WO2016042630A1 - 被覆膜とその製造方法およびpvd装置 - Google Patents
被覆膜とその製造方法およびpvd装置 Download PDFInfo
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- WO2016042630A1 WO2016042630A1 PCT/JP2014/074599 JP2014074599W WO2016042630A1 WO 2016042630 A1 WO2016042630 A1 WO 2016042630A1 JP 2014074599 W JP2014074599 W JP 2014074599W WO 2016042630 A1 WO2016042630 A1 WO 2016042630A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
Definitions
- the present invention relates to a coating film, a manufacturing method thereof, and a PVD apparatus, and more particularly to a coating film suitable as a coating film for various sliding members, a manufacturing method thereof, and a PVD apparatus used in the manufacturing method.
- This hard carbon film is generally called by various names such as a diamond-like carbon (DLC) film, an amorphous carbon film, an i-carbon film, and a diamond-like carbon film. Classified as crystalline.
- DLC diamond-like carbon
- CC single bonds
- it also has features such as low hardness, high lubricity, excellent mating compatibility, etc., like graphite crystals. ing.
- it since it is amorphous, it has excellent flatness and low friction in direct contact with the counterpart material, that is, it has a small friction coefficient and excellent compatibility with the counterpart material.
- the coating film of the sliding member is required to have chipping resistance (breakage resistance) and peeling resistance, but these characteristics are still sufficiently improved. The current situation is not to say.
- Patent Document 1 an amorphous structure mainly composed of carbon, a low-hardness hard carbon layer including a graphite cluster having an average diameter of 2 nm or more, and a high-hardness hard including a graphite cluster having an average diameter of 1 nm or less. It has been shown that by alternately laminating carbon layers, low friction and wear resistance are compatible, but the compatibility is still insufficient, and chipping resistance and peeling resistance are also sufficient. I can not say.
- a hard carbon film mainly composed of carbon and hydrogen and having a surface roughness of Rmax 0.5 ⁇ m or less is formed by a plasma CVD method, and has an amorphous structure in terms of X-ray diffraction crystallography.
- the number of carbon atoms in each cluster is specified to achieve both low friction and wear resistance.
- both clusters of diamond structure and graphite structure are indispensable, and each cluster has a large number of atoms of 100 to 2000. Analyzing the region contains crystalline material, and the size of the cluster may be large, so there is a limit to achieving both low friction and wear resistance, and chipping resistance Peel resistance not be also sufficient.
- Patent Document 3 a metal member in which a DLC film is arranged on a metal substrate containing at least iron, and the DLC film is made of graphite observed in a Raman spectrum with a wave number in the range of 1550 to 1600 cm ⁇ 1.
- a metal member that has a peak due to a plurality of peak intensities mixed in the film surface, and the maximum and minimum difference in peak intensity is one digit or more.
- the DLC film with excellent hardness and the DLC film with excellent lubricity are large in the plane of several tens of ⁇ m, so performance differences depending on the location are likely to appear, and the friction surface is uniformly low in friction. Both wear and wear resistance It is difficult to.
- Patent Document 4 discloses a hard carbon film having a structure in which at least a part of sp 2 bonding crystals are continuously connected in the film thickness direction.
- a crystalline substance is included in the hard carbon film.
- the formed film has a low hardness and is inferior in wear resistance. Therefore, even if it is suitable as a conductive member, it cannot be employed as a coating film for a sliding member that requires excellent wear resistance.
- Patent Document 5 discloses an oriented DLC film containing nitrogen in which the amount of carbon having sp 2 hybrid orbitals is 70 atomic% or more and the (002) plane of graphite is oriented along the thickness direction.
- nitrogen is used in plasma CVD for film formation, and the bias voltage is very low at ⁇ 1500 V or less.
- the number of carbon electrons having sp 2 hybrid orbitals is 70% or more and the sp 2 / sp 3 ratio is very large, 2.3 to ⁇ , and only a coating film having low hardness and poor wear resistance can be obtained. After all, it cannot be employed as a coating film for sliding members.
- Patent Document 6 discloses a DLC film for a piston ring containing at least 10 ⁇ m-thick hydrogen-free ta-c type DLC, and the sp 3 ratio in the outer 1-3 ⁇ m of the ta-c type DLC film.
- B, O, Si is reduced by doping, an amorphous film having excellent friction during running-in, heat resistance improvement in an insufficient lubricating environment, and an effect of suppressing seizure has been proposed. After all, low friction and wear resistance are not fully achieved.
- the present invention not only sufficiently improves the compatibility between low friction and wear resistance, but also a coating film that has improved chipping resistance (fracture resistance) and peel resistance, a method for producing the same, and It is an object of the present invention to provide a PVD apparatus used in the manufacturing method.
- a vapor phase growth method such as a PVD method or a CVD method has been used.
- the base material temperature was controlled to 200 ° C. or lower for film formation. .
- the hard carbon film is formed by raising the substrate temperature using the PVD method without being bound by the above-described conventional concept.
- the inventors themselves have a surprising result that when a hard carbon film is formed at a substrate temperature of 250 ° C. or higher and a bias voltage of ⁇ 275 V or lower, a hard carbon film having a completely different structure is formed. Obtained.
- the columnar hard carbon layer has a relatively black portion and a relatively white portion.
- the white and black colors in this columnar hard carbon layer are not a density difference and are slightly different. It seems to represent a heading difference. That is, the columnar hard carbon layer has a structure in which the (002) plane is parallel to the substrate and the C-axis grows perpendicularly to the substrate, but each columnar structure grows in a slightly rotated form.
- the bright-field TEM image has a color tone difference, and it is considered that this orientation difference is only observed and does not represent a density difference.
- This columnar hard carbon layer has all diffraction spots by electron beam diffraction and is considered crystalline.
