ATE556432T1 - Verfahren zur herstellung eines dünnfilms durch implantation von gasförmigen teilchen - Google Patents

Verfahren zur herstellung eines dünnfilms durch implantation von gasförmigen teilchen

Info

Publication number
ATE556432T1
ATE556432T1 AT01999973T AT01999973T ATE556432T1 AT E556432 T1 ATE556432 T1 AT E556432T1 AT 01999973 T AT01999973 T AT 01999973T AT 01999973 T AT01999973 T AT 01999973T AT E556432 T1 ATE556432 T1 AT E556432T1
Authority
AT
Austria
Prior art keywords
producing
thin film
gaseous particles
thin layer
implanting gaseous
Prior art date
Application number
AT01999973T
Other languages
English (en)
Inventor
Bernard Aspar
Michel Bruel
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE556432T1 publication Critical patent/ATE556432T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
AT01999973T 2000-12-08 2001-12-07 Verfahren zur herstellung eines dünnfilms durch implantation von gasförmigen teilchen ATE556432T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0015980A FR2818010B1 (fr) 2000-12-08 2000-12-08 Procede de realisation d'une couche mince impliquant l'introduction d'especes gazeuses
PCT/FR2001/003873 WO2002047156A1 (fr) 2000-12-08 2001-12-07 Procede de realisation d'une couche mince impliquant l'introduction d'especes gazeuses

Publications (1)

Publication Number Publication Date
ATE556432T1 true ATE556432T1 (de) 2012-05-15

Family

ID=8857408

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01999973T ATE556432T1 (de) 2000-12-08 2001-12-07 Verfahren zur herstellung eines dünnfilms durch implantation von gasförmigen teilchen

Country Status (10)

Country Link
US (1) US6946365B2 (de)
EP (1) EP1354346B1 (de)
JP (1) JP4064816B2 (de)
KR (1) KR100869327B1 (de)
AT (1) ATE556432T1 (de)
AU (1) AU2002217208A1 (de)
FR (1) FR2818010B1 (de)
MY (1) MY127171A (de)
TW (1) TW527621B (de)
WO (1) WO2002047156A1 (de)

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Also Published As

Publication number Publication date
KR20030061833A (ko) 2003-07-22
FR2818010B1 (fr) 2003-09-05
US6946365B2 (en) 2005-09-20
EP1354346A1 (de) 2003-10-22
US20040092087A1 (en) 2004-05-13
AU2002217208A1 (en) 2002-06-18
MY127171A (en) 2006-11-30
KR100869327B1 (ko) 2008-11-18
JP4064816B2 (ja) 2008-03-19
JP2004515920A (ja) 2004-05-27
TW527621B (en) 2003-04-11
WO2002047156A1 (fr) 2002-06-13
FR2818010A1 (fr) 2002-06-14
EP1354346B1 (de) 2012-05-02

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