|
GB434875A
(en)
|
1933-02-08 |
1935-09-05 |
Bela Gasper |
An improved method of producing multi-colour photographic images on coloured and differently sensitized multi-layer photographic material
|
|
NL80628C
(de)
|
1949-07-23 |
|
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BE540601A
(de)
|
1950-12-06 |
|
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NL199484A
(de)
|
1954-08-20 |
|
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US2833827A
(en)
|
1955-01-17 |
1958-05-06 |
Bayer Ag |
Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same
|
|
BE606888A
(de)
|
1960-08-05 |
1900-01-01 |
|
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US3280734A
(en)
|
1963-10-29 |
1966-10-25 |
Howard A Fromson |
Photographic plate
|
|
US3181461A
(en)
|
1963-05-23 |
1965-05-04 |
Howard A Fromson |
Photographic plate
|
|
GB1053866A
(de)
|
1964-08-05 |
|
|
|
|
JPS459610B1
(de)
|
1965-07-19 |
1970-04-07 |
|
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|
JPS4328403B1
(de)
|
1965-12-17 |
1968-12-06 |
|
|
|
NL136645C
(de)
|
1966-12-12 |
|
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|
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US3902114A
(en)
|
1967-10-20 |
1975-08-26 |
Gunther Alich |
Method of and apparatus for measuring the distance between cooperating rollers of a rolling mill
|
|
DE1807644A1
(de)
|
1967-11-21 |
1969-08-28 |
Eastman Kodak Co |
Verwendung von lichtempfindlichen,filmbildenden Polymerisaten aus Aminostyrolen zur Herstellung von lichtempfindlichen Schichten lichtempfindlicher Aufzeichnungsmaterialien
|
|
GB1227602A
(de)
|
1967-11-24 |
1971-04-07 |
|
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|
ZA6807938B
(de)
|
1967-12-04 |
|
|
|
|
US3573917A
(en)
|
1968-07-12 |
1971-04-06 |
Takashi Okamoto |
Light-sensitive printing plate composition
|
|
JPS492284B1
(de)
|
1969-05-30 |
1974-01-19 |
|
|
|
US3837860A
(en)
|
1969-06-16 |
1974-09-24 |
L Roos |
PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
|
|
JPS4917481B1
(de)
|
1970-02-17 |
1974-05-01 |
|
|
|
JPS505083B1
(de)
|
1970-09-16 |
1975-02-28 |
|
|
|
JPS505084B1
(de)
|
1970-09-16 |
1975-02-28 |
|
|
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US3785825A
(en)
|
1971-07-19 |
1974-01-15 |
Polychrome Corp |
Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
|
|
CA990722A
(en)
|
1971-08-25 |
1976-06-08 |
Yoshinobu Murakami |
Organic photoconductive layer sensitized with trimethine compound
|
|
JPS5423571B2
(de)
|
1971-12-13 |
1979-08-15 |
|
|
|
JPS5429922B2
(de)
|
1971-12-13 |
1979-09-27 |
|
|
|
BE795809A
(fr)
|
1972-02-22 |
1973-08-22 |
Eastman Kodak Co |
Nouveaux polymeres photosensibles a groupes o-quinone diazide
|
|
JPS51483B2
(de)
|
1972-08-18 |
1976-01-08 |
|
|
|
DE2331377C2
(de)
|
1973-06-20 |
1982-10-14 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches Kopiermaterial
|
|
US3902734A
(en)
|
1974-03-14 |
1975-09-02 |
Twm Mfg Co |
Frames for axle suspension systems
|
|
US4123279A
(en)
|
1974-03-25 |
1978-10-31 |
Fuji Photo Film Co., Ltd. |
Light-sensitive o-quinonediazide containing planographic printing plate
|
|
US4069056A
(en)
|
1974-05-02 |
1978-01-17 |
General Electric Company |
Photopolymerizable composition containing group Va aromatic onium salts
|
|
GB1512982A
(en)
|
1974-05-02 |
1978-06-01 |
Gen Electric |
Salts
|
|
GB1513368A
(en)
|
1974-07-08 |
1978-06-07 |
Vickers Ltd |
Processing of radiation-sensitive members
|
|
JPS5280022A
(en)
|
1975-12-26 |
1977-07-05 |
Fuji Photo Film Co Ltd |
Light solubilizable composition
|
|
JPS538128A
(en)
|
1976-07-09 |
1978-01-25 |