- Columnar hard carbon grows in the thickness direction with a fine particle size and has a large aspect ratio. Since a fine columnar structure having a large aspect ratio is very excellent in strength, not only low friction but also chipping resistance can be improved. In addition, since the hard carbon structure that is columnar in the thickness direction is resistant to peeling, it can exhibit excellent peeling resistance. Further, the fine carbonized hard carbon is excellent in wear resistance.
- the hard carbon in which the film grows in a columnar shape in a direction perpendicular to the base material as described above is formed using the PVD method.
- a CVD method can form a hard carbon film.
- the CVD method is suitable as a film forming method for forming a high density hard carbon because the film forming temperature is high.
- the present inventor has found that a hard carbon film having the above structure is formed by adopting the PVD method and appropriately controlling the film forming temperature.
- the CVD method uses a gas source containing hydrogen, the hardness of the film tends to decrease, and the low friction property in oil is poor.
- the PVD method uses a solid carbon source for the cathode, so There is a merit that it is possible to form a hard carbon film that is high in hardness and free of low friction in oil.
- a coating film coated on the surface of the substrate When the cross section is observed by a bright field TEM image, a hard carbon layer is formed that is continuous in a columnar shape in a direction perpendicular to the base material, The hard carbon layer is formed using a PVD method; When the hard carbon layer is measured by Raman spectroscopy, the coating film is characterized in that the ID / IG ratio, which is the area intensity ratio of the D-band and G-band peaks of the Raman spectrum, is 1 to 6. .
- the invention described in claim 2 The coating film according to claim 1, wherein the width of the hard carbon connected in a columnar shape in a direction perpendicular to the substrate is 1 to 500 nm.
- the impact absorbing ability from the outside can be improved by narrowing the width of the hard carbon continuous in the direction perpendicular to the base material (the line width of the hard carbon constituting the columnar shape). Further, when the width of the hard carbon is reduced, the structure becomes finer, so that the wear resistance is improved. As a result, a coating film having an excellent balance between chipping resistance and wear resistance can be provided.
- a preferred width is 1 to 500 nm, particularly 3 to 60 nm.
- the invention according to claim 3 3.
- Hard carbon which is continuous in a columnar shape in the direction perpendicular to the base material, has a diffraction spot by electron diffraction of the cross section of the coating film and is crystalline, so it is resistant to repeated stress and positive / negative stress. Chipping property is improved and wear resistance is improved.
- the aspect ratio is preferably 2 to 300.
- the invention according to claim 4 The hard carbon continuous in a columnar shape in a direction perpendicular to the base material exhibits a diffraction spot at a position of a lattice spacing of 0.3 to 0.4 nm by electron beam diffraction of a cross section of the coating film.
- the C-plane and (002) plane of graphite or graphene are laminated. Therefore, it is preferable to improve the lubricity.
- the conductivity in the thickness direction of the columnar hard carbon layer is low, and the conductivity in the direction perpendicular to the thickness direction is also reduced, and many crystal grain boundaries are formed by columnarization of fine crystal grains. Therefore, when measured by the two-terminal method, an electric resistance of 1 to 1000 ⁇ ⁇ cm is exhibited even when coated on a conductor.
- the invention described in claim 5 5.
- a hard carbon layer with a high hydrogen content has a smaller friction reducing effect in oil than when it does not contain hydrogen, and the hardness tends to decrease, so the wear resistance tends to decrease.
- the hydrogen content is 10 atomic% or less
- the hard carbon layer has a high hardness as a whole, so that the wear resistance can be improved. It is especially preferable that it is 5 atomic% or less.
- nitrogen (N), boron (B), silicon (Si), and other metal elements are preferably not included except for inevitable impurities.
- the nanoindentation hardness is too large, the chipping resistance tends to decrease. On the other hand, if the nanoindentation hardness is too small, the wear resistance tends to be insufficient.
- the particularly preferred nanoindentation hardness is 15 to 30 GPa, and in particular, the chipping resistance can be effectively improved.
- the invention described in claim 7 7.
- the sp 2 / sp 3 ratio of hard carbon that is continuous in a columnar shape in a direction perpendicular to the base material is 0.3 to 0.9. 2.
- the sp 2 / sp 3 ratio is too small, the chipping resistance improving effect is not sufficient. On the other hand, if the sp 2 / sp 3 ratio is too large, the wear resistance is greatly reduced.
- the preferred sp 2 / sp 3 ratio is 0.3 to 0.9, more preferably 0.4 to 0.8. By controlling in such a range, both chipping resistance and wear resistance are sufficiently compatible. Can be made. In addition, the coating film is difficult to break even when subjected to high loads or repeated loads.
- the invention according to claim 8 provides: In the lower layer of the columnar hard carbon layer, further has a non-columnar hard carbon layer, The coating film according to any one of claims 1 to 7, wherein a sp 2 / sp 3 ratio of the lower hard carbon layer is 0.1 to 0.3.
- the non-columnar hard carbon layer present in the lower layer of the columnar hard carbon layer contains more sp 3 bonding components than the columnar hard carbon layer, and thus has a higher density and excellent wear resistance.
- sp 2 / By controlling the sp 3 ratio in the range of 0.1 to 0.3, particularly 0.15 to 0.3, the wear resistance can be sufficiently improved.
- the invention according to claim 9 is: The coating film according to claim 8, wherein the lower hard carbon layer has a nanoindentation hardness of 35 to 80 GPa.
- the nanohardness of the lower hard carbon layer is preferably 35 to 80 GPa because the wear resistance of the coating film can be further improved.
- the invention according to claim 10 is: Using the arc PVD method, Controlling the bias voltage, arc current, heater temperature and / or furnace pressure so that the substrate temperature is maintained at 250-400 ° C .; By coating the hard carbon film on the surface of the substrate while rotating and / or revolving the substrate, A method for producing a coating film, comprising producing the coating film according to any one of claims 1 to 9.
