TWI363658B - Multi-processing chamber -type vacuum processing apparatus - Google Patents

Multi-processing chamber -type vacuum processing apparatus Download PDF

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TWI363658B
TWI363658B TW096125750A TW96125750A TWI363658B TW I363658 B TWI363658 B TW I363658B TW 096125750 A TW096125750 A TW 096125750A TW 96125750 A TW96125750 A TW 96125750A TW I363658 B TWI363658 B TW I363658B
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chamber
vacuum
inner chamber
main body
vacuum chamber
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TW096125750A
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Chinese (zh)
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TW200744755A (en
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Yasuo Hamada
Yasushi Sakimoto
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Ulvac Inc
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    • GPHYSICS
    • G02OPTICS
    • G02CSPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C13/00Assembling; Repairing; Cleaning
    • G02C13/008Devices specially adapted for cleaning contact lenses

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  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Pressure Vessels And Lids Thereof (AREA)

Description

1363658 (υ 九、發明說明 【發明所屬之技術領域】 本發明係關於一種真空處理設備之真空 濺射沉澱設備的多處理室型真空處理設備。 【先前技術】 近年來,藉由在沉澱技術上的進步,已 射系統的真空處理設備中,在即使很大的基 精確的沉澱,其中上述濺射系統是用以在玻 基底上形成佈線用的金屬模。此外,近年來 所示,僅藉由在真空中的移動,用以連續執 多室真空處理設備早已成爲主流。 圖8所示的多室真空處理設備30包含 室 33a , 33b, 33c, 33d, 33e 及 33f,係圍 送室32,在此運送室內安裝有一基底運送毛 外’圖9所示的多室真空處理設備40包含 室43a’ 43b及43c,係圍繞著一中央運送] 送室內安裝有一基底運送機器人41。 因此,隨著基底的尺寸加大(例如所謂 長度與寬度爲1800 mmxl500 mm,第七代 寬度爲 2100 mmxl 8 5 0 mm)真空處理設備 會隨之擴大。藉此,由於真空室所用的機器 從前還要大,所以真空室的製造成本當然會 因此,提出了 一種製造方法,可以藉由 室,係用於如 經可以在如濺 底上執行高度 璃等製成的一 ,如圖8及9 行多重處理的 六個真空處理 繞著一中央運 隻器人31。此 三個真空處理 g 42,在此運 第六代基底的 基底的長度與 用的真空室也 工具也變得比 變高。 降低製造成本 -4 - (2) (2)1363658 而獲得大型真空室,卻不需要擴大機器工具,此乃藉由將 一框狀內室主體分割成多數零件,然後將這些多數零件予 以焊接與連接(請參閱日本先行公開專利第Η8·64542號 案一專利文件一)。 順便一提’上述專利文件一所揭示的製造方法在製造 之後並無法再次移除每個零件,這是因爲真空室的側壁均 藉由焊接零件而成。因此,在製造之後,無法改變真空室 的側壁之尺寸與形狀。 此外’由於安裝到真空室的側壁之上下表面的頂板與 底板在上述專利文件一中是一體的,無法分割,所以其尺 寸仍舊大而沉重》 因此,需要一大型吊車設備來吊起頂板與底板,因此 製造成本也會變得很高。而且,由於頂板與底板的尺寸仍 舊很大,所以當欲以成品或組裝前的產品之狀態將真空室 運送至一安裝地點時,則需要特殊的大型拖車。 因此,本發明的目的是要提供一種多處理室型真空處 理設備,在製造之後,其尺寸與形狀仍然可以輕易改變。 此外,本發明的目的是要提供一種多處理室型真空處 理設備,不需要大型吊車設備,即使在組裝後的尺寸很大 ,但是在運送時仍不需要大型特殊拖車。 【發明內容】 爲了達成上述目的’本發明提供一種多處理室型真空 處理設備,係爲具備有運送室、和被配置於此運送室之周 -5- (3) 1363658 圍的複數之真空處理室的多處理室型真空處理裝置 徵爲:前述運送室,係由框狀之內室主體和可自由裝 離地被配置於此內室主體之至少一側面部的多角形 框架的組裝體所構成。 又,本發明之多處理室型真空處理設備,其具 別與前述運送室之上面以及下面相接合的頂板以及 前述頂板以及前述底板係在前述內室主體側與前述 側被彼此分割。 此外,本發明之多處理室型真空處理設備,其 內室主體,和前述側框架,和前述頂板,以及前述 係分別藉由螺絲鎖合而加以組裝。 如以上所述一般,藉由本發明之多處理室型真 設備,由於作爲運送室之真空處理室,係由框狀之 體和可自由裝著脫離地被配置於此內室主體之至少 部的多角形狀之側框架的組裝體所構成,因此在將 組裝之後,能夠因應於使用者之需求,而容易地改 於其他之多角型狀的側框架,而能改變運送室的形 成爲能夠彈性地符合於使用者所要求的規格。 【實施方式】 以下將根據顯示的實施例來說明本發明。 (第一實施例) 圖1是一立體圖,顯示本發明第一實施例的真 ,其特 :附脫 狀之側 備有分 底板, 側框架 中前述 底板, 空處理 內室主 —側面 運送室 爲安裝 狀,故 空室, -6- (4) 1363658 處理設備所用 可作爲一運送 係設置在具有 以下稱爲沉澱 室1藉由連結 角形的側框架 。用以將一基 室主體2與側 內室主體2與 甚成。 i 7,其中連接 之頂面與底面 la,3b上的內 將基底(未顯 室主體2之兩 形成於框架狀 內室主體2的 辱3b之兩側邊 的開口會形成 而圖2是其分解立體圖。在此實施例中真空 之真空處理室(以下稱爲真空室),例如, 室’其中具有一基底運送機器人,此機器人 六個處理室的多室單基底型濺射沉澱設備( 設備)之中心部位內。 如圖1所示,本發明第一實施例的真空 一剖面爲矩形的中央內室主體2及剖面爲三 3a’ 3b,在內室主體2的兩邊上形成六角形 底(未顯示)拿進拿出之開口 4是形成於內 框架3 a,3 b的每一側面上(總共六面)。 側框架3a,3b是由鋁與不銹鋼等金屬材質| 安裝有基底運送機器人的頂板5與底板 的開口是分別形成於框架狀矩形內室主體2 上。此外,也在作爲長邊且連結到側框架2 室主體2之兩側面內形成開口。而且,用以 示)拿進拿出的開口會形成在作爲短邊的內 側面上。 此外,頂板8與底板9相連的開口分別 三角側框架的頂面與下面中。而且,連接到 側面之開口是形成於作爲長邊的側框架3 a | 上。而且,用以將基底(未顯示)拿進拿出 在作爲短邊的內室主體2之兩側面上。 其次,將說明上述實施例的真空室內1之製造方法。 