CN100550086C - Be used to make the equipment of flat-panel monitor - Google Patents

Be used to make the equipment of flat-panel monitor Download PDF

Info

Publication number
CN100550086C
CN100550086C CNB2007101384507A CN200710138450A CN100550086C CN 100550086 C CN100550086 C CN 100550086C CN B2007101384507 A CNB2007101384507 A CN B2007101384507A CN 200710138450 A CN200710138450 A CN 200710138450A CN 100550086 C CN100550086 C CN 100550086C
Authority
CN
China
Prior art keywords
chamber
substrate
covering
load lock
driver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2007101384507A
Other languages
Chinese (zh)
Other versions
CN101089921A (en
Inventor
李荣钟
崔浚泳
曹生贤
尹炳五
金敬勋
郑洪基
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Display Process Engineering Co Ltd
ADP Engineering Co Ltd
Original Assignee
ADP Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ADP Engineering Co Ltd filed Critical ADP Engineering Co Ltd
Publication of CN101089921A publication Critical patent/CN101089921A/en
Application granted granted Critical
Publication of CN100550086C publication Critical patent/CN100550086C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process

Abstract

A kind of flat-panel monitor (FPD) manufacturing equipment, its structure can easily be handled large-size substrate and realize being easy to manufacturing, transportation, running and repair procedures simultaneously.