- the arc PVD method is a film forming method that can generate and coat active carbon particles having a high ionization rate, and by optimizing the bias voltage, arc current, heater temperature, furnace pressure, etc.
- White hard carbon can be generated from active carbon particles, and a columnar hard carbon layer can be formed using this as a growth starting point.
- the invention according to claim 11 11 The method for manufacturing a coating film according to claim 10, wherein the bias voltage is ⁇ 275 to ⁇ 400V.
- a bias voltage In the optimization of each parameter described above, particularly important parameters are a bias voltage, an arc current, and a substrate temperature controlled by a heater.
- the substrate temperature is preferably 250 to 400 ° C, particularly preferably 250 to 350 ° C.
- the invention according to claim 12 It is a PVD apparatus used for the manufacturing method of the coating film of Claim 10 or Claim 11,
- the PVD apparatus is an arc PVD apparatus provided with a control means for controlling the temperature of the substrate to 250 to 400 ° C.
- the base material temperature may not reach 250 ° C. or the substrate temperature may exceed 400 ° C. during film formation depending on the bias voltage of the arc PVD apparatus. May occur, and the coating film having the above structure may not be formed.
- a control means capable of controlling the substrate temperature to be 250 to 400 ° C. is provided to uniformly heat the substrate at an appropriate temperature. Is going.
- Specific control means include a method of providing a heater for heating the base material uniformly, a method of introducing a cooling mechanism into a jig for setting the base material, and a base material temperature monitored by a thermocouple. Examples include a method of automatically controlling the bias voltage and arc current.
- Base material support means for supporting the base material so as to freely rotate and revolve
- the PVD apparatus according to claim 12 further comprising a rotation control unit that controls a rotation speed of rotation and / or revolution of the base material.
- the base material can be heated more uniformly.
- a coating film that not only sufficiently improves both low friction and wear resistance, but also improves chipping resistance (breakage resistance) and peel resistance, a method for producing the same, and A PVD apparatus used in the manufacturing method can be provided.
- the base material on which the coating film is formed is not particularly limited, and base materials such as non-ferrous metals, ceramics, and hard composite materials can be used in addition to iron-based materials.
- base materials such as non-ferrous metals, ceramics, and hard composite materials
- carbon steel, alloy steel, hardened steel, high speed tool steel, cast iron, aluminum alloy, Mg alloy, cemented carbide and the like can be mentioned.
- a base material whose characteristics do not deteriorate greatly with temperature is preferred.
- intermediate layer When forming the coating film, it is preferable to previously provide an intermediate layer on the substrate. As a result, the adhesion between the base material and the coating film can be improved, and when the coating film is worn, the exposed intermediate layer can exhibit a wear resistance function.
- At least one element such as Cr, Ti, Si, W, or B can be used.
- at least one kind of nitride such as Cr, Ti, Si, Al, carbonitride, carbide or the like can be used for the lower layer of these elements.
- nitride such as Cr, Ti, Si, Al, carbonitride, carbide or the like
- examples of such compounds include CrN, TiN, CrAlN. , TiC, TiCN, TiAlSiN and the like.
- the coating film of the present invention forms a hard carbon layer in which hard carbon is connected in a columnar shape when a bright field TEM image in a cross section perpendicular to the substrate is observed.
- FIG. 1 is a bright field TEM image of a cross section of a coating film according to an embodiment of the present invention
- FIG. 2 is an enlarged view of a part of the bright field TEM image of FIG.
- 1 is a coating film and 2 is a substrate.
- columnar hard carbon grows on the upper layer 1 a (surface side) of the coating film 1 toward the surface of the coating film 1, and a hard carbon layer that is not columnar on the lower layer 1 b of the coating film 1. It can be seen that is formed.
- the particle width of the hard carbon particles of the columnar hard carbon layer 1a can be measured by a bright field TEM image as shown in FIG.
- the hard carbon continuous in a columnar shape has a width of 1 to 500 nm, more preferably 3 to 60 nm, and preferably has a diffraction spot (crystalline diffraction pattern) by electron beam diffraction.
- the sp 2 / sp 3 ratio is 0.3 to 0.9, more preferably 0.4 to 0.8.
- the columnar hard carbon has a diffraction spot at a position with a lattice interval of 0.3 to 0.4 nm by electron beam diffraction.
- the columnar hard carbon layer 1a has a hydrogen content of 10 atomic% or less, more preferably 5 atomic% or less, and the balance is substantially made of carbon.
- N, B, Si and other metal elements are preferably not included except for inevitable impurities.
- the nanoindentation hardness is preferably 10 to 35 GPa, particularly preferably 15 to 30 GPa, and the ID / IG ratio is 1 to 6, more preferably 1.5 to 5.
- the lower layer 1b preferably has a nanoindentation hardness of 35 to 80 GPa, and a sp 2 / sp 3 ratio of 0.1 to 0.3, and a particularly preferable range is 0.15 to 0.3.
- Manufacturing method of coating film and arc type PVD apparatus (1) Manufacturing method The arc type PVD method, the sputter PVD method and the like can be applied to the formation of the coating film 1, but the arc type PVD method is particularly preferable.
- the bias voltage and arc current are adjusted, the substrate is heated by a heater, or a cooling mechanism is introduced into a jig (holder) for setting the substrate. And the production conditions are adjusted so that the substrate temperature is 250 to 400 ° C., more preferably 250 to 350 ° C.
- a preferable bias voltage at this time is ⁇ 275 to ⁇ 400 V.
- the arc current is changed or the bias voltage is intermittently changed in a pulsed manner or in a discontinuous manner. Since the substrate temperature can be controlled also by a method such as applying, there is no particular limitation.
- the substrate is rotated at a rotation speed of 10 to 200 rpm or revolved at a rotation speed of 1 to 20 ppm.