底板7分別以螺栓(未顯示)透過0環(未顯示) (5) (5)1363658 而連接到內室主體2的底部,且底板9分別以螺栓(未顯 示)透過0環(未顯示)而連接到側框架3a與3b的底部 。然後,這些側框架3 a,3 b分別以螺栓1 1 a,1 1 b透過0 環10a,10b而連接到內室主體2的兩側面上。 然後,基底運送機器人6是被安裝於連接至內室主體 2的底板7上,之後頂板5是藉由螺栓11c透過Ο環10c 而連接到內室主體2的上部》然後,圖1所示的六角真空 室1是分別藉由螺栓lid,lie透過Ο環10d,10e而連接 到側框架3 a,3 b的每一上部。 根據上述製成的真空室1是被安裝於具六個處理室的 沉澱設備之中心部位內,以便作爲設置有基底運送機器人 6的一運送室。未顯示的六個處理室(載入/載出室、預 熱室、膜形成室、基底冷卻室等)則是安裝於每個開口 4 的周圍,且經由閘閥(未顯示)而安裝於真空室1的側面 中〇 因此,在本實施例中,真空室是藉螺栓來組裝個別的 三個零件(安裝有基底運送機器人的內室主體2,以及在 其兩側上的側框架3a,3b)。因此,即使製造出來的真 空室1已經安裝好了之後,當基底上的沉澱作用產生修改 時,仍可以改變真空室(運送室)的形狀,可根據處理室 的增加或減少,藉由將三角形側框架3a,3b與其他形狀 的側框架執行交換,從內室主體2旋開螺栓1 1 a,1 1 b而 得。因此’本案的彈性可對應於使用者的需求。 此外,由於能將內裝有基底運送機器人6的內室主體 -8- (6) 1363658 2當成共同零件’此共同零件也可以作爲其他真空室 室主體,可事先執行大量製造,因此,可減少生產成 此外,在此實施例中,真空室是藉由組裝個別的 零件(安裝有基底運送機器人的內室主體2,以及在 側上的側框架3a,3b )。因此,即使當使用大型基 製造大型真空室時,也仍然可以使內室主體2與側 3a,3b的尺寸保持得很小。因此,由於藉習知機器 不需要使用大型定製機器工具,就能輕易產生大型真 ,因此能減少生產成本。 而且,由於接合於真空處理室1之上面以及下面 板以及底板係在前述內.室主體2側與前述側框架3 a 側被相互分割,因此即使當使用大型基底來製造大型 室時,也可以抑制頂板5的尺寸,其中頂板係連接到 好的內室主體2上。因此,可以減輕頂板5的重量, 以輕易從一塊金屬來製作頂板5。 此外,在此實施例中,真空室1是以分割成三個 (安裝有基底運送機器人的內室主體2,以及在其兩 的側框架3a,3b)而製成的。因此,即使當使用大 底來製造大型真空室時,也仍然可以使個別零件(內 體2與側框架3 a,3 b )的尺寸保持得很小。因此, 一正常拖車輕易運送這些分割好的零件到安裝場所, 可輕易在安裝場所予以組裝。 (第二實施例) 的內 本。 三個 其兩 底來 框架 工具 空室 的頂 ' 3b 真空 分割 也可 零件 側上 型基 室主 可以 所以 -9- (7) (7)1363658 在第一實施例中,具有六角形真空室結構之真空室是 藉由螺栓將三角形側框架3a,3b裝配於連接至矩形內室 主體2的兩邊上,且使矩形內室主體2作爲中心而製成的 。然而,在此實施例中,如圖3所示,具有正方形真空室 結構之真空室13是藉由螺栓將矩形側框架12a,12b裝配 於連接至矩形內室主體2的兩邊上,且使矩形內室主體2 作爲中心而製成的。由於此真空室與第一實施例的真空室 是相同的,除了使用矩形側框架12a,12b而已,因此遂 省略重複的說明。 在此實施例中的正方形真空室1 3在個別側面上均具 有開口,在這些開口周圍總共可以安裝四個處理室(未顯 示)。 (第三實施例) 在第二實施例中,具有正方形真空室結構之真空室是 藉由螺栓將矩形側框架12a,12b裝配於連接至矩形內室 主體2的兩邊上,且使矩形內室主體2作爲中心而製成的 。在此實施例中,如圖4所示,具有八角形真空室結構之 真空室是藉由螺栓將三角形側框架14a,14b,14c,14d 裝配於連接至正方形真空室13的兩邊上。 在此實施例中的八角形真空室1 5在個別側面上均具 有開口,在這些開口周圍總共可以安裝四個處理室(未顯 示)。 -10- (8) (8)1363658 (第四實施例) 在上述的每個實施例中,具有矩形內室主體2結構之 真空室是藉由螺栓將三角形側框架3a,3b裝配於連接至 矩形內室主體2的兩邊上,且使矩形內室主體2作爲中心 。但是,在此實施例中,如圖5所示,具有五角形真空室 結構之真空室17是藉由螺栓將三角形側框架16裝配於梯 形內室主體2a的長邊上,且使內室主體2a作爲中心。 在此實施例中的五角形真空室17在個別側面上均具 有開口,在這些開口周圍總共可以安裝五個處理室(未顯 示)。 (第五實施例) 在此實施例中,如圖6所示,具有七邊形結構之真空 室20是藉由螺栓將梯形側框架1 8 (形狀小於內室主體2b )裝配於內室主體2b的一長邊上,且藉由螺栓將三角形 側框架19裝配於梯形內室主體2b的另一短邊上,使梯形 內室主體2b作爲中心。 在此實施例中的七邊形真空室20在個別側面上均具 有開口,在這些開口周圍總共可以安裝七個處理室(未顯 示)。 (第六實施例) 在此實施例中,如圖7所示,具有八邊形結構的真空 室22是藉由螺栓將三角形側框架2]a,2]b,2]c裝配於 -11 - (9) 1363658 其個別側面上,且使一正方形 在此實施例中的八邊形真 有開口,在這些開口周圍總共 示)。 在圖3到7所示的第二至 在側面上一正方形或三角形側 方形、梯形等)內室主體2,: 內室主體安裝有一基底運送機 之後,仍可根據使用者的要求 以輕易將真空室的形狀改變成 此外,在圖4所示的第三 架 12a , 12b , 14a , 14b , 14c 邊形內室主體2的側面上,其 器人。因此,即使基底很大, 施。 如上所述,本發明的真空 多角形內室主體;一多角形側 卸地緊密連結至具開口的內室 板,係連結到內室主體的每一 上:及每一底板,係連接到內 開口的側框架上。因此,即使 成織後,由於可根據使用者的 其他多角形側框架,所以能改 此外,根據本發明,可以 內室住體2c作爲中心。 空室22在個別側面上均具 可以安裝八個處理室(未顯 第六實施例中,可以將安裝 框架以一四邊形(矩形、正 2a,2b,2c進行替換,其中 器人,即使在安裝了真空室 而進行替換組裝。因此,可 任意多角形。 實施例中,可以將許多側框 ,14d藉由螺栓而連接到四 中內室主體安裝有基底運送 本發明亦能提出快速對應措 室可以自由地分割成一框狀 框架,其具有一開口且可拆 主體之至少一側上;每一頂 頂面及具有一開口的側框架 室主體的每一底面及具有一 在真空室已經組裝與安裝完 要求輕易地將側框架替換成 變真空室的形狀。 藉由組裝一內室主體、一側 -12- (10) (10)1363658 框架、一頂板及一底板而獲得一真空室。因此,即使當使 用大型基底製造大型真空室時,仍可以保持小巧質輕,這 是因爲內室主體、側框架、頂板與底板是個別分割的。因 此,由於藉習知機器工具不需要使用大型定製機器工具, 就能輕易產生大型真空室,因此能減少生產成本。 而且,即使當使用大型基底來製造大型真空室時,仍 可以保持小巧質輕,這是因爲內室主體、側框架、頂板與 底板是個別分割的。因此,可以一普通拖車輕易運送這些 分割好的零件到安裝場所,所以可輕易在安裝場所組裝起 來。 【圖式簡單說明】 圖1是一立體圖,顯示本發明第一實施例的真空室; 圖2是一槪略立體圖,顯示本發明第一實施例的真空 室; 圖3顯示本發明第二實施例的真空室之製造程序; 圖4顯示本發明第三實施例的真空室之製造程序; 圖5顯示本發明第四實施例的真空室之形狀; 圖6顯示本發明第五實施例的真空室之形狀; 圖7顯示本發明第六實施例的真空室之形狀; 圖8是一槪略平面圖,顯示習知範例中的多室真空處 理設備; 圖9是一槪略平面圖,顯示習知範例中的多室真空處 理設備。 -13- (11) 1363658 【主要元件符號說明】 1,1 3,15,1 7,20,22 :真空室(運; 2,2a,2b,2c :內室主體 3a, 3b, 12a, 12b, 14a, 14b, 14c, 19, 21a, 21b > 21c, 21d:側框架1363658 (Technical Field of the Invention) The present invention relates to a multi-chamber type vacuum processing apparatus for a vacuum sputtering deposition apparatus of a vacuum processing apparatus. [Prior Art] In recent years, by precipitation technology Advances in the vacuum processing equipment of the fired system, in which even a large base is accurately precipitated, wherein the above sputtering system is used to form a metal mold for wiring on a glass substrate. Further, in recent years, only borrowed The multi-chamber vacuum processing apparatus for continuous execution has been mainstream since the movement in the vacuum. The multi-chamber vacuum processing apparatus 30 shown in Fig. 8 includes chambers 33a, 33b, 33c, 33d, 33e and 33f, which are the chambers 32. A multi-chamber vacuum processing apparatus 40 is shown in FIG. 9 and includes chambers 43a' 43b and 43c for mounting a substrate transport robot 41 around a central transport. The size of the substrate is increased (for example, the so-called length and width is 1800 mmxl500 mm, and the seventh generation width is 2100 mmxl 8 50 mm). The vacuum processing equipment will expand. Since the machine used in the vacuum chamber is larger than before, the manufacturing cost of the vacuum chamber will of course be made. Therefore, a manufacturing method can be proposed, which can be made by using a chamber for performing high-grade glass on a splashed bottom, for example. One, as shown in Figures 8 and 9 is a multi-processing six vacuum process around a central transporter 31. The three vacuum processes g 42, the length of the base of the sixth generation substrate and the vacuum chamber used The tool also becomes higher. Reduces the manufacturing cost -4 (2) (2) 1363658 and obtains a large vacuum chamber without enlarging the machine tool by dividing a frame-shaped inner chamber body into a majority of parts Then, the majority of these parts are soldered and connected (refer to Japanese Patent Laid-Open No. 8.464242, Patent Document 1). By the way, the manufacturing method disclosed in the above patent document cannot be removed again after manufacture. For each part, this is because the side walls of the vacuum chamber are made of welded parts. Therefore, after manufacturing, the size and shape of the side walls of the vacuum chamber cannot be changed. The top plate and the bottom plate on the lower surface of the side wall of the vacuum chamber are integrated in the above patent document 1, and cannot be divided, so the size thereof is still large and heavy. Therefore, a large crane device is required to lift the top plate and the bottom plate, so the manufacturing cost is also It will become very high. Moreover, since the size of the top and bottom plates is still large, a special large trailer is required when the vacuum chamber is to be transported to a mounting location in the state of the finished product or the product before assembly. SUMMARY OF THE INVENTION It is an object of the invention to provide a multi-chamber type vacuum processing apparatus which can be easily changed in size and shape after manufacture. Furthermore, it is an object of the present invention to provide a multi-chamber type vacuum processing apparatus which does not require a large crane. The equipment, even after being assembled, is large in size, but does not require a large special trailer when transported. SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a multi-chamber type vacuum processing apparatus which is provided