Description

Be used to make the equipment of flat-panel monitor
The application is that No. 200510008749.1, that submitted on February 25th, 2005 are called dividing an application of " equipment that is used to make flat-panel monitor " Chinese invention patent application.
Technical field
The present invention relates to a kind of equipment that is used to make flat-panel monitor, more specifically, relate to a kind of flat panel display manufacturing apparatus, it has the setting that is suitable for carrying out the required process that is used for large-size substrate.
Background technology
With reference to figure 1, show general flat-panel monitor (FPD) manufacturing equipment, it is used to make FPD, as LCD and plasm display panel (PDP).As shown in fig. 1, the FPD manufacturing equipment of being represented by label 1 comprises load lock chamber 100, feed chamber 200 and process chamber 300, and they are connected in series.Family of power and influence G is arranged between the adjacent chamber independently to keep the vacuum environment in each chamber.
Load lock chamber 100 be connected to outside station to receive the substrate that will in the FPD manufacturing equipment, handle so that mounting substrate, perhaps discharge the substrate in the FPD manufacturing equipment, handled fully so that unload carried base board.Load lock chamber 100 switches between vacuum state and atmospheric condition repeatedly, thereby load lock chamber 100 optionally is communicated with outside station.Loading mould 102 is arranged in the load lock chamber 100 to load the one or more substrates of loading on the mould 102.
Calibrating device 106 is arranged on and loads mould 102 on every side to proofread and correct in the position of loading the substrate S that loads on the mould 102, as shown in fig. 1.Calibrating device 106 is by promoting to come at the sidepiece that loads the substrate S that loads on the mould 102 position of correction substrate S diagonally.Exhaust apparatus (not shown) and gas supply device (not shown) also are installed in the load lock chamber 100 so that the environment of load lock chamber 100 changes between vacuum state and atmospheric condition.
Feed chamber 200 is connected between load lock chamber 100 and the process chamber 300.Feed chamber 200 have be arranged on feed chamber 200 inside present automat 202, thereby feed chamber 200 is used for presenting substrate between load lock chamber 100 and process chamber 300, so that the load/unload substrate as center-aisle.Feed chamber 200 maintains vacuum environment, thereby makes process chamber 300 maintain vacuum environment.
Process chamber 300 is equipped with: load mould 302, be used at process chamber 300 mounting substrates; And the treating apparatus (not shown), be used for the substrate that loads at process chamber 300 is carried out required processing.For example, carry out etching process under the vacuum environment in building on process chamber 300.
This FPD manufacturing equipment can be a group type, and wherein a plurality of process chambers 300 are connected to single feed chamber 200, as shown in Figure 2.In the case, feed chamber 200 can have circle or polygonal shape so that a plurality of process chamber 300 is provided with around feed chamber 200.
Simultaneously, the FPD manufacturing equipment of exploitation comprises the vacuum chamber with very big size recently, and for example 3m or bigger width have 2m or bigger large-size substrate thereby handle.For this reason, the process that such vacuum chamber is transported to its infield from its manufacturing location, have problems.In other words, consider Korea S and other national road conditions, the vacuum chamber of this 3m of having or bigger width can not be transported by the land route.
In addition, under the situation that this large scale vacuum chamber is made with monomeric form, be necessary to use the large scale processing unit (plant) to come machined metallic material to form the shell of vacuum chamber.In addition, process also is difficult.
And when being necessary to repair the structure that is installed in internal vacuum chamber when eliminating the variety of issue that produces between the vacuum chamber on-stream period, the top of vacuum chamber must be opened.Yet, be under the situation about making at vacuum chamber with monomeric form, the top that is difficult to open vacuum chamber.In addition, need be many artificial.For this reason, can not easily repair vacuum chamber.
Because the size of chamber increases, the floor area of vacuum chamber also increases greatly in the broom closet.Therefore, being necessary to provide a kind of can effectively handle large-size substrate and not increase the FPD manufacturing equipment of floor area.
Summary of the invention
Therefore, the purpose of this invention is to provide a kind of FPD manufacturing equipment, it can easily handle large-size substrate, realizes being easy to manufacturing, transportation, operation and repair procedures simultaneously.
According to an aspect, the invention provides a kind of separable vacuum chamber of flat panel display manufacturing apparatus, comprising: top board, it forms the top of described chamber; Base plate, the bottom that it is faced top board and forms described chamber; Peripheral wallboard, it is coupled in top board and base plate respectively to limit enclosure space at the place, top and bottom, this periphery wallboard has the extension in the end that it is connected to base plate, and extend to form the step on the base plate along the peripheral direction of described chamber in described chamber interior this extension; Covering assemblies, it is arranged on the base plate to extend so that covering assemblies covers the extension of peripheral wallboard along the peripheral direction of described chamber in described chamber interior; And seal assembly, its be inserted between extension and the covering assemblies and between base plate and the covering assemblies so that described enclosure space is shielded mutually with the outside of described chamber.
According to another aspect, the invention provides a kind of separable vacuum chamber of flat panel display manufacturing apparatus, comprising: top board, it forms the top of described chamber; Base plate, the bottom that it is faced top board and forms described chamber; Peripheral wallboard, it is coupled in top board and base plate respectively to limit enclosure space at the place, top and bottom, this periphery wallboard has the extension in the end that it is connected to top board, and extend to form the step on the top board along the peripheral direction of described chamber in described chamber interior this extension; Covering assemblies, it is arranged on the top board to extend so that covering assemblies covers the extension of peripheral wallboard along the peripheral direction of described chamber in described chamber interior; And seal assembly, its be inserted between extension and the covering assemblies and between top board and the covering assemblies so that described enclosure space is shielded mutually with the outside of described chamber.
According to another aspect, the invention provides a kind of separable vacuum chamber that in the process of making flat-panel monitor, uses, comprise: the chamber shell, it is divided at least two parts, and wherein vacuum chamber is by chamber shell part is assembled and formed with waiting to be arranged on element in the vacuum chamber.
According to another aspect, the invention provides a kind of flat panel display manufacturing apparatus, comprise a plurality of chambers, each all is suitable for carrying out the required process that is used for substrate, and wherein at least one chamber comprises: the chamber shell with the path that forms at shell top, chamber; The top covers, and its top that is installed on the chamber shell is with the described path of opening/closing, and has and pass on the thickness direction that covers at the top that the top covers and one or more openings of forming; One or more auxiliary coverings, each all is installed on the top and covers with the associated openings in the one or more openings of opening/closing; And one or more seal assemblies, each be inserted in all that the top covers and the relevant covering of described one or more auxiliary coverings between with provide the top to cover and relevant auxiliary the covering between sealing effectiveness.
According to another aspect, the invention provides a kind of flat panel display manufacturing apparatus, it comprises load lock chamber, feed chamber and process chamber, is used to make flat-panel monitor, wherein load lock chamber comprises: the vacuum chamber shell, can set up vacuum therein; Opening, it passes the peripheral wall of vacuum chamber shell and forms to allow substrate to be loaded into the neutralization of vacuum chamber shell by opening so that with substrate and unload carried base board from the vacuum chamber shell; The family of power and influence, it is suitable for the opening/closing opening; And end effector pockets, its diapire at the vacuum chamber shell forms presents the end effector of automat to hold the substrate that is installed in the load lock outdoor respectively, and each end effector pockets all has predetermined depth and vertically moves in the actuator pockets endways with an end effector that allows to be correlated with.
According to another aspect, the invention provides a kind of method that is used at the load lock chamber mounting substrate, may further comprise the steps: A) open the opening of load lock chamber, and when the end effector that will present automat is inserted in the end effector pockets of load lock chamber, substrate is inserted in the load lock chamber by using substrate to present automat; B) end effector of presenting automat in the reduction end effector pockets, mounting substrate in load lock chamber thus; C) move horizontally and present automat, withdraw from from load lock chamber thus and present automat; And D) closes opening, and in load lock chamber, set up vacuum environment.
According to another aspect, the invention provides a kind of flat panel display manufacturing apparatus, it comprises load lock chamber, feed chamber and process chamber, wherein feed chamber comprises: present automat, it comprises and is arranged on presenting arm and being coupled to the driver of presenting the arm lower end and being positioned at feed chamber bottom of feed chamber bottom; Vertical driver, it is arranged on below the feed chamber and is suitable for rising to the level of door with presenting automat; The driver path, its side that is formed at feed chamber is to allow driver by the driver path; And door, it is installed on feed chamber with opening/closing driver path.
According to another aspect, the invention provides a kind of flat panel display manufacturing apparatus, comprise the electric field generation systems, handle gas supply system and exhaust system, they are arranged in the vacuum chamber so that the substrate that loads in the vacuum chamber is carried out required process, wherein vacuum chamber comprises: the chamber body, and it forms the sidewall of vacuum chamber; The top covers, and it is coupled to body top, chamber to form the roof of vacuum chamber; And the bottom covers, it is coupled to body bottom, chamber to form the diapire of vacuum chamber, wherein the chamber body has commissura at its lower end, this commissura is inwardly outstanding to engage with the bottom covering from the lower end level of chamber body, and its middle and lower part covers its peripheral edge place and has the engagement grooves that shape matches with commissura.
According to another aspect, the invention provides a kind of method that is used to repair flat panel display manufacturing apparatus, may further comprise the steps: A) separate the top from the chamber body and cover by feeding means; B) separate the bottom by feeding means from the chamber body and cover, and the bottom covering is placed on the work mould; C) repairing the bottom covers; D) by feeding means the chamber body is coupled in the bottom covering; And E) by feeding means the chamber body is coupled in the top covering.
Description of drawings
After having read the following detailed description that provides in conjunction with the accompanying drawings, above purpose of the present invention and other characteristics and advantage will become more obvious, in the accompanying drawings:
Fig. 1 is the synoptic diagram that the layout of general FPD manufacturing equipment is shown;
Fig. 2 is the synoptic diagram that the layout of another general FPD manufacturing equipment is shown;
Fig. 3 is the front elevation that illustrates according to the separable vacuum chamber of first embodiment of the invention;
Fig. 4 a and 4b are the zoomed-in views of the part " A " that corresponds respectively to Fig. 3;
Fig. 5 illustrates the front elevation that is included in according to the structure of the stacked chamber in the FPD manufacturing equipment of second embodiment of the invention;
Fig. 6 a is the synoptic diagram that the various projection/groove type connected structures of the stacked chamber that is applied to Fig. 5 are shown respectively to 6d;
Fig. 7 is the planimetric map that illustrates according to the couple state of the separable vacuum chamber of third embodiment of the invention;