- the hard carbon layer is likely to grow as a columnar hard carbon layer because it is easy to perform crystal growth in a certain direction.
- the substrate temperature is set to 250 to 400 ° C.
- the temperature is less than 250 ° C., it is difficult for the carbon ions to grow in a columnar shape even if the carbon ions enter the substrate from the front. This is because the hardness is lowered but the wear resistance tends to be lowered although columnarization proceeds.
- the substrate temperature can be adjusted other than the adjustment of the bias voltage such as the arc current, the heater temperature, and the furnace pressure, but when the bias voltage exceeds -275 V, a columnar hard carbon layer is formed.
- the bias voltage such as the arc current, the heater temperature, and the furnace pressure
- it is preferably ⁇ 275 to ⁇ 400 V, more preferably ⁇ 275 to ⁇ 380 V, considering that the wear resistance tends to decrease.
- the pressure in the furnace is 10 ⁇ 4 to 5 ⁇ 10 ⁇ 1 Pa in a vacuum atmosphere, a hard carbon film having low friction and high wear resistance can be obtained as compared with the case where hydrogen gas or nitrogen gas is introduced. This is preferable because it is possible.
- the bias voltage is generally controlled,
- the film was formed under conditions where the substrate temperature did not rise above 200 ° C.
- the bias voltage is set to ⁇ 500 to ⁇ 1000 V, and the inner layer (lower layer) is coated with a layer that appears white in a bright field TEM image, and the upper layer is applied with a bias voltage of ⁇ 100 V.
- a technique for forming a hard carbon layer that appears darker than the inner layer in a bright-field TEM image has been proposed.
- by controlling the bias voltage only the density of the hard carbon film is inclined in the thickness direction. It is not disclosed, and it is not possible to form a highly structured columnar hard carbon structure as in the present invention, and low friction and wear resistance as in the hard carbon film according to the present invention. It is not possible to produce a coating film that has excellent sliding characteristics with sufficient compatibility, and also has excellent chipping resistance and peeling resistance.
- the coating film of the present embodiment can be manufactured by using an arc type PVD apparatus.
- an arc type PVD apparatus M720 manufactured by Japan IT Corporation is cited. Can do.
- the production of the coating film using this arc type PVD apparatus will be specifically described.
- a metal material to be a base material is coated with CrN with a thickness of 10 ⁇ m, and then taken out from the PVD apparatus and polished so that the surface roughness is 0.3 ⁇ m in Rz.
- a base material is set to an arc type PVD apparatus provided with a self-revolving jig.
- the hard carbon film is grown in a columnar shape by controlling the substrate temperature to be about 250 to 400 ° C.
- the details of the film formation mechanism in the present invention are unknown, but by placing the substrate temperature in such a high temperature environment and setting the bias voltage to a low value of ⁇ 275 V or less, the hard carbon It is thought that it grows in a columnar shape in a direction perpendicular to the substrate.
- FIG. 3 is a diagram schematically showing a main part of a film forming furnace of the arc type PVD apparatus according to the present embodiment.
- the arc type PVD apparatus includes a film forming furnace 11 and a control device (not shown).
- the furnace 11 includes a vacuum chamber 12, a plasma generator (not shown), a heater 13, a self-revolving jig 14 as a base material support device, and a thermocouple (TC 10 mm square bar) 15 as a thermometer side device.
- a bias power source (not shown) and a pressure adjusting device (not shown) for adjusting the pressure in the furnace are provided.
- T is a target (carbon target), and 21 is a base material (iron base material) on which an intermediate layer is formed. Further, although five targets T are actually provided, only one is shown in FIG. 3 for the sake of simplicity.
- the plasma generator includes an arc power source, a cathode and an anode, and vaporizes carbon from a carbon target T which is a cathode material by vacuum arc discharge between the cathode and the anode, and includes an ionized cathode material (carbon ions). Generate plasma.
- the bias power source applies a predetermined bias voltage to the base material 21 and causes the carbon ions to fly to the base material 21 with appropriate kinetic energy.
- the self-revolving jig 14 is disc-shaped and is rotatable in the direction of the arrow with the center of the circle as the center of rotation, and is concentric with the center on the disc at regular intervals with respect to the disc. Multiple vertical rotation axes.
- the plurality of base materials 21 are respectively held by the rotation shafts and are rotatable in the direction of the arrow. Thereby, the base material 21 is held by the auto-revolution jig 14 so as to be able to rotate and revolve.
- the auto-revolution jig 14 is heated by heat such as stainless steel so that heat is quickly conducted between the base material 21 and the auto-revolution jig 14 so that the temperatures of the base material 21 and the auto-revolution jig 14 are substantially equal.
- heat such as stainless steel
- a highly conductive metal material is used.
- the heater 13 and the cooling / heating device respectively heat and cool the self-revolving jig 14 so that the base material 21 is indirectly heated and cooled.
- the heater 13 is configured to be temperature adjustable.
- the cooling heating device is configured so that the supply speed of the cooling heating medium can be adjusted. Specifically, when cooling is performed, the cooling water is supplied to the self-revolving jig 14 and / or the rotating shaft, The cooling water supply is stopped when the cooling is stopped, the hot water or steam is supplied to the auto-revolution jig 14 and / or the rotating shaft when the heating is stopped, and the supply of the hot water or the steam is stopped when the heating is stopped. It is configured.
- thermocouple 15 is attached in the vicinity of the base material 21, and the base material temperature is indirectly measured to change at least one of the arc current value, the bias voltage value, and the heater temperature during film formation. Therefore, it is configured to control the target substrate temperature.
- the control device sets the rotation speed of the rotation / revolution jig 14 under a combination of rotation and revolution selected in advance so that the columnar hard carbon layer can be surely formed and the film can be formed evenly.
- Each rotational speed is controlled to a predetermined rotational speed.