Fuji Photo Film Co Ltd |
Photosolubilizable composition
|
|
DE2641100C2
(de)
|
1976-09-13 |
1987-02-26 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches Gemisch
|
|
JPS5463902A
(en)
|
1977-10-31 |
1979-05-23 |
Fuji Photo Film Co Ltd |
Method of making offset printing plate
|
|
JPS5474728A
(en)
|
1977-11-28 |
1979-06-15 |
Fuji Photo Film Co Ltd |
Photosensitive composition
|
|
US4173476A
(en)
|
1978-02-08 |
1979-11-06 |
Minnesota Mining And Manufacturing Company |
Complex salt photoinitiator
|
|
JPS5528062A
(en)
|
1978-08-22 |
1980-02-28 |
Ricoh Co Ltd |
Dry type developing apparatus in electrophotographic copier or the like
|
|
JPS5562444A
(en)
|
1978-11-02 |
1980-05-10 |
Konishiroku Photo Ind Co Ltd |
Photosensitive composition
|
|
JPS5577742A
(en)
|
1978-12-08 |
1980-06-11 |
Fuji Photo Film Co Ltd |
Photosensitive composition
|
|
JPS55121447A
(en)
|
1979-03-15 |
1980-09-18 |
Fuji Photo Film Co Ltd |
Lithographic printing plate correcting agent
|
|
US4283475A
(en)
|
1979-08-21 |
1981-08-11 |
Fuji Photo Film Co., Ltd. |
Pentamethine thiopyrylium salts, process for production thereof, and photoconductive compositions containing said salts
|
|
US4327169A
(en)
|
1981-01-19 |
1982-04-27 |
Eastman Kodak Company |
Infrared sensitive photoconductive composition, elements and imaging method using trimethine thiopyrylium dye
|
|
JPS58112793A
(ja)
|
1981-12-28 |
1983-07-05 |
Ricoh Co Ltd |
光情報記録部材
|
|
JPS58112792A
(ja)
|
1981-12-28 |
1983-07-05 |
Ricoh Co Ltd |
光情報記録部材
|
|
JPS58125246A
(ja)
|
1982-01-22 |
1983-07-26 |
Ricoh Co Ltd |
レ−ザ記録媒体
|
|
JPS58181690A
(ja)
|
1982-04-19 |
1983-10-24 |
Canon Inc |
光学記録媒体
|
|
JPS58220143A
(ja)
|
1982-06-16 |
1983-12-21 |
Canon Inc |
有機被膜
|
|
JPS58173696A
(ja)
|
1982-04-06 |
1983-10-12 |
Canon Inc |
光学記録媒体
|
|
JPS58181051A
(ja)
|
1982-04-19 |
1983-10-22 |
Canon Inc |
有機光導電体
|
|
JPS58194595A
(ja)
|
1982-05-10 |
1983-11-12 |
Canon Inc |
光学記録媒体
|
|
JPS5948187A
(ja)
|
1982-09-10 |
1984-03-19 |
Nec Corp |
光学記録媒体
|
|
JPS58224793A
(ja)
|
1982-06-25 |
1983-12-27 |
Nec Corp |
光学記録媒体
|
|
US4491628A
(en)
|
1982-08-23 |
1985-01-01 |
International Business Machines Corporation |
Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
|
|
JPS5984249A
(ja)
|
1982-11-05 |
1984-05-15 |
Canon Inc |
有機被膜
|
|
JPS5984248A
(ja)
|
1982-11-05 |
1984-05-15 |
Canon Inc |
有機被膜
|
|
JPS5941363A
(ja)
|
1982-08-31 |
1984-03-07 |
Canon Inc |
新規ピリリウム系染料およびその製造方法
|
|
US4518676A
(en)
|
1982-09-18 |
1985-05-21 |
Ciba Geigy Corporation |
Photopolymerizable compositions containing diaryliodosyl salts
|
|
JPS5973996A
(ja)
|
1982-10-22 |
1984-04-26 |
Nec Corp |
光学記録用媒体
|
|
JPS5984356A
(ja)
|
1982-11-05 |
1984-05-16 |
Ricoh Co Ltd |
光デイスク原盤の作成方法
|
|
JPS59121044A
(ja)
|
1982-12-27 |
1984-07-12 |
Fuji Photo Film Co Ltd |
光可溶化組成物
|
|
JPS59146063A
(ja)
|
1983-02-09 |
1984-08-21 |
Canon Inc |
有機被膜
|
|
JPS59146061A
(ja)
|
1983-02-09 |
1984-08-21 |
Canon Inc |
有機被膜
|
|
JPS59174842A
(ja)
|
1983-03-24 |
1984-10-03 |
Fuji Photo Film Co Ltd |
ポジ型感光性平版印刷版を用いた製版方法
|
|
JPS59202829A
(ja)
|
1983-05-04 |
1984-11-16 |
Sanpo Gokin Kogyo Kk |
合成樹脂製品の射出成型金型
|
|
JPS59216146A
(ja)
|
1983-05-24 |
1984-12-06 |
Sony Corp |
電子写真用感光材料
|
|
JPS603626A
(ja)
|
1983-06-22 |
1985-01-10 |
Fuji Photo Film Co Ltd |
感光性組成物
|
|
JPS6063744A
(ja)
|
1983-08-23 |
1985-04-12 |
Nec Corp |
光学的情報記録媒体
|
|
JPS6052940A
(ja)
|
1983-09-02 |
1985-03-26 |
Nec Corp |
光学記録媒体
|
|
JPS6078787A
(ja)
|
1983-10-07 |
1985-05-04 |
Ricoh Co Ltd |
光学的情報記録媒体
|
|
JPS6088942A
(ja)
|
1983-10-21 |
1985-05-18 |
Fuji Photo Film Co Ltd |
感光性組成物
|
|
DE3406101A1
(de)
|
1984-02-21 |
1985-08-22 |