Fig. 8 is the planimetric map that illustrates according to the decomposing state of the separable vacuum chamber of third embodiment of the invention;
Fig. 9 is the front elevation that illustrates according to the structure of the coupled surface of the vacuum chamber of third embodiment of the invention part;
Figure 10 is the stereographic map that illustrates according to the structure of the coupled surface of the vacuum chamber of third embodiment of the invention part;
Figure 11 is schematically illustrated to being included in the planimetric map that covers and assist the couple state that covers according to the top of the feed chamber in the FPD manufacturing equipment of fourth embodiment of the invention;
Figure 12 is the view in transverse section corresponding to Fig. 3;
Figure 13 illustrates to be arranged on top covering and the auxiliary exploded perspective view that covers that is included in according to the place, top of the feed chamber in the FPD manufacturing equipment of fourth embodiment of the invention;
Figure 14 is the view in transverse section that illustrates according to the structure of the load lock chamber of fifth embodiment of the invention;
Figure 15 is the longitdinal cross-section diagram that illustrates according to the structure of the load lock chamber of fifth embodiment of the invention;
Figure 16 illustrates the process flow diagram that is used for according to the method for the load lock chamber mounting substrate of fifth embodiment of the invention;
Figure 17 a and 17b illustrate respectively to be used for presenting the sectional view of the process of automat from being included in according to the feed chamber unloading of the FPD manufacturing equipment of sixth embodiment of the invention;
Figure 18 is the planimetric map that the feed chamber of Figure 17 a and 17b is shown;
Figure 19 illustrates to present automat from being included in the front elevation according to the unloaded state of the feed chamber the FPD manufacturing equipment of sixth embodiment of the invention;
Figure 20 is the exploded perspective view that illustrates according to the structure of the vacuum chamber of seventh embodiment of the invention;
Figure 21 illustrates the synoptic diagram that is used to assemble and repair the process that the bottom covers according to seventh embodiment of the invention;
Figure 22 illustrates the process flow diagram that is used to make and assemble according to the method for the vacuum chamber of seventh embodiment of the invention; And
Figure 23 illustrates the process flow diagram that is used to repair according to the method for the vacuum chamber of seventh embodiment of the invention.
Embodiment
Hereinafter with reference to accompanying drawing example embodiment of the present invention is described.In the following description, with Fig. 1 and 2 in the element corresponding elements will be denoted by the same reference numerals respectively.
First embodiment
Fig. 3 illustrates the front view that is included in according to the separable vacuum chamber in the FPD manufacturing equipment of first embodiment of the invention.Fig. 4 a and 4b are the zoomed-in views of the part " A " that corresponds respectively to Fig. 3.Although shown vacuum chamber applicable to any one of load lock chamber, feed chamber and process chamber, is convenient the description, below describing will be only in conjunction with vacuum chamber being applied to the situation of load lock chamber and providing.
As shown in Figure 3, with the separable vacuum chamber according to present embodiment that label 100 is represented, it comprises: top board 110 and base plate 120, top board 110 and base plate 120 face with each other with the top and the bottom of difference delimit chamber 100; And peripheral wallboard 130, it is coupled in top board 110 and base plate 120 respectively at the place, top and bottom.The top and bottom that have extension 135 to be formed at peripheral wallboard 130 are located and 100 inside form the step on top board 110 and the base plate 120 respectively, shown in Fig. 3,4a and 4b thus along top board 110 and base plate 120 extensions in the chamber.Although be respectively arranged with two extensions 135 at the two ends of peripheral wall plate 130, shown in situation under, also can be only form single extension 135 at an end of peripheral wall plate 130.
Like this, an end or the every end of each extension 135 along the inside surface of vacuum chamber 100 from peripheral wallboard 130 extends with formation and is positioned at top board 110, base plate 120 or top board and base plate 110 and 120 both steps, as shown in Fig. 4 a.Each extension 135 all has three surfaces, promptly contacts outside surface or surface in contact 135a, inside surface 135b and the end surfaces 135c of top board 110 or base plate 120.
For the inside with chamber 100 shields mutually with the outside of chamber 100 and thus the inside of chamber 100 maintained vacuum state effectively, be separately positioned on top board 110, base plate 120 or top board and base plate 110 and 120 both step place seal assemblies 140, as shown in Figure 3.Covering assemblies 150 also is set at top board 110, base plate 120 or top board and base plate 110 and 120 both step places respectively covers extension 135 to be inserted at each seal assembly 140 under the situation between a relevant step and the relevant covering assemblies 150.Each covering assemblies 150 all with the surface contact that limits relevant step, promptly the surface portion of relevant extension 135, be formed with extension 135 peripheral wallboard 130 surface portion and contact the top board of extension 135 and the surface portion of base plate 110 or 120.
Each covering assemblies 150 all makes the exposure minimum of the plasma gas that exists in relevant 140 pairs of chambers 100 of a seal assembly, and protects relevant seal assembly 140 thus.Preferably, each covering assemblies 150 all contacts with relevant top board 110 or base plate 120 with peripheral wallboard 130 when covering relevant seal assembly 140.Be coupled at covering assemblies 150 under the situation of base plate 120, this coupling can realize simply by the weight of using covering assemblies 150, as shown in Fig. 4 a.Yet preferably covering assemblies 150 uses to the coupling of base plate 120 and realizes to obtain higher bonding force such as the fastening assembly of screw or bolt.On the other hand, be coupled at covering assemblies 150 under the situation of top board 110, as shown in Figure 3, this coupling must be used and realize such as the fastening assembly of screw or bolt, separates from top board 110 owing to the weight of covering assemblies 150 to prevent covering assemblies 150.
As shown in Fig. 3 and 4a, each seal assembly 140 all can comprise O shape circle, and it typically can be used in the general vacuum chamber.According to illustrated embodiment of the present invention, each seal assembly 140 all comprises pair of O shape circle 140a, and it is separately positioned on the relevant extension 135 and the top board 110 or the base plate 120 at 135 places, extension are set.
The O shape circle 140a of each seal assembly 140 can be independently of one another or is whole each other.Under the situation of Fig. 4 a, the O shape of each seal assembly 140 circle 140a is separately positioned on the relevant extension 135 and near the part the end surfaces 135c that is positioned at extension 135 of top board 110 or base plate 120, the while is independently of one another.On the other hand, under the situation of Fig. 4 b, each seal assembly 140 all comprises pair of O shape circle 140b, and it is separately positioned near the end surfaces 135c that is positioned at extension 135 of relevant extension 135 and top board 110 or base plate 120 the part, be simultaneously integral body each other.Comprise in use under the situation of seal assembly 140, might more efficiently chamber 100 be maintained vacuum state with the integrally-built O shape circle 140b as shown in Fig. 4 b.
Although each seal assembly 140 all has been described to comprise the inside surface 135b that is separately positioned on the extension 135 of being correlated with and upward and on the top board 110 of 135 placements, extension or the base plate 120 has enclosed 140a or 140b for whole pair of O shape independently of one another or each other simultaneously, shown in Fig. 4 a or 4b, if necessary, seal assembly 140 can have such structure, wherein, the O shape circle 140a or the 140b that are suitable for being arranged on extension 135 are not arranged on the inside surface 135 of extension 135, and are arranged on the end surfaces 135c of extension 135.
In order to make separable vacuum chamber 100, the base plate 120 that constitutes 100 bottoms, chamber at first is installed in required place.Describe for simplifying, below description will only be combined in the assembling process that a side of 100 is carried out in the chamber under situation of using each seal assembly 140 that all has separation O shape coil structures and provide.Afterwards, an O shape circle 140a with a seal assembly (lower seal assembly) 140 is placed on the base plate 120.In order on base plate 120, O shape circle 140a to be in place, preferably, form the seat of the part that is suitable for holding O shape circle 140a in the part of the base plate 120 that will place O shape circle 140a.
After being placed on O shape circle 140a on the base plate 120, peripheral wallboard 130 is installed on the base plate 120 so that the outside surface 135a in the extension, bottom 135 that the lower end of peripheral wall plate 130 forms touches base plate 120, as shown in Fig. 4 a.As a result, on base plate 120, form lower step.Owing to there is O shape circle not to be inserted between the rear surface of base plate 120 and peripheral wallboard 130, opposite with regular situation, there is no need to form the seat of a part that is suitable for holding O shape circle at the rear surface place of the peripheral wallboard 130 of contact base plate 120.
After being installed in peripheral wallboard 130 on the base plate 120, another O shape circle 140a of lower seal assembly 140 is placed on the inside surface 135b of extension, bottom 135 of the lower end that is formed on peripheral wallboard 130, as shown in Fig. 4 a.In order on extension, bottom 135 another O shape circle 140a to be in place, the inside surface 135b in extension, bottom 135 forms and is suitable for holding the seat that another O shape is enclosed the part of 140a.Therefore, another O shape circle 140a is placed on the seat at the inside surface 135b place that is formed at extension, bottom 135.
Afterwards, a covering assemblies 150 (bottom covering assemblies) is arranged on lower step, make: cover at bottom covering assemblies 150 under the condition of O shape circle 140 of the lower seal assembly 140 on the inside surface 135b of the upper surface that is placed on base plate 120 respectively and extension, bottom 135, bottom covering assemblies 150 touches peripheral wallboard 130 and base plate 120.The lower surface of bottom covering assemblies 150 has given shape, thereby makes lower surface touch the extension 135 that forms lower step, and engages with extension 135 thus.The lower surface of bottom covering assemblies 150 also is formed with seat partly to hold the O shape circle 140a on the inside surface 135b that is arranged on extension 135 respectively and to be arranged on O shape circle 140a on the upper surface of base plate 120.Afterwards, bottom covering assemblies 150 is by means of being fastened to base plate 120 such as the fastening assembly of bolt or screw, thereby bottom covering assemblies 150 is coupled to base plate 120 securely, and prevents that thus bottom covering assemblies 150 from moving, and protection O shape circle 140a.
Like this, be completed into the substructure of chamber 100 according to above-mentioned assembling process.By using the assembling process identical, form the superstructure of chamber 100 then with above-mentioned assembling process.In other words, can carry out assembling process in the following order: top board 110 is placed on the peripheral wallboard 130, top seal assembly 140 is set, top covering assemblies 150 then is coupled.
Second embodiment
According to present embodiment, at least one of load lock chamber, feed chamber and the process chamber of formation FPD manufacturing equipment has vertical stacked cell structure, and vertical stacked cell structure comprises at least two seed cells, and each all uses various projection/groove type structures and intercouples.According to present embodiment, a kind of like this FPD manufacturing equipment might be provided, it can be realized optimal spatial efficient and realize that thus cost reduces the increase with throughput rate, obtains the required rigidity of stacked chamber simultaneously.Therefore, present embodiment meets nearest requirement, i.e. exploitation can make that large scale FPD represents simultaneously that throughput rate increases and not owing to increase the FPD manufacturing equipment of the erection space increase that FPD manufacturing equipment size causes.
Although according to the stacked chamber of present embodiment any one applicable to load lock chamber, feed chamber and process chamber, be convenient the description, below describing will be only in conjunction with stacked chamber being applied to the situation of process chamber and providing.