- the bias voltage, arc current, heater temperature, and furnace pressure are optimized according to the measurement result of the temperature of the base material 21 by the thermocouple 15. As a result, the temperature of the substrate 21 during film formation can be maintained in the temperature range of 250 to 400 ° C. Further, the operation of the cooling device and the application pattern of the bias voltage are controlled as necessary.
- the substrate temperature is measured at the upper, middle, and lower stages, and the arc current value at each position of the upper, middle, and lower stages is appropriately changed during film formation based on the measured value, and the target temperature is set at the upper, middle, and lower positions.
- a feedback system such as This can stabilize the film structure of the hard carbon film in the upper, middle, and lower stages.
- the film formation parameters such as bias voltage and arc current are input to the control device before the film formation and performed under pre-programmed film formation conditions.
- the density of the hard carbon film can usually be measured by the GIXA method (oblique incidence X-ray analysis method) or the GIXR method (X-ray reflectivity measurement method).
- GIXA method oblique incidence X-ray analysis method
- GIXR method X-ray reflectivity measurement method
- a method utilizing the brightness of a bright field TEM image described in Japanese Patent No. 4918656 can be used.
- a bright-field TEM image the amount of transmission of electron beams increases as the density decreases, so that in the case of substances having the same composition, the image becomes whiter as the density decreases. Therefore, it is preferable to use a bright field TEM image in the cross section of the hard carbon layer in order to determine the density of each layer of the multi-layer hard carbon layer having the same composition.
- the hard carbon layer on the surface has a columnar structure, and no columnar structure is observed on the hard carbon layer on the inner layer.
- the hard carbon layer can be obtained by separating the peak of the Raman spectrum by Raman spectrum analysis. Specifically, the peak position of the D band is fixed at 1350 cm ⁇ 1 and taken out, the area intensity of the peak is taken as ID, and the peak position of the G band is set freely around 1560 cm ⁇ 1 to separate the peaks. The ID / IG ratio is calculated using the peak area intensity as IG.
- the sp 2 / sp 3 ratio is calculated by calculating the sp 2 intensity and the sp 3 intensity by EELS analysis (Electron Energy-Loss Spectroscopy). can do. Specifically, the spectral imaging method in the STEM (scanning TEM) mode is applied, and the EELS obtained at a pitch of 1 nm is integrated under the conditions of an acceleration voltage of 200 kv, a sample absorption current of 10 ⁇ 9 A, and a beam spot size of ⁇ 1 nm. Then, a CK absorption spectrum is extracted as average information from the region of about 10 nm, and the sp 2 / sp 3 ratio is calculated.
- EELS analysis Electrode-Loss Spectroscopy
- sp 2 / sp 3 ratio of density of the hard carbon is less than sp 2 / sp 3 ratio of low density hard carbon Therefore, it can be used as a hard carbon density determination method.
- Nanoindentation hardness is measured using a nanoindenter ENT1100a manufactured by Elionix, Inc. under the conditions of a load of 300 mgf, a load division number of 500 steps, and a load load time of 1 second.
- the columnar hard carbon layer is the uppermost layer, it is possible to measure the nanoindentation hardness from the film surface, but when another coating layer is provided and not the uppermost layer, the cross section of the film is mirror-finished. Measure after polishing. For the lower layer film, the nanoindentation hardness is measured from the film cross section.
- the coating film according to the present invention is a columnar hard carbon layer in which hard carbon grows in a columnar shape in the thickness direction of the hard carbon layer in a bright field image of a TEM structure. It has a very unique tissue structure that was not found in conventional hard carbon layers.
- columnar hard carbon has excellent strength due to its crystal structure having a large aspect ratio, and therefore has excellent chipping resistance. Moreover, since it is a structure continuously connected in the thickness direction, it is resistant to peeling. Furthermore, the c-plane of graphite is oriented in the direction parallel to the base material, so that particularly excellent low friction can be exhibited.
- both low friction and wear resistance can be sufficiently achieved, and the sliding characteristics can be greatly improved compared to the conventional coating film, and the chipping resistance and peeling resistance are also higher than those of the conventional coating film. It can be greatly improved.
- FIG. 1 which is a bright field TEM image of a cross section
- the upper layer 1a (surface side) of the coating film 1 has a columnar hard Carbon grows toward the surface of the coating film 1, and a hard carbon layer that is not columnar is formed on the lower layer 1 b of the coating film 1.
- the present inventors further investigated, by changing the growth conditions of the hard carbon film in various ways, the network-like hard carbon layer grown in a mesh form on the lower layer side of the columnar hard carbon layer grown in a columnar shape. It has been found that a coating film having the same may be formed. In particular, when the substrate is rotated during film formation, heating and cooling are repeated, so that a reticulated hard carbon layer is easily formed.
- the coating film is coated on the surface of the base material, and has a columnar hard carbon continuous in a columnar shape in the thickness direction when a cross-section is observed by a bright field TEM image.
- the columnar hard carbon In the lower layer side of the columnar hard carbon, when the cross section is observed with a bright field TEM image, it has hard carbon relatively black and white, and the white hard carbon is connected in a mesh shape in the thickness direction.
- a net-like hard carbon layer in which black hard carbon is dispersed in the mesh gaps is formed, and both the columnar hard carbon layer and the net-like hard carbon layer are formed using a PVD method.
- the ID / IG ratio which is the area intensity ratio of the D-band and G-band peaks of the Raman spectrum, was 1-6. It is characterized by being Found coating film.
- white hard carbon has a relatively low density
- black hard carbon has a relatively high density
- the low density white hard carbon is soft and more resistant to impact and has lower friction than the high density black hard carbon.
- white hard carbon has a three-dimensional structure that is connected in a mesh shape in the thickness direction, so that externally applied stress can be dispersed very efficiently, and only low frictional properties can be achieved. And chipping resistance can be improved.
- the wear resistance is improved.
