AU3593395A - High voltage lateral dmos device with enhanced drift region - Google Patents

High voltage lateral dmos device with enhanced drift region

Info

Publication number
AU3593395A
AU3593395A AU35933/95A AU3593395A AU3593395A AU 3593395 A AU3593395 A AU 3593395A AU 35933/95 A AU35933/95 A AU 35933/95A AU 3593395 A AU3593395 A AU 3593395A AU 3593395 A AU3593395 A AU 3593395A
Authority
AU
Australia
Prior art keywords
high voltage
drift region
dmos device
lateral dmos
voltage lateral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU35933/95A
Other languages
English (en)
Inventor
Martin J Alter
Martin E Garnett
Michael R Hsing
Helmuth R Liftin
James C Moyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microchip Technology Inc
Original Assignee
Micrel Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26978899&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU3593395(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US08/313,471 external-priority patent/US5447876A/en
Application filed by Micrel Inc filed Critical Micrel Inc
Publication of AU3593395A publication Critical patent/AU3593395A/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65Lateral DMOS [LDMOS] FETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126Top-view geometrical layouts of the regions or the junctions
    • H10D62/127Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/257Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
    • H10W20/484
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149Source or drain regions of field-effect devices
    • H10D62/151Source or drain regions of field-effect devices of IGFETs 
    • H10D62/156Drain regions of DMOS transistors
    • H10D62/157Impurity concentrations or distributions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/256Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are recessed in semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/514Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers
    • H10D64/516Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers the thicknesses being non-uniform
AU35933/95A 1994-09-27 1995-09-25 High voltage lateral dmos device with enhanced drift region Abandoned AU3593395A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US313471 1994-09-27
US08/313,471 US5447876A (en) 1993-11-19 1994-09-27 Method of making a diamond shaped gate mesh for cellular MOS transistor array
US08/384,168 US5517046A (en) 1993-11-19 1995-02-06 High voltage lateral DMOS device with enhanced drift region
PCT/US1995/011959 WO1996010267A1 (en) 1994-09-27 1995-09-25 High voltage lateral dmos device with enhanced drift region
US384168 1999-08-27

Publications (1)

Publication Number Publication Date
AU3593395A true AU3593395A (en) 1996-04-19

Family

ID=26978899

Family Applications (1)

Application Number Title Priority Date Filing Date
AU35933/95A Abandoned AU3593395A (en) 1994-09-27 1995-09-25 High voltage lateral dmos device with enhanced drift region

Country Status (6)

Country Link
US (1) US5517046A (OSRAM)
EP (1) EP0788659B1 (OSRAM)
JP (1) JPH10506755A (OSRAM)
AU (1) AU3593395A (OSRAM)
DE (1) DE69513680T2 (OSRAM)
WO (1) WO1996010267A1 (OSRAM)