Fig. 5 illustrates the front elevation that is included in according to the structure of the stacked chamber in the FPD manufacturing equipment of second embodiment of the invention.
As shown in Figure 5, the process chamber 300 that is included in the FPD manufacturing equipment comprises at least two vertical stacked seed cells.In an example shown, process chamber 300 comprises two vertical stacked seed cells 310 and 320.In order to make FPD, the FPD manufacturing equipment generally includes load lock chamber, feed chamber and process chamber.Consider and handle and space efficiency that the chamber of FPD manufacturing equipment can have stacked structure.In other words, constitute, two in three chambers of FPD manufacturing equipment or all can have stacked structure.
Simultaneously, in the FPD manufacturing equipment, it is the longest that the processing substrate time that is spent in process chamber was compared with the processing substrate time that is spent in all the other chambers.And process chamber is carried out a large amount of functions.For this reason, preferably process chamber comprises that the vertical stacked seed cell of some is to realize the raising of processing substrate efficient.
For example, process chamber can comprise two vertical stacked seed cells.In this example, load lock chamber and feed chamber are actuated to externally be discharged in the substrate of handling fully in the sub-process chamber and load another pending substrate in this sub-process chambers, simultaneously another substrate in another sub-process chamber are carried out a certain processing.Like this, can in two sub-process chambers, carry out processing effectively to substrate.
The quantity of vertical stacked seed cell can be two or more.Under the situation of using two seed cells, they can carry out identical functions or different functions respectively.
In an example shown, the process chamber 300 of FPD manufacturing equipment comprises two vertical stacked seed cells 310 and 320, and it intercouples by using the projection/groove type connected structure that 310 and 320 contact portion 330 places form in the seed cell respectively.With do not use respectively the projection/groove type connected structure that forms at contact portion 330 places and realize that the situation of seed cell 310 and 320 coupling compares, under the situation of intercouple seed cell 310 and 320, its advantage is that the overall height of process chamber 300 reduces using respectively the projection/groove type connected structure that forms at contact portion 330 places of seed cell 310 and 320.
In addition, do not using respectively the projection/groove type connected structure that forms at contact portion 330 places to realize that seed cell 310 and 320 can relative to each other move under the situation of coupling of seed cell 310 and 320.Certainly, can prevent such moving by contact portion by means of soldering coupling seed cell 310 and 320.Yet, in the case, when needs are replaced one of seed cell with a new seed cell, be difficult to make the seed cell separated from one another.Yet, stating projection/groove type connected structure in the use intercouples under the contact portion situation of seed cell 310 and 320, might be coupled securely seed cell 310 and 320 and do not have its any moves, and when needs are replaced one of seed cell with new seed cell, can easily separate seed cell 310 and 320.
Fig. 6 a is the synoptic diagram that various projection/groove type connected structures are shown respectively to 6d, and 310 and 320 contact portion 330 places form with seed cell 310 and 320 and the overall height of optimization process chamber 300 of being coupled securely described structure in the seed cell.
Fig. 6 a illustrates rectangular protrusions/fluted body connected structure, and Fig. 6 b illustrates right-angle triangle projection/groove type connected structure, and Fig. 6 c illustrates half-circle projection/fluted body connected structure, and Fig. 6 d illustrates polygon projection/groove type connected structure.According to such projection/groove type connected structure, seed cell 310 and 320 contact portion 330 engage each other securely, relative to each other move preventing thereby seed cell 310 and 320 is coupled each other securely.On the other hand, when needs make seed cell 310 and 320 when separated from one another, can be by simply seed cell, top 320 vertically being moved away seed cell, bottom 310 and easily realizes this separation.
Projection/groove type connected structure can have different shape with easy coupling that realizes seed cell 310 and 320 and the overall height that reduces chamber 300.Preferably, the projection of projection/groove type connected structure and groove can have the shape of selecting from rectangular shape, right-angle triangle, semicircular in shape and polygonal shape.
As mentioned above, the seed cell 310 and 320 with chamber 300 of above-mentioned vertical stacked structure can carry out identical functions or carry out different functions respectively.Therefore, might realize the space efficiency optimized, and realize the raising of throughput rate thus, and obtain the treatment effeciency that improves.
As mentioned above, might realize the raising of treatment effeciency by in the load lock chamber, feed chamber and the process chamber that constitute the FPD manufacturing equipment at least by vertical two stacked seed cells at least one.And the seed cell is engaged with each other by the projection/groove type connected structure that use is partly located to form in the corresponding contact of seed cell, so the seed cell has fastness and easy separation property.Process chamber has the overall height that reduces, the space efficiency that is optimized thus.
The 3rd embodiment
According to present embodiment, provide to have separable structure to realize being easy to the vacuum chamber of manufacturing, transportation and repair procedures, it is used to make FPD.For separable structure, vacuum chamber comprises the chamber shell, and it is divided at least two parts.Like this, separable vacuum chamber forms by the element of shell part in chamber in being arranged on vacuum chamber assembled.
Although according to the separable vacuum chamber of present embodiment any one applicable to load lock chamber, feed chamber and process chamber, be convenient the description, below describing will be only in conjunction with separable vacuum chamber being applied to the example of feed chamber and providing.
Preferably, be applied to feed chamber 200 according to the separable vacuum chamber of present embodiment, it is used for presenting substrate between load lock chamber 100 and process chamber 300, as shown in Figure 7.Feed chamber 200 need be than load lock chamber and the wide wideer inner space, inner space of process chamber, allowing to be arranged on the element free movement in the feed chamber 200, as allows to present the automat free movement.As a result, to handle the problem that may run under the situation of large-size substrate at needs even more serious for feed chamber 200.For example, although the size of feed chamber 200 must fully increase in the case, still can not transport feed chamber with this size.In order to address this is that, it is desirable under feed chamber is divided into the condition of a plurality of chambers part, transport feed chamber.For this reason, preferably mainly will be applied to feed chamber according to the separable cell structure of present embodiment.
Also preferably, when from the top view of separable vacuum chamber 200, separable vacuum chamber 200 has circular configuration, as shown in Figure 7.For a plurality of process chambers being arranged on around the feed chamber, to compare with rectangular shape or such as the polygonal shape of hexagonal shape, it is desirable that feed chamber has round-shaped.Have under the round-shaped situation in feed chamber, might freely form the process chamber of requirement.Like this, according to the present invention, preferably, separable vacuum chamber 200 shape of cross sections parallel to the ground have round-shaped.
Also preferably separable vacuum chamber 200 is divided into three part A, B and C, as shown in Figure 8.In the case, also preferably chamber part B and C have crown shape, and described crown central angle with 90 ° ± 10 ° faces with each other simultaneously.Therefore in the case, the arc length of each chamber part B or C is similar to the width of center section A.
As shown in Figure 9, form seal assembly pockets 212 at the coupled surface place of each chamber part.Clamper 211 also extends radially outwardly with the adjacent part of the chamber part that is coupled securely from each coupled end of each chamber part.
Each seal assembly pockets 212 all has desired depth, and extends along the coupled surface of associated chamber part.Having a seal assembly 213 to be inserted under the condition between the seal assembly pockets 212 of adjacent chamber part, the adjacent part of chamber part intercouples.
If by be inserted at each seal assembly 213 be formed at adjacent chamber part mutually in the face of the above-mentioned chamber of coupling part under the condition between the seal assembly pockets 212 at coupled surface place forms the situation of vacuum chamber, might prevent surrounding air along coupled surface enter vacuum chamber and prevent in the vacuum chamber existing gas from vacuum chamber to external leakage.Like this, seal assembly 213 works with the sealed vacuum chamber.
Preferably, each seal assembly 213 all extends continuously along the coupled surface of associated chamber part, and is made by resilient material, makes that seal assembly 213 is slightly flexibly compressed by the chamber part when the chamber part intercouples.
Clamper 211 works to be firmly fastened to the chamber part of vacuum chamber.Especially, only be held the elastic compression slightly that device 211 just can be realized seal assembly 213 when fastening when the chamber of vacuum chamber part.Like this, the coupled surface of adjacent chamber's part can the sealing fully by the function of clamper 211.
As shown in Figure 10, each clamper 211 is all radially outward outstanding from the associated side end of associated chamber part.Pass each clamper 211 and form a plurality of even isolated clamping holes 214.In other words, each clamper 211 all extends radially outwardly so that clamper 211 forms the extensional surface of the relevant coupled surface that is connected to the associated chamber part from the associated side end of associated chamber part.Each clamper 211 all has desired thickness.The clamping hole 214 of each clamper 211 runs through the thickness of clamper 211 and extends, and is evenly spaced apart each other along clamper 211 simultaneously.Each clamping hole 214 all within it the surface be formed with box thread, it is suitable for and grip bolt 215 screw thread couple mutually.
As shown in Fig. 7 or 8, when the adjacent part in the part of chamber will intercouple, the clamping hole 214 of grip bolt 215 and adjacent chamber part is screw thread couple mutually, and chamber part thus securely is coupled.
The 4th embodiment
Present embodiment provides a kind of like this FPD manufacturing equipment, and at least one vacuum chamber that is included in therein in the FPD manufacturing equipment comprises that the top with separate structure covers, and promptly comprises detachable auxiliary the covering, thereby realizes the easy transportation to vacuum chamber.
Although according to the vacuum chamber of present embodiment any one applicable to load lock chamber, feed chamber and process chamber, be convenient the description, below describing will be only in conjunction with vacuum chamber being applied to the situation of feed chamber and providing.
As shown in Figure 11 and 12, comprise according to the feed chamber 200 of the FPD manufacturing equipment of present embodiment and to present automat path 232, outwards move from the inside of feed chamber 200 with the automat 220 of presenting that allows to be arranged in the feed chamber 200 at its top that is formed on feed chamber 200, is used for repairing or replacing and present automat 220.Feed chamber 200 comprises that also the top covers 240 and presents automat path 232 with opening and closing.
As shown in Figure 13, the top covers 240 and has the circular slab structure, and it has the cut-away portions at its opposite side.The top covers 240 and has a plurality of openings 244, and covers the 240 reinforcement edge 242 that project upwards on every side from the top at opening 244.In the top of each opening 244 inside covering 240 a seal assembly O is being set, the sealing assembly can be an O shape circle.