- Friction and wear test sample preparation (1) Formation of base material and intermediate layer Base material (SWOSC-V equivalent material) is prepared, diameter ( ⁇ ) 80 mm, ring radial width (a1) 2.6 mm, ring axial width (H1) A 1.2 mm piston ring is formed, and the surface on the sliding surface side is coated with a 10 ⁇ m thick CrN layer using an arc type PVD apparatus, and then polished, and the surface roughness Rz is 0. A 3 ⁇ m CrN layer coated steel substrate was prepared.
- FIG. 4 is a diagram conceptually showing changes in the substrate temperature during the formation of the coating film of the present example and the conventional example, and the horizontal axis represents the thickness of the DLC film grown in%, and the vertical axis Is the substrate temperature at that time.
- FIG. 4 shows that in this example, the substrate temperature when the DLC film grows 50% is 250 ° C., and the substrate temperature reaches 285 ° C. when the DLC film grows 100%.
- the substrate temperature when the DLC film grows 50% is about 170 ° C., and the substrate temperature remains at 190 ° C. even when the DLC film grows 100%. I understand.
- Such a columnar hard carbon layer was formed under a bias voltage of ⁇ 300 V, as shown in FIG. 4, in the initial stage of film formation where the coating temperature of the substrate was less than 250 ° C. This is because the upper layer was formed under temperature conditions controlled to 250 ° C. or higher (260 to 285 ° C. in this embodiment).
- Friction and Wear Test was performed on each coating film using an SRV (Schwingings Rehound and Verschleiss) tester, which is generally performed in evaluation of sliding members for automobiles. Specifically, as shown in FIG. 5, in a state where the sliding surface of the frictional wear test sample W is in contact with the SUJ2 material 24 that is the sliding object, the sliding is performed by reciprocating sliding with a load of 100N and 1000N. The sliding surface of the friction and wear test sample W was observed with a microscope. In FIG. 5, 22 is an intermediate layer, and 23 is a coating film. 21 'is CrN.
- FIG. 6 is a photomicrograph of the sliding surface after sliding for 10 minutes with a load of 100 N of the example
- FIG. 7 is a sliding surface after sliding for 1 hour with a load of 1000 N of the example
- FIG. FIG. 8 is a photomicrograph showing a sliding test result after sliding for 10 minutes with a load of 100 N in the conventional example
- FIG. 9 shows a result after sliding for 1 hour with a load of 1000 N of the conventional example.
- It is a microscope picture which shows a sliding test result.
- the light gray portion 23 in FIGS. 6 and 7 is a hard carbon coating film
- the light gray portion 21 ′ at the center in FIGS. 8 and 9 is CrN, which has a gray color close to white around it.
- Portion 22 is a Cr intermediate layer.
- the surrounding dark gray portion 23 is a hard carbon coating film.
- the initial bias voltage is set to -170 V
- the hard carbon layer is coated at a temperature of 200 to 300 ° C.
