ZA988342B - A fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips - Google Patents

A fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips

Info

Publication number
ZA988342B
ZA988342B ZA988342A ZA988342A ZA988342B ZA 988342 B ZA988342 B ZA 988342B ZA 988342 A ZA988342 A ZA 988342A ZA 988342 A ZA988342 A ZA 988342A ZA 988342 B ZA988342 B ZA 988342B
Authority
ZA
South Africa
Prior art keywords
rinsing
manufacture
increasing
efficiency
semiconductor chips
Prior art date
Application number
ZA988342A
Other languages
English (en)
Inventor
Brian V Jenkins
John E Hoots
Original Assignee
Nalco Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nalco Chemical Co filed Critical Nalco Chemical Co
Publication of ZA988342B publication Critical patent/ZA988342B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/906—Cleaning of wafer as interim step
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/12—Condition responsive control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/13—Tracers or tags

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
ZA988342A 1997-09-16 1998-09-11 A fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips ZA988342B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/931,556 US5922606A (en) 1997-09-16 1997-09-16 Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips

Publications (1)

Publication Number Publication Date
ZA988342B true ZA988342B (en) 1999-03-23

Family

ID=25460968

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA988342A ZA988342B (en) 1997-09-16 1998-09-11 A fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips

Country Status (15)