Preferably, the top covers 240 and has two or three openings 244, and each opening 244 all has rectangular shape.Certainly, can use other quantity and shaped aperture 244.In top covering 240, seat 246 is set in relevant edge 242 inside of strengthening around each opening 244.Auxiliary cover 248 at an O shape circle, promptly seal assembly O insert present 246 and auxiliary following of the condition that covers between 248 be placed on each on 246 to produce the sealing effectiveness between seat 246 and the auxiliary covering 248.Line abutment ring 250 is fixed in top covering 240 and auxiliary covering 248, to use line that top covering 240 is connected together heavy-duty machine with auxiliary covering 248, this crane is installed on the ceiling of the broom closet of FPD manufacturing equipment installation place, thereby top covering 240 and auxiliary covering 248 can be moved by crane.Preferably, line abutment ring 250 is fixed in the respective corners of top covering 240, corresponding opposite side and each auxiliary 248 the corresponding opposite side that covers that each strengthens edge 242.Each all has the horizontal stiffener assembly (not shown) of the length identical with the width of each opening 244, can cover 240 places at the top and be provided with along the required side of associated openings 244, covers 240 owing to the heat that is applied in is thereon twisted to prevent the top.
The top covers 240 and can be made obtaining required rigidity and required permanance by stainless steel, and prevents that thus the top from covering 240 and producing excessive strain.
Each auxiliary covering 248 all can have the rectangular parallelepiped protrusion part box structure.In the case, each auxiliary cover 240 rectangular parallelepiped protrusion part box structure all upwardly-openable to reduce auxiliary 240 the weight that covers.As mentioned above, a pair of line abutment ring 250 is fixed in each auxiliary upper end of 248 that covers respectively at the opposite side place of assisting covering 248, so that auxiliary covering 248 can be moved by crane.Each assists covering 248 all made of aluminum so that auxiliary covering 248 has the weight that reduces.
As shown in Figure 12, presenting automat 220 comprises and presents arm 224.Present automat 220 and also comprise that driver 222 is to supply driving force to presenting arm 224.Although not shown, to present automat 220 and further comprise automatic casing and end effector, pending substrate is located thereon.Remove from feed chamber 200 when needs and to present automat 220 so that maintenance and repair when presenting automat 220, it is to carry out presenting presenting under arm 224 and driver 222 condition separated from one another of automat 220 that automat 220 is presented in dismounting, and this is because feed chamber 200 has limited height.
The top covers 240 and has large scale, and has big weight thus, and this is because feed chamber 200 has large scale to present large-size substrate.Therefore, top covering 240 must be divided into several sections and arrive these parts with the distribution of weight with top covering 240, and the cranes that make top covering 240 can be suitable for mobile limited weight thus move.For this reason, the top covering 240 according to present embodiment has the above-mentioned separate structure that comprises a plurality of auxiliary coverings 248.
Be described as being applied to feed chamber 200 although will cover 240 the structure that demarcates according to the top of present embodiment, this structure is also applicable to process chamber, and it can be for example plasma processing apparatus, chemical vapor deposition (CVD) device, etcher or asher (asher).
When needs move top on the top that is installed in the feed chamber 200 in the FPD manufacturing equipment according to present embodiment when covering 240, constitute auxiliary covering 248 that the top covers 240 separate structure and all be connected under the condition that is included in the suspension hook in the crane and move successively at each auxiliary line abutment ring 250 of 248 of covering by the crane that is installed on broom closet.
Afterwards, cover 248 and cover 240 from the top and separate and top with the weight that reduces covers 240,, move to required place by crane each auxiliary covering under the condition of suspension hook that 248 line abutment ring 250 all is connected to crane according to auxiliary.Presenting automat 220 then outwards moves so that maintenance and repair from feed chamber 200.After finishing maintenance and repair, present automat 220 according to being placed on once more in the feed chamber 200 with the process in sequence opposite with said process.
When being necessary to present automat 220 or other large scale inner structure when carrying out maintenance and repair to being arranged in the feed chamber 200, separable top covers 240.On the other hand, when being necessary feed chamber 200 to be carried out simple-to-maintain and when repairing, separable auxiliary covering 248.
Like this, according to present embodiment, the top covers 240 to have and comprises that a plurality of detachable auxiliary separate structures of 248 of covering cover 248 the top is covered 240 distribution of weight to auxiliary, and makes thus and can have the crane of limited capability and the top is covered 240 easily separate from large scale feed chamber 200 by use.Separating auxiliary the covering after 248, the weight of top covering 240 reduces accordingly, therefore might come mobile top to cover 240 by crane, and can not apply any overload to crane.
The 5th embodiment
Present embodiment provides a kind of load lock chamber, and what it had simple structure and had represented manufacturing cost thus reduces reducing of time of being spent with the load/unload substrate.
As shown in Figure 14, the load lock chamber 100 according to present embodiment comprises chamber shell 140, opening (not shown), family of power and influence's (not shown) and end effector pockets 150.
Chamber shell 140 limits a chamber therein, and vacuum can be set up in this chamber.Because load lock chamber is set up atmospheric condition and vacuum state repeatedly and alternately, load lock chamber 100 comprises aspirator, is used for setting up the vacuum state of load lock chamber, and ventilation unit, is used for setting up the atmospheric condition of load lock chamber.
Opposing sidewalls at chamber shell 140 forms two openings, and described opening is faced with each other.Adjacent with feed chamber 200 and an opening that the side-walls chamber shell 140 that is provided with forms is loaded into carried base board is unloaded in feed chamber 200 neutralizations from feed chamber 200 path with acting on substrate.On the other hand, another opening that forms at the opposing sidewalls place is loaded into path that load lock chamber 100 neutralizations from load lock chamber 100 be unloaded to substrate the outside of load lock chamber 100 with substrate from the outside of load lock chamber 100 with acting on.Each opening is is all opened and closed by the family of power and influence.The family of power and influence has a kind of like this structure, and it can prevent from forming the gap under the closed condition of opening between the family of power and influence and opening, is in sealing state thereby keep described chamber.
Each end effector pockets 150 all limits a path, the associated ends actuator E that presents automat along this path movement to enter load lock chamber 100.Actuator E is housed inside in the corresponding end effector pockets 150 and is thus lifted to simultaneously under the condition of height that substrate do not touch chamber shell 140 diapires endways, and the end effector E that presents automat that has loaded substrate on it enters load lock chamber 100.For this reason, each end effector pockets 150 all is formed on the diapire of chamber shell 140 with the form with the groove that can allow the predetermined depth that end effector E vertically moves in the actuator pockets 150 endways.Therefore, each end effector E can vertically move under the state in being housed inside associated ends actuator pockets 150.When moving down under the state of end effector E at bearing substrate, substrate be placed on chamber shell 140 diapire so that substrate separate with end effector E.In this case, end effector E outwards withdraws.
Preferably, substrate protection assembly 160 is arranged on the diapire of chamber shell 140, as shown in Figure 14 to the location of this diapire in the substrate contacts that is placed on the diapire.Directly touch at substrate under the situation of diapire of chamber shell 140, substrate can be damaged, and this is because the diapire of chamber shell 140 has the hardness higher than substrate.Therefore, the substrate protection assembly of being made by the material that does not cause substrate damage is arranged on the diapire of chamber shell 140.
Preferably, in substrate-guided 170 load lock chambers 100 that also are arranged on according to present embodiment.Substrate-guided 170 substrates that work and to load in the exact position in the load lock chamber 100 with guiding.According to present embodiment, substrate-guided 170 along the edge of the diapire of chamber shell 140 and be provided with.Substrate-guided 170 have the structure to the core inclination of load lock chamber 100.Therefore, when mounting substrate in load lock chamber 100, substrate moves to exact position in the load lock chamber 100 at substrate edges when substrate-guided 170 slide.As shown in Figure 15, substrate-guided 170 rectangular shapes that have in side opening pass in and out load lock chamber 100 to allow end effector E by opening side.In other words, substrate-guided 170 have the U-shaped structure, and it has opening to allow end effector by substrate-guided 170 in a side.
Preferably, at least one loads mould 180 and also is arranged in the load lock chamber 100 according to present embodiment, as shown in Figure 14.Loading mould 180 works with mounting substrate S thereon.At least two are loaded mould 180 and can be arranged in the load lock chamber 100 to load at least two substrates simultaneously.A plurality of evenly spaced substrate supporting assemblies 182 are arranged on each and load on mould 180 so that substrate supporting assembly 182 projects upwards from loading mould 180.Substrate supporting assembly 182 is made to prevent substrate supporting assembly 182 damaged substrates by the material with hardness lower than substrate.Substrate supporting assembly 182 has enough length, vertically moves under being inserted into the state that is defined in the relevant gap of loading between mould 180 and 182 substrate supported of substrate supporting assembly to allow end effector E.
Another substrate-guided 170 substrate executing location correction that is configured to loading on each loading mould 180.As shown in Figure 14, this substrate-guided 170 be arranged on relevant load mould 180 around, and have incline structure, it has the lower end that extends to the level lower than the upper end of each supporting component 182.Certainly, the calibrating device of separation can be arranged in the load lock chamber 100 to be aligned in a plurality of substrates that load on the corresponding loading mould 180 simultaneously.
Describe according to present embodiment hereinafter with reference to Figure 16 and to be used for method at the load lock chamber mounting substrate.
At first, carry out substrate S is incorporated into step S110 in the load lock chamber 100.At step S110, a family of power and influence is actuated to open an opening of load lock chamber 100.Afterwards, use the substrate that is arranged on load lock chamber 100 outsides to present automat, pass the opening of opening substrate is incorporated in the load lock chamber 100.At this moment, the substrate end effector E that presents automat is inserted in the end effector pockets at the diapire place that is formed at load lock chamber 100.
Subsequently, the step S120 that carries out at load lock chamber 100 mounting substrate S.At step S120, substrate is presented automat and is actuated to move down end effector E in the associated end actuator pockets 212, is placed on the diapire of load lock chamber 100 up to the substrate S on the end effector E.Like this, substrate S is loaded in the load lock chamber 100 fully.
Afterwards, execution is withdrawed from the step S130 that substrate is presented automat from load lock chamber 100.At step S130, substrate is presented automat and is moved horizontally, and shifts out fully from load lock chamber 100 up to end effector E.
Next, execution is aligned in the step S140 of the substrate S of loading in the load lock chamber 100 with accurate location substrate S.Under the situation of use substrate-guided 170, step S140 and step S120 carry out simultaneously, this is because when on the diapire that is loaded in load lock chamber 100 at substrate loading step S120 substrate S, substrate S slides along substrate-guided 170, this guides along the edge setting of the diapire of load lock chamber 100, and moves to the exact position thus.Certainly, under the situation of using the calibrating device that separates, substrate calibration steps S140 is independent of substrate loading step S120 and carries out.
At last, carry out the step S150 that in load lock chamber 100, sets up vacuum environment.At step S150, the family of power and influence is actuated to close the opening of opening.Vacuum pump is actuated to discharge existing gas in the load lock chamber 100 then.
Simultaneously, when needs loaded a plurality of substrate in load lock chamber 100, repeated execution of steps S110, S120 and S130 were loaded in the load lock chamber 100 up to all substrates.Afterwards, execution in step S140 and S150.