- the Cr layer is thinly coated. Is applied at a temperature exceeding 250 ° C. at a bias voltage of ⁇ 350 V, or the initial bias voltage is set to ⁇ 170 V, and the substrate temperature is once cooled to 150 ° C. or less, and then the hard carbon is coated at a bias voltage of ⁇ 300 V.
- network on the lower layer side of the hard carbon layer grown in the columnar shape was often formed.
Abstract
Description
基材の表面に被覆される被覆膜であって、
断面を明視野TEM像により観察したとき基材に対して垂直な方向に柱状に連なっている硬質炭素層が形成されており、
前記硬質炭素層がPVD法を用いて形成されており、
前記硬質炭素層をラマン分光法で測定したとき、ラマン分光スペクトルのDバンドとGバンドのピークの面積強度比であるID/IG比が1~6である
ことを特徴とする被覆膜である。
前記基材に対して垂直な方向に柱状に連なっている硬質炭素の幅が、1~500nmであることを特徴とする請求項1に記載の被覆膜である。
前記基材に対して垂直な方向に柱状に連なっている硬質炭素が、被覆膜断面の電子線回折で回折スポットを示すことを特徴とする請求項1または請求項2に記載の被覆膜である。
前記基材に対して垂直な方向に柱状に連なっている硬質炭素が、被覆膜断面の電子線回折で格子間隔0.3~0.4nmの位置に回折スポットを示すことを特徴とする請求項1ないし請求項3のいずれか1項に記載の被覆膜である。
柱状の前記硬質炭素層の水素含有量が、10原子%以下であることを特徴とする請求項1ないし請求項4のいずれか1項に記載の被覆膜である。
柱状の前記硬質炭素層のナノインデンテーション硬度が、10~35GPaであることを特徴とする請求項1ないし請求項5のいずれか1項に記載の被覆膜である。
前記基材に対して垂直な方向に柱状に連なっている硬質炭素のsp2/sp3比が、0.3~0.9であることを特徴とする請求項1ないし請求項6のいずれか1項に記載の被覆膜である。
柱状の前記硬質炭素層の下層に、さらに、柱状ではない硬質炭素層を有しており、
前記下層の硬質炭素層のsp2/sp3比が0.1~0.3であることを特徴とする請求項1ないし請求項7のいずれか1項に記載の被覆膜である。
前記下層の硬質炭素層は、ナノインデンテーション硬度が35~80GPaであることを特徴とする請求項8に記載の被覆膜である。
アーク式PVD法を用いて、
前記基材温度が250~400℃に維持されるように、バイアス電圧、アーク電流、ヒーター温度および/または炉内圧力を制御すると共に、
前記基材を自転および/または公転させながら、前記基材の表面に前記硬質炭素膜を被覆することにより、
請求項1ないし請求項9のいずれか1項に記載の被覆膜を製造することを特徴とする被覆膜の製造方法である。
前記バイアス電圧が-275~-400Vであることを特徴とする請求項10に記載の被覆膜の製造方法である。
請求項10または請求項11に記載の被覆膜の製造方法に用いられるPVD装置であって、
前記基材の温度を250~400℃に制御する制御手段が備えられたアーク式PVD装置であることを特徴とするPVD装置である。
前記基材を自公転自在に支持する基材支持手段と、
前記基材の自転および/または公転の回転速度を制御する回転制御手段と
を備えていることを特徴とする請求項12に記載のPVD装置である。
本発明において、被覆膜を形成させる基材としては特に限定されず、鉄系の他、非鉄系の金属あるいはセラミックス、硬質複合材料等の基材を使用することができる。例えば、炭素鋼、合金鋼、焼入れ鋼、高速度工具鋼、鋳鉄、アルミ合金、Mg合金や超硬合金等を挙げることができるが、被覆膜の成膜温度を考慮すると、250℃以上の温度で特性が大きく劣化しない基材が好ましい。
被覆膜の形成に際しては、基材上に予め中間層を設けることが好ましい。これにより、基材と被覆膜の密着性を向上させることができると共に、被覆膜が摩耗した場合には、露出したこの中間層に耐摩耗性機能を発揮させることができる。
本発明の被覆膜は、基材に対して垂直な断面における明視野TEM像を観察すると、硬質炭素が柱状に連なった硬質炭素層を形成している。
(1)製造方法
上記被覆膜1の形成にはアーク式PVD法、スパッタPVD法などを適用できるが、特に好ましいのはアーク式PVD法である。
次に、本実施の形態に係るアーク式PVD装置について具体的に説明する。図3は本実施の形態のアーク式PVD装置の成膜用の炉の要部を模式的に示す図である。
(1)TEM組織の観察
FIB(Focused Ion Beam)を用いて薄膜化した被覆膜を、TEM(透過型電子顕微鏡:Transmission Electron Microscope)により、例えば加速電圧300kVで明視野TEM像を観察する。
HFS(Hydrogen Forward Scattering)分析により被覆膜中の水素含有量を測定する。
硬質炭素皮膜の密度は、通常、GIXA法(斜入射X線分析法)やGIXR法(X線反射率測定法)によって測定可能である。しかし、硬質炭素層中で密度の小さい粗な硬質炭素と密度の大きい密の硬質炭素とが非常に微細に分散している場合、上記方法では各部の密度を高精度で測定することは難しい。
FIBにて断面を薄膜化した被覆膜を加速電圧200kV、試料吸収電流10-9A、ビームスポットサイズ0.7nmφにて電子線回折を行い、極微小電子線回折図形の画像を取得して、その画像が散漫散乱パターンであれば非晶性と判定し、スポット状のパターンが観察されれば結晶性と判定してスポット近傍の強度間隔Lを測定して、2Lλ=カメラ長の関係から格子間隔λ(nm)を求める。
硬質炭素層は、ラマンスペクトル分析によるラマンスペクトルのピークを分離することにより得ることができる。具体的には、Dバンドのピーク位置を1350cm-1に固定して取り出し、そのピークの面積強度をIDとし、Gバンドのピーク位置は1560cm-1付近にフリーにセットしてピーク分離し、そのピークの面積強度をIGとして、ID/IG比を算出する。
EELS分析(Electron Energy-Loss Spectroscopy:電子エネルギー損失分光法)により、sp2強度、sp3強度を算出することで、sp2/sp3比を算出することができる。具体的には、STEM(走査型TEM)モードでのスペクトルイメージング法を適用し、加速電圧200kv、試料吸収電流10-9A、ビームスポットサイズφ1nmの条件で、1nmのピッチで得たEELSを積算し、約10nm領域からの平均情報としてC-K吸収スペクトルを抽出し、sp2/sp3比を算出する。本測定方法を用いれば、微小部におけるSP2/SP3比を測定可能であり、高密度の硬質炭素のsp2/sp3比は低密度の硬質炭素のsp2/sp3比よりも小さいため、硬質炭素の粗密判定方法として代用することができる。
二端子法により、端子間に一定の電流を流して二端子間の電圧降下を測定し、抵抗値を算出して被覆膜の電気抵抗を測定する。
