ATE534937T1 - System zur änderung der abmessungen einer vorlage - Google Patents

System zur änderung der abmessungen einer vorlage

Info

Publication number
ATE534937T1
ATE534937T1 AT10160309T AT10160309T ATE534937T1 AT E534937 T1 ATE534937 T1 AT E534937T1 AT 10160309 T AT10160309 T AT 10160309T AT 10160309 T AT10160309 T AT 10160309T AT E534937 T1 ATE534937 T1 AT E534937T1
Authority
AT
Austria
Prior art keywords
substrate
bodies
lever arm
pivot axis
actuator assembly
Prior art date
Application number
AT10160309T
Other languages
English (en)
Inventor
Anshuman Cherala
Byung-Jin Choi
Pawan K Nimmakayala
Mario J Meissl
Sidlgata V Sreenivasan
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Application granted granted Critical
Publication of ATE534937T1 publication Critical patent/ATE534937T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Micromachines (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Manipulator (AREA)
  • Optical Head (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Bending Of Plates, Rods, And Pipes (AREA)
  • Electrodes Of Semiconductors (AREA)
AT10160309T 2004-06-03 2005-06-01 System zur änderung der abmessungen einer vorlage ATE534937T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57687904P 2004-06-03 2004-06-03
US10/999,898 US20050270516A1 (en) 2004-06-03 2004-11-30 System for magnification and distortion correction during nano-scale manufacturing

Publications (1)

Publication Number Publication Date
ATE534937T1 true ATE534937T1 (de) 2011-12-15

Family

ID=35448519

Family Applications (2)

Application Number Title Priority Date Filing Date
AT05768764T ATE479130T1 (de) 2004-06-03 2005-06-01 Gerät, system und verfahren zur änderung von substratabmessungen bei nanoskaligen herstellungsverfahren
AT10160309T ATE534937T1 (de) 2004-06-03 2005-06-01 System zur änderung der abmessungen einer vorlage

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT05768764T ATE479130T1 (de) 2004-06-03 2005-06-01 Gerät, system und verfahren zur änderung von substratabmessungen bei nanoskaligen herstellungsverfahren

Country Status (9)

Country Link
US (4) US20050270516A1 (de)
EP (3) EP2267531B1 (de)
JP (1) JP4688872B2 (de)
KR (1) KR101113030B1 (de)
CN (1) CN1981236B (de)
AT (2) ATE479130T1 (de)
DE (1) DE602005023153D1 (de)
TW (1) TWI298816B (de)
WO (1) WO2005121892A2 (de)

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