Families Citing this family (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6242787B1 (en) 1995-11-15 2001-06-05 Denso Corporation Semiconductor device and manufacturing method thereof
US6831331B2 (en) 1995-11-15 2004-12-14 Denso Corporation Power MOS transistor for absorbing surge current
US6071768A (en) * 1996-05-17 2000-06-06 Texas Instruments Incorporated Method of making an efficient NPN turn-on in a high voltage DENMOS transistor for ESD protection
SE513283C2 (sv) * 1996-07-26 2000-08-14 Ericsson Telefon Ab L M MOS-transistorstruktur med utsträckt driftregion
US5846866A (en) * 1997-02-07 1998-12-08 National Semiconductor Corporation Drain extension regions in low voltage lateral DMOS devices
EP0880183A3 (en) * 1997-05-23 1999-07-28 Texas Instruments Incorporated LDMOS power device
EP0922302A2 (en) * 1997-05-23 1999-06-16 Koninklijke Philips Electronics N.V. Lateral mos transistor device
JP3387782B2 (ja) 1997-07-14 2003-03-17 松下電器産業株式会社 半導体装置
KR100244282B1 (ko) * 1997-08-25 2000-02-01 김영환 고전압 트랜지스터의 구조 및 제조 방법
US6133077A (en) 1998-01-13 2000-10-17 Lsi Logic Corporation Formation of high-voltage and low-voltage devices on a semiconductor substrate
US6020239A (en) 1998-01-28 2000-02-01 International Business Machines Corporation Pillar transistor incorporating a body contact
US6150200A (en) * 1998-04-03 2000-11-21 Motorola, Inc. Semiconductor device and method of making
US6303961B1 (en) * 1998-04-29 2001-10-16 Aqere Systems Guardian Corp. Complementary semiconductor devices
US6096606A (en) * 1998-05-04 2000-08-01 Motorola, Inc. Method of making a semiconductor device
US6093585A (en) * 1998-05-08 2000-07-25 Lsi Logic Corporation High voltage tolerant thin film transistor
US6252278B1 (en) * 1998-05-18 2001-06-26 Monolithic Power Systems, Inc. Self-aligned lateral DMOS with spacer drift region
JP3443355B2 (ja) * 1999-03-12 2003-09-02 三洋電機株式会社 半導体装置の製造方法
KR100336557B1 (ko) * 1999-09-14 2002-05-11 박종섭 정전방전보호소자 제조방법
US6271552B1 (en) * 1999-10-04 2001-08-07 Xemod, Inc Lateral RF MOS device with improved breakdown voltage
US6784059B1 (en) * 1999-10-29 2004-08-31 Sanyo Electric Co., Ltd. Semiconductor device and method of manufacturing thereof
US6683349B1 (en) * 1999-10-29 2004-01-27 Sanyo Electric Co., Ltd. Semiconductor device and method of manufacturing the same
WO2001075979A1 (de) * 2000-03-31 2001-10-11 Ihp Gmbh-Innovations For High Performance Microelectronics Cmos-kompatibler lateraler dmos-transistor und verfahren zur herstellung eines derartigen transistors
TW512533B (en) 2000-04-26 2002-12-01 Sanyo Electric Co Semiconductor device and its manufacturing process
EP1158583A1 (en) * 2000-05-23 2001-11-28 STMicroelectronics S.r.l. Low on-resistance LDMOS
JP2002094063A (ja) * 2000-09-11 2002-03-29 Toshiba Corp 半導体装置
JP2002217407A (ja) * 2001-01-16 2002-08-02 Sanyo Electric Co Ltd 半導体装置とその製造方法
JP4030269B2 (ja) * 2001-03-06 2008-01-09 三洋電機株式会社 半導体装置とその製造方法
TW543146B (en) * 2001-03-09 2003-07-21 Fairchild Semiconductor Ultra dense trench-gated power device with the reduced drain-source feedback capacitance and miller charge
US7109558B2 (en) 2001-06-06 2006-09-19 Denso Corporation Power MOS transistor having capability for setting substrate potential independently of source potential
US20060038223A1 (en) * 2001-07-03 2006-02-23 Siliconix Incorporated Trench MOSFET having drain-drift region comprising stack of implanted regions
US7033876B2 (en) * 2001-07-03 2006-04-25 Siliconix Incorporated Trench MIS device having implanted drain-drift region and thick bottom oxide and process for manufacturing the same
US7009247B2 (en) * 2001-07-03 2006-03-07 Siliconix Incorporated Trench MIS device with thick oxide layer in bottom of gate contact trench
US7291884B2 (en) * 2001-07-03 2007-11-06 Siliconix Incorporated Trench MIS device having implanted drain-drift region and thick bottom oxide
US6563142B2 (en) 2001-07-11 2003-05-13 Lumileds Lighting, U.S., Llc Reducing the variation of far-field radiation patterns of flipchip light emitting diodes
US6486034B1 (en) * 2001-07-20 2002-11-26 Taiwan Semiconductor Manufacturing Company Method of forming LDMOS device with double N-layering
US6475870B1 (en) * 2001-07-23 2002-11-05 Taiwan Semiconductor Manufacturing Company P-type LDMOS device with buried layer to solve punch-through problems and process for its manufacture
US6593621B2 (en) * 2001-08-23 2003-07-15 Micrel, Inc. LDMOS field effect transistor with improved ruggedness in narrow curved areas
DE10156468A1 (de) 2001-11-16 2003-05-28 Eupec Gmbh & Co Kg Halbleiterbauelement und Verfahren zum Kontaktieren eines solchen Halbleiterbauelements
JP2003303961A (ja) * 2002-04-09 2003-10-24 Sanyo Electric Co Ltd Mos半導体装置
US7635621B2 (en) * 2002-11-22 2009-12-22 Micrel, Inc. Lateral double-diffused metal oxide semiconductor (LDMOS) device with an enhanced drift region that has an improved Ron area product
US6833586B2 (en) * 2003-01-02 2004-12-21 Micrel, Inc. LDMOS transistor with high voltage source and drain terminals
KR100493059B1 (ko) * 2003-04-18 2005-06-02 삼성전자주식회사 게이트 캐패시턴스를 감소시킬 수 있는 트랜지스터
US6946706B1 (en) 2003-07-09 2005-09-20 National Semiconductor Corporation LDMOS transistor structure for improving hot carrier reliability
US20050275027A1 (en) * 2003-09-09 2005-12-15 Micrel, Incorporated ESD protection for integrated circuits
AU2003264478A1 (en) * 2003-09-18 2005-04-11 Shindengen Electric Manufacturing Co., Ltd. Lateral short-channel dmos, method for manufacturing same and semiconductor device
JP4800566B2 (ja) * 2003-10-06 2011-10-26 ルネサスエレクトロニクス株式会社 半導体装置及びその製造方法
CN100376020C (zh) * 2003-12-29 2008-03-19 中芯国际集成电路制造(上海)有限公司 一种制作具有延伸闸极晶体管的方法
US20050280053A1 (en) * 2004-06-22 2005-12-22 Hayes Monty B Semiconductor device with diagonal gate signal distribution runner