The 6th embodiment
Present embodiment provides a kind of feed chamber, and it has can allow to present the structure of automat by a sidewall of feed chamber.
In comprising the FPD manufacturing equipment of a plurality of chambers, work substrate is loaded in the selected chamber according to the feed chamber of present embodiment, for example load lock chamber or process chamber, and unload carried base board from selected chamber.As shown in Figure 17 a and 17b, the feed chamber 200 that disposes according to present embodiment is provided with the path and the family of power and influence who is used for the opening/closing path respectively at its opposing sidewalls place.And the top covers 240 and is installed on the feed chamber 200.The driver of presenting automat 220 222 that is suitable for presenting substrate is seated in the diapire of feed chamber 200 in the top, and the diapire place that is passed in feed chamber 200 simultaneously forms that Open Side Down extends.Be inserted in such as the seal assembly O of O shape circle between the surface in contact of upper end of the diapire of feed chamber 200 and driver 222.
As mentioned above, present automat 220 mainly comprise automatic casing, be installed on the upper end of automatic casing and in the predetermined length scope the folding driver 222 of presenting arm 224, being installed on the lower end of automatic casing, with and on will place the end effector E of substrate.Remove from feed chamber 200 when needs and to present automat 220 so that when presenting automat 220 and carry out maintenance and repair, the removal of presenting automat 220 is to carry out presenting presenting under arm 224 and driver 222 condition separated from one another of automat 220, and this is because feed chamber 200 has limited height.
The sidewall that driver path 266 is arranged on feed chamber 200 with the driver 222 that allows to present automat 220 by driver path 266 in case in feed chamber 200 installation of driver 222 with separate driver 222 from feed chamber 200.Door 264 also is arranged on the sidewall of feed chamber 200 to allow presenting automat 220 from feed chamber 200 removals when needs carry out maintenance and repair to presenting automat 220.Door 264 can hingedly be installed on the sidewall of the feed chamber 200 that is formed with driver path 266 rotationally.
Extension with certain thickness extends internally from the inside surface of driver path 266, so that seal assembly O can be installed between the edge, rear surface of driver path 266 and door 264, and provides sealing effectiveness between driver path 266 and the door 284 thus.
And, be inserted in the seal assembly O between the surface in contact of upper end of the diapire of feed chamber 200 and driver 222, the sealing effectiveness between feed chamber 200 and the driver 222 is provided.Vertically driver 270 also is arranged on below the driver 222 of presenting automat 220.When feed chamber 200 is removed drivers 222, vertically driver 270 works so that driver 222 is moved upwards up to selected level, and prevents to damage during removing driver 222 seal assembly O thus.When being loaded into driver 222 in the feed chamber 200, vertically driver 270 also is moved down into original position with driver 222.
Preferably, vertically driver 270 comprises cylinder.
As shown in Figure 18, feed chamber 200 has comprised directing assembly 272, and it is arranged on driver path 266 and presents between the driver 222 of automat 220.Each directing assembly 272 all has the form of guide rail.Aid in guide assembly 273 respectively can the hinged outer end that is installed on directing assembly 272 rotationally, thereby aid in guide assembly 273 is extended and withdrawal by driver path 266 according to its hinged rotating operation.Sliding panel 274 is slidably disposed on the slide assemblies 272.Aid in guide assembly 273 can be slidably mounted on directing assembly 272 respectively, thereby aid in guide assembly 273 is extended and withdrawal by driver path 266.
When removing when presenting the driver 222 of automat 220 from feed chamber 200, driver 222 at first is raised to be placed on then and is slidably mounted in directing assembly 272 upper sliding plates 274.The hinged then rotation of aid in guide assembly 273 so that they stretch out from feed chamber 200.Under this condition, sliding panel 274 moves along directing assembly 272 and aid in guide assembly 273 then, as shown in Figure 19.Like this, driver 222 can easily be removed from feed chamber 200.Driver 222 is loaded in the feed chamber 200 and also can easily realizes according to the process opposite with said process.Under the normal condition, aid in guide assembly 273 maintains folded state.Only in the time will removing the driver 222 of presenting automat 220, aid in guide assembly 273 launches according to its hinged rotating operation.
The conveyer (not shown) can be arranged on the rear portion of the driver of presenting automat 220 222 in the feed chamber 200 so that driver 222 is sent to sliding panel 274.
Describe hereinafter with reference to Figure 17 a, 17b and 18 and to be used for to present automat 220 according to present embodiment and to be loaded into the process that feed chamber 200 neutralization is presented automat 220 from feed chamber 200 unloadings at the FPD manufacturing equipment.When presenting automat 220 so that when presenting the maintenance and repair of automat 220, at first discharge the vacuum state of feed chamber 200 from feed chamber 200 unloading.Afterwards, door 264 hinged rotations are to open driver path 266.
Use crane to remove the top then and cover 240 from feed chamber 200.Subsequently, manually separate from driver 222 and to present arm 224, use crane that it is moved to the outside of feed chamber 100 then.
Afterwards, being arranged on the vertical drivers 270 that contacts with driver 222 simultaneously below the driver 222 is actuated to driver 222 is moved upwards up to such level: can be at this horizontal driver 222 without any passing through driver path 266 intrusively, and prevent from simultaneously to damage and be suitable for providing the diapire of feed chamber 100 and the seal assembly O of the sealing effectiveness between the driver 222.
Next, driver 222 is sent to sliding panel 274 by conveyer.Be slidably mounted on directing assembly 272 respectively so that under the situation of aid in guide assembly 273 by 266 extensions of driver path and withdrawal at aid in guide assembly 273, conveyer is the 200 outside slip aid in guide assemblies 273 along directing assembly 272 from feed chamber also, as shown in Figure 19.As a result, driver 222 is removed from feed chamber 200.
Under this condition, can to present automat 220 present arm 224 and driver 222 carries out maintenance and repair.After maintenance and repair, once more driver 222 is loaded in the feed chamber 200 according to the process opposite with said process.
Like this, be to present automat 220 and can come loading and unloading under the condition that driver path 266 that side-walls of feed chamber 200 forms opened by door 264 by driver path 266.Therefore, even, also might realize loading and unloading to driver 222 because feed chamber 200 size increases make is defined under the situation that the space between feed chamber 200 and the broom closet reduces.
The 7th embodiment
Present embodiment provides a kind of vacuum chamber that comprises separable diapire, to realize easy installation to the structure that will be arranged on the vacuum chamber bottom, and to the easy functional test of described structure, and to the easy maintenance and repair of described structure; And provide a kind of repair method that is used for described structure.
Preferably, be applied to the process chamber 300 of FPD manufacturing equipment according to the vacuum chamber of present embodiment.According to present embodiment, as shown in Figure 20, vacuum chamber 300 comprises three independent parts of making, and promptly chamber body 330, top covering 340 and base plate cover 350.
As shown in Figure 20, chamber body 330 has the rectangular box structure that comprises four sidewalls.Chamber body 330 forms the sidewall sections of vacuum chamber 300, and limits the overall appearance of vacuum chamber 300.Chamber body 330 is provided with opening 332 to allow substrate by opening 332 in required part, unload carried base board so that substrate is loaded into vacuum chamber 300 neutralization from vacuum chamber 300, and be provided with observation panel 334 with allow the operator to observe to use plasma processing substrate process of in vacuum chamber, carrying out and the result who in the processing substrate process, represents.
The top covers 340 and is coupled to the upper end while of chamber body 330 and the last end in contact of chamber body 330, forms the top wall portion of vacuum chamber 300 thus, as shown in Figure 20.Upper electrode and processing gas supply system are arranged on the top and cover 340 places.Corresponding coupled surface place at top covering 340 and chamber body 330 forms the seal assembly pockets.Seal assembly O is inserted between the seal assembly pockets.Seal assembly O provide the top cover 340 and the coupled surface of chamber body 330 between sealing effectiveness so that can in vacuum chamber 300, set up vacuum.At least two seal assemblies can be set to obtain the enhanced seal effect.
As shown in Figure 20, the bottom covers 350 and is coupled to the lower end while of chamber body 330 and the following end in contact of chamber body 330, forms the bottom wall portion of vacuum chamber 300 thus.The bottom covers 350 and is formed with various holes, for example be used for lower electrode drive hole 352, be used for inner vertically shuttle pin drive hole 354, be used for the outside vertically drive hole 356 and the vacuum pump connecting hole 358 of to-and-fro movement rod.These holes correspond respectively to and will cover the position that the 350 various elements that extend are set up by the bottom.In other words, the driving shaft of lower electrode driver module passes 352 extensions of lower electrode drive hole.Be suitable for making near the vertical to-and-fro movement module in the reciprocating vertically inside of the vertical shuttle pin in inside of lower electrode to pass inner vertically shuttle pin drive hole 354.Outside to-and-fro movement rod driver module is by outside vertically shuttle pin drive hole 356.
As shown in Figure 20, commissura 336 covers the interior side-wall surface outstanding Len req of 350 zones that are coupled from chamber body 330 along the lower end and the bottom of chamber body 330.The bottom covers 350 and engages with commissura 336 in the chamber body 330 at its peripheral edge, so that chamber body 330 is coupled in bottom covering 350.
Preferably, the bottom covers 350 and is provided with engagement grooves 359 at its peripheral edge, and it has the stairstepping that cooperates with commissura 336.Because engagement grooves 359 has the shape that cooperates with commissura 336, when chamber body 330 is coupled in bottom covering 250, between the composition surface of commissura 336 and engagement grooves 359, do not form the gap.Particularly, the composition surface of commissura 336 and engagement grooves 359 has stairstepping, and therefore the plasma that produces in vacuum chamber 300 can not easily leak from vacuum chamber 300 between composition surface, and this is because plasma has rectilinearity.More preferably, the horizontal surface of each composition surface part forms at a slant.In the case, when chamber body 330 was coupled in bottom covering 350, bottom covering 350 can be positioned the exact position and need not any position correction.
Preferably, the seal assembly pockets forms at the composition surface place of commissura 336 and engagement grooves 359 respectively, as shown in Figure 20.Seal assembly O is assemblied between the seal assembly pockets.Seal assembly O provide the bottom cover 350 and the coupled surface of chamber body 330 between sealing effectiveness so that can in vacuum chamber 300, set up vacuum.At least two seal assemblies can be set to obtain the enhanced seal effect.
Preferably, cover 350 peripheral edge along the bottom and cover 50 upper surface in the bottom and form a plurality of feeding means coupling apertures 357, as shown in Figure 20.Be coupled to chamber body 330 or when chamber body 330 separates when the bottom being covered 350, feeding means coupling aperture 357 works so that feeding means, and for example lifting function is easily operated and promoted the bottom and cover 350.Each bottom cover coupling aperture 357 all have box thread with carry out screw thread couple being connected to the male thread that forms on the feed lines end of crane.Therefore, the bottom covers 350 can be connected to crane securely, therefore might use crane easily to rise the bottom and cover 350.
According to present embodiment, coupling stops that module 355 preferably is arranged on the bottom and covers 350 places.Coupling stops that module 355 is assembled in the corresponding feeding means coupling aperture 357, with inaccessible feeding means coupling aperture 357 after finishing bottom covering assembling or repair procedures.In the processing substrate process of feeding means coupling aperture 357, maintain under the situation of open mode at ensuing use plasma, various particles can be deposited in the feeding means coupling aperture 357, perhaps because plasma can produce electric arc at feeding means coupling aperture 357.Preferably, coupling stops that module 355 is assembled in the corresponding feeding means coupling aperture 357 so that each coupling stops that the upper end of module 355 and bottom cover 350 upper surface flush.