with a transport chamber and a plurality of vacuum treatments arranged around the circumference of the transport chamber -5 - (3) 1363658 The multi-chamber type vacuum processing apparatus of the chamber is characterized in that the transport chamber is an assembly of a polygonal frame which is disposed in a frame-shaped inner chamber main body and is detachably disposed on at least one side surface of the inner chamber main body. Composition. Further, in the multi-chamber type vacuum processing apparatus of the present invention, the top plate which is joined to the upper surface and the lower surface of the transport chamber, and the top plate and the bottom plate are divided from each other on the side of the inner chamber main body and the side. Further, in the multi-chamber type vacuum processing apparatus of the present invention, the inner chamber main body, the side frame, and the top plate, and the aforementioned portions are assembled by screwing, respectively. As described above, in the multi-processing chamber type true device of the present invention, the vacuum processing chamber serving as the transport chamber is disposed in the frame-like body and at least at least in the inner chamber main body. Since the assembly of the side frame of the polygonal shape is configured, the assembly can be easily changed to the other side-shaped side frame after the assembly, and the formation of the transport chamber can be changed to be elastically Meet the specifications required by the user. [Embodiment] Hereinafter, the present invention will be described based on the embodiments shown. (First Embodiment) Fig. 1 is a perspective view showing the first embodiment of the present invention. The side of the detachable shape is provided with a sub-floor, the bottom plate in the side frame, and the main-side transfer chamber of the empty processing inner chamber. For the installation, the empty chamber, -6-(4) 1363658, can be used as a transport system for a transport system having a side frame called a sedimentation chamber 1 by a joint angle. It is used to integrate a base body 2 and a side inner chamber body 2. i 7, wherein the top surface of the connection and the inner bottom substrate on the bottom surfaces la, 3b (the two openings of the non-explicit chamber main body 2 formed on the sides of the frame-like inner chamber main body 2) are formed, and FIG. 2 is An exploded perspective view. In this embodiment, a vacuum vacuum processing chamber (hereinafter referred to as a vacuum chamber), for example, a chamber having a substrate transport robot therein, a multi-chamber single-substrate type sputtering deposition apparatus of the six processing chambers of the robot (equipment) As shown in Fig. 1, a central inner chamber body 2 having a rectangular cross-section in a vacuum according to a first embodiment of the present invention and a cross section of three 3a' 3b, a hexagonal bottom formed on both sides of the inner chamber main body 2. (not shown) The opening 4 for taking in and taking out is formed on each side of the inner frames 3a, 3b (total of six sides). The side frames 3a, 3b are made of metal such as aluminum and stainless steel | The top plate 5 of the robot and the opening of the bottom plate are respectively formed on the frame-shaped rectangular inner chamber main body 2. Further, openings are formed in both side surfaces which are long sides and are connected to the side frame 2 chamber main body 2. Further, for