Hoechst Ag, 6230 Frankfurt |
Verfahren zur zweistufigen hydrophilierenden nachbehandlung von aluminiumoxidschichten mit waessrigen loesungen und deren verwendung bei der herstellung von offsetdruckplattentraegern
|
|
US4708925A
(en)
|
1984-12-11 |
1987-11-24 |
Minnesota Mining And Manufacturing Company |
Photosolubilizable compositions containing novolac phenolic resin
|
|
JPS61143748A
(ja)
|
1984-12-17 |
1986-07-01 |
Fuji Photo Film Co Ltd |
感光性組成物
|
|
JPS61151644A
(ja)
|
1984-12-26 |
1986-07-10 |
Fuji Photo Film Co Ltd |
感光性組成物
|
|
JPS61159655A
(ja)
|
1985-01-07 |
1986-07-19 |
Fuji Photo Film Co Ltd |
製版方法
|
|
JPS6231859A
(ja)
|
1985-08-01 |
1987-02-10 |
Fuji Photo Film Co Ltd |
製版方法
|
|
JPS6256971A
(ja)
|
1985-09-05 |
1987-03-12 |
Fuji Photo Film Co Ltd |
電子写真感光材料
|
|
JPS6259963A
(ja)
|
1985-09-10 |
1987-03-16 |
Fuji Photo Film Co Ltd |
電子写真感光材料
|
|
JPH083630B2
(ja)
|
1986-01-23 |
1996-01-17 |
富士写真フイルム株式会社 |
感光性組成物
|
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US4756993A
(en)
|
1986-01-27 |
1988-07-12 |
Fuji Photo Film Co., Ltd. |
Electrophotographic photoreceptor with light scattering layer or light absorbing layer on support backside
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DE3604581A1
(de)
|
1986-02-14 |
1987-08-20 |
Basf Ag |
4-acylbenzylsulfoniumsalze, ihre herstellung sowie sie enthaltende photohaertbare gemische und aufzeichnungsmaterialien
|
|
DE3604580A1
(de)
|
1986-02-14 |
1987-08-20 |
Basf Ag |
Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
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|
JPH0743501B2
(ja)
|
1986-04-24 |
1995-05-15 |
富士写真フイルム株式会社 |
ポジ型感光性平版印刷版
|
|
JPH065384B2
(ja)
|
1986-06-12 |
1994-01-19 |
富士写真フイルム株式会社 |
感光性印刷版
|
|
JPS6358440A
(ja)
|
1986-08-29 |
1988-03-14 |
Fuji Photo Film Co Ltd |
感光性組成物
|
|
JPH07120039B2
(ja)
|
1986-11-14 |
1995-12-20 |
富士写真フイルム株式会社 |
感光性組成物
|
|
US4760013A
(en)
|
1987-02-17 |
1988-07-26 |
International Business Machines Corporation |
Sulfonium salt photoinitiators
|
|
JPH07120042B2
(ja)
|
1987-05-21 |
1995-12-20 |
富士写真フイルム株式会社 |
感光性組成物
|
|
DE3721741A1
(de)
|
1987-07-01 |
1989-01-12 |
Basf Ag |
Strahlungsempfindliches gemisch fuer lichtempfindliche beschichtungsmaterialien
|
|
DE3721740A1
(de)
|
1987-07-01 |
1989-01-12 |
Basf Ag |
Sulfoniumsalze mit saeurelabilen gruppierungen
|
|
JPH06104385B2
(ja)
|
1987-12-01 |
1994-12-21 |
富士写真フイルム株式会社 |
感熱記録材料
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JPH0769605B2
(ja)
|
1988-02-25 |
1995-07-31 |
富士写真フイルム株式会社 |
感光性組成物
|
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US4933377A
(en)
|
1988-02-29 |
1990-06-12 |
Saeva Franklin D |
Novel sulfonium salts and the use thereof as photoinitiators
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|
JPH0296755A
(ja)
|
1988-10-03 |
1990-04-09 |
Konica Corp |
感光性組成物
|
|
CA2002873A1
(en)
|
1988-11-21 |
1990-05-21 |
Franklin Donald Saeva |
Onium salts and the use thereof as photoinitiators
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|
JPH02150848A
(ja)
|
1988-12-02 |
1990-06-11 |
Hitachi Ltd |
光退色性放射線感応性組成物およびそれを用いたパターン形成法
|
|
JP2522693B2
(ja)
|
1988-12-08 |
1996-08-07 |
富士写真フイルム株式会社 |
感光性組成物
|
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US5156938A
(en)
|
1989-03-30 |
1992-10-20 |
Graphics Technology International, Inc. |
Ablation-transfer imaging/recording
|
|
US5041358A
(en)
|
1989-04-17 |
1991-08-20 |
International Business Machines Corporation |
Negative photoresist and use thereof
|
|
JPH02296514A
(ja)
|
1989-05-12 |
1990-12-07 |
Matsushita Electric Ind Co Ltd |
車両用サスペンション制御装置
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JP2845995B2