ナノインデンテーション硬度は、エリオニクス社製ナノインデンターENT1100aを用いて、荷重300mgf、荷重分割数500ステップ、荷重負荷時間1秒の条件で測定する。
以上述べてきたように、本発明に掛かる被覆膜は、TEM組織の明視野像において硬質炭素が、硬質炭素層の厚み方向に柱状に成長した柱状の硬質炭素層という従来の硬質炭素層には見られなかった非常に特異な組織構造を有している。
なお、上記した一実施の形態の被覆膜において、断面の明視野TEM像である図1に示したように、被覆膜1の上層1a(表面側)に柱状の硬質炭素が被覆膜1の表面に向かって成長しており、被覆膜1の下層1bには柱状でない硬質炭素層が形成されている。
(1)基材、中間層の形成
基材(SWOSC-V相当材)を用意し、直径(φ)80mm、リング径方向幅(a1)2.6mm、リング軸方向幅(h1)1.2mmのピストンリング形状に形成し、その摺動面側の表面にアーク式PVD装置を用いて厚み10μmのCrN層を被覆した後、磨き処理を行い、面粗さRzで0.3μmのCrN層被覆鋼基材を準備した。
次に、図3に示す成膜用の炉11を備えるアーク式PVD装置を用いて、CrN層被覆鋼基材に、厚み0.2μmのCr中間層および厚み0.9μmの硬質炭素膜を以下に示す成膜条件の下で形成し、実施例、および従来例の試料を作製した。図4は本実施例および従来例の被覆膜形成時の基材温度の変化を概念的に示す図であり、横軸はDLC膜が成長した厚みを%で表したものであり、縦軸はそのときの基材温度である。
CrN層被覆鋼基材を基材支持装置でもある自公転治具14に配置した後、アーク式PVD装置の炉11内にセットし、厚み0.2μmの金属Cr層を中間層として被覆後、ヒーター13を250℃に加熱し、12kW(-300V、40A)でアーク放電を行って、カーボンカソードを用いて硬質炭素を被覆した。自公転治具14の回転(自転:39rpm、公転:4rpm)により、炉11内の基材21の温度が、成膜初期の70℃から成膜後期の最高温度285℃まで連続的に上昇するように制御した。
硬質炭素成膜中のバイアス電圧を-75Vとし、途中冷却を挟みながら成膜中の基材温度が70~200℃になるように制御したこと以外は実施例と同様にして成膜を行った。
(1)明視野TEM像の観察
形成した被覆膜の基材に対して垂直な断面における明視野TEM像を観察した。観察結果を表1に示す。
実施例の被覆膜について、上層(柱状の硬質炭素層)の電気抵抗、ID/IG比、電子線回折による結晶性、水素含有量、ナノインデンテーション硬度、sp2/sp3比を計測した。なお、電子線回折による結晶性の計測およびsp2/sp3比の計測は、上層の柱状の硬質炭素と下層の柱状でない硬質炭素の双方で行った。また、下層の硬質炭素層におけるナノインデンテーション硬度とsp2/sp3比も計測した。計測結果を表2に示す。
次に、各被覆膜に対して、自動車用摺動部材の評価で一般的に行われているSRV(Schwingungs Reihungund und Verschleiss)試験機による摩擦摩耗試験を行った。具体的には、図5に示すように、摩擦摩耗試験試料Wの摺動面を摺動対象であるSUJ2材24に当接させた状態で、100Nおよび1000Nの荷重を掛けて往復摺動させ、摩擦摩耗試験試料Wの摺動面を顕微鏡で観察した。なお、図5において22は中間層であり、23は被覆膜である。また、21’はCrNである。
なお、上記した実施例において、初期のバイアス電圧を-170Vとし、200~300℃の温度で硬質炭素層を被覆した後、途中でCr層を薄く被覆し、さらに硬質炭素層をバイアス電圧-350Vで250℃を超える温度で被覆した場合や、初期のバイアス電圧を-170Vとし、一旦基材温度を150℃以下にまで冷却した後に、バイアス電圧-300Vで硬質炭素の被覆を行った場合に、柱状に成長した硬質炭素層の下層側に網目状に成長した網目状硬質炭素層を有する被覆膜が形成されることが多いことが確認できた。
1a 柱状の硬質炭素層
1b 下層
2、21 基材
11 炉
12 真空チャンバー
13 ヒーター
14 自公転治具(基材支持装置)
15 熱電対
21’ CrN
22 中間層
24 SUJ2材
T ターゲット
W 摩擦摩耗試験試料
Claims (13)
- 基材の表面に被覆される被覆膜であって、
断面を明視野TEM像により観察したとき基材に対して垂直な方向に柱状に連なっている硬質炭素層が形成されており、
前記硬質炭素層がPVD法を用いて形成されており、
前記硬質炭素層をラマン分光法で測定したとき、ラマン分光スペクトルのDバンドとGバンドのピークの面積強度比であるID/IG比が1~6である
ことを特徴とする被覆膜。 - 前記基材に対して垂直な方向に柱状に連なっている硬質炭素の幅が、1~500nmであることを特徴とする請求項1に記載の被覆膜。
- 前記基材に対して垂直な方向に柱状に連なっている硬質炭素が、被覆膜断面の電子線回折で回折スポットを示すことを特徴とする請求項1または請求項2に記載の被覆膜。
- 前記基材に対して垂直な方向に柱状に連なっている硬質炭素が、被覆膜断面の電子線回折で格子間隔0.3~0.4nmの位置に回折スポットを示すことを特徴とする請求項1ないし請求項3のいずれか1項に記載の被覆膜。
- 柱状の前記硬質炭素層の水素含有量が、10原子%以下であることを特徴とする請求項1ないし請求項4のいずれか1項に記載の被覆膜。
- 柱状の前記硬質炭素層のナノインデンテーション硬度が、10~35GPaであることを特徴とする請求項1ないし請求項5のいずれか1項に記載の被覆膜。
- 前記基材に対して垂直な方向に柱状に連なっている硬質炭素のsp2/sp3比が、0.3~0.9であることを特徴とする請求項1ないし請求項6のいずれか1項に記載の被覆膜。
- 柱状の前記硬質炭素層の下層に、さらに、柱状ではない硬質炭素層を有しており、
前記下層の硬質炭素層のsp2/sp3比が0.1~0.3であることを特徴とする請求項1ないし請求項7のいずれか1項に記載の被覆膜。 - 前記下層の硬質炭素層は、ナノインデンテーション硬度が35~80GPaであることを特徴とする請求項8に記載の被覆膜。
- アーク式PVD法を用いて、
前記基材温度が250~400℃に維持されるように、バイアス電圧、アーク電流、ヒーター温度および/または炉内圧力を制御すると共に、
前記基材を自転および/または公転させながら、前記基材の表面に前記硬質炭素膜を被覆することにより、
請求項1ないし請求項9のいずれか1項に記載の被覆膜を製造することを特徴とする被覆膜の製造方法。 - 前記バイアス電圧が-275~-400Vであることを特徴とする請求項10に記載の被覆膜の製造方法。
- 請求項10または請求項11に記載の被覆膜の製造方法に用いられるPVD装置であって、
前記基材の温度を250~400℃に制御する制御手段が備えられたアーク式PVD装置であることを特徴とするPVD装置。 - 前記基材を自公転自在に支持する基材支持手段と、
前記基材の自転および/または公転の回転速度を制御する回転制御手段と
を備えていることを特徴とする請求項12に記載のPVD装置。
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