Country Link
US (2) US5922606A (de)
EP (1) EP1016127B1 (de)
JP (1) JP4160254B2 (de)
KR (1) KR100644257B1 (de)
CN (1) CN1270701A (de)
AT (1) ATE292843T1 (de)
AU (1) AU736380B2 (de)
DE (1) DE69829675T8 (de)
ES (1) ES2238769T3 (de)
ID (1) ID24157A (de)
MY (1) MY121693A (de)
PT (1) PT1016127E (de)
TW (1) TW386912B (de)
WO (1) WO1999014798A1 (de)
ZA (1) ZA988342B (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6179486B1 (en) 1997-05-13 2001-01-30 Micron Electronics, Inc. Method for hot add of a mass storage adapter on a system including a dynamically loaded adapter driver
US5922606A (en) * 1997-09-16 1999-07-13 Nalco Chemical Company Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips
US6177279B1 (en) * 1998-11-12 2001-01-23 Memc Electronic Materials, Inc. Ion extraction process for single side wafers
US6255123B1 (en) * 1998-11-17 2001-07-03 Kenneth P. Reis Methods of monitoring and maintaining concentrations of selected species in solutions during semiconductor processing
JP3434750B2 (ja) * 1999-09-30 2003-08-11 Ｎｅｃエレクトロニクス株式会社 洗浄装置のライン構成及びその設計方法
US6267641B1 (en) 2000-05-19 2001-07-31 Motorola, Inc. Method of manufacturing a semiconductor component and chemical-mechanical polishing system therefor
US6367679B1 (en) 2000-06-28 2002-04-09 Advanced Micro Devices, Inc. Detection of flux residue
US6409070B1 (en) * 2000-06-28 2002-06-25 Advanced Micro Devices, Inc. Minimizing flux residue by controlling amount of moisture during reflow
US6597444B1 (en) 2000-06-28 2003-07-22 Advanced Micro Devices, Inc. Determination of flux coverage
US6258612B1 (en) 2000-06-28 2001-07-10 Advanced Micro Devices, Inc. Determination of flux prior to package assembly
US6448097B1 (en) 2001-07-23 2002-09-10 Advanced Micro Devices Inc. Measure fluorescence from chemical released during trim etch
EP1283546A1 (de) * 2001-08-08 2003-02-12 Infineon Technologies AG Verfahren zur Feststellung der Entfernung von organischem Material von einer Halbleitervorrichtung während des Herstellungsverfahrens
US6857434B2 (en) * 2002-01-24 2005-02-22 International Business Machines Corporation CMP slurry additive for foreign matter detection
US7464134B2 (en) * 2002-01-24 2008-12-09 Hewlett-Packard Development Company, L.P. Mechanism and method for sharing imaging information from an enterprise resource planning computing environment
GB0216620D0 (en) * 2002-07-17 2002-08-28 Aoti Operating Co Inc Detection method and apparatus
US20050008532A1 (en) * 2003-07-11 2005-01-13 Jenkins Brian V. Method of inhibiting corrosion of copper plated or metallized surfaces and circuitry during semiconductor manufacturing processes
KR100585139B1 (ko) * 2004-04-12 2006-05-30 삼성전자주식회사 웨이퍼 세정액의 금속 측정 시약과 웨이퍼 세정액의 금속오염 모니터링 장치 및 방법
US20060286676A1 (en) * 2005-06-17 2006-12-21 Van Camp James R Fluorometric method for monitoring a clean-in-place system
KR100700280B1 (ko) * 2005-11-17 2007-03-26 동부일렉트로닉스 주식회사 반도체 박막의 성분 농도 측정 방법
US8753896B2 (en) * 2007-04-05 2014-06-17 Nalco Company Method of monitoring a surfactant in a microelectronic process by fluorescence
WO2009126147A1 (en) * 2008-04-08 2009-10-15 Nalco Company A method of monitoring a surfactant in a microelectronic process by fluorescence
US8716028B2 (en) * 2007-04-05 2014-05-06 Nalco Company Control over hydrogen fluoride levels in oxide etchant
US8372651B2 (en) * 2007-04-05 2013-02-12 Nalco Company Method of monitoring a surfactant in a microelectronic process by absorbance
KR100860269B1 (ko) 2008-02-29 2008-09-25 주식회사 위드텍 단일 웨이퍼 공정에서의 웨이퍼 세정액 온라인 모니터링방법, 웨이퍼 세정액 온라인 모니터링 장치 및 상기 장치에사용되는 시약 용기
EP2939263B1 (de) * 2012-12-31 2022-06-01 Nalco Company Bestimmung des gehalts an freiem fluorwasserstoff in einem gepufferten oxidätzmittel
US9937535B2 (en) * 2013-03-14 2018-04-10 Ecolab Usa Inc. Method and system for operating a CIP pre-flush step using fluorometric measurements of soil content
US10157801B2 (en) * 2016-01-04 2018-12-18 Taiwan Semiconductor Manufacturing Company, Ltd. Detecting the cleanness of wafer after post-CMP cleaning
US10875059B2 (en) 2017-11-21 2020-12-29 Automatic Spring Products Corp. Method and apparatus for automated particulate extraction from solid parts
CN112368078B (zh) * 2018-04-26 2023-07-14 迪瓦西公司 智能容器系统
US20220252548A1 (en) * 2019-05-23 2022-08-11 Lam Research Corporation Chamber component cleanliness measurement system
US11712778B2 (en) 2019-08-23 2023-08-01 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical mechanical planarization tool
TWI707144B (zh) * 2019-12-13 2020-10-11 新唐科技股份有限公司 積體電路測試裝置的清潔方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4156619A (en) * 1975-06-11 1979-05-29 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for cleaning semi-conductor discs
US4276186A (en) * 1979-06-26 1981-06-30 International Business Machines Corporation Cleaning composition and use thereof
US4637938A (en) * 1983-08-19 1987-01-20 Energy Conversion Devices, Inc. Methods of using selective optical excitation in deposition processes and the detection of new compositions
US4536322A (en) * 1983-10-28 1985-08-20 Union Carbide Corporation Fluorescent corrosive fluoride solution
JPS61186854A (ja) * 1985-02-14 1986-08-20 Fuji Photo Film Co Ltd 超純水中のバクテリア数測定装置
US4783314A (en) * 1987-02-26 1988-11-08 Nalco Chemical Company Fluorescent tracers - chemical treatment monitors
US4992380A (en) * 1988-10-14 1991-02-12 Nalco Chemical Company Continuous on-stream monitoring of cooling tower water
DE9012816U1 (de) * 1990-09-07 1990-11-08 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4204806A1 (de) * 1992-02-18 1993-08-19 Henkel Kgaa Waschverfahren fuer gewerbliche waeschereien
DE4234466A1 (de) * 1992-10-13 1994-04-14 Henkel Kgaa Verfahren zum Bestimmen der Konzentration eines einen Tracer enthaltenden Wirkstoffes in Wirkstofflösungen
US5328556A (en) * 1992-12-31 1994-07-12 Nace Technology, Inc. Wafer fabrication
JP3278513B2 (ja) * 1993-12-09 2002-04-30 株式会社東芝 半導体基板の不純物分析方法
JP3249316B2 (ja) * 1993-12-20 2002-01-21 株式会社東芝 全反射蛍光ｘ線分析が行われる被測定体の表面処理方法
US5411889A (en) * 1994-02-14 1995-05-02 Nalco Chemical Company Regulating water treatment agent dosage based on operational system stresses
US5435969A (en) * 1994-03-29 1995-07-25 Nalco Chemical Company Monitoring water treatment agent in-system concentration and regulating dosage
JPH07326599A (ja) * 1994-05-30 1995-12-12 Mitsubishi Electric Corp 半導体基板の洗浄方法および洗浄装置
US5614032A (en) * 1994-08-04 1997-03-25 At&T Corp. Terpene-based method for removing flux residues from electronic devices
US5665609A (en) * 1995-04-21 1997-09-09 Sony Corporation Prioritizing efforts to improve semiconductor production yield
US5820697A (en) * 1997-04-18 1998-10-13 International Business Machines Corporation Fluorescent water soluble solder flux
US5922606A (en) * 1997-09-16 1999-07-13 Nalco Chemical Company Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips

Also Published As

Publication number Publication date
TW386912B (en) 2000-04-11
WO1999014798A1 (en) 1999-03-25
US5922606A (en) 1999-07-13
PT1016127E (pt) 2005-07-29
DE69829675D1 (de) 2005-05-12
US6238487B1 (en) 2001-05-29
KR100644257B1 (ko) 2006-11-10
CN1270701A (zh) 2000-10-18
EP1016127B1 (de) 2005-04-06
ATE292843T1 (de) 2005-04-15
ID24157A (id) 2000-07-13
DE69829675T2 (de) 2006-03-30
ES2238769T3 (es) 2005-09-01
KR20010023959A (ko) 2001-03-26
JP4160254B2 (ja) 2008-10-01
DE69829675T8 (de) 2006-06-08
EP1016127A1 (de) 2000-07-05
AU736380B2 (en) 2001-07-26
MY121693A (en) 2006-02-28
JP2001516968A (ja) 2001-10-02
AU9384898A (en) 1999-04-05

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