ATE225568T1 - Leistung-mosfet aus siliziumkarbid - Google Patents

Leistung-mosfet aus siliziumkarbid

Info

Publication number
ATE225568T1
ATE225568T1 AT94900484T AT94900484T ATE225568T1 AT E225568 T1 ATE225568 T1 AT E225568T1 AT 94900484 T AT94900484 T AT 94900484T AT 94900484 T AT94900484 T AT 94900484T AT E225568 T1 ATE225568 T1 AT E225568T1
Authority
AT
Austria
Prior art keywords
region
drain
silicon carbide
conductivity type
source
Prior art date
Application number
AT94900484T
Other languages
English (en)
Inventor
John W Palmour
Original Assignee
Cree Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cree Inc filed Critical Cree Inc
Application granted granted Critical
Publication of ATE225568T1 publication Critical patent/ATE225568T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7813Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
    • H01L29/1608Silicon carbide
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/24Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Recrystallisation Techniques (AREA)
  • Bipolar Transistors (AREA)
AT94900484T 1992-11-24 1993-10-27 Leistung-mosfet aus siliziumkarbid ATE225568T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/980,753 US5506421A (en) 1992-11-24 1992-11-24 Power MOSFET in silicon carbide
PCT/US1993/010490 WO1994013017A1 (en) 1992-11-24 1993-10-27 Power mosfet in silicon carbide

Publications (1)

Publication Number Publication Date
ATE225568T1 true ATE225568T1 (de) 2002-10-15

Family

ID=25527819

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94900484T ATE225568T1 (de) 1992-11-24 1993-10-27 Leistung-mosfet aus siliziumkarbid

Country Status (8)

Country Link
US (1) US5506421A (de)
EP (1) EP0671056B1 (de)
JP (1) JPH08505492A (de)
KR (1) KR100271106B1 (de)
AT (1) ATE225568T1 (de)
AU (1) AU5545894A (de)
DE (1) DE69332358T2 (de)
WO (1) WO1994013017A1 (de)

Families Citing this family (168)

* Cited by examiner, † Cited by third party
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AU5545894A (en) 1994-06-22
KR100271106B1 (ko) 2000-11-01
EP0671056B1 (de) 2002-10-02
KR950704815A (ko) 1995-11-20
DE69332358T2 (de) 2003-07-31
WO1994013017A1 (en) 1994-06-09
US5506421A (en) 1996-04-09
EP0671056A1 (de) 1995-09-13
DE69332358D1 (de) 2002-11-07

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