The method that is used to make and assemble vacuum chamber according to present embodiment is described now with reference to Figure 22.
At first, execution in step S210 is to make vacuum chamber 300, and it comprises that chamber body 330, top covering 340 and bottom cover 350.At step S210, the manufacturing of vacuum chamber 300 be by the independent chamber body 330 of making the sidewall sections that forms vacuum chamber 300, the top that forms the top wall portion of vacuum chamber 300 cover 340 and the bottom that forms the bottom wall portion of vacuum chamber 300 cover 350 and realize.
Next, carry out chamber body 330 is installed in step S220 on the main frame (not shown).At step S220, chamber body 330 at first is placed on the main frame, is fixed in main frame then.Especially, use feeding means to promote chamber body 330, place it in then on the part of main frame, this part is corresponding to the position of chamber body 330 with the main frame coupling.Afterwards, conditioning chamber body 330 on main frame the position so that chamber body 330 accurately locate.After chamber body 330 was positioned exact position on the main frame, chamber body 330 was firmly fixed at main frame so that chamber body 330 can not move.
Afterwards, carry out the step S230 that is installed in the structure in top covering and the bottom covering 340 and 350.At step S230, the bottom covers 350 and at first is positioned on the work mould, and its bottom interval with chamber body 330 of this work mould is opened a long distance, thereby permission structure installation process is easily carried out.Therefore under this condition, might easily carry out the process that is used to install such as the structure of lower electrode driver module, inner vertically shuttle pin driver module, outside vertically to-and-fro movement rod driver module and vacuum chamber.And, might easily carry out functional test to each structure, this is because the broad space that carries out functional test can be provided.
Subsequently, carry out the step S240 that uses feeding means bottom covering 350 to be coupled to chamber body 330.At step S240, structure installation and structure function are tested completed bottom covering 350 and are coupled to chamber body 330.According to present embodiment, step S240 carries out by using following method: the bottom is covered 350 be promoted to chamber body 330 tops; The bottom is covered 350 to be reduced in the chamber body 330; And the bottom is covered 350 be coupled to chamber body 330.Preferably, step S240 may further comprise the steps: a) bottom is covered 350 and be promoted to the level higher than chamber body 330; B) bottom is covered 350 and move to and make the bottom cover 350 to be positioned at the position of chamber body 330 or more just, and the bottom is covered 350 be reduced in the chamber body 330 so that bottom covering 350 and be installed on chamber body 330.And preferably, step S240 further may further comprise the steps: c) bottom is covered 350 and be fixed firmly to chamber body 330.When the bottom covers 350 when being coupled to chamber body 330 according to said method, because the bottom covers 350 and be installed in the weight that the bottom covers the structure on 350, the bottom covers 350 coupling and becomes firm.Yet, more preferably consider to be installed in the driven fact of big part that the bottom covers the structure on 350, further carry out fixing step and be coupled to chamber body 330 more firmly so that the bottom is covered 350.
At last, carry out the step S250 that uses feeding means top covering 340 to be coupled to chamber body 330.At step S250, the top covering 340 that desired structure has been installed on it is coupled to the upper end of chamber body 330.Step S250 carries out in the following manner: the top is covered 340 be promoted to the chamber body more than 330, reduce top covering 340 so that top covering 340 is positioned on the chamber body 330, and chamber body 330 is coupled in top covering 340 securely.
Like this, finished assembling according to the vacuum chamber 300 of present embodiment.
The method that is used to repair vacuum chamber according to present embodiment is described hereinafter with reference to Figure 23.
At first, carry out the step S310 that separates top covering 340.At step S310, the top override open device that use comprises in the substrate board treatment that uses plasma or the feeding means of separation cover 340 from 330 separation of chamber body with the top, thereby open the top wall portion of vacuum chamber 300.
Next, execution separates bottom covering 350 and the bottom is covered the 350 step S320 that are placed on the work mould.At step S320, feeding means at first covers 350 feeding means coupling aperture 357 couplings with the bottom.Under this condition, feeding means promotes bottom covering 350 and the bottom is covered 350 and is fed to the place that the work mould is positioned at, and then the bottom is covered 350 and is placed on the work mould.Like this, the operator can cover 350 and carry out the repairing processing to the bottom on the work mould.The work mould is configured to: the bottom is covered 350 maintain the level of opening sizable vertical distance with ground separation, thereby place under repair is easily handled.
Carry out then and repair bottom covering 350 and be installed in the step S330 that the bottom covers the structure on 350.At step S330, the parts that described structure will be repaired are carried out the repairing processing.
Afterwards, carry out the step S340 that bottom covering 350 is coupled to chamber body 330.At step S340, the bottom of using feeding means to repair fully covers 350 original positions that move in the chamber body 330.This step is carried out to cover the opposite order of separating step S320 with the bottom.
At last, carry out the step S350 that top covering 340 is coupled to chamber body 330.Step S350 carries out to cover the opposite order of separating step S310 with the top.
Like this, the top covers and bottom covering 340 and 350 is located in its corresponding original position, has therefore finished the repairing of against vacuum chamber 300 and has handled.
According to the above embodiment of the present invention, various advantages and effect have been obtained.
In other words, according to first embodiment, a seal assembly is set so that described chamber is maintained vacuum state on the extension at every end place of the peripheral wallboard that is formed on the chamber, and a covering assemblies is set on seal assembly to cover seal assembly.Therefore, favourable part is that increase the serviceable life of seal assembly.
When needs were replaced seal assembly with New Parent, this replacement can not separate the peripheral wallboard, top board and the base plate that constitute described chamber and realize by only separating covering assemblies.Therefore, might easily realize maintenance and repair for described chamber.
According to second embodiment, at least one in load lock chamber, feed chamber and the process chamber of formation FPD manufacturing equipment has vertical stacked cell structure, and described vertical stacked cell structure comprises at least two seed cells.Therefore, the raising treatment effeciency is arranged, and increase the advantage of throughput rate thus.In other words, comprise at process chamber under the situation of two seed cells that the effect that is had is to carry out two identical processes or two different processes simultaneously.
And the coupling between the seed cell realizes by using projection/groove type structure.Therefore, might make the overall height minimum of chamber, and the increase of seed cell's bonding force, and obtain the space efficiency optimized thus.
Because the seed cell intercouples by using projection/groove type structure, favourable part is the seed cell that might be coupled securely, and can easily make the seed cell separated from one another.
According to the 3rd embodiment, vacuum chamber is not made with monomeric form, but make with the form of a plurality of chambers part that can be assembled to form vacuum chamber.Therefore, favourable part is and large-sized vacuum chamber that has of making easily might be transported to the infield.In other words, making with monomeric form under the situation of this large scale vacuum chamber, can not use vehicle to come vacuum transport chamber.Yet, make under the situation of vacuum chamber in form with a plurality of chambers part, might easily realize transportation by transporting described chamber part to vacuum chamber, to compare with vacuum chamber, each of described chamber part all has the width that reduces.Certainly, after it is transported to the infield, be completed into vacuum chamber by assembling described chamber part.And it is no problem setting up vacuum environment in the vacuum chamber after assembling.
In addition, under the situation that the vacuum chamber with 3m or bigger width is made with monomeric form, be necessary the large scale metallic object is carried out machining to form vacuum chamber.For this reason, the machining device that is suitable for metallic object is carried out machining also must have large scale.The machining process also is difficult.Yet, eliminated such problem according to the present invention.
In addition, the advantage of easy maintenance and repair is arranged, this is because can carry out under the condition that only a part of described chamber part is separated from vacuum chamber the maintenance and repair process of the damage inner structure of vacuum chamber.
According to the 4th embodiment, the top covering that is arranged on the vacuum chamber has the separate structures that comprise one or more detachable auxiliary coverings, cover to auxiliary with the distribution of weight that separate the process that the top covers from vacuum chamber, the top is covered, pass through vacuum chamber so that maintenance and repair allow to present automat when presenting automat and present automat in loading or unloading.Separating the process of top covering from vacuum chamber, the auxiliary covering by crane separated individually from the top covering.Therefore, the separation of top covering and assembling can realize in the weight range that crane is allowed.Like this, the separation of top covering and assembling can easily realize.
According to the 5th embodiment, there is no need in load lock chamber, to be provided with to promote and sell and calibrating device.Therefore, advantage simple in structure and that manufacturing cost reduces is arranged.And the process that substrate is loaded in the load lock chamber is simple.Therefore, the time that mounting substrate spent reduces, thereby total processing substrate time is reduced.
According to the 6th embodiment, present automat so that assembling, maintenance or repairing are presented in the process of automat in loading or unloading, the driver of presenting automat can come loading or unloading by the driver path that is arranged on feed chamber one side place.Therefore, might not use crane and realize loading and unloading driver.As a result, the time that is spent of loading or unloading driver reduces.
And, unloading to driver is to carry out under the state that is promoted to desired level by vertical driver, described vertical driver is arranged on presents the level that moves to the driver path below the automat with the driver that will present automat, prevents from simultaneously to damage to be suitable for the seal assembly that feed chamber is provided and presents the sealing effectiveness between the automat.To the unloading of presenting the automat driver with load and also can easily realize by directing assembly and aid in guide assembly, described aid in guide assembly can hinged rotation or is slidably mounted on directing assembly so that the aid in guide assembly extends by the driver path and withdraws.
According to the 7th embodiment, as shown in Figure 21, work mould J has enough height l so that the operator can carry out repair procedures under the state in the space below entering work mould J.Therefore, the operator can cover in the bottom and easily carry out under the condition be placed on the work mould J for the assembling process that will be installed in the structure that the bottom covers with for the repair procedures of the structure of being installed.Like this, might eliminate fully main frame apart from the short regular situation of the height on ground under execution architecture assembling process and bottom cover the difficulty that runs in the repair procedures.Because the operator can cover repair procedures in execution architecture assembling process and bottom under the erectility, execution architecture assembling process and the bottom covering time that repair procedures spent reduce greatly.In addition, favourable part is might prevent to meet accident the term of execution of process.