(ja)
|
1989-10-27 |
1999-01-13 |
株式会社日立製作所 |
領域抽出手法
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JP2639741B2
(ja)
|
1990-05-02 |
1997-08-13 |
富士写真フイルム株式会社 |
感光性組成物
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JPH052281A
(ja)
|
1991-06-26 |
1993-01-08 |
Fuji Photo Film Co Ltd |
平版印刷用原版の製造方法
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JPH05158230A
(ja)
|
1991-12-10 |
1993-06-25 |
Fuji Photo Film Co Ltd |
ポジ型感光性組成物
|
|
US5340699A
(en)
|
1993-05-19 |
1994-08-23 |
Eastman Kodak Company |
Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
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JP3471990B2
(ja)
|
1995-09-27 |
2003-12-02 |
富士写真フイルム株式会社 |
ポジ型感光性平版印刷版およびその製造方法
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JP3622063B2
(ja)
|
1995-11-20 |
2005-02-23 |
光洋精工株式会社 |
油圧制御弁
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JP3646461B2
(ja)
|
1997-03-24 |
2005-05-11 |
Jsr株式会社 |
磁性ポリマー粒子およびその製造方法
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JP3899581B2
(ja)
|
1997-03-27 |
2007-03-28 |
大日本インキ化学工業株式会社 |
着色樹脂粒子水分散液製造方法
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JP3812082B2
(ja)
|
1997-09-22 |
2006-08-23 |
コニカミノルタホールディングス株式会社 |
画像形成材料および画像形成方法
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JP3949832B2
(ja)
|
1997-11-14 |
2007-07-25 |
富士フイルム株式会社 |
赤外線レーザ用感光性画像形成材料
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JPH11291652A
(ja)
|
1998-02-10 |
1999-10-26 |
Fuji Photo Film Co Ltd |
画像形成材料
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JPH11338131A
(ja)
|
1998-03-26 |
1999-12-10 |
Fuji Photo Film Co Ltd |
感光性組成物及びそれを用いた平版印刷版原版
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JPH11288093A
(ja)
|
1998-04-06 |
1999-10-19 |
Fuji Photo Film Co Ltd |
赤外線レーザ用ポジ型感光性組成物
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EP0950517B1
(de)
|
1998-04-15 |
2001-10-04 |
Agfa-Gevaert N.V. |
Wärmeempfindliches Aufzeichnungsmaterial zur Herstellung von positiv arbeitenden Druckplatten
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JP2000087318A
(ja)
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1998-09-17 |
2000-03-28 |
Kam:Kk |
吸音部材及びその製造方法
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JP3842471B2
(ja)
|
1998-12-22 |
2006-11-08 |
富士写真フイルム株式会社 |
赤外線レーザ用ポジ型感光性組成物
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WO2005001576A1
(ja)
*
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2003-06-30 |
2005-01-06 |
Think Laboratory Co., Ltd. |
ポジ型感光性組成物
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JP2005242241A
(ja)
*
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2004-02-27 |
2005-09-08 |
Fuji Photo Film Co Ltd |
平版印刷版原版
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JP4474309B2
(ja)
*
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2005-03-22 |
2010-06-02 |
富士フイルム株式会社 |
平版印刷版原版及びその作製方法
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US7678533B2
(en)
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2005-06-30 |
2010-03-16 |
Agfa Graphics, N.V. |
Heat-sensitive lithographic printing plate precursor
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EP1738901B1
(de)
*
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2005-06-30 |
2008-03-26 |
Agfa Graphics N.V. |
Wärmeempfindlicher lithographischer Druckplattenvorläufer
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EP1738900B1
(de)
*
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2005-06-30 |
2008-04-16 |
Agfa Graphics N.V. |
Wärmeempfindlicher Flachdruckplattenvorläufer
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