display) Take in and take out the opening It is formed on the inner side as the short side. Further, the opening of the top plate 8 connected to the bottom plate 9 is respectively in the top surface and the lower surface of the triangular side frame. Moreover, the opening connected to the side is formed on the side frame 3a| as the long side. Further, a substrate (not shown) is taken in and taken out on both side faces of the inner chamber main body 2 which is a short side. Next, a method of manufacturing the vacuum chamber 1 of the above embodiment will be explained. The bottom plate 7 is connected to the bottom of the inner chamber main body 2 by bolts (not shown) through a 0 ring (not shown) (5) (5) 1363658, and the bottom plate 9 is respectively passed through a 0 ring (not shown) by a bolt (not shown). It is connected to the bottom of the side frames 3a and 3b. Then, the side frames 3a, 3b are connected to both side faces of the inner chamber main body 2 by bolts 1 1 a, 1 1 b through the 0 rings 10a, 10b, respectively. Then, the substrate transport robot 6 is mounted on the bottom plate 7 connected to the inner chamber main body 2, after which the top plate 5 is connected to the upper portion of the inner chamber main body 2 through the bolt 11c through the loop 10c. Then, as shown in Fig. 1, The hexagonal vacuum chamber 1 is connected to each upper portion of the side frames 3a, 3b by bolts lid, lie through the loops 10d, 10e, respectively. The vacuum chamber 1 manufactured as described above is installed in a central portion of a sedimentation apparatus having six processing chambers as a transport chamber provided with the substrate transport robot 6. Six processing chambers (loading/discharging chamber, preheating chamber, film forming chamber, base cooling chamber, etc.) not shown are installed around each opening 4 and are mounted to the vacuum via a gate valve (not shown). In the side of the chamber 1, therefore, in the present embodiment, the vacuum chamber is assembled by bolts to individual three parts (the inner chamber body 2 on which the substrate transport robot is mounted, and the side frames 3a, 3b on both sides thereof) ). Therefore, even after the vacuum chamber 1 has been installed, when the precipitation on the substrate is modified, the shape of the vacuum chamber (transport chamber) can be changed, depending on the increase or decrease of the processing chamber, by the triangle The side frames 3a, 3b are exchanged with the side frames of other shapes, and are obtained by unscrewing the bolts 1 1 a, 1 1 b from the inner chamber body 2. Therefore, the flexibility of the case can correspond to the needs of the user. Further, since the inner chamber main body-8-(6) 1363658 2 in which the substrate transport robot 6 is housed can be regarded as a common part 'this common part can also be used as another vacuum chamber main body, and mass production can be performed in advance, thereby reducing Further, in this embodiment, the vacuum chamber is assembled by assembling individual parts (the inner chamber main body 2 on which the substrate transport robot is mounted, and the side frames 3a, 3b on the side). Therefore, even when a large vacuum chamber is manufactured using a large base, the size of the inner chamber main body 2 and the sides 3a, 3b can be kept small. Therefore, since the machine can be easily produced with a large custom machine tool without using a large custom machine tool, the production cost can be