Claims (3)

1. flat panel display manufacturing apparatus, it comprises load lock chamber, feed chamber and process chamber, wherein:
At least one chamber in described these chambers comprises at least two vertical stacked seed cells; And
Contact portion in described seed cell has interengageable projection/groove type connected structure respectively.
2. flat panel display manufacturing apparatus as claimed in claim 1, wherein each projection/groove type connected structure all has projection and groove, and each all has rectangular shape, right-angle triangle, semicircular in shape or polygonal shape these projections and groove.
3. flat panel display manufacturing apparatus as claimed in claim 1, wherein said seed cell carries out identical functions respectively or carries out different functions respectively.
CNB2007101384507A 2004-02-25 2005-02-25 Be used to make the equipment of flat-panel monitor Expired - Fee Related CN100550086C (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
KR1020040012675 2004-02-25
KR1020040012675A KR20050086265A (en) 2004-02-25 2004-02-25 Vacuum chamber for manufacturing fpd
KR1020040046667 2004-06-22
KR1020040047243 2004-06-23
KR1020040066006 2004-08-20
KR1020040069166 2004-08-31
KR1020040108225 2004-12-17
KR1020040111695 2004-12-24

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNB2005100087491A Division CN100401338C (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display

Publications (2)

Publication Number Publication Date
CN101089921A CN101089921A (en) 2007-12-19
CN100550086C true CN100550086C (en) 2009-10-14

Family

ID=37270190

Family Applications (5)

Application Number Title Priority Date Filing Date
CN2007101384511A Expired - Fee Related CN101101863B (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display
CNB2007101384530A Expired - Fee Related CN100539012C (en) 2004-02-25 2005-02-25 Be used to make the equipment of flat-panel monitor
CNB2007101384545A Expired - Fee Related CN100498881C (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display
CNB2007101384507A Expired - Fee Related CN100550086C (en) 2004-02-25 2005-02-25 Be used to make the equipment of flat-panel monitor
CNB2007101384526A Expired - Fee Related CN100521081C (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display

Family Applications Before (3)

Application Number Title Priority Date Filing Date
CN2007101384511A Expired - Fee Related CN101101863B (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display
CNB2007101384530A Expired - Fee Related CN100539012C (en) 2004-02-25 2005-02-25 Be used to make the equipment of flat-panel monitor
CNB2007101384545A Expired - Fee Related CN100498881C (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNB2007101384526A Expired - Fee Related CN100521081C (en) 2004-02-25 2005-02-25 Apparatus for manufacturing flat-panel display

Country Status (2)

Country Link
KR (1) KR20050086265A (en)
CN (5) CN101101863B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100831950B1 (en) * 2005-11-28 2008-05-23 주식회사 유진테크 chamber
KR100752242B1 (en) * 2007-02-05 2007-08-27 에이스하이텍 주식회사 Slit of arc chamber generating semiconductor plasma
JP5585238B2 (en) * 2010-06-24 2014-09-10 東京エレクトロン株式会社 Substrate processing equipment
CN104752263B (en) * 2013-12-31 2018-03-09 北京北方华创微电子装备有限公司 Reative cell location structure and reative cell

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0613361A (en) * 1992-06-26 1994-01-21 Tokyo Electron Ltd Processing apparatus
US5830272A (en) * 1995-11-07 1998-11-03 Sputtered Films, Inc. System for and method of providing a controlled deposition on wafers
JPH09209150A (en) * 1996-02-06 1997-08-12 Tokyo Electron Ltd Vacuum chamber and its production

Also Published As

Publication number Publication date
CN101101863A (en) 2008-01-09
CN101101865A (en) 2008-01-09
CN101089921A (en) 2007-12-19
CN101101864A (en) 2008-01-09
KR20050086265A (en) 2005-08-30
CN101101863B (en) 2012-01-11
CN100498881C (en) 2009-06-10
CN100539012C (en) 2009-09-09
CN100521081C (en) 2009-07-29
CN101089922A (en) 2007-12-19

Similar Documents

Publication Publication Date Title
CN100401338C (en) Apparatus for manufacturing flat-panel display
US11205585B2 (en) Substrate processing apparatus and method of operating the same
KR100566324B1 (en) Lift pin module of fpd manufacturing machine
KR100856145B1 (en) Vacuum chamber and vacuum processing apparatus
CN100550086C (en) Be used to make the equipment of flat-panel monitor
US20050183665A1 (en) Apparatus for manufacturing flat-panel display
EP2280410A2 (en) Assembly method of transfer mechanism and transfer chamber
CN100411095C (en) Chamber for vacuum processing device and device having the chamber
US20150301524A1 (en) Methods and apparatus for cleanspace fabricators
KR100890522B1 (en) Plasma processing apparatus
US20150141225A1 (en) Method and apparatus to support process tool modules in processing tools in a cleanspace fabricator
US6425477B1 (en) Substrate conveyance system
CN101604610B (en) Chamber and treating device
US10627809B2 (en) Multilevel fabricators
US20200176289A1 (en) Method and apparatus for multilevel fabricators
KR101598176B1 (en) Vacuum chamber
KR101308389B1 (en) A chamber for a substrate processing apparatus
KR100740453B1 (en) Apparatus for vacuum processing
TWI533371B (en) Processing device
KR101490454B1 (en) Slot Valve Assembly And Operating Method Thereof
KR20070071304A (en) Flat panel display manufacturing machine
WO2012054630A2 (en) Front opening wafer container with door deflection minimization
US20160375529A1 (en) Retrofitting manufacturing lines into cleanspace fabricators
KR20080046923A (en) Vacuum processing system

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20091014

Termination date: 20210225