US7718448B1 (en) * 2005-05-27 2010-05-18 National Semiconductor Corporation Method of monitoring process misalignment to reduce asymmetric device operation and improve the electrical and hot carrier performance of LDMOS transistor arrays
US7868378B1 (en) * 2005-07-18 2011-01-11 Volterra Semiconductor Corporation Methods and apparatus for LDMOS transistors
US7375408B2 (en) * 2005-10-11 2008-05-20 United Microelectronics Corp. Fabricating method of a high voltage metal oxide semiconductor device
US7956384B2 (en) * 2006-06-23 2011-06-07 Alpha & Omega Semiconductor Ltd. Closed cell configuration to increase channel density for sub-micron planar semiconductor power device
TWI312192B (en) * 2006-09-18 2009-07-11 Promos Technologies Inc Semiconductor device and manufacture method thereof
US7737526B2 (en) * 2007-03-28 2010-06-15 Advanced Analogic Technologies, Inc. Isolated trench MOSFET in epi-less semiconductor sustrate
CN100592533C (zh) * 2007-10-15 2010-02-24 天钰科技股份有限公司 横向扩散金属氧化物晶体管
TWI394277B (zh) * 2007-10-19 2013-04-21 Fitipower Integrated Tech Inc 橫向擴散金屬氧化物電晶體
US7999318B2 (en) * 2007-12-28 2011-08-16 Volterra Semiconductor Corporation Heavily doped region in double-diffused source MOSFET (LDMOS) transistor and a method of fabricating the same
TWI470797B (zh) 2008-01-14 2015-01-21 沃特拉半導體公司 具保護通道的功率電晶體
JP2009239096A (ja) * 2008-03-27 2009-10-15 Renesas Technology Corp 半導体装置
US8114750B2 (en) * 2008-04-17 2012-02-14 International Business Machines Corporation Lateral diffusion field effect transistor with drain region self-aligned to gate electrode
JP5420854B2 (ja) * 2008-04-28 2014-02-19 パナソニック株式会社 半導体装置およびその製造方法
US7851314B2 (en) * 2008-04-30 2010-12-14 Alpha And Omega Semiconductor Incorporated Short channel lateral MOSFET and method
US7759923B2 (en) * 2008-07-08 2010-07-20 Micrel, Inc. Current sensing in a buck-boost switching regulator using integrally embedded PMOS devices
KR20100064264A (ko) * 2008-12-04 2010-06-14 주식회사 동부하이텍 반도체 소자 및 이의 제조 방법
US8049307B2 (en) * 2009-01-23 2011-11-01 Vanguard International Semiconductor Corporation Insulated gate bipolar transistor (IGBT) electrostatic discharge (ESD) protection devices
JP5525736B2 (ja) * 2009-02-18 2014-06-18 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置及びその製造方法
US9184097B2 (en) * 2009-03-12 2015-11-10 System General Corporation Semiconductor devices and formation methods thereof
JP5985393B2 (ja) * 2009-08-04 2016-09-06 ジーエーエヌ システムズ インコーポレイテッド アイランドマトリックス化窒化ガリウムマイクロ波トランジスタおよびパワースイッチングトランジスタ
US8048765B2 (en) * 2009-08-28 2011-11-01 Broadcom Corporation Method for fabricating a MOS transistor with source/well heterojunction and related structure
US20110062554A1 (en) * 2009-09-17 2011-03-17 Hsing Michael R High voltage floating well in a silicon die
DE102009051745B4 (de) * 2009-11-03 2017-09-21 Austriamicrosystems Ag Hochvolt-Transistor mit Mehrfach-Dielektrikum und Herstellungsverfahren
JP5784269B2 (ja) * 2009-11-11 2015-09-24 ルネサスエレクトロニクス株式会社 半導体装置及びその製造方法
KR101128694B1 (ko) * 2009-11-17 2012-03-23 매그나칩 반도체 유한회사 반도체 장치
US8362557B2 (en) * 2009-12-02 2013-01-29 Fairchild Semiconductor Corporation Stepped-source LDMOS architecture
US8390078B2 (en) * 2010-06-10 2013-03-05 Taiwan Semiconductor Manufacturing Company, Ltd. Quadrangle MOS transistors
JP5043990B2 (ja) * 2010-06-18 2012-10-10 シャープ株式会社 半導体装置およびその製造方法
US9450074B1 (en) * 2011-07-29 2016-09-20 Maxim Integrated Products, Inc. LDMOS with field plate connected to gate
US9214457B2 (en) 2011-09-20 2015-12-15 Alpha & Omega Semiconductor Incorporated Method of integrating high voltage devices
US8916913B2 (en) * 2012-07-13 2014-12-23 Monolithic Power Systems, Inc. High voltage semiconductor device and the associated method of manufacturing
US20140175526A1 (en) * 2012-12-20 2014-06-26 Macronix International Co., Ltd. Semiconductor device for current control and method thereof
US8981475B2 (en) 2013-06-18 2015-03-17 International Business Machines Corporation Lateral diffusion metal oxide semiconductor (LDMOS)
CN105556647B (zh) * 2013-07-19 2017-06-13 日产自动车株式会社 半导体装置及其制造方法
US9219146B2 (en) * 2013-12-27 2015-12-22 Monolithic Power Systems, Inc. High voltage PMOS and the method for forming thereof
GB201418752D0 (en) * 2014-10-22 2014-12-03 Rolls Royce Plc Lateral field effect transistor device
US9583612B1 (en) * 2016-01-21 2017-02-28 Texas Instruments Incorporated Drift region implant self-aligned to field relief oxide with sidewall dielectric
US20170292047A1 (en) 2016-04-12 2017-10-12 Rextac Llc Hexene-1 Containing Amorphous Polyalphaolefins For Improved Hot Melt Adhesives
TWM547757U (zh) 2017-01-20 2017-08-21 杰力科技股份有限公司 功率晶片及其電晶體結構
KR20190118745A (ko) * 2018-04-11 2019-10-21 주식회사 디비하이텍 3d 채널 영역을 형성하는 반도체 소자 및 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4148047A (en) * 1978-01-16 1979-04-03 Honeywell Inc. Semiconductor apparatus
JPS63262873A (ja) * 1987-04-21 1988-10-31 Fuji Xerox Co Ltd 半導体装置
US4922327A (en) * 1987-12-24 1990-05-01 University Of Toronto Innovations Foundation Semiconductor LDMOS device with upper and lower passages
JPH01207976A (ja) * 1988-02-15 1989-08-21 Nec Corp 半導体装置
US5072267A (en) * 1989-06-28 1991-12-10 Nec Corporation Complementary field effect transistor
JP2545762B2 (ja) * 1990-04-13 1996-10-23 日本電装株式会社 高耐圧misトランジスタおよびこのトランジスタを有する相補型トランジスタの製造方法
US5306652A (en) * 1991-12-30 1994-04-26 Texas Instruments Incorporated Lateral double diffused insulated gate field effect transistor fabrication process
US5412239A (en) * 1993-05-14 1995-05-02 Siliconix Incorporated Contact geometry for improved lateral MOSFET
US5355008A (en) * 1993-11-19 1994-10-11 Micrel, Inc. Diamond shaped gate mesh for cellular MOS transistor array