reduced. Further, since the upper surface of the vacuum processing chamber 1 and the lower panel and the bottom plate are separated from each other on the side of the inner chamber main body 2 and the side frame 3 a side, even when a large substrate is used to manufacture a large chamber, The size of the top plate 5 is suppressed, wherein the top plate is attached to the good inner chamber main body 2. Therefore, the weight of the top plate 5 can be reduced to easily make the top plate 5 from a piece of metal. Further, in this embodiment, the vacuum chamber 1 is formed by dividing into three (the inner chamber main body 2 on which the substrate transport robot is mounted, and the side frames 3a, 3b of the two). Therefore, even when a large vacuum chamber is used to manufacture a large vacuum chamber, the size of the individual parts (the inner body 2 and the side frames 3a, 3b) can be kept small. Therefore, a normal trailer can easily transport these divided parts to the installation site and can be easily assembled at the installation site. The internals of (the second embodiment). The top of each of the three bottoms of the frame tool empty chamber '3b vacuum partition can also be the part side type base chamber main can be so 9-(7) (7) 1363658 In the first embodiment, there is a hexagonal vacuum chamber structure The vacuum chamber is formed by fitting the triangular side frames 3a, 3b to both sides of the rectangular inner chamber main body 2 by bolts, and making the rectangular inner chamber main body 2 as a center. However, in this embodiment, as shown in FIG. 3, the vacuum chamber 13 having a square vacuum chamber structure is fitted with the rectangular side frames 12a, 12b by bolts to both sides of the rectangular inner chamber main body 2, and is made rectangular. The inner chamber body 2 is made as a center. Since this vacuum chamber is the same as the vacuum chamber of the first embodiment, except that the rectangular side frames 12a, 12b are used, the overlapping description will be omitted. The square vacuum chambers 13 in this embodiment have openings on individual sides, and a total of four processing chambers (not shown) can be installed around these openings. (Third Embodiment) In the second embodiment, the vacuum chamber having the square vacuum chamber structure is fitted with the rectangular side frames 12a, 12b by bolts to both sides of the rectangular inner chamber main body 2, and the rectangular inner chamber is made The main body 2 is made as a center. In this embodiment, as shown in Fig. 4, the vacuum chamber having the octagonal vacuum chamber structure is fitted with the triangular side frames 14a, 14b, 14c, 14d to both sides of the square vacuum chamber 13 by bolts. The octagonal vacuum chambers 15 in this embodiment have openings on the individual sides, and a total of four processing chambers (not shown) can be installed around the openings. -10- (8) (8) 1363658 (Fourth Embodiment) In each of the above embodiments, the vacuum chamber having the structure of the rectangular inner chamber main body 2 is fitted to the triangular side frames 3a, 3b by bolts to The rectangular inner chamber body 2 is on both sides, and the rectangular inner chamber body 2 is centered. However, in this embodiment, as shown in FIG. 5, the vacuum chamber 17 having the pentagonal vacuum chamber structure is fitted with the triangular side frame 16 on the long side of the trapezoidal inner chamber main body 2a by bolts, and the inner chamber