-08 2004-05-08 用于真空处理装置的真空室
CN2007101399292A Expired - Lifetime CN101359579B (zh) 2003-05-08 2004-05-08 真空室
CN2007101399288A Expired - Lifetime CN101419902B (zh) 2003-05-08 2004-05-08 多室真空处理装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN2005101285606A Expired - Lifetime CN1776008B (zh) 2003-05-08 2004-05-08 真空室及其分割方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN2007101399292A Expired - Lifetime CN101359579B (zh) 2003-05-08 2004-05-08 真空室
CN2007101399288A Expired - Lifetime CN101419902B (zh) 2003-05-08 2004-05-08 多室真空处理装置

Country Status (4)

Country Link
JP (1) JP2004335743A (ja)
KR (2) KR100745366B1 (ja)
CN (4) CN1776008B (ja)
TW (4) TWI326715B (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4619116B2 (ja) 2002-06-21 2011-01-26 アプライド マテリアルズ インコーポレイテッド 真空処理システムのための搬送チャンバ
KR100441875B1 (ko) * 2003-06-02 2004-07-27 주성엔지니어링(주) 분리형 이송 챔버
US7784164B2 (en) 2004-06-02 2010-08-31 Applied Materials, Inc. Electronic device manufacturing chamber method
KR100803726B1 (ko) * 2005-08-12 2008-02-15 주식회사 아이피에스 반송챔버의 구조
JP4791110B2 (ja) * 2005-09-02 2011-10-12 東京エレクトロン株式会社 真空チャンバおよび真空処理装置
JP4355314B2 (ja) * 2005-12-14 2009-10-28 東京エレクトロン株式会社 基板処理装置、及び該装置の蓋釣支装置
WO2007094617A1 (en) * 2006-02-14 2007-08-23 Brooks Automation Asia Ltd. Transfer chamber for vacuum processing apparatus of substrate
KR100981099B1 (ko) 2006-04-12 2010-09-09 엘아이지에이디피 주식회사 평면 표시소자 제조장치
KR100790797B1 (ko) * 2006-06-08 2008-01-02 주식회사 아이피에스 진공처리장치
US20080025821A1 (en) * 2006-07-25 2008-01-31 Applied Materials, Inc. Octagon transfer chamber
DE102007057644A1 (de) * 2007-11-28 2009-06-04 Oerlikon Trading Ag, Trübbach Vakuumkammer auf Rahmenbasis für Beschichtungsanlagen
KR100978851B1 (ko) * 2008-03-21 2010-08-31 주식회사 아이피에스 진공처리장치
DE102009007897A1 (de) * 2009-02-08 2010-08-12 Oerlikon Trading Ag, Trübbach Vakuumkammer für Beschichtungsanlagen und Verfahren zum Herstellen einer Vakuumkammer für Beschichtungsanlagen
KR101598176B1 (ko) * 2010-03-30 2016-02-26 주식회사 원익아이피에스 진공챔버
CN112295612A (zh) * 2020-11-12 2021-02-02 之江实验室 一种分段式真空装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0864542A (ja) * 1994-08-25 1996-03-08 Plasma Syst:Kk 半導体処理装置用真空チャンバーおよびその製造方法
JP2000183129A (ja) * 1998-12-18 2000-06-30 Mitsubishi Heavy Ind Ltd 真空処理システム
JP2001267246A (ja) * 2000-03-15 2001-09-28 Ulvac Japan Ltd 真空槽及び真空処理装置
JP2003077976A (ja) * 2001-08-31 2003-03-14 Tokyo Electron Ltd 処理システム

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2511265A1 (fr) * 1981-08-13 1983-02-18 Creusot Loire Chambre a vide modulaire extensible
JP4253107B2 (ja) * 2000-08-24 2009-04-08 キヤノンアネルバ株式会社 基板処理装置及びその増設方法
JP4843572B2 (ja) * 2007-07-06 2011-12-21 株式会社アルバック マルチチャンバー型真空処理装置
JP2007294997A (ja) * 2007-07-06 2007-11-08 Ulvac Japan Ltd 真空チャンバー

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0864542A (ja) * 1994-08-25 1996-03-08 Plasma Syst:Kk 半導体処理装置用真空チャンバーおよびその製造方法
JP2000183129A (ja) * 1998-12-18 2000-06-30 Mitsubishi Heavy Ind Ltd 真空処理システム
JP2001267246A (ja) * 2000-03-15 2001-09-28 Ulvac Japan Ltd 真空槽及び真空処理装置
JP2003077976A (ja) * 2001-08-31 2003-03-14 Tokyo Electron Ltd 処理システム

Also Published As

Publication number Publication date
JP2004335743A (ja) 2004-11-25
TW200745364A (en) 2007-12-16
KR100745366B1 (ko) 2007-08-02
TW200428495A (en) 2004-12-16
TW200744755A (en) 2007-12-16
TWI326715B (en) 2010-07-01
CN101419902A (zh) 2009-04-29
TWI417408B (zh) 2013-12-01
TWI363658B (en) 2012-05-11
KR20040090496A (ko) 2004-10-25
CN101359579B (zh) 2010-06-23
TW200613576A (en) 2006-05-01
CN101359579A (zh) 2009-02-04
KR20050113574A (ko) 2005-12-02
CN1776008B (zh) 2010-05-05
TWI281708B (en) 2007-05-21
CN1776008A (zh) 2006-05-24
CN1574232A (zh) 2005-02-02
KR100736243B1 (ko) 2007-07-06
CN101419902B (zh) 2011-04-20

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