BR0108935A - Folha de cobre composta e seu método de fabricação - Google Patents

Folha de cobre composta e seu método de fabricação

Info

Publication number
BR0108935A
BR0108935A BR0108935-8A BR0108935A BR0108935A BR 0108935 A BR0108935 A BR 0108935A BR 0108935 A BR0108935 A BR 0108935A BR 0108935 A BR0108935 A BR 0108935A
Authority
BR
Brazil
Prior art keywords
manufacturing
composite copper
copper foil
cathode
blade
Prior art date
Application number
BR0108935-8A
Other languages
English (en)
Inventor
Raymond Gales
Rene Lanners
Michel Streel
Akitoshi Suzuki
Original Assignee
Circuit Foil Luxembourg Trading Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Circuit Foil Luxembourg Trading Sarl filed Critical Circuit Foil Luxembourg Trading Sarl
Publication of BR0108935A publication Critical patent/BR0108935A/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611Smooth layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12431Foil or filament smaller than 6 mils
    • Y10T428/12438Composite
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12472Microscopic interfacial wave or roughness
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12806Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826Group VIB metal-base component
    • Y10T428/12847Cr-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12903Cu-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12993Surface feature [e.g., rough, mirror]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

"FOLHA DE COBRE COMPOSTA E SEU MéTODO DE FABRICAçãO". Uma folha de cobre composta (10) é constituída por uma lâmina portadora (12) formada por eletrodeposição sobre um cátodo, sendo que a lâmina portadora (12) tem um lado de cátodo formado em contato com o cátodo e um lado de eletrólito oposto. Uma camada de liberação muito fina (14) está no lado de eletrólito da referida lâmina portadora (12). Uma lâmina funcional fina (16), formada por deposição de cobre, tem um lado frontal em contato com a camada de liberação (14) e um lado posterior oposto. O lado de eletrólito da lâmina portadora (12) tem rugosidade superficial Rz menor ou igual a 3,5 pm. Está apresentado também um método para fabricação da folha de cobre composta.
BR0108935-8A 2000-02-24 2001-01-18 Folha de cobre composta e seu método de fabricação BR0108935A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
LU90532A LU90532B1 (en) 2000-02-24 2000-02-24 Comosite copper foil and manufacturing method thereof
PCT/EP2001/000544 WO2001063016A1 (en) 2000-02-24 2001-01-18 Composite copper foil and manufacturing method thereof

Publications (1)

Publication Number Publication Date
BR0108935A true BR0108935A (pt) 2002-12-24

Family

ID=19731872

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0108935-8A BR0108935A (pt) 2000-02-24 2001-01-18 Folha de cobre composta e seu método de fabricação

Country Status (13)

Country Link
US (1) US7153590B2 (pt)
EP (1) EP1257693B1 (pt)
JP (1) JP2003524078A (pt)
KR (1) KR100729005B1 (pt)
CN (1) CN1263898C (pt)
AU (1) AU2001250300A1 (pt)
BR (1) BR0108935A (pt)
CA (1) CA2397984C (pt)
DE (1) DE60101259T2 (pt)
LU (1) LU90532B1 (pt)
RU (1) RU2250934C2 (pt)
TW (1) TW573078B (pt)
WO (1) WO2001063016A1 (pt)

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WO2014162875A1 (ja) * 2013-04-02 2014-10-09 株式会社Adeka 電解銅めっき浴用添加剤、該添加剤を含む電解銅めっき浴および該電解銅めっき浴を用いた電解銅めっき方法
CN103397354B (zh) * 2013-08-08 2016-10-26 上海新阳半导体材料股份有限公司 一种用于减少硅通孔技术镀铜退火后空洞的添加剂
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KR101852671B1 (ko) * 2015-01-21 2018-06-04 제이엑스금속주식회사 캐리어 부착 동박, 적층체, 프린트 배선판, 및, 프린트 배선판의 제조 방법
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JP7122675B2 (ja) * 2017-10-23 2022-08-22 パナソニックIpマネジメント株式会社 金属基材付薄膜金属箔、金属張透明基材材料、透視型電極用積層板、透視型電極素材、及びデバイス
CN110042444B (zh) * 2019-05-10 2022-03-08 九江德福科技股份有限公司 一种提高铜箔表面均匀性的添加剂配方
CN110093637A (zh) * 2019-06-11 2019-08-06 九江德福科技股份有限公司 用于挠性覆铜板、挠性印制电路板的电解铜箔及制备方法
CN111005041B (zh) * 2019-12-30 2021-10-26 中国科学院青海盐湖研究所 一种复合多层结构多孔铜箔及其制备方法与系统
CN114178710A (zh) * 2020-08-24 2022-03-15 奥特斯(中国)有限公司 部件承载件及其制造方法
LU500134B1 (en) * 2021-05-07 2022-11-08 Circuit Foil Luxembourg Method for producing an electrodeposited copper foil and copper foil obtained therewith
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CN115087198B (zh) * 2022-08-11 2022-12-20 广州方邦电子股份有限公司 金属箔的支持体、金属箔及其应用

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Also Published As

Publication number Publication date
US20030012975A1 (en) 2003-01-16
KR20020081698A (ko) 2002-10-30
CN1404535A (zh) 2003-03-19
RU2250934C2 (ru) 2005-04-27
EP1257693A1 (en) 2002-11-20
KR100729005B1 (ko) 2007-06-14
CN1263898C (zh) 2006-07-12
DE60101259T2 (de) 2004-11-18
EP1257693B1 (en) 2003-11-19
RU2002123341A (ru) 2004-03-20
CA2397984C (en) 2011-08-02
DE60101259D1 (de) 2003-12-24
LU90532B1 (en) 2001-08-27
JP2003524078A (ja) 2003-08-12
TW573078B (en) 2004-01-21
WO2001063016A1 (en) 2001-08-30
AU2001250300A1 (en) 2001-09-03
CA2397984A1 (en) 2001-08-30
US7153590B2 (en) 2006-12-26

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