main body 2a is made. As the center. The pentagonal vacuum chamber 17 in this embodiment has openings on the individual sides, and a total of five processing chambers (not shown) can be installed around the openings. (Fifth Embodiment) In this embodiment, as shown in Fig. 6, a vacuum chamber 20 having a heptagonal structure is fitted with a trapezoidal side frame 18 (having a shape smaller than the inner chamber main body 2b) to an inner chamber main body by bolts. On one long side of 2b, the triangular side frame 19 is fitted to the other short side of the trapezoidal inner chamber main body 2b by bolts, and the trapezoidal inner chamber main body 2b is centered. The heptagonal vacuum chamber 20 in this embodiment has openings on individual sides, and a total of seven processing chambers (not shown) can be installed around the openings. (Sixth embodiment) In this embodiment, as shown in Fig. 7, a vacuum chamber 22 having an octagonal structure is assembled with a triangular side frame 2]a, 2] b, 2] c by bolts - 11 - (9) 1363658 On its individual sides, and making a square in this embodiment the octagon has an opening, shown in total around these openings). In the second to lateral side square, trapezoidal, etc. on the side shown in Figures 3 to 7, the inner chamber body 2, after the inner chamber body is mounted with a substrate conveyor, can still be easily opened according to the user's request. The shape of the vacuum chamber is changed to, in addition, on the side of the third frame 12a, 12b, 14a, 14b, 14c of the side-shaped inner chamber main body 2 shown in Fig. 4, which is a person. Therefore, even if the substrate is large, it is applied. As described above, the vacuum polygonal inner chamber body of the present invention; a polygonal side portion is tightly coupled to the inner chamber plate having an opening, and is coupled to each of the inner chamber main bodies: and each bottom plate is connected to the inner portion On the side frame of the opening. Therefore, even after the weaving, since it can be made according to other polygonal side frames of the user, it is possible to change the outer living body 2c as the center according to the present invention. The empty chamber 22 has eight processing chambers on each of the individual sides (not shown in the sixth embodiment, the mounting frame can be replaced by a quadrilateral (rectangular, positive 2a, 2b, 2c, where the person is installed even The vacuum chamber is used for replacement assembly. Therefore, it can be arbitrarily polygonal. In the embodiment, a plurality of side frames, 14d can be connected to the inner chamber body by bolts, and the base is transported. The present invention can also provide a quick corresponding room. Can be freely divided into a frame-like frame having an opening and at least one side of the detachable body; each of the top surface and each bottom surface of the side frame chamber body having an opening and having a vacuum chamber has been assembled The installation requires that the side frame be easily replaced with the shape of the vacuum chamber. A vacuum chamber is obtained by assembling an inner chamber body, a side 12-(10) (10) 1363658 frame, a top plate and a bottom plate. Even when a large vacuum chamber is used to manufacture a large vacuum chamber, it can be kept small and light, because the inner chamber body, the side frame, the top plate and the bottom plate are individually divided. Conventional machine tools can easily produce