Also Published As

Publication number Publication date
JPH10506755A (ja) 1998-06-30
US5517046A (en) 1996-05-14
DE69513680D1 (de) 2000-01-05
EP0788659A1 (en) 1997-08-13
WO1996010267A1 (en) 1996-04-04
EP0788659A4 (OSRAM) 1997-09-10
DE69513680T2 (de) 2000-05-11
EP0788659B1 (en) 1999-12-01

Similar Documents

Publication Publication Date Title
AU3593395A (en) High voltage lateral dmos device with enhanced drift region
SG52400A1 (en) Short channel trenched dmos transistor
AU2443297A (en) Method and device for eliminating electrode drift
ZA9810938B (en) High voltage induction device
EP0416805A3 (en) Transistor with voltage clamp
EP0343977A3 (en) Mosfet having drain voltage detection function
AU3125797A (en) Long channel trench-gated power mosfet having fully depleted body region
AU1018100A (en) Voltage switch-over device
KR100190145B1 (en) High voltage mosfet with an improved channel stopper structure
AU4388093A (en) Integrated field-effect initiator
AU1616195A (en) Device for describing arcs
AU5791199A (en) Electro-optic voltage sensor
AU1708999A (en) Ldmos structure with via grounded source
AU9000798A (en) Channel switching device and channel switching method
KR100204452B1 (en) The elastomeric capacitively graded high voltage cable termination
EP0684468A3 (en) Condensation-free electrophoresis device.
AU4942993A (en) Current limiting device
AU7978398A (en) Variable voltage isolation gate
GB2332797B (en) Low voltage transistor biasing
AU2019995A (en) High voltage cable
GB2318927B (en) Voltage clamp
AU2524895A (en) Swivelling-deflector switching device
GB2287125B (en) High voltage transistors
AU6722396A (en) Low voltage short channel trench dmos transistor
AU5142298A (en) Electrode for field control