large vacuum chambers without the use of large custom machine tools, thus reducing production costs. Moreover, even when large substrates are used to make large vacuum chambers, they can be kept small and light. Because the inner chamber body, the side frame, the top plate and the bottom plate are separately divided. Therefore, the divided parts can be easily transported to the installation place by an ordinary trailer, so that it can be easily assembled at the installation place. [Simple diagram of the drawing] Is a perspective view showing a vacuum chamber according to a first embodiment of the present invention; FIG. 2 is a schematic perspective view showing a vacuum chamber according to a first embodiment of the present invention; and FIG. 3 is a view showing a manufacturing process of a vacuum chamber according to a second embodiment of the present invention; Figure 4 is a view showing the manufacturing process of the vacuum chamber of the third embodiment of the present invention; Figure 5 is a view showing the shape of the vacuum chamber of the fourth embodiment of the present invention; Figure 6 is a view showing the shape of the vacuum chamber of the fifth embodiment of the present invention; The shape of the vacuum chamber of the sixth embodiment of the invention; Fig. 8 is a schematic plan view showing the multi-chamber vacuum processing apparatus in the conventional example; A plan view showing the multi-chamber vacuum processing equipment in the conventional example. -13- (11) 1363658 [Signature description of main components] 1,1 3,15,1 7,20,22 : Vacuum chamber (2; 2a, 2b, 2c: inner chamber main body 3a, 3b, 12a, 12b, 14a, 14b, 14c, 19, 21a, 21b > 21c, 21d: side frame

室) 14d , 16, 18, 5,8 :頂板 6 :基底運送機器人 7,9 :底板Room) 14d , 16, 18, 5,8 : Top plate 6 : Base transport robot 7,9 : Base plate

-14--14-

Claims (1)

1363658 ί公告本/|〇卜修林 第096125750號專利申請案中文申請專利範圍修正本 民國101年2月16日修正 / 十、申請專利範圍 1. 一種多處理室型真空處理設備,係爲具備有運送 室、和被配置於此運送室之周圍的複數之真空處理室的多 處理室型真空處理裝置,其特徵爲, . 前述運送室,係由框狀之處理室本體和可自由裝附脫 Φ 離地被配置於此處理室本體之至少一側面部的多角形狀之 側框架的組裝體所構成, 其中該多處理室型真空處理設備,更包含分別與前述 運送室之上面以及下面相接合的頂板以及底板,前述頂板 以及前述底板係在前述處理室本體側與前述側框架側被彼 * 此分割,及 * 其中前述處理室本體,和前述側框架,和前述頂板, 以及前述底板,係分別藉由螺絲鎖合而加以組裝。1363658 ί Announcement /|〇卜修林第096125750 Patent application Chinese patent application scope amendments Amendment of the Republic of China on February 16, 101 / X. Patent application scope 1. A multi-processing chamber type vacuum processing equipment, which is equipped with transportation a multi-chamber type vacuum processing apparatus of a plurality of vacuum processing chambers disposed around the transport chamber, wherein the transport chamber is a frame-shaped processing chamber body and is freely attachable and detachable. The multi-chamber type vacuum processing apparatus further includes an assembly that is disposed on the upper and lower sides of the transport chamber of the processing chamber body, respectively. a top plate and a bottom plate, wherein the top plate and the bottom plate are divided by the side of the processing chamber body and the side frame side, and wherein the processing chamber body, the front side frame, the top plate, and the bottom plate are respectively It is assembled by screwing.
TW096125750A 2003-05-08 2004-05-07 Multi-processing chamber -type vacuum processing apparatus TWI363658B (en)

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KR100736243B1 (en) 2007-07-06
CN101419902B (en) 2011-04-20

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